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    • 8. 发明申请
    • EMBEDDED ELECTRODE INTEGRATED OPTICAL DEVICES AND METHODS OF FABRICATION
    • 嵌入式电极集成光学器件和制造方法
    • WO2004049048A1
    • 2004-06-10
    • PCT/US2003/037267
    • 2003-11-21
    • OPTIMER PHOTONICS, INC.NIPPA, David, W.RISSER, Steven, M.RIDGWAY, Richard, W.SHORTRIDGE, Tim, L.MCGINNISS, VincentSPAHR, Kevin
    • NIPPA, David, W.RISSER, Steven, M.RIDGWAY, Richard, W.SHORTRIDGE, Tim, L.MCGINNISS, VincentSPAHR, Kevin
    • G02F1/01
    • G02F1/065
    • Waveguide devices and schemes for fabricating waveguide devices useful in applications requiring modulation, attenuation, polarization control, and switching of optical signals are provided. In accordance with one embodiment of the present invention, a method of fabricating an integrated optical device is provided. The method comprises the acts of: (i) providing a support wafer (20) defining an electrode support surface; (ii) forming an electrode pattern (30) over the electrode support surface of the support wafer; (iii) forming a non-polymeric buffer layer (40) on at least a portion of the electrode pattern and over at least a portion of the support wafer; (iv) forming a waveguide core material layer (50) over the non-polymeric silica-based buffer layer; (v) removing portions of the core material layer (50) to define a waveguide core (52); and (vi) positioning a cladding material (60) in optical communication with the waveguide core such that the buffer layer, the cladding material, and the waveguide core define an optically-clad waveguide core.
    • 提供了用于制造波导器件的波导器件和方案,其用于需要调制,衰减,偏振控制和光信号切换的应用中。 根据本发明的一个实施例,提供了一种制造集成光学器件的方法。 该方法包括以下动作:(i)提供限定电极支撑表面的支撑晶片(20); (ii)在支撑晶片的电极支撑表面上形成电极图案(30); (iii)在所述电极图案的至少一部分上和所述支撑晶片的至少一部分上形成非聚合物缓冲层(40); (iv)在非聚合物二氧化硅基缓冲层上形成波导芯材料层(50); (v)去除芯材料层(50)的一部分以限定波导芯(52); (vi)将包层材料(60)定位成与波导芯光学连通,使得缓冲层,包层材料和波导芯限定光学包层波导芯。