专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明申请

US20100051830A1 SEMICONDUCTOR PROCESSING APPARATUS AND SEMICONDUCTOR PROCESSING METHOD 失效
标题翻译：半导体加工设备和半导体加工方法
公开(公告)号：US20100051830A1
公开(公告)日：2010-03-04
申请号：US12507985
申请日：2009-07-23
申请人： Akio Machida , Toshio Fujino , Tadahiro Kono , Katsuji Takagi , Shinsuke Haga
发明人： Akio Machida , Toshio Fujino , Tadahiro Kono , Katsuji Takagi , Shinsuke Haga
IPC分类号： H01L21/02
CPC分类号： H01L21/02691 , B23K26/0608 , B23K26/066 , B23K26/0676 , H01L21/02678 , H01L21/268
摘要： A semiconductor processing apparatus includes: a stage on which a substrate having a semiconductor film to be processed is to be mounted; a supply section that supplies a plurality of energy beams onto the semiconductor film mounted on the stage in such a way that irradiation points of the energy beams are aligned at given intervals; and a control section that moves the plurality of energy beams and the substrate relative to each other in a direction not in parallel to alignment of the irradiation points of the plurality of energy beams supplied by the supply section, and scans the semiconductor film with the irradiation points of the plurality of energy beams in parallel to thereby control a heat treatment on the semiconductor film.
摘要翻译：一种半导体处理装置，包括：要安装具有要加工的半导体膜的衬底的阶段; 供给部，其以使得能量束的照射点以给定间隔对准的方式将多个能量束提供到安装在台上的半导体膜上; 以及控制部，其使所述多个能量束和所述基板相对于与所述供给部供给的所述多个能量束的照射点的排列不平行的方向移动，并且利用所述照射来扫描所述半导体膜多个能量束的点平行，从而控制半导体膜上的热处理。

2. 发明授权

US08278163B2 Semiconductor processing apparatus and semiconductor processing method 失效
标题翻译：半导体处理装置及半导体加工方法
公开(公告)号：US08278163B2
公开(公告)日：2012-10-02
申请号：US12507985
申请日：2009-07-23
申请人： Akio Machida , Toshio Fujino , Tadahiro Kono , Katsuji Takagi , Shinsuke Haga
发明人： Akio Machida , Toshio Fujino , Tadahiro Kono , Katsuji Takagi , Shinsuke Haga
IPC分类号： H01L21/268 , G21K5/10
CPC分类号： H01L21/02691 , B23K26/0608 , B23K26/066 , B23K26/0676 , H01L21/02678 , H01L21/268
摘要： A semiconductor processing apparatus includes: a stage on which a substrate having a semiconductor film to be processed is to be mounted; a supply section that supplies a plurality of energy beams onto the semiconductor film mounted on the stage in such a way that irradiation points of the energy beams are aligned at given intervals; and a control section that moves the plurality of energy beams and the substrate relative to each other in a direction not in parallel to alignment of the irradiation points of the plurality of energy beams supplied by the supply section, and scans the semiconductor film with the irradiation points of the plurality of energy beams in parallel to thereby control a heat treatment on the semiconductor film.
摘要翻译：一种半导体处理装置，包括：要安装具有要加工的半导体膜的衬底的阶段; 供给部，其以使得能量束的照射点以给定间隔对准的方式将多个能量束提供到安装在台上的半导体膜上; 以及控制部，其使所述多个能量束和所述基板相对于与所述供给部供给的所述多个能量束的照射点的排列不平行的方向移动，并且利用所述照射来扫描所述半导体膜多个能量束的点平行，从而控制半导体膜上的热处理。

3. 发明申请

US20110090477A1 EXPOSURE DEVICE AND EXPOSURE METHOD 有权
标题翻译：曝光装置和曝光方法
公开(公告)号：US20110090477A1
公开(公告)日：2011-04-21
申请号：US12901887
申请日：2010-10-11
申请人： SHINSUKE HAGA , MASAKI OHNO , TAICHI TAKEUCHI
发明人： SHINSUKE HAGA , MASAKI OHNO , TAICHI TAKEUCHI
IPC分类号： G03B27/54
CPC分类号： G03F7/704 , B29C64/00 , B29C64/264 , B33Y30/00 , G03F7/70191 , G03F7/70366
摘要： An exposure device includes a rotation driving section that rotationally drives an exposure object; a light irradiation section that irradiates an exposure surface of the exposure object with laser light; a slide moving section secured to the rotation driving section or the light irradiation section, and moving the rotation driving section or the light irradiation section along the exposure surface in a direction crossing a direction of rotation of the rotation driving section; a signal generating section that transmits an analog modulating signal to the light irradiation section in accordance with a rotation synchronization signal from the rotation driving section, the analog modulating signal causing an intensity of the laser light to be changed; and a controlling section that controls movements of the rotation driving section, the slide moving section, and the light irradiation section.
摘要翻译：曝光装置包括：旋转驱动曝光对象的旋转驱动部; 用激光照射曝光对象的曝光面的光照射部; 滑动移动部分，固定到旋转驱动部分或光照射部分，沿着与旋转驱动部分的旋转方向交叉的方向沿着曝光表面移动旋转驱动部分或光照射部分; 信号生成部，其根据来自所述旋转驱动部的旋转同步信号向所述光照射部发送模拟调制信号，所述模拟调制信号使所述激光的强度变化; 以及控制部，其控制旋转驱动部，滑动移动部和光照射部的移动。

