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    • 2. 发明授权
    • Manufacturing method of organic electroluminescence display device
    • 有机电致发光显示装置的制造方法
    • US07553208B2
    • 2009-06-30
    • US11639205
    • 2006-12-15
    • Akiko YasukawaShoichi UchinoEmiko YamadaNobuaki Hayashi
    • Akiko YasukawaShoichi UchinoEmiko YamadaNobuaki Hayashi
    • H01L51/56H01L51/50
    • H01L27/3246H01L51/0005H01L51/5246H01L51/5253H01L51/5284H01L51/56
    • A manufacturing method of organic electroluminescence display device according to the present invention performs (1) a first step for forming a non-affinity region in a surface of an anode provided in each of pixels arranged on a glass substrate by exposing the glass substrate in a saturated vapor pressure of an organic solvent, (2) a second step for forming an affinity region in a central portion of the anode surface spaced from its edges by irradiating the central portion of the anode surface with ultraviolet light, and (3) a third step for forming polymer material layers which constitute an organic electroluminescent element in the each of the pixels in the affinity region by blowing off polymer material solutions onto the affinity region of the anode in the each of the pixels, in this order, to simplify entire steps in, to reduce cost for, and to improve productivity of the manufacturing process of the organic electroluminescence display device thereby.
    • 根据本发明的有机电致发光显示装置的制造方法执行(1)通过将玻璃基板曝光在玻璃基板上而设置在布置在玻璃基板上的每个像素中的阳极表面中形成非亲和性区域的第一步骤 有机溶剂的饱和蒸汽压,(2)通过用紫外光照射阳极表面的中心部分,在阳极表面的与中心部分间隔开的中心部分形成亲和性区域的第二步骤,(3)第三步骤 通过在每个像素中将聚合物材料溶液吹送到阳极的亲和性区域上以依次形成在亲和区域中的每个像素中构成有机电致发光元件的聚合物材料层的步骤,以简化整个步骤 因此,为了降低有机电致发光显示装置的制造工艺的成本并提高生产率。
    • 7. 发明授权
    • Resist pattern forming method using anti-reflective layer, resist pattern formed, and method of etching using resist pattern and product formed
    • 使用抗反射层的抗蚀剂图案形成方法,形成的抗蚀剂图案,以及形成的抗蚀剂图案和产品的蚀刻方法
    • US06355400B1
    • 2002-03-12
    • US09849487
    • 2001-05-07
    • Toshihiko TanakaShoichi UchinoNaoko Asai
    • Toshihiko TanakaShoichi UchinoNaoko Asai
    • G03C1825
    • G03F7/091Y10S430/151
    • Disclosed are methods for forming a resist pattern which solve a problem caused by halation and interference phenomena due to reflected light from the substrate. A first method forms between the substrate and resist film an anti-reflective film whose photoabsorbance of the exposure light is greater on the substrate surface side than on the resist surface side. A second method forms between the substrate and resist film a two-layer anti-reflective film made up of an upper interference film for the exposure light and a lower film having higher exposure light absorbance than the upper film and functions as a light shielding film. A third method forms between the substrate and resist film a two-layer anti-reflective film consisting of a lower film that reflects exposure light and an upper film that is an interference film for the exposure light.
