专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明授权

US08404590B2 Plasma processing method and storage medium 有权
标题翻译：等离子体处理方法和存储介质
公开(公告)号：US08404590B2
公开(公告)日：2013-03-26
申请号：US13189715
申请日：2011-07-25
申请人： Sung Tae Lee , Kazuya Dobashi
发明人： Sung Tae Lee , Kazuya Dobashi
IPC分类号： H01L21/00
CPC分类号： H01L21/31116 , H01L22/12 , H01L22/20
摘要： There is provided a plasma processing method performing a plasma etching process on an oxide film of a target substrate through one or more steps by using a processing gas including a CF-based gas and a COS gas. The plasma processing method includes: performing a plasma etching process on the oxide film of the target substrate according to a processing recipe; measuring a concentration of sulfur (S) remaining on the target substrate (residual S concentration) after the plasma etching process is performed according to the processing recipe; adjusting a ratio of a COS gas flow rate with respect to a CF-based gas flow rate (COS/CF ratio) so as to allow the residual S concentration to become equal to or smaller than a predetermined value; and performing an actual plasma etching process according to a modified processing recipe storing the adjusted COS/CF ratio.
摘要翻译：提供了通过使用包括CF基气体和COS气体的处理气体，通过一个或多个步骤对目标基板的氧化物膜进行等离子体蚀刻处理的方法。等离子体处理方法包括：根据处理配方对目标基板的氧化物膜进行等离子体蚀刻处理; 根据加工配方进行等离子体蚀刻处理后，测定残留在目标基板上的硫（S）浓度（残留S浓度）调整COS气体流量相对于CF系气体流量比（COS / CF比）的比例，使残留S浓度变得等于或小于预定值; 并根据存储了经调整的COS / CF比的改进处理方案进行实际等离子体蚀刻处理。

2. 发明授权

US07967997B2 Plasma etching method, plasma etching apparatus, control program and computer-readable storage medium 有权
标题翻译：等离子体蚀刻方法，等离子体蚀刻装置，控制程序和计算机可读存储介质
公开(公告)号：US07967997B2
公开(公告)日：2011-06-28
申请号：US12026084
申请日：2008-02-05
申请人： Sung Tae Lee
发明人： Sung Tae Lee
IPC分类号： C03C15/00
CPC分类号： H01L21/67069 , H01L21/31116 , H01L21/31144
摘要： A plasma etching method includes: plasma etching a silicon oxide film to be etched that is positioned under a multi-layer resist mask by using the multi-layer resist mask formed on a substrate to be processed; and plasma etching a glass based film positioned under the silicon oxide film by using the multi-layer resist mask. In the method a gaseous mixture of C4F6 gas and C3F8 gas as a processing gas is used in the plasma etching of the glass based layer.
摘要翻译：等离子体蚀刻方法包括：通过使用形成在待处理基板上的多层抗蚀剂掩模，等离子体蚀刻位于多层抗蚀剂掩模下的要蚀刻的氧化硅膜; 并且通过使用多层抗蚀剂掩模等离子体蚀刻位于氧化硅膜下方的玻璃基膜。在该方法中，在玻璃基层的等离子体蚀刻中使用作为处理气体的C 4 F 6气体和C 3 F 8气体的气体混合物。

3. 发明申请

US20070235624A1 Bracket for fixing compressor 审中-公开
标题翻译：固定压缩机支架
公开(公告)号：US20070235624A1
公开(公告)日：2007-10-11
申请号：US11731104
申请日：2007-03-30
申请人： Sung Tae Lee
发明人： Sung Tae Lee
IPC分类号： F16M7/00
CPC分类号： F16F7/10 , F04B39/0044 , F04B39/121 , F25D23/006
摘要： Disclosed is a bracket for fixing a compressor capable of reducing vibration generated due to resonance occurring when a specific frequency generated from the compressor matches with a natural frequency of the bracket for fixing the compressor. The bracket for fixing the compressor includes a body section extending in one direction and a folding section coupled so as to change the natural frequency of the bracket. The bracket for fixing the compressor includes a body section extending in one direction and a weight coupled to the body section so as to reduce displacement when the bracket is vibrated.
摘要翻译：公开了一种用于固定压缩机的支架，当压缩机产生的特定频率与用于固定压缩机的支架的固有频率匹配时，能够减少由于共振而产生的振动。用于固定压缩机的支架包括沿一个方向延伸的主体部分和联接以便改变支架的固有频率的折叠部分。用于固定压缩机的支架包括沿一个方向延伸的主体部分和联接到主体部分的重物，以便当支架振动时减小位移。

