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    • 2. 发明授权
    • Capacitive pressure sensor
    • 电容式压力传感器
    • US07319581B2
    • 2008-01-15
    • US11292445
    • 2005-12-02
    • Toshihide SutoShigefumi SakaiSasahiro Takahashi
    • Toshihide SutoShigefumi SakaiSasahiro Takahashi
    • H01G7/00
    • G01L9/0073
    • A capacitive pressure sensor includes: a conductive silicon substrate having a diaphragm; an insulating substrate having a fixed electrode, the insulating substrate overlapping the conductive silicon substrate so as to be bonded thereto; and a sealed chamber formed between the diaphragm and the fixed electrode. A conductive silicon member is buried in a part of the insulating substrate, a portion of the conductive silicon member is exposed toward a surface of the insulating substrate facing the sealed chamber so as to form the fixed electrode, and another portion of the conductive silicon member is exposed toward the other surface of the insulating substrate not facing the sealed chamber so as to form a lead electrode of the fixed electrode.
    • 电容式压力传感器包括:具有隔膜的导电硅衬底; 具有固定电极的绝缘基板,所述绝缘基板与所述导电硅基板重叠以与所述绝缘基板接合; 以及形成在隔膜和固定电极之间的密封室。 将导电硅构件埋设在绝缘基板的一部分中,导电硅构件的一部分朝向密封室的绝缘基板的表面露出,形成固定电极,另一部分导电硅构件 暴露于绝缘基板的不面向密封室的另一表面,以形成固定电极的引线电极。
    • 4. 发明授权
    • Methods of heat treatment and heat treatment apparatus for silicon oxide films
    • 氧化硅膜的热处理和热处理装置的方法
    • US06635589B2
    • 2003-10-21
    • US09286999
    • 1999-04-07
    • Shunpei YamazakiYasuhiko TakemuraMitsunori SakamaTomohiko SatoSatoshi TeramotoShigefumi Sakai
    • Shunpei YamazakiYasuhiko TakemuraMitsunori SakamaTomohiko SatoSatoshi TeramotoShigefumi Sakai
    • H01L2142
    • H01L21/28158C23C14/58C23C16/56H01L29/66757Y10S438/909Y10S438/91Y10S438/958
    • Silicon oxide films which are good as gate insulation films are formed by subjecting a silicon oxide film which has been formed on an active layer comprising a silicon film by means of a PVD method or CVD method to a heat treatment at 300-700° C. in a dinitrogen monoxide atmosphere, or in an NH3 or N2H4 atmosphere, while irradiating with ultraviolet light, reducing the hydrogen and carbon contents in the silicon oxide film and introducing nitrogen into the boundary with the silicon film in particular. Furthermore, silicon oxide films which are good as gate insulating films have been formed by subjecting silicon oxide films which have been formed on an active layer comprising a silicon film by means of a PVD method or CVD method to a heat treatment at 300-700° C. in an N2O atmosphere (or hydrogen nitride atmosphere) while irradiating with ultraviolet light, and then carrying out a heat treatment at 300-700° C. in a hydrogen nitride atmosphere (N2O atmosphere), and reducing the amount of hydrogen and carbon in the silicon oxide film and introducing nitrogen into the boundary with the silicon film in particular.
    • 作为栅极绝缘膜良好的氧化硅膜通过在300-700℃下通过PVD法或CVD法对形成在包含硅膜的有源层上的氧化硅膜进行热处理而形成。 在一氧化二氮气氛中,或在NH 3或N 2 H 4气氛中,同时用紫外线照射,降低氧化硅膜中的氢和碳含量,并将氮引入与硅膜的边界。 此外,作为栅极绝缘膜良好的氧化硅膜已经通过利用PVD法或CVD法在由硅膜的活性层上形成的氧化硅膜在300-700°的温度下进行热处理而形成 在氮氧化物气氛(N 2 O气氛)中在N2O气氛(或氮化氢气氛)中照射紫外线,然后在300-700℃下进行热处理,并减少氢和碳的量 在氧化硅膜中,特别是将氮引入与硅膜的边界。
    • 8. 发明申请
    • Capacitive pressure sensor
    • 电容式压力传感器
    • US20060133006A1
    • 2006-06-22
    • US11292445
    • 2005-12-02
    • Toshihide SutoShigefumi SakaiSasahiro Takahashi
    • Toshihide SutoShigefumi SakaiSasahiro Takahashi
    • H01G7/00
    • G01L9/0073
    • A capacitive pressure sensor includes: a conductive silicon substrate having a diaphragm; an insulating substrate having a fixed electrode, the insulating substrate overlapping the conductive silicon substrate so as to be bonded thereto; and a sealed chamber formed between the diaphragm and the fixed electrode. A conductive silicon member is buried in a part of the insulating substrate, a portion of the conductive silicon member is exposed toward a surface of the insulating substrate facing the sealed chamber so as to form the fixed electrode, and another portion of the conductive silicon member is exposed toward the other surface of the insulating substrate not facing the sealed chamber so as to form a lead electrode of the fixed electrode.
    • 电容式压力传感器包括:具有隔膜的导电硅衬底; 具有固定电极的绝缘基板,所述绝缘基板与所述导电硅基板重叠以与所述绝缘基板接合; 以及形成在隔膜和固定电极之间的密封室。 将导电硅构件埋设在绝缘基板的一部分中,导电硅构件的一部分朝向密封室的绝缘基板的表面露出,形成固定电极,另一部分导电硅构件 暴露于绝缘基板的不面向密封室的另一表面,以形成固定电极的引线电极。