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    • 1. 发明申请
    • METHOD AND APPARATUS FOR REAL-TIME DYNAMIC CHEMICAL ANALYSIS
    • 用于实时动态化学分析的方法和装置
    • WO03027647A9
    • 2004-04-08
    • PCT/IL0200779
    • 2002-09-19
    • NIRA SCIENCES LTDSHEKEL YEHUDAHARTMAN IRA MTHOMPSON GEORGE A
    • SHEKEL YEHUDAHARTMAN IRA MTHOMPSON GEORGE A
    • C23F1/16G01N21/35H01L21/304H01L21/306
    • H01L21/67075C23F1/16G01N21/3577G01N21/359
    • Methods and apparatus for real-time dynamic analysis of a chemical etching process are provided. The apparatus comprises an optical element (36) operative to pass a beam of electromagnetic radiation at least at two points in time through a liquid phase (42) comprising at least one chemical component and including an etchant, wherein the etchant is operative to etch a solid. A detector (60) is operative to perform an ex-situ non-contact scanning detection of the electromagnetic radiation subsequent to passing through the liquid phase in a near infra-red range (700-2500 nm) at the at least at two points in time so as to detect a change in an optical property of at least one of the at least one chemical component and the etchant. The apparatus further comprises a processor (64) operative to activate an algorithm so as to compare the change in the optical property of the at least of the at least one chemical component and the etchant received from the detector so as to provide data concerning a change in concentration of the etchant; and further configured to perform a chemometric manipulation of the data so as to provide a rate of etching of the solid.
    • 提供了化学蚀刻工艺的实时动态分析方法和装置。 所述装置包括光学元件(36),其操作以至少在两个时间点通过包含至少一种化学成分并包括蚀刻剂的液相(42)的电磁辐射束,其中所述蚀刻剂可操作以蚀刻 固体。 检测器(60)可操作用于在至少在两个点处的近红外范围(700-2500nm)中通过液相之后执行电磁辐射的非原位非接触扫描检测 以便检测至少一种化学成分和蚀刻剂中的至少一种的光学特性的变化。 所述装置还包括处理器(64),其用于激活算法,以便比较所述至少一个化学成分中的至少一个化学成分和从检测器接收的蚀刻剂的光学特性的变化,以提供关于变化的数据 浓度为腐蚀剂; 并且还被配置为执行数据的化学计量操作,以便提供固体的蚀刻速率。
    • 3. 发明申请
    • METHOD AND APPARATUS FOR REAL-TIME DYNAMIC CHEMICAL ANALYSIS
    • 用于实时动态化学分析的方法和装置
    • WO2003027647A1
    • 2003-04-03
    • PCT/IL2002/000779
    • 2002-09-19
    • NIRA SCIENCES LTD.SHEKEL, YehudaHARTMAN, Ira, M.THOMPSON, George, a.
    • SHEKEL, YehudaHARTMAN, Ira, M.THOMPSON, George, a.
    • G01N21/35
    • H01L21/67075C23F1/16G01N21/3577G01N21/359
    • Methods and apparatus for real-time dynamic analysis of a chemical etching process are provided. The apparatus comprises an optical element (36) operative to pass a beam of electromagnetic radiation at least at two points in time through a liquid phase (42) comprising at least one chemical component and including an etchant, wherein the etchant is operative to etch a solid. A detector (60) is operative to perform an ex-situ non-contact scanning detection of the electromagnetic radiation subsequent to passing through the liquid phase in a near infra-red range (700-2500 nm) at the at least at two points in time so as to detect a change in an optical property of at least one of the at least one chemical component and the etchant. The apparatus further comprises a processor (64) operative to activate an algorithm so as to compare the change in the optical property of the at least of the at least one chemical component and the etchant received from the detector so as to provide data concerning a change in concentration of the etchant; and further configured to perform a chemometric manipulation of the data so as to provide a rate of etching of the solid.
    • 提供了化学蚀刻工艺的实时动态分析方法和装置。 所述装置包括光学元件(36),其操作以至少在两个时间点通过包含至少一种化学成分并包括蚀刻剂的液相(42)的电磁辐射束,其中所述蚀刻剂可操作以蚀刻 固体。 检测器(60)可操作用于在至少在两个点处的近红外范围(700-2500nm)中通过液相之后执行电磁辐射的非原位非接触扫描检测 以便检测至少一种化学成分和蚀刻剂中的至少一种的光学特性的变化。 所述装置还包括处理器(64),其用于激活算法,以便比较所述至少一个化学成分中的至少一个化学成分和从检测器接收的蚀刻剂的光学特性的变化,以提供关于变化的数据 浓度为蚀刻剂; 并且还被配置为执行数据的化学计量操作,以便提供固体的蚀刻速率。