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    • 1. 发明申请
    • PROCESS FOR PRODUCING FERRITIC IRON-BASE ALLOY AND FERRITIC HEAT-RESISTANT STEEL
    • 生产铁素体合金和耐热钢的工艺
    • WO1996001334A1
    • 1996-01-18
    • PCT/JP1995001339
    • 1995-07-05
    • THE KANSAI ELECTRIC POWER CO., INC.MORINAGA, MasahikoMURATA, YoshinoriHASHIZUME, Ryokichi
    • THE KANSAI ELECTRIC POWER CO., INC.
    • C22C38/00
    • C22C38/36C22C38/00C22C38/001C22C38/22C22C38/26C22C38/54
    • A method of designing a ferritic iron-base alloy having excellent characteristics according not to the conventional trial-and-error technique but to a theoretical method, and a ferritic heat-resistant steel for use as the material of turbines and boilers usable even in an ultrasupercritical pressure power plant. Specifically, the d-electron orbital energy level (Md) and the bond order (Bo) with respect to iron (Fe) of each alloying element of a body-centered cubic iron-base alloy are determined by the DV-Xa cluster method, and the type and quantity of each element to be added to the alloy are determined in such a manner that the average Bo value and average Md value represented respectively by the following equations: (1) average Bo value = SIGMA Xi.(Bo)i and (2) average Md value = SIGMA Xi.(Md)i, coincide with particular values conforming to the characteristics required of the alloy; wherein Xi represents the molar fraction of an alloying element i, and (Bo)i and (Md)i represent respectively the Bo value and Md value of the element i. Preferably, the average Bo value and average Md value are, respectively, in the ranges of 1.805 to 1.817 and 0.8520 to 0.8628.
    • 一种根据传统的试错技术而非理论方法设计具有优异特性的铁素体铁基合金的方法,以及用作涡轮机和锅炉的材料的铁素体耐热钢,即使在 超临界压力发电厂。 具体地说,体心立方铁基合金的合金元素的d电子轨道能级(Md)和键级(Bo)相对于铁(Fe)由DV-Xa簇法确定, 并且以下述方式确定添加到合金中的各元素的种类和数量:平均Bo值和平均Md值分别由以下等式表示:(1)平均Bo值= SIGMA Xi(Bo)i 和(2)平均Md值= SIGMA Xi(Md)i符合符合合金要求的特性的特定值; 其中,Xi表示合金元素i的摩尔分数,(Bo)i和(Md)i分别表示元素i的Bo值和Md值。 优选地,平均Bo值和平均Md值分别在1.805至1.817和0.8520至0.8628的范围内。
    • 3. 发明申请
    • INSULATED GATE SEMICONDUCTOR DEVICE
    • 绝缘栅半导体器件
    • WO1998026458A1
    • 1998-06-18
    • PCT/JP1997004538
    • 1997-12-10
    • THE KANSAI ELECTRIC POWER CO., INC.HITACHI, LTD.SUGAWARA, YoshitakaASANO, Katsunori
    • THE KANSAI ELECTRIC POWER CO., INC.HITACHI, LTD.
    • H01L29/78
    • H01L29/1095H01L29/0623H01L29/1608H01L29/42368H01L29/66068H01L29/7397H01L29/7398H01L29/7809H01L29/7811H01L29/7813
    • In a semiconductor device having a trench type insulated gate structure, in the case where a drift layer (2) of an n conduction type has a high carrier concentration, when a high voltage is applied between a drain and a source in such a manner that a channel is not formed, the electric field strength of an insulator layer (9) below the trench type insulated gate is increased, thus causing breakdown. The withstand voltage of the semiconductor device is limited by the breakdown of the insulator layer (9), and it is difficult to realize high withstand voltage. Thus, a field relaxation semiconductor region (1) of a conduction type opposite to the conduction type of the drift layer (2) is formed within the drift layer (2) below the insulator layer (9) in the trench of the trench type insulated gate semiconductor device. Also, the thickness of a bottom portion of the insulator layer (9) provided in the trench of the trench type insulated gate semiconductor device is made significantly greater than the thickness of a lateral portion thereof.
    • 在具有沟槽型绝缘栅极结构的半导体器件中,在n导电类型的漂移层(2)具有高载流子浓度的情况下,当在这样的漏极和源极之间施加高电压时 不形成沟道的方式,沟槽型绝缘栅下方的绝缘体层(9)的电场强度增加,从而导致击穿。 半导体器件的耐压受到绝缘体层(9)的击穿的限制,难以实现高耐压。 因此,在沟槽型绝缘的沟槽中的绝缘体层(9)下方的漂移层(2)内形成与漂移层(2)的导电类型相反的导电类型的场弛豫半导体区域(1) 门半导体器件。 此外,设置在沟槽型绝缘栅极半导体器件的沟槽中的绝缘体层(9)的底部的厚度被制成明显大于其侧面部分的厚度。
    • 10. 发明专利
    • 高耐熱電力用靜止機器
    • 高耐热电力用静止机器
    • TW200637477A
    • 2006-10-16
    • TW095102493
    • 2006-01-23
    • 關西電力股份有限公司 THE KANSAI ELECTRIC POWER CO., INC.
    • 菅原良孝 SUGAWARA, YOSHITAKA
    • H05K
    • H01G2/10C08G77/12C08G77/20C08L83/04C08L2205/03H01B7/292H01F27/327Y10T428/31544Y10T428/31721C08L83/00
    • 本發明之高耐熱電力用靜止機器,其係高耐熱電力用靜止機器之至少一個的構成要素以合成高分子化合物A被覆。合成高分子化合物A係使至少一種之第1有機矽聚合物與至少一種之第2有機矽聚合物結合而成之第3有機矽聚合物複數結合而構成。第1有機矽聚合物係具有以矽氧烷鍵所得到之交聯構造。第2有機矽聚合物係具有以矽氧烷鍵所得到之線狀結合構造。第3有機矽聚合物係使第1有機矽聚合物與第2有機矽聚合物以矽氧烷鍵而結合所構成、且具有2萬~80萬之分子量。合成高分子化合物A係使複數之第3有機矽聚合物藉加成反應所產生之共價鍵而結合構成且具有三次元立體構造。
    • 本发明之高耐热电力用静止机器,其系高耐热电力用静止机器之至少一个的构成要素以合成高分子化合物A被覆。合成高分子化合物A系使至少一种之第1有机硅聚合物与至少一种之第2有机硅聚合物结合而成之第3有机硅聚合物复数结合而构成。第1有机硅聚合物系具有以硅氧烷键所得到之交联构造。第2有机硅聚合物系具有以硅氧烷键所得到之线状结合构造。第3有机硅聚合物系使第1有机硅聚合物与第2有机硅聚合物以硅氧烷键而结合所构成、且具有2万~80万之分子量。合成高分子化合物A系使复数之第3有机硅聚合物藉加成反应所产生之共价键而结合构成且具有三次元三維构造。