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1. 发明专利

JP2005502480A It hung the method of manufacturing a micro-structure of the porous silicon, and the application of the gas sensor 审中-公开
公开(公告)号：JP2005502480A
公开(公告)日：2005-01-27
申请号：JP2003516946
申请日：2002-02-18
申请人：エヌシーエスアール“デモクリトス”−インスティテュートオブマイクロエレクトロニクスNcsr“Demokritos”−Institute Of Microelectronics , ツァミス、クリストスTSAMIS,Christos , ツェレピ、アンジェリキTSEREPI,Angeliki , ナシオプールー、アンドロウラジー.NASSIOPOULOU,Androula,G.
发明人：ツァミス、クリストス , ツェレピ、アンジェリキ , ジー．ナシオプールー、アンドロウラ
IPC分类号： G01N27/16 , B81B3/00 , B81C1/00 , G01F1/684 , G01N27/12 , G01N27/18 , H01L37/00 , H05B3/26
CPC分类号： H05B3/265 , B81B2201/0278 , B81B2203/0109 , B81B2203/0118 , B81C1/00682 , B81C1/0069 , B81C2201/0115 , G01F1/6845 , G01N27/12 , G01N27/16 , G01N27/18
摘要：本発明は、橋又はカンチレバーの形状により掛架した多孔質シリコン薄膜、及びその薄膜を採用した熱センサ装置の製造のための前面シリコンマイクロマシニングの方法を提供する。掛架した多孔質シリコン薄膜の製造方法は、以下の工程からなる。（ａ）少なくとも一つの、シリコン基板（１）の所定領域に多孔質シリコンを形成する工程と、（ｂ）標準的なフォトリソグラフィーを使用して、該多孔質シリコン層の周囲又は内部にエッチング開口窓（５）を画定する工程と、（ｃ）ドライエッチング技術の使用により、多孔質シリコン層（２）の下のシリコン基板（１）に、選択的なエッチングをすることにより、多孔質シリコン薄膜の分離と、該多孔質シリコン層の下に空間（６）形成する。更に、提供した方法が、多孔質シリコンの低い熱伝導性から生じる利点と、掛架した薄膜の使用とを組み合わせるため、本発明は熱損失が最小限の多孔質シリコン薄膜に基づく、熱センサの製造方法を提供する。さらに、本発明で提供された前面のマイクロマシニングの方法は、製造の方法を容易にする。提供した方法を利用する、熱定量的型のガスセンサ、伝導性測定型のガスセンサ、及び熱伝導センサ等、様々な型の熱センサ装置が記載された。

2. 发明申请

WO2008032128A1 BONDING TECHNIQUE 审中-公开
标题翻译：粘结技术
公开(公告)号：WO2008032128A1
公开(公告)日：2008-03-20
申请号：PCT/GR2007/000047
申请日：2007-08-14
申请人： NATIONAL CENTER OF SCIENTIFIC RESEARCH ''DEMOKRITOS'' , MISIAKOS, Konstantinos , TSEREPI, Angeliki , VASILOPOULOU, Maria
发明人： MISIAKOS, Konstantinos , TSEREPI, Angeliki , VASILOPOULOU, Maria
IPC分类号： C09D5/00 , B01L3/00
CPC分类号： C09J5/02 , B01L3/5027 , B81B2201/058 , B81C3/001 , B81C2201/019 , B81C2203/038 , C09J2400/146 , C09J2400/228 , C09J2425/008 , C09J2433/008 , C09J2463/008 , C09J2483/008
摘要： The present invention offers a rapid, low cost, and low temperature process for bonding microfluidic devices, which are composed of at least one plastic substrate, and which is based on the surface modification of the substrates composing the device resulting in the irreversible bonding between the substrates. It is a generic method of bonding of bare or structured substrates at least one of which is a plexiglass (known also as poly(methylmethacrylate), PMMA), or a PS, or an epoxy (such as the commercial photoresist SU(8)) polymeric substrate.
摘要翻译：本发明提供了一种快速，低成本和低温工艺，用于粘合微流体装置，所述微流体装置由至少一个塑料基板组成，并且基于构成基板的基板的表面改性器件导致衬底之间不可逆的结合。它是至少其中一种是有机玻璃（也称为聚（甲基丙烯酸甲酯），PMMA）或PS或环氧树脂（例如市售光致抗蚀剂SU（8））的裸露或结构化基底的通用方法聚合物基材。

