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1. 发明申请

US20100015438A1 HIGH COLOUR DIAMOND LAYER 有权
标题翻译：高色金刚石层
公开(公告)号：US20100015438A1
公开(公告)日：2010-01-21
申请号：US11917908
申请日：2006-06-22
申请人： Stephen David Williams , Daniel James Twitchen , Philip Maurice Martineau , Geoffrey Alan Scarsbrook , Ian Friel
发明人： Stephen David Williams , Daniel James Twitchen , Philip Maurice Martineau , Geoffrey Alan Scarsbrook , Ian Friel
IPC分类号： C23C16/27 , C30B23/02 , C01B31/06 , B32B5/00
CPC分类号： C23C16/278 , C23C16/006 , C23C16/27 , C30B25/02 , C30B25/105 , C30B29/04 , Y10T428/26 , Y10T428/30
摘要： A method of producing CVD diamond having a high colour, which is suitable for optical applications, for example. The method includes adding a gaseous source comprising a second impurity atom type to counter the detrimental effect on colour caused by the presence in the CVD synthesis atmosphere of a first impurity atom type. The described method applies to the production of both single crystal diamond and polycrystalline diamond.
摘要翻译：例如，适用于光学应用的具有高颜色的CVD金刚石的方法。该方法包括添加包含第二杂质原子类型的气态源，以抵消由于在第一杂质原子类型的CVD合成气氛中的存在引起的对颜色的不利影响。所描述的方法适用于单晶金刚石和多晶金刚石的生产。

2. 发明授权

US10403477B2 Microwave plasma reactor for manufacturing synthetic diamond material 有权
公开(公告)号：US10403477B2
公开(公告)日：2019-09-03
申请号：US13994880
申请日：2011-12-14
申请人： John Robert Brandon , Alexander Lamb Cullen , Stephen David Williams , Joseph Michael Dodson , Helen Wilman , Christopher John Howard Wort
发明人： John Robert Brandon , Alexander Lamb Cullen , Stephen David Williams , Joseph Michael Dodson , Jonathan James Wilman , Christopher John Howard Wort
IPC分类号： H01J37/32 , C23C16/27 , C23C16/511
摘要： A microwave plasma reactor for manufacturing synthetic diamond material via chemical vapor deposition, the microwave plasma reactor comprising: a microwave generator configured to generate microwaves at a frequency f; a plasma chamber comprising a base, a top plate, and a side wall extending from said base to said top plate defining a resonance cavity for supporting a microwave resonance mode, wherein the resonance cavity has a central rotational axis of symmetry extending from the base to the top plate, and wherein the top plate is mounted across said central rotational axis of symmetry; a microwave coupling configuration for feeding microwaves from the microwave generator into the plasma chamber; a gas flow system for feeding process gases into the plasma chamber and removing them therefrom; and a substrate holder disposed in the plasma chamber and comprising a supporting surface for supporting a substrate on which the synthetic diamond material is to be deposited in use; wherein the resonance cavity is configured to have a height, as measured from the base to the top plate of the plasma chamber, which supports a TM011 resonant mode between the base and the top plate at said frequency f, and wherein the resonance cavity is further configured to have a diameter, as measured at a height less than 50% of the height of the resonance cavity as measured from the base, which satisfies the condition that a ratio of the resonance cavity height/the resonance cavity diameter is in the range 0.3 to 1.0.

