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    • 2. 发明授权
    • Pigment-dispersion photo-sensitive coating solution
    • 颜料分散光敏涂料溶液
    • US06514669B2
    • 2003-02-04
    • US09734620
    • 2000-12-13
    • Kazuo TakebeTakao MoriShigeo Hozumi
    • Kazuo TakebeTakao MoriShigeo Hozumi
    • G03F110
    • G03F1/56G03F7/0007Y10S430/111
    • A pigment-dispersion photo-sensitive coating solution comprising a binder resin, an organic-solvent and a main pigment dispersed in the solvent, wherein the combined area of peaks detected at a relative retention ratio in the range of 0.68 to 0.72 based on a retention time of dibutyl phthalate and peaks detected at a relative retention ratio in the range of 1.06 to 1.10 based on a retention time of dibutyl phthalate is not more than 50% of the total area of all peaks when the pigment is extracted by ethyl acetate and the extracts are analyzed by high-speed liquid chromatography using dibutyl phthalate as internal standard, is provided and use of the coating solution ensures that the colored image of stable quality is formed.
    • 一种颜料分散光敏涂层溶液,其包含分散在溶剂中的粘合剂树脂,有机溶剂和主要颜料,其中以相对保留率检测的峰的组合面积为0.68至0.72,基于保留 邻苯二甲酸二丁酯的时间和邻苯二甲酸二丁酯的保留时间相对保留比在1.06〜1.10范围内检测到的峰值不超过当乙酸乙酯萃取颜料时所有峰的总面积的50%, 提取物通过使用邻苯二甲酸二丁酯作为内标的高速液相色谱进行分析,并且使用涂布溶液确保形成稳定质量的着色图像。
    • 4. 发明授权
    • Color filter, method of manufacturing color filter and photosensitive coloring composition
    • 彩色滤光片,彩色滤光片和感光着色组合物的制造方法
    • US06344300B1
    • 2002-02-05
    • US09467781
    • 1999-12-20
    • Koji BabaShigeo Hozumi
    • Koji BabaShigeo Hozumi
    • G02B520
    • G03F7/033G02B5/201G03F7/0007
    • A color filter comprising a transparent substrate, a light-shielding layer patterned on said transparent substrate, and colored pixels of plural colors patterned on a portion of said substrate where said light-shielding layer is not formed, wherein said colored pixels of at least one color are formed from a photosensitive coloring composition comprising: (A) a pigment; (B) a copolymer of (meth)acrylic acid, as one monomer, and at least one other monomer; (C) a photopolymerizable monomer; (D) a photopolymerizable initiator; and (F) a solvent; and an acid value of a nonvolatile component of said photosensitive coloring composition is 25 through 60 mg KOH/g; and after forming the colored pixels from a photosensitive coloring composition, the light-shielding layer attains reflectance at 380 through 780 nm of 95% or more of reflectance thereof before coating the photosensitive coloring composition; and the transparent portion of the substrate attains transmittance at 380 through 780 nm of 99.5% or more of transmittance thereof before coating the photosensitive coloring composition.
    • 一种滤色镜,包括透明基板,在所述透明基板上图案化的遮光层和在所述基板的未形成所述遮光层的部分上图案化的多色彩色像素,其中所述彩色像素至少一个 颜料由感光着色组合物形成,其包含:(A)颜料;(B)作为一种单体的(甲基)丙烯酸和至少一种其它单体的共聚物;(C)可光聚合单体;(D) 光聚合引发剂; 和(F)溶剂; 所述感光着色组合物的不挥发成分的酸值为25〜60mgKOH / g, 并且在从感光着色组合物形成着色像素之后,在涂覆感光着色组合物之前,遮光层在380至780nm处的反射率达到95%或更高的反射率; 并且在涂布感光着色组合物之前,基片的透明部分在380〜780nm下透射率为99.5%以上。
    • 7. 发明授权
    • Photoresist composition comprising a polyfunctional vinyl ether compound
    • 包含多官能乙烯基醚化合物的光致抗蚀剂组合物
    • US5719008A
    • 1998-02-17
    • US525186
    • 1995-09-08
    • Shigeo HozumiHiroya Nakagawa
    • Shigeo HozumiHiroya Nakagawa
    • G03F7/027G03C1/72C08F2/50G03C1/73
    • G03F7/027Y10S430/121Y10S430/122
    • A photoresist composition is disclosed which includes: (1) a photopolymerizable monomer represented by the following formula (I) or its derivative: ##STR1## wherein n represents a number of from 0 to 20; R.sub.1 and R.sub.2 represents a hydrogen atom, a halogen atom, an alkyl group, an aryl group, an aralkyl group, an alkoxy group, an aryloxy group or a cycloalkyl group; each of Q represents --OH or --OROCH.dbd.CH.sub.2 in which R represents an alkylene group, provided that the molar ratio of (--OH)/(--OROCH.dbd.CH.sub.2) is from 10/90 to 90/10; and A represents a divalent hydrocarbon group or a divalent group having Q on it; (2) a triazine compound having a methyl group substituted with one, two or three halogen atoms; and (3) a solvent, which can be used in photolithography or for producing a color filter.
    • 公开了一种光致抗蚀剂组合物,其包括:(1)由下式(I)表示的光聚合性单体或其衍生物:0〜20; R1和R2表示氢原子,卤素原子,烷基,芳基,芳烷基,烷氧基,芳氧基或环烷基; 每个Q表示-OH或-OROCH = CH 2,其中R表示亚烷基,条件是(-OH)/( - OROCH = CH 2)的摩尔比为10/90〜90/10; A表示二价烃基或具有Q的二价基团; (2)具有被一个,两个或三个卤素原子取代的甲基的三嗪化合物; 和(3)可用于光刻或制造滤色器的溶剂。