3. 发明申请

WO2007031799A1 METHOD FOR THE FABRICATION OF HIGH SURFACE AREA RATIO AND HIGH ASPECT RATIO SURFACES ON SUBSTRATES 审中-公开
标题翻译：高表面积比和基材上高比例表面的制备方法
公开(公告)号：WO2007031799A1
公开(公告)日：2007-03-22
申请号：PCT/GR2006/000011
申请日：2006-03-08
申请人： NATIONAL CENTER FOR SCIENTIFIC RESEARCH "DEMOKRITOS" , TSEREPI, Angeliki , GOGOLIDIS, Evangelos , MISIAKOS, Konstantinos , VLACHOPOULOU, Maria-Elena , VOURDAS, Nicolaos
发明人： TSEREPI, Angeliki , GOGOLIDIS, Evangelos , MISIAKOS, Konstantinos , VLACHOPOULOU, Maria-Elena , VOURDAS, Nicolaos
IPC分类号： C08J7/12 , B05D3/14 , H05H1/14 , B81B1/00
CPC分类号： B05D5/08 , B01L3/5027 , B05D3/144 , B05D7/02 , B29C59/14 , B29K2033/12 , C08J7/12 , C08J2333/12 , C08J2383/04
摘要： This invention provides a method for the fabrication of surfaces of high surface area ratio on polymeric/plastic materials, and their application in the control of the wetting properties of surfaces, of the transport of liquids on such fabricated surfaces, or of the separation of liquids in microchannels of said surfaces. The fabrication of surfaces of high surface area ratio comprises the following steps : (a) selection of a polymer/plastic layer which contains two or more componenets differing in their plasma etching behaviour (b) exposure of said polymer/plastic layer to an etching plasma to provide selective removal of one polymer component versus a second plasma-resistant component so as to result in a randomly rough columnar-like surface. In addition, exposure of the said surface to an oxidizing plasma or to a fluorocarbon. depositing plasma renders the surface fully hydrophilic or super-hydrophobic, respectively.
摘要翻译：本发明提供了一种用于制造聚合物/塑料材料上高表面积比的表面的方法及其在控制表面的润湿性能，在这种制造表面上输送液体或液体分离的应用在所述表面的微通道中。高表面积比的表面的制造包括以下步骤：（a）选择含有两种或更多种等离子体蚀刻行为不同组分的聚合物/塑料层（b）将所述聚合物/塑料层暴露于蚀刻等离子体以提供一种聚合物组分相对于第二等离子体抗性组分的选择性除去，从而导致随机粗糙的柱状样表面。此外，将所述表面暴露于氧化等离子体或氟碳化合物。沉积等离子体使表面分别完全亲水或超疏水。

4. 发明专利

DE60217359D1 未知
公开(公告)号：DE60217359D1
公开(公告)日：2007-02-15
申请号：DE60217359
申请日：2002-02-18
申请人： NCSR DEMOKRITOS AGHIA PARASKEV , TSAMIS CHRISTOS , TSEREPI ANGELIKI , NASSIOPOULOU ANDROULA G
发明人： TSAMIS CHRISTOS , TSEREPI ANGELIKI , NASSIOPOULOU ANDROULA G
IPC分类号： B81B3/00 , G01N27/16 , B81C1/00 , G01F1/684 , G01N27/12 , G01N27/18 , H01L37/00 , H05B1/00 , H05B3/26
摘要： This invention provides a front side silicon micromachining process for the fabrication of suspended Porous Silicon membranes in the form of bridges or cantilevers and of thermal sensor devices employing these membranes. The fabrication of the suspended Porous Silicon membranes comprises the following steps: (a) formation of a Porous Silicon layer (2) in, at least one, predefined area of a Silicon substrate (1), (b) definition of etch windows (5) around or inside said Porous Silicon layer (2) using standard photolithography and (c) selective etching of the silicon substrate (1), underneath the Porous Silicon layer (2), by using dry etching techniques to provide release of the Porous Silicon membrane and to form a cavity (6) under the said Porous Silicon layer. Furthermore, the present invention provides a method for the fabrication of thermal sensors based on Porous Silicon membranes with minimal thermal losses, since the proposed methodology combines the advantages that result from the low thermal conductivity of Porous Silicon and the use of suspended membranes. Moreover, the front-side micromachining process proposed in the present invention simplifies the fabrication process. Various types of thermal sensor devices, such as calorimetric-type gas sensors, conductometric type gas sensors and thermal conductivity sensors are described utilizing the proposed methodology.

