专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明申请

WO2010054076A2 RAPID THERMAL PROCESSING CHAMBER WITH MICRO-POSITIONING SYSTEM 审中-公开
标题翻译：具有微定位系统的快速热处理室
公开(公告)号：WO2010054076A2
公开(公告)日：2010-05-14
申请号：PCT/US2009/063394
申请日：2009-11-05
申请人： APPLIED MATERIALS, INC. , SORABJI, Khurshed , RANISH, Joseph M. , ADERHOLD, Wolfgang , HUNTER, Aaron M. , KOELMEL, Blake R. , LERNER, Alexander N. , MERRY, Nir
发明人： SORABJI, Khurshed , RANISH, Joseph M. , ADERHOLD, Wolfgang , HUNTER, Aaron M. , KOELMEL, Blake R. , LERNER, Alexander N. , MERRY, Nir
IPC分类号： H01L21/324 , H01L21/68 , H01L21/683 , H01L21/687
CPC分类号： H01L21/67259 , C23C16/46 , H01L21/324 , H01L21/67115 , H01L21/68 , H01L21/681 , H01L21/6835 , H01L21/68742
摘要： Methods and apparatus for rapid thermal processing of a planar substrate including axially aligning the substrate with a substrate support or with an empirically determined position are described. The methods and apparatus include a sensor system that determines the relative orientations of the substrate and the substrate support.
摘要翻译：描述了用于平面衬底的快速热处理的方法和设备，包括轴向对准衬底与衬底支撑件或凭借凭经验确定的位置。该方法和设备包括确定衬底和衬底支撑的相对方向的传感器系统。

2. 发明申请

WO2010030649A1 RAPID THERMAL PROCESSING LAMPHEAD WITH IMPROVED COOLING 审中-公开
标题翻译：具有改进冷却功能的快速热处理灯
公开(公告)号：WO2010030649A1
公开(公告)日：2010-03-18
申请号：PCT/US2009/056340
申请日：2009-09-09
申请人： APPLIED MATERIALS, INC. , RANISH, Joseph M. , SORABJI, Khurshed , SANGAM, Kedarnath , LERNER, Alexander
发明人： RANISH, Joseph M. , SORABJI, Khurshed , SANGAM, Kedarnath , LERNER, Alexander
IPC分类号： H01L21/324
CPC分类号： F27B17/0025 , F27D5/0037 , F27D21/0014 , H01L21/67109 , H01L21/67115
摘要： Embodiments of a lamphead and apparatus utilizing same are provided herein. In some embodiments, a lamphead for use in thermal processing may include a monolithic member having a plurality of coolant passages and a plurality of lamp passages and reflector cavities, wherein each lamp passage is configured to accommodate a lamp and each reflector cavity is shaped to act as a reflector or to receive a replaceable reflector for the lamp, and wherein the plurality of coolant passages are disposed proximate to the plurality of lamp passages; and at least one heat transfer member extending from the monolithic member into each coolant passage. In some embodiments, the lamphead may be disposed in an apparatus comprising a process chamber having a substrate support, wherein the lamphead is positioned to provide energy to the substrate support.
摘要翻译：本发明提供了一种灯头及其使用装置的实施例。在一些实施例中，用于热处理的灯头可以包括具有多个冷却剂通道和多个灯通道和反射器腔的整体构件，其中每个灯通道被配置成容纳灯，并且每个反射器空腔成形为能够起作用作为反射器或接收用于灯的可更换反射器，并且其中所述多个冷却剂通道设置成靠近所述多个灯通道; 以及至少一个传热构件，其从所述整体构件延伸到每个冷却剂通道中。在一些实施例中，灯头可以设置在包括具有基板支撑件的处理室的设备中，其中灯头被定位成向基板支撑件提供能量。