4. 发明申请

US20100093112A1 LASER ANNEALING METHOD AND LASER ANNEALING APPARATUS 有权
标题翻译：激光退火方法和激光退火设备
公开(公告)号：US20100093112A1
公开(公告)日：2010-04-15
申请号：US12574024
申请日：2009-10-06
申请人： Katsuji Takagi , Akio Machida , Toshio Fujino , Tadahiro Kono , Norio Fukasawa , Shinsuke Haga
发明人： Katsuji Takagi , Akio Machida , Toshio Fujino , Tadahiro Kono , Norio Fukasawa , Shinsuke Haga
IPC分类号： H01L21/66 , B23K26/00
CPC分类号： B23K26/03 , H01L22/26
摘要： An embodiment of the invention provides a laser annealing method, including the steps of radiating a laser beam to an amorphous film on a substrate while scanning the laser beam for the amorphous film, crystallizing the amorphous film, detecting a light quantity of laser beam reflected from the substrate and a scanning speed of the laser beam while the radiation and the scanning of the laser beam are carried out for the amorphous film, and controlling a radiation level and the scanning speed of the laser beam based on results of comparison of the light quantity of laser beam reflected from the substrate, and the scanning speed of the laser beam with respective preset references.
摘要翻译：本发明的一个实施例提供了一种激光退火方法，包括以下步骤：扫描激光束为非晶膜时，在基板上的非晶膜上照射激光，使非晶膜结晶，检测从基板和激光束的扫描速度，同时对非晶膜进行激光束的辐射和扫描，并且基于光量的比较结果控制激光束的辐射水平和扫描速度从基板反射的激光束和激光束的扫描速度具有各自的预设参考。

5. 发明授权

US09333708B2 Exposure device and exposure method 有权
标题翻译：曝光装置和曝光方法
公开(公告)号：US09333708B2
公开(公告)日：2016-05-10
申请号：US12901887
申请日：2010-10-11
申请人： Shinsuke Haga , Masaki Ohno , Taichi Takeuchi
发明人： Shinsuke Haga , Masaki Ohno , Taichi Takeuchi
IPC分类号： G21G5/00 , B29C67/00
CPC分类号： G03F7/704 , B29C64/00 , B29C64/264 , B33Y30/00 , G03F7/70191 , G03F7/70366
摘要： An exposure device includes a rotation driving section that rotationally drives an exposure object; a light irradiation section that irradiates an exposure surface of the exposure object with laser light; a slide moving section secured to the rotation driving section or the light irradiation section, and moving the rotation driving section or the light irradiation section along the exposure surface in a direction crossing a direction of rotation of the rotation driving section; a signal generating section that transmits an analog modulating signal to the light irradiation section in accordance with a rotation synchronization signal from the rotation driving section, the analog modulating signal causing an intensity of the laser light to be changed; and a controlling section that controls movements of the rotation driving section, the slide moving section, and the light irradiation section.
摘要翻译：曝光装置包括：旋转驱动曝光对象的旋转驱动部; 用激光照射曝光对象的曝光面的光照射部; 滑动移动部分，固定到旋转驱动部分或光照射部分，沿着与旋转驱动部分的旋转方向交叉的方向沿着曝光表面移动旋转驱动部分或光照射部分; 信号生成部，其根据来自所述旋转驱动部的旋转同步信号向所述光照射部发送模拟调制信号，所述模拟调制信号使所述激光的强度变化; 以及控制部，其控制旋转驱动部，滑动移动部和光照射部的移动。

6. 发明授权

US08357620B2 Laser annealing method and laser annealing apparatus 有权
标题翻译：激光退火方法和激光退火装置
公开(公告)号：US08357620B2
公开(公告)日：2013-01-22
申请号：US12574024
申请日：2009-10-06
申请人： Katsuji Takagi , Akio Machida , Toshio Fujino , Tadahiro Kono , Norio Fukasawa , Shinsuke Haga
发明人： Katsuji Takagi , Akio Machida , Toshio Fujino , Tadahiro Kono , Norio Fukasawa , Shinsuke Haga
IPC分类号： H01L21/00
CPC分类号： B23K26/03 , H01L22/26
摘要： An embodiment of the invention provides a laser annealing method, including the steps of radiating a laser beam to an amorphous film on a substrate while scanning the laser beam for the amorphous film, crystallizing the amorphous film, detecting a light quantity of laser beam reflected from the substrate and a scanning speed of the laser beam while the radiation and the scanning of the laser beam are carried out for the amorphous film, and controlling a radiation level and the scanning speed of the laser beam based on results of comparison of the light quantity of laser beam reflected from the substrate, and the scanning speed of the laser beam with respective preset references.
摘要翻译：本发明的一个实施例提供了一种激光退火方法，包括以下步骤：扫描激光束为非晶膜时，在基板上的非晶膜上照射激光，使非晶膜结晶，检测从基板和激光束的扫描速度，同时对非晶膜进行激光束的辐射和扫描，并且基于光量的比较结果控制激光束的辐射水平和扫描速度从基板反射的激光束和激光束的扫描速度具有各自的预设参考。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式