5. 发明申请

WO2009150479A1 METHOD FOR THE FABRICATION OF PERIODIC STRUCTURES ON POLYMERS USING PLASMA PROCESSES 审中-公开
标题翻译：使用等离子体处理制备聚合物周期结构的方法
公开(公告)号：WO2009150479A1
公开(公告)日：2009-12-17
申请号：PCT/GR2009000039
申请日：2009-06-15
申请人： NAT CT SCIENT RES DEMOKRITOS , GOGOLIDES EVANGELOS , TSEREPI ANGELIKI , CONSTANTOUDIS VASSILIOS , VOURDAS NIKOLAOS , BOULOUSIS GEORGIOS , VLACHOPOULOU MARIE-ELENA , TSOUGENI AIKATERINI , KONTZIAMPASIS DIMITRIOS
发明人： GOGOLIDES EVANGELOS , TSEREPI ANGELIKI , CONSTANTOUDIS VASSILIOS , VOURDAS NIKOLAOS , BOULOUSIS GEORGIOS , VLACHOPOULOU MARIE-ELENA , TSOUGENI AIKATERINI , KONTZIAMPASIS DIMITRIOS
IPC分类号： B29C59/14 , C08J7/12
CPC分类号： B29C59/14 , B29K2023/06 , B29K2025/00 , B29K2033/12 , B29K2067/00 , B29K2083/00 , Y10T428/24479
摘要： This invention presents a method for the fabrication of periodic nanostructures on polymeric surfaces by means of plasma processing, which method comprises the following steps: (i) provision of a homogeneous organic polymer (such as PMMA, or PET, or PEEK, or PS, or PE, or COC) or inorganic polymer (such as PDMS or ORMOCER); (ii) exposure of the polymer to an etching plasma such as oxygen (O2) or sulphur hexafluoride (SF6) or a mixture of oxygen (O2) and sulphur hexafluoride (SF6), or mixtures of etching gases with inert gases such as any Noble gas (Ar, He, Ne, Xe).
摘要翻译：本发明提出了一种通过等离子体处理在聚合物表面上制造周期性纳米结构的方法，该方法包括以下步骤：（i）提供均匀的有机聚合物（例如PMMA或PET或PEEK或PS，或PE，或COC）或无机聚合物（例如PDMS或ORMOCER）; （ii）将聚合物暴露于蚀刻等离子体如氧（O 2）或六氟化硫（SF 6）或氧（O 2）和六氟化硫（SF 6）的混合物，或蚀刻气体与惰性气体如任何贵族气体（Ar，He，Ne，Xe）。