3. 发明申请

WO2010006156A3 RAPID THERMAL PROCESSING CHAMBER WITH SHOWER HEAD 审中-公开
标题翻译：快速热处理室与淋浴头
公开(公告)号：WO2010006156A3
公开(公告)日：2010-03-11
申请号：PCT/US2009050085
申请日：2009-07-09
申请人： APPLIED MATERIALS INC , SORABJI KHURSHED , RANISH JOSEPH M , ADERHOLD WOLFGANG , HUNTER AARON M , LERNER ALEXANDER N
发明人： SORABJI KHURSHED , RANISH JOSEPH M , ADERHOLD WOLFGANG , HUNTER AARON M , LERNER ALEXANDER N
IPC分类号： H01L21/324
CPC分类号： H01L21/67109 , C23C16/4404 , C23C16/45512 , C23C16/45565 , C23C16/4557 , C23C16/45572 , C23C16/4584 , C23C16/481 , F27B17/0025 , H01L21/67098 , H01L21/67115 , H01L21/67167 , H01L21/67207
摘要： Apparatus and methods for thermally processing a substrate are provided. A chamber containing a levitating support assembly configured to position the substrate at different distances from a plate during the heating and cooling of a substrate. In one embodiment a plurality of openings on the surface of the plate are configured to evenly distribute gas across a radial surface of the substrate. The distribution of gas may couple radiant energy not reflected back to the substrate during thermal processing with an absorptive region of the plate to begin the cooling of the substrate. The method and apparatus provided within allows for a controllable and effective means for thermally processing a substrate rapidly.
摘要翻译：提供了用于热处理衬底的设备和方法。容纳悬浮支撑组件的腔室，所述悬浮支撑组件被配置成在基板的加热和冷却期间将基板定位在与板不同的距离处。在一个实施例中，板的表面上的多个开口被构造成将气体均匀地分布在衬底的径向表面上。气体的分布可以将在热处理期间未反射回衬底的辐射能量与板的吸收区域耦合以开始衬底的冷却。所提供的方法和装置允许用于快速热处理衬底的可控和有效的装置。

4. 发明申请

WO2011116013A1 WAFER CARRIER TRACK 审中-公开
标题翻译：拖车履带
公开(公告)号：WO2011116013A1
公开(公告)日：2011-09-22
申请号：PCT/US2011/028551
申请日：2011-03-15
申请人： ALTA DEVICES, INC. , HE, Gang , HIGASHI, Gregg , SORABJI, Khurshed , HAMAMJY, Roger , HEGEDUS, Andreas, G.
发明人： HE, Gang , HIGASHI, Gregg , SORABJI, Khurshed , HAMAMJY, Roger , HEGEDUS, Andreas, G.
IPC分类号： C23C16/458
CPC分类号： C23C16/4412 , C23C16/45519 , C23C16/45565 , C23C16/4583 , C23C16/481 , C23C16/54 , C30B25/025 , C30B25/12 , C30B29/40 , C30B29/42 , C30B35/005 , H01L21/67115 , H01L21/67784
摘要： Embodiments of the invention generally relate to apparatuses for chemical vapor deposition (CVD) processes. In one embodiment, a wafer carrier track for levitating and traversing a wafer carrier within a vapor deposition reactor system is provided which includes upper and lower sections of a track assembly having a gas cavity formed therebetween. A guide path extends along an upper surface of the upper section and between two side surfaces which extend along and above the guide path and parallel to each other. A plurality of gas holes along the guide path extends from the upper surface of the upper section, through the upper section, and into the gas cavity. In some examples, the upper and lower sections of the track assembly may be independently contain quartz, and in some examples, may be fused together.
摘要翻译：本发明的实施例一般涉及用于化学气相沉积（CVD）工艺的装置。在一个实施例中，提供了用于在气相沉积反应器系统内悬浮和横穿晶片载体的晶片载体轨道，其包括在其间形成有气体腔的轨道组件的上部和下部。引导路径沿着上部的上表面延伸并且在引导路径之上和之上延伸并且彼此平行的两个侧表面之间延伸。沿着引导路径的多个气孔从上部的上表面延伸穿过上部并进入气体腔。在一些示例中，轨道组件的上部和下部可以独立地包含石英，并且在一些示例中可以熔合在一起。

