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    • 4. 发明申请
    • METHOD FOR PRODUCING 5-HYDROXYMETHYL-2-FURFURAL OR ALKYL ETHER DERIVATIVES THEREOF USING AN ION EXCHANGE RESIN IN THE PRESENCE OF AN ORGANIC SOLVENT
    • 在存在有机溶剂中使用离子交换树脂生产5-羟甲基-2-丙烯或其衍生物的方法
    • US20140235881A1
    • 2014-08-21
    • US14348566
    • 2012-07-09
    • Jin Ku ChoSang Yong KimJae Hoon ChoBo Ra KimPaul Joo
    • Jin Ku ChoSang Yong KimJae Hoon ChoBo Ra KimPaul Joo
    • C07D307/50
    • C07D307/50C07D307/46C07D307/48
    • The present invention relates to a method for producing a furan-based compound using an ion exchange resin in the presence of an organic solvent. In the method for producing a furan-based compound according to the present invention, a furan-based compound is made from an aldose-type hexose compound in the presence of an organic solvent by using an anion exchange resin and a cation exchange resin. Thus, the aldose-type hexose compound obtained from biomass by simultaneously or consecutively using the anion/cation exchange resins as catalysts can be made into 5-hydroxymethyl-2-furfural (HMF) or alkyl ether derivatives thereof such as 5-alkoxymethyl-2-furfural (AMF) without using an expensive reagent. Also, since the selection of an organic solvent is not limitative and a heterogeneous catalyst can be used, separation and purification is easy and chemically stable AMF can be directly obtained. Further, the conversion efficiency of the aldose-type hexose compound is excellent, and the hexose compound can be used at a high concentration.
    • 本发明涉及在有机溶剂存在下使用离子交换树脂生产呋喃类化合物的方法。 在本发明的呋喃类化合物的制造方法中,通过使用阴离子交换树脂和阳离子交换树脂,在有机溶剂的存在下,通过醛糖型己糖化合物制造呋喃系化合物。 因此,通过同时或连续使用阴离子/阳离子交换树脂作为催化剂从生物质获得的醛糖型己糖化合物可以制成5-羟甲基-2-糠醛(HMF)或其烷基醚衍生物,例如5-烷氧基甲基-2 (AMF),而不使用昂贵的试剂。 此外,由于有机溶剂的选择不是限制性的并且可以使用多相催化剂,所以分离和纯化容易,并且可以直接获得化学稳定的AMF。 此外,醛糖型己糖化合物的转化效率优异,可以高浓度使用己糖化合物。
    • 7. 发明授权
    • Method of manufacturing a semiconductor device having a dual gate structure
    • 制造具有双栅结构的半导体器件的方法
    • US07390719B2
    • 2008-06-24
    • US11497972
    • 2006-08-01
    • Taek-Soo JeonYu-Gyun ShinSang-Bom KangHag-Ju ChoHye-Lan LeeSang-Yong Kim
    • Taek-Soo JeonYu-Gyun ShinSang-Bom KangHag-Ju ChoHye-Lan LeeSang-Yong Kim
    • H01L21/8234
    • H01L21/28088H01L21/823842H01L29/4966H01L29/78
    • A semiconductor device having a dual gate is formed on a substrate having a dielectric layer. A first metallic conductive layer is formed on the dielectric layer to a first thickness, and annealed to have a reduced etching rate. A second metallic conductive layer is formed on the first metallic conductive layer to a second thickness that is greater than the first thickness. A portion of the second metallic conductive layer formed in a second area of the substrate is removed using an etching selectivity. A first gate structure having a first metallic gate including the first and the second metallic conductive layers is formed in a first area of the substrate. A second gate structure having a second metallic gate is formed in the second area. A gate dielectric layer is not exposed to an etching chemical due to the first metallic conductive layer, so its dielectric characteristics are not degraded.
    • 具有双栅极的半导体器件形成在具有电介质层的衬底上。 在电介质层上形成第一金属导电层至第一厚度,并且退火以降低蚀刻速率。 在第一金属导电层上形成第二金属导电层至大于第一厚度的第二厚度。 使用蚀刻选择性去除在衬底的第二区域中形成的第二金属导电层的一部分。 具有包括第一和第二金属导电层的第一金属栅极的第一栅极结构形成在衬底的第一区域中。 具有第二金属栅极的第二栅极结构形成在第二区域中。 由于第一金属导电层,栅极电介质层不暴露于蚀刻化学品,因此其介电特性不劣化。