6. 发明申请

WO2003011747A1 METHOD FOR THE FABRICATION OF SUSPENDED POROUS SILICON MICROSTRUCTURES AND APPLICATION IN GAS SENSORS 审中-公开
标题翻译：悬挂多孔硅微结构的制造方法及其在气体传感器中的应用
公开(公告)号：WO2003011747A1
公开(公告)日：2003-02-13
申请号：PCT/GR2002/000008
申请日：2002-02-18
申请人： NCSR "DEMOKRITOS" , TSAMIS, Christos , TSEREPI, Angeliki , NASSIOPOULOU, Androula, G.
发明人： TSAMIS, Christos , TSEREPI, Angeliki , NASSIOPOULOU, Androula, G.
IPC分类号： B81B3/00
CPC分类号： H05B3/265 , B81B2201/0278 , B81B2203/0109 , B81B2203/0118 , B81C1/00682 , B81C1/0069 , B81C2201/0115 , G01F1/6845 , G01N27/12 , G01N27/16 , G01N27/18
摘要： This invention provides a front-side silicon micromachining process for the fabrication of suspended Porous Silicon membranes in the form of bridges or cantilevers and of thermal sensor devices employing these membranes. The fabrication of the suspended Porous Silicon membranes comprises the following steps: (a) formation of a Porous Silicon layer (2) in, at least one, predefined area of a Silicon substrate (1), (b) definition of etch windows (5) around or inside said Porous Silicon layer (2) using standard photolithography and (c) selective etching of the Silicon substrate (1), underneath the Porous Silicon layer (2), by using dry etching techniques to provide release of the Porous Silicon membrane and to form a cavity (6) under the said Porous Silicon layer. Furthermore, the present invention provides a method for the fabrication of thermal sensors based on Porous Silicon membranes with minimal thermal losses, since the proposed methodology combines the advantages that result from the low thermal conductivity of Porous Silicon and the use of suspended membranes. Moreover, the front-side micromachining process proposed in the present invention simplifies the fabrication process. Various types of thermal sensor devices, such as calorimetric-type gas sensors, conductometric-type gas sensors and thermal conductivity sensors are described utilizing the proposed methodology.
摘要翻译：本发明提供了一种用于制造桥梁或悬臂形式的悬浮多孔硅膜和使用这些膜的热传感器装置的前侧硅微加工方法。悬浮的多孔硅膜的制造包括以下步骤：（a）在硅衬底（1）的至少一个预定区域中形成多孔硅层（2），（b）蚀刻窗口（5））使用标准光刻法和（c）在多孔硅层（2）下方的硅衬底（1）的选择性蚀刻，通过使用干蚀刻技术提供多孔硅膜（2）的多孔硅膜（2）的内部并在所述多孔硅层下方形成空腔（6）。此外，本发明提供了一种用于制造基于具有最小热损失的多孔硅膜的热传感器的方法，因为所提出的方法结合了多孔硅的低热导率和悬浮膜的使用所产生的优点。此外，本发明中提出的前侧微加工工艺简化了制造工艺。使用所提出的方法来描述各种类型的热传感器装置，例如量热式气体传感器，电导型气体传感器和导热传感器。

7. 发明申请

WO2009150479A4 METHOD FOR THE FABRICATION OF PERIODIC STRUCTURES ON POLYMERS USING PLASMA PROCESSES 审中-公开
公开(公告)号：WO2009150479A4
公开(公告)日：2009-12-17
申请号：PCT/GR2009/000039
申请日：2009-06-15
申请人： NATIONAL CENTER FOR SCIENTIFIC RESEARCH ''DEMOKRITOS'' , GOGOLIDES, Evangelos , TSEREPI, Angeliki , CONSTANTOUDIS, Vassilios , VOURDAS, Nikolaos , BOULOUSIS, Georgios , VLACHOPOULOU, Marie-Elena , TSOUGENI, Aikaterini , KONTZIAMPASIS, Dimitrios
发明人： GOGOLIDES, Evangelos , TSEREPI, Angeliki , CONSTANTOUDIS, Vassilios , VOURDAS, Nikolaos , BOULOUSIS, Georgios , VLACHOPOULOU, Marie-Elena , TSOUGENI, Aikaterini , KONTZIAMPASIS, Dimitrios
IPC分类号： B29C59/14 , C08J7/12
摘要： This invention presents a method for the fabrication of periodic nanostructures on polymeric surfaces by means of plasma processing, which method comprises the following steps: (i) provision of a homogeneous organic polymer (such as PMMA, or PET, or PEEK, or PS, or PE, or COC) or inorganic polymer (such as PDMS or ORMOCER); (ii) exposure of the polymer to an etching plasma such as oxygen (O 2 ) or sulphur hexafluoride (SF 6 ) or a mixture of oxygen (O 2 ) and sulphur hexafluoride (SF 6 ), or mixtures of etching gases with inert gases such as any Noble gas (Ar, He, Ne, Xe).

