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1. 发明专利

TW200600440A 浮上搬運裝置及浮上搬運方法失效
简体标题：浮上搬运设备及浮上搬运方法
公开(公告)号：TW200600440A
公开(公告)日：2006-01-01
申请号：TW094120757
申请日：2005-06-22
申请人：渡邊商行股份有限公司 KABUSHIKI KAISHA WATANABE SHOKO , 都田昌之 TODA MASAYUKI
发明人：都田昌之 TODA MASAYUKI , 梅田優 UMEDA, MASARU
IPC分类号： B65G
CPC分类号： B65G51/03 , B65G47/24 , H01L21/67784
摘要：提供一種對被搬運體從搬運道中心偏移的情況進行調整的上浮搬運裝置。本發明之上浮搬運裝置包括：形成被搬運體的搬運路徑的搬運道，將被搬運體沿上述搬運道上浮搬運的複數個噴射噴嘴，檢測出上述搬運道中被搬運體的搬運方向的至少一檢測部，以及根據該檢測部的檢測結果獨立控制上述複數個噴射噴嘴的控制部。
简体摘要：提供一种对被搬运体从搬运道中心偏移的情况进行调整的上浮搬运设备。本发明之上浮搬运设备包括：形成被搬运体的搬运路径的搬运道，将被搬运体沿上述搬运道上浮搬运的复数个喷射喷嘴，检测出上述搬运道中被搬运体的搬运方向的至少一检测部，以及根据该检测部的检测结果独立控制上述复数个喷射喷嘴的控制部。

2. 发明专利

DE69736224D1 未知
公开(公告)号：DE69736224D1
公开(公告)日：2006-08-10
申请号：DE69736224
申请日：1997-11-21
申请人： TAIYO NIPPON SANSO CORP , OHMI TADAHIRO , TODA MASAYUKI
发明人： TODA MASAYUKI , OHMI TADAHIRO , ISHIHARA YOSHIO
IPC分类号： B65G49/00 , H01L21/00 , B65G49/07 , H01L21/677
摘要： The present invention uses a transportation robot furnished with a storage chamber 3 that can store substrate wafers S under an inert gas atmosphere, and when transporting substrate wafers S between transportation chambers 2 installed on processing apparatus 1 and holding an inert gas atmosphere, connection chamber 4 is disposed between storage chamber 3 and transportation chamber 2 when placing and removing substrate wafers S between storage chamber 3 of transportation robot 30 and the transportation chamber 2 of processing apparatus 1, and after introducing inert gas into the connection chamber 4 at low pressure, opening the gate valves GV1 and GV2 between storage chamber 3 and transportation chamber 2.

3. 发明专利

AU2003241915A1 VAPORIZER, VARIOUS APPARATUSES INCLUDING THE SAME AND METHOD OF VAPORIZATION 未知
公开(公告)号：AU2003241915A1
公开(公告)日：2003-12-12
申请号：AU2003241915
申请日：2003-05-29
申请人： WATANABE M & CO LTD , TODA MASAYUKI
发明人： TODA MASAYUKI , UMEDA MASARU
IPC分类号： C23C16/40 , C23C16/448 , H01L21/00 , H01L21/205
摘要： There is provided a vaporizer which can be used for a long period of time without being clogged and can supply a raw material stably to a reaction section. An object of the present invention is to provide a vaporizer which can supply a raw material adjusted to a stoichiometric ratio continuously and stably and has an effect of decreasing the quantity of residual carbon in a formed film, a disperser, a film forming apparatus, and a vaporizing method, and a dispersing method and a film forming method. The vaporizer for vaporizing a raw material solution contained in a carrier gas is characterized in that means for containing a solvent for the raw material solution in the carrier gas before containing the raw material solution is provided.

4. 发明专利

IL156978A CARBURETOR, VARIOUS TYPES OF DEVICES USING THE CARBURETOR AND METHOD OF VAPORIZATION 未知
公开(公告)号：IL156978A
公开(公告)日：2008-03-20
申请号：IL15697803
申请日：2003-07-17
申请人： WATANABE M & CO LTD , TODA MASAYUKI
IPC分类号： B01B1/00 , B01D3/34 , B01F3/04 , B01F5/06 , C23C16/40 , C23C16/448 , H01L21/02 , H01L21/316 , H01L21/8246 , H01L27/115
摘要： To provide a vaporizer which can be used long time without blockage, and possible to stably supply raw materials to reaction part. A gas passage 2 formed inside of main body of a dispersion part 1, a gas inlet opening 4 to introduce pressurized carrier gas 3 into gas passage 2, a means 6 to supply raw material solution 5 to carrier gas passing gas passage 2, a gas outlet 7 to send carrier gas including dispersed raw material solution 5 to vaporization part 22, a dispersion part 8 to flow through gas passage 2 having means 18 to cool, a vaporization pipe 20 connected with a reaction part and gas outlet 7 of dispersion part 8 of the device, and a heater 21 to heat vaporization pipe 20 is provided, a vaporization part 22 to heat and vaporizes the carrier gas where raw materials solution is dispersed is provided, and a radiation prevention portion 102 having small hole 101 for the outside of gas outlet 7 is provided.