4. 发明授权

US06755630B2 Apparatus for compressing fluid 失效
标题翻译：用于压缩流体的装置
公开(公告)号：US06755630B2
公开(公告)日：2004-06-29
申请号：US10140143
申请日：2002-05-07
申请人： Gui-gwon Kim , Sung-tae Lee , Kyung-tae Jang
发明人： Gui-gwon Kim , Sung-tae Lee , Kyung-tae Jang
IPC分类号： F04B3910
CPC分类号： F04B7/04 , F04B39/102
摘要： An apparatus for compressing fluid comprises a cylinder bore longitudinally penetrating a cylinder block a suction port penetrating to the cylinder bore, and a pair of slot-shaped fluid discharge having one opening at an end portion of the cylinder bore; a piston; a discharge valve assembly movably disposed at the cylinder bore to selectively open and close the fluid discharge ports of the cylinder block, the discharge valve assembly including a valve piston having a flange for limiting movement of the discharge valve assembly; a cylinder head defining a discharge chamber communicating with the fluid discharge ports, the cylinder head having a fluid discharge passage from the discharge chamber. The fluid suction port is selectively opened by the piston reciprocally moving in the cylinder bore to draw in fluid, which is discharged through the fluid discharge ports opened by the movement of the valve piston as the pressure of the fluid in the cylinder bore increases beyond a predetermined threshold. The compressed fluid is fully discharged, and clearance volume can be eliminated or minimized.
摘要翻译：一种用于压缩流体的装置包括纵向穿过气缸体的贯通气缸孔的吸入口的气缸孔和在气缸孔的端部具有一个开口的一对槽形流体排出口; 活塞排出阀组件，其可移动地设置在所述气缸孔处，以选择性地打开和关闭所述气缸体的流体排出口，所述排出阀组件包括具有用于限制所述排出阀组件的运动的凸缘的阀活塞; 气缸盖限定与流体排出口连通的排出室，气缸盖具有从排出室流出的流体排出通道。流体吸入口由在气缸孔中往复运动的活塞选择性地打开，以吸入流体，该流体通过由于气缸孔中的流体的压力增加而超过阀门活塞而被阀活塞打开的流体排放口排出预定阈值。压缩流体被完全排出，并且可以消除或最小化间隙体积。

5. 发明授权

US5888055A Connection between a refrigerant pipe and a suction muffler of a hermetic reciprocating compressor 失效
标题翻译：制冷剂管和密封往复式压缩机的吸入消声器之间的连接
公开(公告)号：US5888055A
公开(公告)日：1999-03-30
申请号：US892309
申请日：1997-07-14
申请人： Sung Tae Lee
发明人： Sung Tae Lee
IPC分类号： F25B1/00 , F04B39/00 , F04B39/04 , F04B39/12 , F25B43/02
CPC分类号： F04B39/123 , F04B39/0055 , F04B39/04 , Y10S417/902
摘要： A hermetic reciprocating compressor comprises a hermetic casing and a compressing portion installed inside the casing. The compressing portion includes a cylinder, and a piston reciprocating inside the cylinder. A suction pipe transfers a mixture of compressible and incompressible media (e.g. gaseous refrigerant and lubricating oil) into the casing. A suction muffler has an inlet communicating with the suction pipe and an outlet connected to the compressing portion. A tubular spring has a first end portion of frusto-conical shape fitted into the inlet of the suction muffler so that a space is formed between the first end portion of the spring and the inlet of the suction muffler, and a second end portion connected to the suction pipe. Incompressible medium in the mixture is able to gravitate out of the suction muffler through the space, thereby preventing damage to internal parts of the compressing portion.
摘要翻译：密封往复式压缩机包括密封壳体和安装在壳体内部的压缩部分。压缩部分包括气缸和在气缸内往复运动的活塞。吸入管将可压缩和不可压缩介质（例如气态制冷剂和润滑油）的混合物输送到壳体中。吸入消声器具有与吸入管连通的入口和连接到压缩部分的出口。管状弹簧具有与吸入消声器的入口嵌合的截头圆锥形状的第一端部，从而在弹簧的第一端部与吸入消声器的入口之间形成空间，第二端部连接到吸管。混合物中的不可压缩介质能够通过空间从吸入消声器中引出，从而防止对压缩部分的内部部件的损坏。