8. 发明申请

WO2008155585A1 METHOD FOR MAKING A MICROARRAY 审中-公开
标题翻译：制造微波炉的方法
公开(公告)号：WO2008155585A1
公开(公告)日：2008-12-24
申请号：PCT/GR2008/000048
申请日：2008-06-20
申请人： NATIONAL CENTER FOR SCIENTIFIC RESEARCH "DEMOKRIT OS" , TSEREPI, Angeliki , GOGOLIDES, Evangelos , KAKABAKOS, Sotirios , PETROU, Panagiota , BAYIATI, Pinelopi , MATROZOS, Evrimahos
发明人： TSEREPI, Angeliki , GOGOLIDES, Evangelos , KAKABAKOS, Sotirios , PETROU, Panagiota , BAYIATI, Pinelopi , MATROZOS, Evrimahos
IPC分类号： B01J19/00 , B01L3/00 , C12M1/20
CPC分类号： C40B40/08 , B01J19/0046 , B01J2219/00432 , B01J2219/00497 , B01J2219/00527 , B01J2219/00585 , B01J2219/00596 , B01J2219/00605 , B01J2219/00659 , B01J2219/00664 , B01J2219/00677 , B01J2219/00691 , B01J2219/00722 , B01J2219/00725 , B01J2219/00734 , C40B40/10 , C40B50/14
摘要： This invention provides a method for protein patterning and fabrication of biomolecule microarrays, based on the selective biomolecule adsorption on hydrophilic versus hydrophobic patterns created by selective plasma deposition of fluorocarbon film.
摘要翻译：本发明提供了一种用于蛋白质图案化和制造生物分子微阵列的方法，其基于通过氟碳膜的选择性等离子体沉积产生的亲水性与疏水性图案上的选择性生物分子吸附。

9. 发明申请

WO2008032128A8 BONDING TECHNIQUE 审中-公开
标题翻译：粘接技术
公开(公告)号：WO2008032128A8
公开(公告)日：2008-05-22
申请号：PCT/GR2007000047
申请日：2007-08-14
申请人： NAT CT OF SCIENT RES DEMOKRITO , MISIAKOS KONSTANTINOS , TSEREPI ANGELIKI , VLACHOPOULOU MARIA-ELENA
发明人： MISIAKOS KONSTANTINOS , TSEREPI ANGELIKI , VLACHOPOULOU MARIA-ELENA
IPC分类号： C09D5/00 , B01L3/00
CPC分类号： C09J5/02 , B01L3/5027 , B81B2201/058 , B81C3/001 , B81C2201/019 , B81C2203/038 , C09J2400/146 , C09J2400/228 , C09J2425/008 , C09J2433/008 , C09J2463/008 , C09J2483/008
摘要： The present invention offers a rapid, low cost, and low temperature process for bonding microfluidic devices, which are composed of at least one plastic substrate, and which is based on the surface modification of the substrates composing the device resulting in the irreversible bonding between the substrates. It is a generic method of bonding of bare or structured substrates at least one of which is a plexiglass (known also as poly(methylmethacrylate), PMMA), or a PS, or an epoxy (such as the commercial photoresist SU(8)) polymeric substrate.
摘要翻译：本发明提供了一种用于粘合微流体装置的快速，低成本和低温过程，其由至少一个塑料基板组成，并且其基于构成该装置的基板的表面改性，导致在第基板。它是裸露或结构化基材的通用方法，其中至少一种是有机玻璃（也称为聚（甲基丙烯酸甲酯），PMMA）或PS或环氧树脂（例如商业光致抗蚀剂SU（8）））聚合物基材。

10. 发明授权

EP2300214B1 METHOD FOR THE FABRICATION OF PERIODIC STRUCTURES ON POLYMERS USING PLASMA PROCESSES 有权
标题翻译：用等离子体工艺在聚合物上制备周期性结构的方法
公开(公告)号：EP2300214B1
公开(公告)日：2017-11-22
申请号：EP09762028.0
申请日：2009-06-15
申请人： National Center for Scientific Research Demokritos , Gogolidis, Evangelos , Tserepi, Angeliki , Constantoudis, Vassilios
发明人： GOGOLIDES, Evangelos , TSEREPI, Angeliki , CONSTANTOUDIS, Vassilios , VOURDAS, Nikolaos , BOULOUSIS, Georgios , VLACHOPOULOU, Marie-Elena , TSOUGENI, Aikaterini , KONTZIAMPASIS, Dimitrios
IPC分类号： B29C59/14 , C08J7/12
CPC分类号： B29C59/14 , B29K2023/06 , B29K2025/00 , B29K2033/12 , B29K2067/00 , B29K2083/00 , Y10T428/24479

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