    • 公开了形成抗蚀剂图案的方法,该抗蚀剂图案解决了由于来自基板的反射光引起的由于偏离和干扰现象引起的问题。 在基板和抗蚀剂膜之间形成第一种方法,其中在基板表面侧的曝光光的光吸收性大于在抗蚀剂表面侧上的抗反射膜。 在基板和抗蚀剂膜之间形成由用于曝光光的上部干涉膜构成的两层抗反射膜和具有比上部膜更高的曝光吸光度的下部膜并用作遮光膜的第二种方法。 第三种方法在基板和抗蚀剂膜之间形成由反射曝光光的下膜和作为曝光光的干涉膜的上膜构成的两层抗反射膜。
    • 8. 发明授权
    • Resist pattern forming method using anti-reflective layer with variable
extinction coefficient
    • 使用具有可变消光系数的抗反射层的抗蚀图案形成方法
    • US5935765A
    • 1999-08-10
    • US159786
    • 1998-09-24
    • Toshihiko TanakaShoichi UchinoNaoko Asai
    • Toshihiko TanakaShoichi UchinoNaoko Asai
    • G03F7/09G03C1/825
    • G03F7/091Y10S430/151
    • Disclosed are methods for forming a resist pattern which solve a problem (dimensional precision degradation) caused by halation and interference phenomena due to reflected light from the substrate, and which are fine and have high precision even with substrates having high reflectivity or substrates having a transparent film or substrates with an uneven surface. A first method forms between the substrate and resist film an anti-reflective film whose photoabsorbance of the exposure light is greater on the substrate surface side than on the resist surface side. A second method forms between the substrate and resist film a two-layer anti-reflective film made up of an upper-layer film which is an interference film for the exposure light and a lower-layer film which has higher exposure light absorbance than the upper-layer film and functions as a light shielding film. A third method forms between the substrate and resist film a two-layer anti-reflective film consisting of a lower-layer film that reflects the exposure light and an upper-layer film that is an interference film for the exposure light. A very high anti-reflection effect can be obtained without aspect ratio problems during the process of forming the anti-reflective film and without being influenced by the kind of substrate including those having a transparent film. With these methods, it is possible to form a fine and highly precise resist pattern. These methods can be used to form patterned resist films to etch object films, e.g., in forming microcircuits and/or gates (and word lines) of semiconductor devices.
    • 公开了形成抗蚀剂图案的方法,其解决了由于来自基板的反射光引起的由于偏光和干涉现象引起的问题(尺寸精度降低),即使具有高反射率的基板或具有透明度的基板也是精细且具有高精度 膜或具有不平坦表面的基底。 在基板和抗蚀剂膜之间形成第一种方法,其中在基板表面侧的曝光光的光吸收性大于在抗蚀剂表面侧上的抗反射膜。 在基板和抗蚀剂膜之间形成由作为曝光用的干涉膜的上层膜构成的双层抗反射膜的第二种方法和具有比上层的曝光吸光度高的下层膜 并且用作遮光膜。 在基板和抗蚀剂膜之间形成由反射曝光光的下层膜构成的两层抗反射膜和作为曝光用光的干涉膜的上层膜的第三种方法。 在形成抗反射膜的过程中可以获得非常高的抗反射效果,而不受包括具有透明膜的基板的种类的影响。 利用这些方法,可以形成精细且高精度的抗蚀剂图案。 这些方法可以用于形成图案化的抗蚀剂膜以蚀刻对象膜,例如在形成半导体器件的微电路和/或栅极(和字线)中。
    • 9. 发明授权
    • Process for forming fluorescent screen
    • 荧光屏形成工艺
    • US4407916A
    • 1983-10-04
    • US358263
    • 1982-03-15
    • Motoo AkagiShoichi UchinoSaburo Nonogaki
    • Motoo AkagiShoichi UchinoSaburo Nonogaki
    • H01J9/227H01J29/22G03C5/00
    • H01J29/225H01J9/2271
    • A process for forming a fluorescent screen, where polychroic patterns are successively formed from at least two kinds of phosphors having different color emission or black powder by means of a photosensitive substance capable of turning tacky by light irradiation, which comprises bringing a finer particulate filling material than particles of the phosphors in contact with tackified parts when or after the particles of the phosphors are applied to the tackified parts in the individual steps of forming patterns each of the individual phosphors. The filling material saturates the tackiness of the phosphor pattern in question in advance to formation of a phosphor pattern in the successive step, and a cause for contamination of the pattern of the preceding step with the phosphor of the successive step can be eliminated thereby.
    • 一种用于形成荧光屏的方法,其中通过具有不同颜色发射或黑色粉末的至少两种荧光体通过能够通过光照射转动粘性的光敏物质连续地形成多色图案,其包括使细颗粒填充材料 当在形成每个单独的荧光体的图案的各个步骤中将荧光体的颗粒施加到增粘部分上或之后,与增粘部分接触的荧光体的颗粒。 预先填充材料在连续步骤中预先使磷光体图案的粘性饱和以形成荧光体图案,并且可以消除前述步骤的图案与连续步骤的荧光体的污染的原因。