5. 发明申请

WO2010107843A3 REACTOR LID ASSEMBLY FOR VAPOR DEPOSITION 审中-公开
标题翻译：用于蒸气沉积的反应器组件
公开(公告)号：WO2010107843A3
公开(公告)日：2011-01-13
申请号：PCT/US2010027547
申请日：2010-03-16
申请人： ALTA DEVICES INC , HE GANG , HIGASHI GREGG , SORABJI KHURSHED , HAMAMJY ROGER , HEGEDUS ANDREAS
发明人： HE GANG , HIGASHI GREGG , SORABJI KHURSHED , HAMAMJY ROGER , HEGEDUS ANDREAS
IPC分类号： H01L21/205 , H01L31/18 , H05H1/34
CPC分类号： C23C16/45565 , C23C16/4411 , C23C16/4412 , C23C16/45519 , C23C16/4557 , C23C16/4583 , C23C16/54
摘要： Embodiments of the invention generally relate to apparatuses for chemical vapor deposition (CVD) processes. In one embodiment, a reactor lid assembly for vapor deposition is provided which includes a first showerhead assembly and an isolator assembly disposed next to each other on a lid support, and a second showerhead assembly and an exhaust assembly disposed next to each other on the lid support, wherein the isolator assembly is disposed between the first and second showerhead assemblies and the second showerhead assembly is disposed between the isolator assembly and the exhaust assembly.
摘要翻译：本发明的实施例一般涉及用于化学气相沉积（CVD）工艺的装置。在一个实施例中，提供了一种用于气相沉积的反应器盖组件，其包括在盖支撑件上彼此相邻设置的第一淋浴器组件和隔离器组件，以及彼此靠近设置在盖上的第二淋浴喷头组件和排气组件支撑件，其中隔离器组件设置在第一和第二喷头组件之间，并且第二喷头组件设置在隔离器组件和排气组件之间。

6. 发明申请

WO2010054076A3 RAPID THERMAL PROCESSING CHAMBER WITH MICRO-POSITIONING SYSTEM 审中-公开
标题翻译：具有微定位系统的快速热处理室
公开(公告)号：WO2010054076A3
公开(公告)日：2010-07-29
申请号：PCT/US2009063394
申请日：2009-11-05
申请人： APPLIED MATERIALS INC , SORABJI KHURSHED , RANISH JOSEPH M , ADERHOLD WOLFGANG , HUNTER AARON M , KOELMEL BLAKE R , LERNER ALEXANDER N , MERRY NIR
发明人： SORABJI KHURSHED , RANISH JOSEPH M , ADERHOLD WOLFGANG , HUNTER AARON M , KOELMEL BLAKE R , LERNER ALEXANDER N , MERRY NIR
IPC分类号： H01L21/324 , H01L21/68 , H01L21/683 , H01L21/687
CPC分类号： H01L21/67259 , C23C16/46 , H01L21/324 , H01L21/67115 , H01L21/68 , H01L21/681 , H01L21/6835 , H01L21/68742
摘要： Methods and apparatus for rapid thermal processing of a planar substrate including axially aligning the substrate with a substrate support or with an empirically determined position are described. The methods and apparatus include a sensor system that determines the relative orientations of the substrate and the substrate support.
摘要翻译：描述了包括将衬底轴向对准衬底支撑件或经验确定的位置的用于快速热处理平面衬底的方法和装置。所述方法和装置包括确定衬底和衬底支撑件的相对取向的传感器系统。

