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1. 发明申请

WO2004003969A3 METHOD AND SYSTEM FOR PREDICTING PROCESS PERFORMANCE USING MATERIAL PROCESSING TOOL AND SENSOR DATA 审中-公开
标题翻译：使用材料处理工具和传感器数据预测过程性能的方法和系统
公开(公告)号：WO2004003969A3
公开(公告)日：2004-05-13
申请号：PCT/US0316245
申请日：2003-06-27
申请人： TOKYO ELECTRON LTD , LAM HIEU A , YUE HONGYU , SHRINER JOHN
发明人： LAM HIEU A , YUE HONGYU , SHRINER JOHN
IPC分类号： H01L21/3065 , C23F1/00 , G05B19/418 , G05B23/02 , H01L21/66 , H05H1/00
CPC分类号： H01L22/20 , G05B19/41875 , G05B23/0254 , G05B2219/31357 , G05B2219/32179 , G05B2219/32194 , G05B2219/45028 , G05B2219/45031 , H01J37/32935 , Y02P90/14 , Y02P90/22
摘要： A material processing system including a process tool and a process performance prediction system. The performance prediction system includes sensors coupled to the tool to measure tool data and a controller coupled to the sensors to receive tool data, where the controller is configured to predict the process performance for the tool using the tool data. A method for detecting a fault in a material processing system using a process performance prediction model is also provided. The method includes preparing the tool, initiating a process in the tool, and recording tool data to form to a tool data matrix. The method also includes performing a matrix multiplication of the tool data matrix and a correlation matrix to form predicted process performance data, where the correlation matrix includes the performance prediction model, comparing the predicted data with target data, and determining a fault condition of the processing system from the comparing step.
摘要翻译：一种材料处理系统，包括处理工具和处理性能预测系统。性能预测系统包括耦合到工具以测量工具数据的传感器和耦合到传感器以接收工具数据的控制器，其中控制器被配置为使用工具数据预测工具的工艺性能。还提供了一种使用过程性能预测模型来检测材料处理系统中的故障的方法。该方法包括准备工具，在工具中启动过程，以及记录工具数据以形成工具数据矩阵。该方法还包括执行工具数据矩阵和相关矩阵的矩阵乘法以形成预测过程性能数据，其中相关矩阵包括性能预测模型，将预测数据与目标数据进行比较，并且确定处理的故障状况系统从比较步骤。

2. 发明申请

WO2004003969A2 METHOD AND SYSTEM FOR PREDICTING PROCESS PERFORMANCE USING MATERIAL PROCESSING TOOL AND SENSOR DATA 审中-公开
标题翻译：使用材料加工工具和传感器数据预测过程性能的方法和系统
公开(公告)号：WO2004003969A2
公开(公告)日：2004-01-08
申请号：PCT/US2003/016245
申请日：2003-06-27
申请人： TOKYO ELECTRON LIMITED , LAM, Hieu, A. , YUE, Hongyu , SHRINER, John
发明人： LAM, Hieu, A. , YUE, Hongyu , SHRINER, John
IPC分类号： H01L
CPC分类号： H01L22/20 , G05B19/41875 , G05B23/0254 , G05B2219/31357 , G05B2219/32179 , G05B2219/32194 , G05B2219/45028 , G05B2219/45031 , H01J37/32935 , Y02P90/14 , Y02P90/22
摘要： A material processing system including a process tool and a process performance prediction system. The performance prediction system includes sensors coupled to the tool to measure tool data and a controller coupled to the sensors to receive tool data, where the controller is configured to predict the process performance for the tool using the tool data. A method for detecting a fault in a material processing system using a process performance prediction model is also provided. The method includes preparing the tool, initiating a process in the tool, and recording tool data to form to a tool data matrix. The method also includes performing a matrix multiplication of the tool data matrix and a correlation matrix to form predicted process performance data, where the correlation matrix includes the performance prediction model, comparing the predicted data with target data, and determining a fault condition of the processing system from the comparing step.
摘要翻译：一种材料处理系统，包括处理工具和过程性能预测系统。性能预测系统包括耦合到工具以测量工具数据的传感器和耦合到传感器以接收工具数据的控制器，其中控制器被配置为使用工具数据预测工具的过程性能。还提供了使用过程性能预测模型来检测材料处理系统中的故障的方法。该方法包括准备工具，启动工具中的过程，以及记录工具数据以形成工具数据矩阵。该方法还包括执行刀具数据矩阵和相关矩阵的矩阵乘法以形成预测过程性能数据，其中相关矩阵包括性能预测模型，将预测数据与目标数据进行比较，以及确定处理的故障状况系统从比较步骤。