5. 发明专利

IL156978D0 CARBURETOR, VARIOUS TYPES OF DEVICES USING THE CARBURETOR, AND METHOD OF VAPORIZATION 未知
公开(公告)号：IL156978D0
公开(公告)日：2004-02-08
申请号：IL15697802
申请日：2002-01-18
申请人： WATANABE M & CO LTD , TODA MASAYUKI
IPC分类号： B01B1/00 , B01D3/34 , B01F3/04 , B01F5/06 , C23C16/40 , C23C16/448 , H01L21/02 , H01L21/316 , H01L21/8246 , H01L27/115 , H01L
摘要： To provide a vaporizer which can be used long time without blockage, and possible to stably supply raw materials to reaction part. A gas passage 2 formed inside of main body of a dispersion part 1, a gas inlet opening 4 to introduce pressurized carrier gas 3 into gas passage 2, a means 6 to supply raw material solution 5 to carrier gas passing gas passage 2, a gas outlet 7 to send carrier gas including dispersed raw material solution 5 to vaporization part 22, a dispersion part 8 to flow through gas passage 2 having means 18 to cool, a vaporization pipe 20 connected with a reaction part and gas outlet 7 of dispersion part 8 of the device, and a heater 21 to heat vaporization pipe 20 is provided, a vaporization part 22 to heat and vaporizes the carrier gas where raw materials solution is dispersed is provided, and a radiation prevention portion 102 having small hole 101 for the outside of gas outlet 7 is provided.

6. 发明专利

DE69736224T2 未知
公开(公告)号：DE69736224T2
公开(公告)日：2007-05-10
申请号：DE69736224
申请日：1997-11-21
申请人： TAIYO NIPPON SANSO CORP , OHMI TADAHIRO , TODA MASAYUKI
发明人： TODA MASAYUKI , OHMI TADAHIRO , ISHIHARA YOSHIO
IPC分类号： B65G49/00 , H01L21/00 , B65G49/07 , H01L21/677
摘要： The present invention uses a transportation robot furnished with a storage chamber 3 that can store substrate wafers S under an inert gas atmosphere, and when transporting substrate wafers S between transportation chambers 2 installed on processing apparatus 1 and holding an inert gas atmosphere, connection chamber 4 is disposed between storage chamber 3 and transportation chamber 2 when placing and removing substrate wafers S between storage chamber 3 of transportation robot 30 and the transportation chamber 2 of processing apparatus 1, and after introducing inert gas into the connection chamber 4 at low pressure, opening the gate valves GV1 and GV2 between storage chamber 3 and transportation chamber 2.

7. 发明专利

AT535940T 未知
公开(公告)号：AT535940T
公开(公告)日：2011-12-15
申请号：AT02715811
申请日：2002-01-18
申请人： WATANABE M & CO LTD , TODA MASAYUKI
发明人： TODA MASAYUKI , KUSUHARA MASAKI , UMEDA MASARU , FUKAGAWA MITSURU
IPC分类号： H01L23/31 , B01B1/00 , B01D1/16 , B01D3/34 , B01F3/04 , B01F5/06 , C23C16/40 , C23C16/448 , H01L21/02 , H01L21/316 , H01L21/8246 , H01L27/115
摘要： To provide a vaporizer which can be used long time without blockage, and possible to stably supply raw materials to reaction part. A gas passage 2 formed inside of main body of a dispersion part 1, a gas inlet opening 4 to introduce pressurized carrier gas 3 into gas passage 2, a means 6 to supply raw material solution 5 to carrier gas passing gas passage 2, a gas outlet 7 to send carrier gas including dispersed raw material solution 5 to vaporization part 22, a dispersion part 8 to flow through gas passage 2 having means 18 to cool, a vaporization pipe 20 connected with a reaction part and gas outlet 7 of dispersion part 8 of the device, and a heater 21 to heat vaporization pipe 20 is provided, a vaporization part 22 to heat and vaporizes the carrier gas where raw materials solution is dispersed is provided, and a radiation prevention portion 102 having small hole 101 for the outside of gas outlet 7 is provided.