7. 发明申请

WO2010006156A2 RAPID THERMAL PROCESSING CHAMBER WITH SHOWER HEAD 审中-公开
标题翻译：具有淋浴头的快速热处理室
公开(公告)号：WO2010006156A2
公开(公告)日：2010-01-14
申请号：PCT/US2009/050085
申请日：2009-07-09
申请人： APPLIED MATERIALS, INC. , SORABJI, Khurshed , RANISH, Joseph, M. , ADERHOLD, Wolfgang , HUNTER, Aaron, M. , LERNER, Alexander, N.
发明人： SORABJI, Khurshed , RANISH, Joseph, M. , ADERHOLD, Wolfgang , HUNTER, Aaron, M. , LERNER, Alexander, N.
IPC分类号： H01L21/324
CPC分类号： H01L21/67109 , C23C16/4404 , C23C16/45512 , C23C16/45565 , C23C16/4557 , C23C16/45572 , C23C16/4584 , C23C16/481 , F27B17/0025 , H01L21/67098 , H01L21/67115 , H01L21/67167 , H01L21/67207
摘要： Apparatus and methods for thermally processing a substrate are provided. A chamber containing a levitating support assembly configured to position the substrate at different distances from a plate during the heating and cooling of a substrate. In one embodiment a plurality of openings on the surface of the plate are configured to evenly distribute gas across a radial surface of the substrate. The distribution of gas may couple radiant energy not reflected back to the substrate during thermal processing with an absorptive region of the plate to begin the cooling of the substrate. The method and apparatus provided within allows for a controllable and effective means for thermally processing a substrate rapidly.
摘要翻译：提供了用于热处理基板的设备和方法。包含悬浮支撑组件的腔室，其构造成在衬底的加热和冷却期间将衬底定位在与板不同的距离处。在一个实施例中，板的表面上的多个开口构造成均匀地分布气体穿过衬底的径向表面。气体的分布可以在热处理期间将具有未反射回衬底的辐射能量与板的吸收区域耦合以开始冷却衬底。所提供的方法和装置允许用于快速热处理基板的可控和有效的装置。

8. 发明申请

WO2009120729A1 TEMPERATURE MEASUREMENT AND CONTROL OF WAFER SUPPORT IN THERMAL PROCESSING CHAMBER 审中-公开
标题翻译：温度测量和控制热处理室中的支撑
公开(公告)号：WO2009120729A1
公开(公告)日：2009-10-01
申请号：PCT/US2009/038156
申请日：2009-03-25
申请人： APPLIED MATERIALS, INC. , SORABJI, Khurshed , LERNER, Alexander, N. , RANISH, Joseph, M. , HUNTER, Aaron, M. , ADAMS, Bruce, E. , BEHDJAT, Mehran , RAMANUJAM, Rajesh, S.
发明人： SORABJI, Khurshed , LERNER, Alexander, N. , RANISH, Joseph, M. , HUNTER, Aaron, M. , ADAMS, Bruce, E. , BEHDJAT, Mehran , RAMANUJAM, Rajesh, S.
IPC分类号： H01L21/324 , H01L21/683 , H01L21/687
CPC分类号： H01L21/67109 , H01L21/67115 , H01L21/67248
摘要： Apparatus and methods for achieving uniform heating or cooling of a substrate during a rapid thermal process are disclosed. More particularly, apparatus and methods for controlling the temperature of an edge ring supporting a substrate and/or a reflector plate during a rapid thermal process to improve temperature uniformity across the substrate are disclosed, which include a thermal mass or plate adjacent the edge ring to heat or cool the edge ring.
摘要翻译：公开了用于在快速热处理期间实现基板的均匀加热或冷却的装置和方法。更具体地，公开了用于在快速热处理期间控制支撑衬底和/或反射板的边缘环的温度以改善衬底上的温度均匀性的装置和方法，其包括邻近边缘环到加热或冷却边缘环。