3. 发明授权

US08955456B2 Microwave plasma reactor for manufacturing synthetic diamond material 有权
标题翻译：用于制造合成金刚石材料的微波等离子体反应器
公开(公告)号：US08955456B2
公开(公告)日：2015-02-17
申请号：US13994836
申请日：2011-12-14
申请人： Alexander Lamb Cullen , Joseph Michael Dodson , Stephen David Williams , John Robert Brandon
发明人： Alexander Lamb Cullen , Joseph Michael Dodson , Stephen David Williams , John Robert Brandon
IPC分类号： H01J37/00 , H01J37/32 , C23C16/27 , C23C16/511 , C23C16/00
CPC分类号： H01J37/32238 , C23C16/274 , C23C16/511 , H01J37/32009 , H01J37/32192 , H01J37/32211 , H01J37/32229 , H01J37/32266 , H01J37/3244 , H01J2237/3321
摘要： A microwave plasma reactor for manufacturing a synthetic diamond material via chemical vapour deposition, the microwave plasma reactor comprising: a plasma chamber (2); a substrate holder (4) disposed in the plasma chamber for supporting a substrate on which the synthetic diamond material is to be deposited in use; a microwave coupling configuration (12) for feeding microwaves from a microwave generator (8) into the plasma chamber; and a gas flow system (13,16) for feeding process gases into the plasma chamber and removing them therefrom, wherein the microwave coupling configuration for feeding microwaves from the microwave generator into the plasma chamber comprises: an annular dielectric window (18) formed in one or several sections; a coaxial waveguide (14) having a central inner conductor (20) and an outer conductor (22) for feeding microwaves to the annular dielectric window; and a waveguide plate (24) comprising a plurality of apertures (28) disposed in an annular configuration with a plurality of arms (26) extending between the apertures, each aperture forming a waveguide for coupling microwaves towards the plasma chamber.
摘要翻译：一种用于通过化学气相沉积制造合成金刚石材料的微波等离子体反应器，所述微波等离子体反应器包括：等离子体室（2）; 设置在等离子体室中的衬底保持器（4），用于支撑在使用中沉积合成金刚石材料的衬底; 用于将微波从微波发生器（8）馈入等离子体室的微波耦合配置（12）; 以及用于将工艺气体进料到等离子体室中并将其从中除去的气体流动系统（13,16），其中用于将来自微波发生器的微波馈送到等离子体室中的微波耦合结构包括：环形介质窗（18），其形成在一个或几个部分; 具有中心内部导体（20）和外部导体（22）的同轴波导（14），用于将微波馈送到环形电介质窗口; 以及波导板（24），其包括以环形构造设置的多个孔（28），所述孔具有在孔之间延伸的多个臂（26），每个孔形成用于将微波耦合到等离子体室的波导。

4. 发明授权

US07964280B2 High colour diamond layer 有权
标题翻译：高色金刚石层
公开(公告)号：US07964280B2
公开(公告)日：2011-06-21
申请号：US11917908
申请日：2006-06-22
申请人： Stephen David Williams , Daniel James Twitchen , Philip Maurice Martineau , Geoffrey Alan Scarsbrook , Ian Friel
发明人： Stephen David Williams , Daniel James Twitchen , Philip Maurice Martineau , Geoffrey Alan Scarsbrook , Ian Friel
IPC分类号： C30B25/10 , C23C16/27
CPC分类号： C23C16/278 , C23C16/006 , C23C16/27 , C30B25/02 , C30B25/105 , C30B29/04 , Y10T428/26 , Y10T428/30
摘要： A method of producing CVD diamond having a high color, which is suitable for optical applications, for example. The method includes adding a gaseous source comprising a second impurity atom type to counter the detrimental effect on colour caused by the presence in the CVD synthesis atmosphere of a first impurity atom type. The described method applies to the production of both single crystal diamond and polycrystalline diamond.
摘要翻译：例如，适用于光学应用的具有高颜色的CVD金刚石的方法。该方法包括添加包含第二杂质原子类型的气态源，以抵消由于在第一杂质原子类型的CVD合成气氛中的存在引起的对颜色的不利影响。所描述的方法适用于单晶金刚石和多晶金刚石的生产。