6. 发明授权

US08054383B2 Display apparatus and method of preventing image burn-in 有权
标题翻译：防止图像老化的显示装置及方法
公开(公告)号：US08054383B2
公开(公告)日：2011-11-08
申请号：US11491975
申请日：2006-07-25
申请人： Sung-tae Lee
发明人： Sung-tae Lee
IPC分类号： H04N5/445 , H04N9/76
CPC分类号： G09G3/2007 , G09G3/007 , G09G2320/046 , G09G2330/021 , G09G2340/10 , H04N5/445
摘要： A method of preventing image burn-in of a display apparatus to display an image includes detecting pixel data of a pixel of the image, calculating OSD data corresponding to the detected pixel data, generating the calculated OSD data, and merging the OSD data to the pixel data and displaying the merged OSD data in the pixel for a predetermined refresh period of time.
摘要翻译：防止显示装置的图像老化显示图像的方法包括检测图像的像素的像素数据，计算与检测到的像素数据相对应的OSD数据，生成计算出的OSD数据，以及将OSD数据合并到像素数据，并且在预定的刷新时间段内在像素中显示合并的OSD数据。

7. 发明授权

US08005517B2 Mobile communication device 有权
标题翻译：移动通信设备
公开(公告)号：US08005517B2
公开(公告)日：2011-08-23
申请号：US11734164
申请日：2007-04-11
申请人： Jeong-Hoon Kang , Jin-Ho Kim , Sung-Tae Lee
发明人： Jeong-Hoon Kang , Jin-Ho Kim , Sung-Tae Lee
IPC分类号： H04M1/00
CPC分类号： H04R1/2857 , H04M1/035 , H04R1/2811 , H04R2499/11
摘要： A mobile communication device is provided. The mobile communication device includes a terminal body, and a speaker module located in the terminal body. The speaker module includes an enclosure located in the terminal body, the enclosure defining a chamber therein, and a speaker having a front surface and a rear surface, the speaker being located in the enclosure such that the front surface of the speaker is exposed from the enclosure and the rear surface thereof is positioned within the chamber, to allow a sound generated from the rear surface to resonate within the chamber. A mutual interference between the sound generated from the front side of the sound emission part and the sound emitted from the rear side thereof can be reduced to thereby improve the performance of the middle and low sound.
摘要翻译：提供了一种移动通信设备。移动通信设备包括终端主体和位于终端主体中的扬声器模块。扬声器模块包括位于终端主体中的外壳，外壳在其中限定一个室，以及具有前表面和后表面的扬声器，扬声器位于外壳中，使扬声器的前表面从外壳并且其后表面位于室内，以允许从后表面产生的声音在腔室内共振。可以减少从声音发射部分的前侧产生的声音与从其后侧发出的声音之间的相互干扰，从而提高中低音的性能。

8. 发明申请

US20070046815A1 Display apparatus and method of preventing image burn-in 有权
标题翻译：防止图像老化的显示装置和方法
公开(公告)号：US20070046815A1
公开(公告)日：2007-03-01
申请号：US11491975
申请日：2006-07-25
申请人： Sung-tae Lee
发明人： Sung-tae Lee
IPC分类号： H04N5/44
CPC分类号： G09G3/2007 , G09G3/007 , G09G2320/046 , G09G2330/021 , G09G2340/10 , H04N5/445
摘要： A method of preventing image burn-in of a display apparatus to display an image includes detecting pixel data of a pixel of the image, calculating OSD data corresponding to the detected pixel data, generating the calculated OSD data, and merging the OSD data to the pixel data and displaying the merged OSD data in the pixel for a predetermined refresh period of time.
摘要翻译：防止显示装置的图像老化显示图像的方法包括检测图像的像素的像素数据，计算与检测到的像素数据相对应的OSD数据，生成计算出的OSD数据，以及将OSD数据合并到像素数据，并且在预定的刷新时间段内在像素中显示合并的OSD数据。