8. 发明申请

WO1997024760A1 METHOD AND DEVICE FOR TRANSFERRING THIN PLATE-LIKE SUBSTRATE 审中-公开
标题翻译：用于传输薄板状基板的方法和装置
公开(公告)号：WO1997024760A1
公开(公告)日：1997-07-10
申请号：PCT/JP1996003852
申请日：1996-12-27
申请人： NIPPON SANSO CORPORATION , TODA, Masayuki , OHMI, Tadahiro , ISHIHARA, Yoshio
发明人： NIPPON SANSO CORPORATION
IPC分类号： H01L21/68
CPC分类号： H01L21/67253 , G03F7/7075 , G03F7/70933 , G03F7/70991 , H01L21/67242 , H01L21/67784 , Y10T29/41
摘要： A method and device by which the yield of a thin plate-like substrate of a semiconductor integrated circuit, liquid crystal panel, etc., is improved by always transferring the substrate to each processing device in a highly clean damage-free state when the substrate is subjected to various kinds of treatment. A substrate is transferred through a gas tunnel through which a purging gas composed of in insert gas or a mixed gas of an inert gas and oxygen gas is made to flow. The concentrations of impurities in the gas tunnel are measured with a semiconductor laser detector, and the transfer of the substrate is controlled based on the obtained measured data.
摘要翻译：通过在基板的高度清洁的无损状态下始终将基板转印到各处理装置，提高半导体集成电路，液晶面板等的薄板状基板的成品率的方法和装置进行各种处理。衬底通过气体通道传送，通过该气体通道将由插入气体组成的净化气体或惰性气体和氧气的混合气体流过。用半导体激光检测器测量气体通道中的杂质浓度，并且基于获得的测量数据来控制衬底的转移。

9. 发明申请

WO1992009103A1 DEVICE AND METHOD FOR CARRYING THIN PLATE-LIKE SUBSTRATE 审中-公开
标题翻译：用于承载薄板状基板的装置和方法
公开(公告)号：WO1992009103A1
公开(公告)日：1992-05-29
申请号：PCT/JP1991001469
申请日：1991-10-28
申请人： KABUSHIKI-KAISHA WATANABE SHOKO , TODA, Masayuki , ONODA, Tohru , OHMI, Tadahiro , UMEDA, Masaru , KANNO, Yoichi
发明人： KABUSHIKI-KAISHA WATANABE SHOKO
IPC分类号： H01L21/68
CPC分类号： H01L21/67787 , B65G51/03 , H01L21/67784 , Y10S414/135 , Y10S414/136
摘要： A device for carrying a thin plate-like substrate such as a semiconductor wafer and controlling its position by floating it with an inert gas of low impurity concentration. A transferring unit and a controlling unit are respectively provided with gas nozzles for floating a thin plate-like substrate and with a gas exhausting and circulating system, and a plurality of them are in combination with each other in a sealing state. The controlling unit, further, has a vacuum suction hole at its controlling center, and is provided with nozzles for controlling the thin plate-like substrate in its radial and cirumferential direction respectively and with nozzles for stopping the thin plate-like substrate or sending out it to the next unit too. On the bottom face of a control space, grooves extending from the vacuum suction hole are formed for improving the positional accuracy of stopping the thin plate-like substrate, and they are closed on the insides of their circumferential parts when the center of the thin plate-like substrate has coincided with the controlling center of the controlling unit.

10. 发明申请

WO1998024123A1 METHOD AND APPARATUS FOR CONVEYING THIN SHEET-LIKE SUBSTRATE 审中-公开
标题翻译：用于输送薄片状基板的方法和装置
公开(公告)号：WO1998024123A1
公开(公告)日：1998-06-04
申请号：PCT/JP1997004242
申请日：1997-11-21
申请人： NIPPON SANSO CORPORATION , TODA, Masayuki , OHMI, Tadahiro , ISHIHARA, Yoshio
发明人： NIPPON SANSO CORPORATION
IPC分类号： H01L21/68
CPC分类号： H01L21/67126 , H01L21/67724 , H01L21/67736
摘要： When a thin sheet-like substrate S is conveyed between conveying chambers (2) equipped with a processing apparatus (1) and kept in an inert gas atmosphere by using a conveying robot (30) equipped with an accommodation chamber (3) capable of accommodating the thin sheet-like substrate (S) in an inert gas atmosphere, a connection chamber (4) is interposed between the accommodation chamber (3) and the conveying chamber (2) when the thin sheet-like substrate (S) is transferred between the accommodation chamber (3) of the conveying robot (30) and the conveying chamber (2) on the side of the processing apparatus (1), and is vacuumized, and then an inert gas is introduced. Thereafter, gate valves (GV1 and GV2) of the accommodation chamber (3) and the conveying chamber (2) are opened and the thin sheet-like substrate (S) is carried in and out.
摘要翻译：当薄板状基板S在配备有处理装置（1）的输送室（2）之间输送并通过使用具有容纳容纳室（3）的输送机器人（30）的惰性气体气氛中输送时，在惰性气体气氛中的薄片状基材（S）中，当将薄片状基材（S）转移到容纳室（3）和输送室（2）之间时，连接室（4）插入容纳室（3）和输送室输送机器人（30）的容纳室（3）和处理装置（1）一侧的输送室（2），被抽真空，然后引入惰性气体。此后，打开容纳室（3）和输送室（2）的闸阀（GV1，GV2），使薄板状基板（S）进出。

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