9. 发明申请

WO2010107842A3 SHOWERHEAD FOR VAPOR DEPOSITION 审中-公开
标题翻译：用于蒸气沉积的淋浴器
公开(公告)号：WO2010107842A3
公开(公告)日：2011-01-13
申请号：PCT/US2010027545
申请日：2010-03-16
申请人： ALTA DEVICES INC , HE GANG , HIGASHI GREGG , SORABJI KHURSHED , HAMAMJY ROGER , HEGEDUS ANDREAS
发明人： HE GANG , HIGASHI GREGG , SORABJI KHURSHED , HAMAMJY ROGER , HEGEDUS ANDREAS
IPC分类号： H01L21/205 , H01L31/18 , H05H1/34
CPC分类号： C23C16/45565 , C23C16/4411 , C23C16/4412 , C23C16/45519 , C23C16/4557 , C23C16/4583 , C23C16/54
摘要： Embodiments of the invention generally relate to apparatuses for chemical vapor deposition (CVD) processes. In one embodiment, a showerhead assembly is provided which includes a body having a centralized channel extending through upper and lower portions of the body and extending parallel to a central axis of the body. The showerhead assembly contains an optional diffusion plate having a first plurality of holes and disposed within the centralized channel, an upper tube plate having a second plurality of holes and disposed within the centralized channel below the diffusion plate, a lower tube plate having a third plurality of holes and disposed within the centralized channel below the upper tube plate, and a plurality of tubes extending from the upper tube plate to the lower tube plate. Each tube is coupled to and in fluid communication with individual holes of the upper and lower tube plates.
摘要翻译：本发明的实施例一般涉及用于化学气相沉积（CVD）工艺的装置。在一个实施例中，提供了一种喷头组件，其包括具有延伸穿过主体的上部和下部并且平行于主体的中心轴线延伸的集中通道的主体。淋浴头组件包括具有第一多个孔并且设置在集中通道内的可选扩散板，具有第二多个孔并且设置在扩散板下方的集中通道内的上管板，具有第三多个的下管板并且设置在上管板下方的集中通道内，以及从上管板延伸到下管板的多个管。每个管连接到上管和下管板的各个孔中并与其流体连通。

10. 发明申请

WO2010107835A3 VAPOR DEPOSITION REACTOR SYSTEM AND METHODS THEREOF 审中-公开
标题翻译：蒸气沉积反应器系统及其方法
公开(公告)号：WO2010107835A3
公开(公告)日：2011-01-13
申请号：PCT/US2010027538
申请日：2010-03-16
申请人： ALTA DEVICES INC , HE GANG , HIGASHI GREGG , SORABJI KHURSHED , HAMAMJY ROGER , HEGEDUS ANDREAS
发明人： HE GANG , HIGASHI GREGG , SORABJI KHURSHED , HAMAMJY ROGER , HEGEDUS ANDREAS
IPC分类号： H01L21/205 , H05H1/34
CPC分类号： C23C16/45565 , C23C16/4411 , C23C16/4412 , C23C16/45519 , C23C16/4557 , C23C16/4583 , C23C16/54
摘要： Embodiments of the invention generally relate to apparatuses and methods for chemical vapor deposition (CVD) processes. In one embodiment, a CVD reactor has a reactor lid assembly disposed on a reactor body and containing a first showerhead assembly, an isolator assembly, a second showerhead assembly, and an exhaust assembly consecutively and linearly disposed next to each other on a lid support. The CVD reactor further contains first and second faceplates disposed on opposite ends of the reactor body, wherein the first showerhead assembly is disposed between the first faceplate and the isolator assembly and the exhaust assembly is disposed between the second showerhead assembly and the second faceplate. The reactor body has a wafer carrier disposed on a wafer carrier track and a lamp assembly disposed below the wafer carrier track and containing a plurality of lamps which may be utilized to heat wafers disposed on the wafer carrier.
摘要翻译：本发明的实施例一般涉及用于化学气相沉积（CVD）工艺的装置和方法。在一个实施方案中，CVD反应器具有反应器盖组件，反应器盖组件设置在反应器主体上，并且在盖支撑件上彼此相邻并且连续并线性地设置有第一淋浴头组件，隔离器组件，第二淋浴头组件和排气组件。 CVD反应器还包含设置在反应器主体的相对端上的第一和第二面板，其中第一喷头组件设置在第一面板和隔离器组件之间，排气组件设置在第二喷头组件和第二面板之间。反应器主体具有设置在晶片载体轨道上的晶片载体和设置在晶片载体轨道下方的灯组件，并且容纳可用于加热设置在晶片载体上的晶片的多个灯。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式