3. 发明申请

WO2003103017A3 METHOD AND SYSTEM OF DETERMINING CHAMBER SEASONING CONDITION BY OPTICAL EMISSION 审中-公开
公开(公告)号：WO2003103017A3
公开(公告)日：2003-12-11
申请号：PCT/US2003/015391
申请日：2003-05-29
申请人： TOKYO ELECTRON LIMITED , LAM, Hieu, A. , YUE, Hongyu , SHRINER, John
发明人： LAM, Hieu, A. , YUE, Hongyu , SHRINER, John
IPC分类号： G01N21/00
摘要： A plasma processing system that comprises a process chamber, a plasma source, a light detection device and a controller. The controller is useful for determining a seasoning state of the plasma processing system. The present invention further provides a method of determining the seasoning state of a plasma processing system comprising the steps of forming a first plasma in the process chamber utilizing the plasma source; measuring a first signal related to light emitted from the first plasma using the light detection device and storing the first signal using the controller; forming a second plasma in the process chamber utilizing the plasma source; measuring a second signal related to light emitted from the second plasma using the light detection device and storing the second signal using the controller; and correlating a change between the first signal and the second signal with a seasoning state of the plasma processing system.

4. 发明申请

WO2003103017A2 METHOD AND SYSTEM OF DETERMINING CHAMBER SEASONING CONDITION BY OPTICAL EMISSION 审中-公开
标题翻译：通过光学发射测定室温条件的方法和系统
公开(公告)号：WO2003103017A2
公开(公告)日：2003-12-11
申请号：PCT/US2003/015391
申请日：2003-05-29
申请人： TOKYO ELECTRON LIMITED , LAM, Hieu, A. , YUE, Hongyu , SHRINER, John
发明人： LAM, Hieu, A. , YUE, Hongyu , SHRINER, John
IPC分类号： H01L
CPC分类号： H01L21/67253 , A61K48/005 , C23C16/4404 , C23C16/52 , G01N33/574 , G01N2333/4706 , H01J37/32935 , H01L21/67069
摘要： A plasma processing system that comprises a process chamber, a plasma source, a light detection device and a controller. The controller is useful for determining a seasoning state of the plasma processing system. The present invention further provides a method of determining the seasoning state of a plasma processing system comprising the steps of forming a first plasma in the process chamber utilizing the plasma source; measuring a first signal related to light emitted from the first plasma using the light detection device and storing the first signal using the controller; forming a second plasma in the process chamber utilizing the plasma source; measuring a second signal related to light emitted from the second plasma using the light detection device and storing the second signal using the controller; and correlating a change between the first signal and the second signal with a seasoning state of the plasma processing system.
摘要翻译：一种等离子体处理系统，包括处理室，等离子体源，光检测装置和控制器。控制器可用于确定等离子体处理系统的调味状态。本发明还提供了一种确定等离子体处理系统的调味状态的方法，包括以下步骤：利用等离子体源在处理室中形成第一等离子体; 使用所述光检测装置测量与从所述第一等离子体发射的光有关的第一信号，并使用所述控制器存储所述第一信号; 在所述处理室中利用所述等离子体源形成第二等离子体; 使用所述光检测装置测量与从所述第二等离子体发射的光相关的第二信号，并使用所述控制器存储所述第二信号; 以及用所述等离子体处理系统的调节状态将所述第一信号和所述第二信号之间的变化相关联。

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