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    • 2. 发明申请
    • Multilayer imageable elements
    • 多层可成像元件
    • US20050287448A1
    • 2005-12-29
    • US11144315
    • 2005-06-03
    • Anthony KitsonKevin RaySocrates PappasCelin Savariar-Hauck
    • Anthony KitsonKevin RaySocrates PappasCelin Savariar-Hauck
    • B41C1/10B41M5/36B41M5/42B41M5/44B41M5/46G03C3/00
    • B41M5/368B41C1/1016B41C2210/02B41C2210/06B41C2210/14B41C2210/22B41C2210/24B41C2210/262B41M5/42B41M5/44B41M5/46B41M5/465B41M2205/38Y10S430/165
    • Multilayer, positive working, thermally imageable, bakeable imageable elements have a substrate, an underlayer, and a top layer. The underlayer comprises a polymeric material that comprises, in polymerized form from about 5 mol % to about 30 mol % of recurring units derived from an ethylenically unsaturated polymerizable monomer having a carboxy group; from about 20 mol % to about 75 mol % of recurring units derived from N-phenylmaleimide, N-cyclohexylmaleimide, N-benzylmaleimide, or a mixture thereof; and from about 3 mol % to about 50 mol % of recurring units derived from a compound represented by the formula: CH2═C(R2)—C(O)—NH—CH2—OR1, in which R1 is C1 to C12 alkyl, phenyl, C1 to C12 substituted phenyl, C1 to C12 aralkyl, or Si(CH3)3; and R2 is hydrogen or methyl. Other materials, such as a resin or resins having activated methylol and/or activated alkylated methylol groups, such as a resole resin, may be present in the underlayer. The elements can be used to produce bakeable lithographic printing plates that are resistant to press chemistries.
    • 多层,正面工作,可热成像的可烘烤成像元件具有基底,底层和顶层。 底层包含聚合物,其聚合形式为约5mol%至约30mol%的衍生自具有羧基的烯属不饱和可聚合单体的重复单元; 约20mol%至约75mol%的衍生自N-苯基马来酰亚胺,N-环己基马来酰亚胺,N-苄基马来酰亚胺或其混合物的重复单元; 和约3mol%至约50mol%的由下式表示的化合物的重复单元:<?in-line-formula description =“In-line formula”end =“lead”?> CH 2 -C(R 2) - C(O)-NH-CH 2 -OR 1,&lt; -formulae description =“In-line Formulas”end =“tail”?>其中R 1是C 1至C 12烷基的C 1〜 苯基,C 1至C 12取代的苯基,C 1至C 12芳烷基,或Si(CH 3) 3> 3 3; R 2是氢或甲基。 其它材料,例如具有活性羟甲基和/或活化的烷基化羟甲基的树脂或树脂,例如甲阶酚醛树脂,可存在于底层中。 这些元素可用于生产耐压印化学品的可烘烤平版印刷版。