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1. 发明授权

US06696225B1 Substrate and manufacturing method thereof 有权
标题翻译：基板及其制造方法
公开(公告)号：US06696225B1
公开(公告)日：2004-02-24
申请号：US09356395
申请日：1999-07-16
申请人： Sadao Kanbe , Hitoshi Fukushima , Hiroshi Kiguchi , Syunichi Seki
发明人： Sadao Kanbe , Hitoshi Fukushima , Hiroshi Kiguchi , Syunichi Seki
IPC分类号： G03F742
CPC分类号： B41M5/368 , G03F7/40
摘要： A method of manufacturing a substrate with a pattern showing hydrophilic property formed on a pattern surface comprising the steps of applying a silane coupling agent to the pattern surface of the base and forming a silane coupling film, forming a mask conforming to the pattern to be provided on the silane coupling film, and activating the silane coupling film provided with the mask by applying energy thereto in order to generate a polar group. In the regions where masking could not be performed, a polar group such as the hydroxyl group, carboxyl group, amino group, or amino carboxyl group is generated and shows hydrophilic property. The masked regions comprise hydrophobic property. This substrate functions as a universal substrate suitable for forming patterns with the inkjet system.
摘要翻译：一种制造具有形成在图案表面上的具有亲水性的图案的基板的方法，包括以下步骤：将硅烷偶联剂涂布在基体的图案表面上并形成硅烷偶联膜，形成符合要提供的图案的掩模在硅烷偶联膜上，通过向其上施加能量来激活设置有掩模的硅烷偶联膜，以产生极性基团。在不能进行掩蔽的区域中，产生羟基，羧基，氨基或氨基羧基等极性基团，显示亲水性。掩蔽区域包含疏水性。该基板用作适于用喷墨系统形成图案的通用基板。

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