9. 发明申请

US20050041807A1 Display apparatus having lock operation for external input and method of implementing lock operation 审中-公开
标题翻译：具有用于外部输入的锁定操作的显示装置和实现锁定操作的方法
公开(公告)号：US20050041807A1
公开(公告)日：2005-02-24
申请号：US10902182
申请日：2004-07-30
申请人： Sung-tae Lee
发明人： Sung-tae Lee
IPC分类号： H04N5/44 , H04N5/445 , H04N7/16 , H04N7/167
CPC分类号： H04N21/441 , H04N7/163 , H04N21/4532 , H04N21/4751 , H04N21/485
摘要： A display apparatus having a lock function for an external input and a method of implementing the lock operation to prevent teenagers from viewing inappropriate videos by setting the lock operation when changing an input signal. The method of implementing the lock operation for the external input includes receiving and storing a password as a first password used for setting the lock operation to be performed when changing the input signal, requesting that a password be input as a second password whenever a change of the input signal is required, to determine whether the input second password and the stored first password are the same, and changing the input signal if the input second password and the stored first password are the same, to display an image corresponding to the changed input signal. The present general inventive concept prevents teenagers from viewing inappropriate videos by changing an input signal only if the input second password and the stored first password are the same when the change of the input signal is requested.
摘要翻译：具有用于外部输入的锁定功能的显示装置和实现锁定操作的方法，用于通过在改变输入信号时设定锁定操作来防止青少年观看不适当的视频。实现外部输入的锁定操作的方法包括接收和存储作为用于设置在改变输入信号时要执行的锁定操作的第一密码的密码，每当改变输入信号时，请求输入密码作为第二密码需要输入信号，以确定输入的第二密码和存储的第一密码是否相同，如果输入的第二密码和存储的第一密码相同，则改变输入信号，以显示与改变的输入相对应的图像信号。本发明的总体构思通过仅当输入的第二密码和所存储的第一个密码在输入信号的改变被请求时相同时才改变输入信号来防止青少年观看不合适的视频。

10. 发明申请

US20080190892A1 PLASMA ETCHING METHOD, PLASMA ETCHING APPARATUS, CONTROL PROGRAM AND COMPUTER-READABLE STORAGE MEDIUM 有权
标题翻译：等离子体蚀刻方法，等离子体蚀刻装置，控制程序和计算机可读存储介质
公开(公告)号：US20080190892A1
公开(公告)日：2008-08-14
申请号：US12026084
申请日：2008-02-05
申请人： Sung Tae LEE
发明人： Sung Tae LEE
IPC分类号： C03C15/00 , H01L21/306
CPC分类号： H01L21/67069 , H01L21/31116 , H01L21/31144
摘要： A plasma etching method includes: plasma etching a silicon oxide film to be etched that is positioned under a multi-layer resist mask by using the multi-layer resist mask formed on a substrate to be processed; and plasma etching a glass based film positioned under the silicon oxide film by using the multi-layer resist mask. In the method a gaseous mixture of C4F6 gas and C3F8 gas as a processing gas is used in the plasma etching of the glass based layer.
摘要翻译：等离子体蚀刻方法包括：通过使用形成在待处理基板上的多层抗蚀剂掩模，等离子体蚀刻位于多层抗蚀剂掩模下的要蚀刻的氧化硅膜; 并且通过使用多层抗蚀剂掩模等离子体蚀刻位于氧化硅膜下方的玻璃基膜。在该方法中，作为加工气体的C 4 H 6 F 6气体和C 3 F 8 N 3气体的气体混合物用于玻璃基层的等离子体蚀刻。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式