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1. 发明申请

WO1991016745A1 LASER DEVICE 审中-公开
标题翻译：激光装置
公开(公告)号：WO1991016745A1
公开(公告)日：1991-10-31
申请号：PCT/JP1991000495
申请日：1991-04-16
申请人： MITSUI PETROCHEMICAL INDUSTRIES, LTD. , SHIBATA, Hideaki , OHMATA, Ken , UEHARA, Mitchito , TERADA, Mitsugu , OEDA, Yasuo , TERASHI, Yuichiro
发明人： MITSUI PETROCHEMICAL INDUSTRIES, LTD.
IPC分类号： H01S03/106
CPC分类号： H01S3/137 , H01S3/225
摘要： This invention relates to a technique being effective in applying it to the control of the oscillation wavelength and output of a laser device. The object thereof is that the inclination of a wavelength selecting element such as an etalon is adjusted with high accuracy and the wavelength of the laser output of a laser resonator is made always stable. A laser device having at least first and second wavelength selecting elements which are aligned on an optical path and make the bandwidth of the laser beam narrow by adjusting the inclination of at least one of the elements, is provided with an automatic micrometer head for the fine adjustment of the inclination. By using the automatic micrometer capable of controlling finely the quantity of movment, the inclination to the optical path of the wavelength selecting elements can be adjusted finely. Thereby, the wave length of the laser beam can be always stabilized. Therefore, the laser device can be utilized effectively, for example, for the light source of the lithography process of semiconductor manufacturing.
摘要翻译：本发明涉及一种有效地将其应用于激光装置的振荡波长和输出的控制的技术。其目的在于，以高精度调节诸如标准具的波长选择元件的倾斜度，使激光谐振器的激光输出的波长总是稳定。一种具有至少第一和第二波长选择元件的激光装置，其具有自动测微头，该第一和第二波长选择元件在光路上对准并通过调节至少一个元件的倾斜使激光束的带宽变窄。调整倾向。通过使用能够精细地控制移动量的自动千分尺，可以精细地调节波长选择元件的光路的倾斜度。因此，激光束的波长可以始终稳定。因此，可以有效地利用激光装置，例如用于半导体制造的光刻工艺的光源。

2. 发明申请

WO1991014302A1 DISCHARGE EXCITATION EXCIMER LASER DEVICE 审中-公开
标题翻译：放电激光激光器激光器件
公开(公告)号：WO1991014302A1
公开(公告)日：1991-09-19
申请号：PCT/JP1991000288
申请日：1991-03-04
申请人： MITSUI PETROCHEMICAL INDUSTRIES, LTD. , WATANABE, Shuntaro , OEDA, Yasuo , OHMATA, Ken , UEHARA, Michito , TERADA, Mitsugu , SHIBATA, Hideaki , TERASHI, Yuichiro
发明人： MITSUI PETROCHEMICAL INDUSTRIES, LTD.
IPC分类号： H01S03/03
CPC分类号： H01S3/038
摘要： A discharge excitation excimer laser device comprising an auxiliary electrode and a pair of main discharge electrodes, which can be used, for example, for a light source for lithography, fine working of various materials (including boring and surface reforming of various materials), a laser annealing. The device is provided with a pair of main discharge electrodes (1, 2), a dielectric (3) and an auxiliary electrode (4). The dielectric has a plate-like part facing the main discharge electrodes and is formed in a tubular shape. The auxiliary electrode is contained in the tubular dielectric leaving a space and faces one of the main discharge electrodes with the plate-like part between. By this construction, the electron density of preliminary ionization is high and consequently the output power of a laser is high. The insulation performance is also improved. Therefore, the device can be suitably used for applications where high power is required.

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