5. 发明授权

US08986645B2 Diamond 有权
标题翻译：钻石
公开(公告)号：US08986645B2
公开(公告)日：2015-03-24
申请号：US11480823
申请日：2006-07-06
申请人： Daniel James Twitchen , Geoffrey Alan Scarsbrook , Philip Maurice Martineau , Paul Martyn Spear , Stephen David Williams , Ian Friel
发明人： Daniel James Twitchen , Geoffrey Alan Scarsbrook , Philip Maurice Martineau , Paul Martyn Spear , Stephen David Williams , Ian Friel
IPC分类号： B01J3/06 , C30B7/00 , C30B23/00 , C30B25/00 , C30B28/12 , H05H1/24 , A44C17/00 , B44C1/00 , C30B25/02 , C30B29/04 , C30B33/00
CPC分类号： A44C17/00 , B44C1/005 , C30B25/00 , C30B25/02 , C30B29/04 , C30B33/00 , H01J2237/2808 , Y10T428/30
摘要： A method of producing a CVD single crystal diamond layer on a substrate includes adding into a DVD synthesis atmosphere a gaseous source comprising silicon. The method can be used to mark the diamond material, for instance to provide means by which its synthetic nature can more easily be determined. It can also be exploited to generate single crystal diamond material of high color.
摘要翻译：在衬底上制造CVD单晶金刚石层的方法包括在DVD合成气氛中加入包含硅的气态源。该方法可用于标记金刚石材料，例如提供可以更容易地确定其合成性质的方法。也可以开发出高颜色的单晶金刚石材料。

6. 发明申请

US20140308461A1 MICROWAVE PLASMA REACTOR FOR MANUFACTURING SYNTHETIC DIAMOND MATERIAL 有权
标题翻译：用于制造合成金刚石材料的微波等离子体反应器
公开(公告)号：US20140308461A1
公开(公告)日：2014-10-16
申请号：US13994836
申请日：2011-12-14
申请人： Alexander Lamb Cullen , Joseph Michael Dodson , Stephen David Williams , John Robert Brandon
发明人： Alexander Lamb Cullen , Joseph Michael Dodson , Stephen David Williams , John Robert Brandon
IPC分类号： H01J37/32 , C23C16/27
CPC分类号： H01J37/32238 , C23C16/274 , C23C16/511 , H01J37/32009 , H01J37/32192 , H01J37/32211 , H01J37/32229 , H01J37/32266 , H01J37/3244 , H01J2237/3321
摘要： A microwave plasma reactor for manufacturing a synthetic diamond material via chemical vapour deposition, the microwave plasma reactor comprising: a plasma chamber (2); a substrate holder (4) disposed in the plasma chamber for supporting a substrate on which the synthetic diamond material is to be deposited in use; a microwave coupling configuration (12) for feeding microwaves from a microwave generator (8) into the plasma chamber; and a gas flow system (13,16) for feeding process gases into the plasma chamber and removing them therefrom, wherein the microwave coupling configuration for feeding microwaves from the microwave generator into the plasma chamber comprises: an annular dielectric window (18) formed in one or several sections; a coaxial waveguide (14) having a central inner conductor (20) and an outer conductor (22) for feeding microwaves to the annular dielectric window; and a waveguide plate (24) comprising a plurality of apertures (28) disposed in an annular configuration with a plurality of arms (26) extending between the apertures, each aperture forming a waveguide for coupling microwaves towards the plasma chamber.
摘要翻译：一种用于通过化学气相沉积制造合成金刚石材料的微波等离子体反应器，所述微波等离子体反应器包括：等离子体室（2）; 设置在等离子体室中的衬底保持器（4），用于支撑在使用中沉积合成金刚石材料的衬底; 用于将微波从微波发生器（8）馈入等离子体室的微波耦合配置（12）; 以及用于将工艺气体进料到等离子体室中并将其从中除去的气体流动系统（13,16），其中用于将来自微波发生器的微波馈送到等离子体室中的微波耦合结构包括：环形介质窗（18），其形成在一个或几个部分; 具有中心内部导体（20）和外部导体（22）的同轴波导（14），用于将微波馈送到环形电介质窗口; 以及波导板（24），其包括以环形构造设置的多个孔（28），其中在所述孔之间延伸有多个臂（26），每个孔形成用于将微波耦合到所述等离子体室的波导。

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