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    • 5. 发明授权
    • Double fluid layer-type ultrasonic cleaning apparatus
    • 双流体层式超声波清洗装置
    • US5345958A
    • 1994-09-13
    • US131148
    • 1993-10-04
    • Shigeo Otsuka
    • Shigeo Otsuka
    • B08B3/12C23G5/04H05K3/26B08B3/10
    • C23G5/04B08B3/12H05K3/26
    • The present invention relates to a double fluid layer-type ultrasonic cleaning apparatus for cleaning such a workpiece as electronic element and pressed component by immersing it in a cleaning bath, wherein cleaning and removal of foreign substances adhered in spacings and blind holes of the workpiece are assured by storing a cleaning solution of upper layer having a lower specific gravity and containing a hydrocarbon solvent as a main component in an upper stock fluid area of the cleaning bath, and another of lower layer having a higher specific gravity and containing an inert solvent as a main component thereof in a lower stock fluid area of the cleaning bath so as to provide two fluid layers.
    • 双流体层型超声波清洗装置技术领域本发明涉及一种双液体层式超声波清洗装置,其用于将其作为电子元件和被加压部件浸渍在清洗槽中进行清洗,其特征在于,清除和除去附着在所述工件的间隔和盲孔中的异物 通过将具有较低比重的上层清洁溶液作为主要成分存储在清洗槽的上部储备液区域中,另一个具有较高比重的下层并含有惰性溶剂的清洁溶液作为 其主要成分在清洗槽的下部储备液区域中,以便提供两个流体层。
    • 6. 发明授权
    • Chloro-fluoro-carbon liquid jetting immersion cleaning apparatus
    • 氯 - 氟 - 碳液体喷射浸渍清洗设备
    • US4867186A
    • 1989-09-19
    • US231901
    • 1988-08-15
    • Shigeo Otsuka
    • Shigeo Otsuka
    • B08B3/02B08B3/08B08B3/10B08B9/00C23G5/04
    • C23G5/04B08B3/02B08B3/08B08B3/10B08B9/00
    • This invention relates to a cleaning apparatus for cleaning workpieces such as semiconductors and other electronic devices, or automobile parts, hydraulic implement parts and other die-cast products. A workpiece is completely immersed in chloro-fluoro-carbon (R113) liquid acting as cleaning liquid stored in a cleaning tank, and the cleaning liquid is caused to jet out of injection nozzles under pressure against portions of the workpiece to be cleaned. This immersion cleaning effectively removes cutting powder, abrasive materials and other such substances persistently clinging to the workpiece. This apparatus is capable of an efficient cleaning treatment which is achieved by reducing consumption and loss of the cleaning liquid.
    • 本发明涉及一种用于清洁半导体和其他电子设备等工件的清洁装置,或汽车部件,液压工具部件和其他压铸产品。 将工件完全浸入存储在清洗槽中的作为清洗液体的氯 - 氟(R113)液体中,并使清洗液在压力下喷射出喷射喷嘴,使之被清洁的工件的部分。 这种浸渍清洗有效地去除了切割粉末,研磨材料和其他持久粘附在工件上的物质。 该装置能够通过减少清洁液的消耗和损失来实现有效的清洁处理。