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1. 发明申请

WO2006003592A3 SOFT LITHOGRAPHIC STAMP WITH A CHEMICALLY PATTERNED SURFACE 审中-公开
标题翻译：具有化学表面的软光刻印
公开(公告)号：WO2006003592A3
公开(公告)日：2007-12-27
申请号：PCT/IB2005052111
申请日：2005-06-27
申请人： KONINKL PHILIPS ELECTRONICS NV , DECRE MICHEL M J , BLEES MARTIN , VAN EERD PATRICK P J , SCHROEDERS RICHARD J M , BURDINSKI DIRK , SHARPE RUBEN B A , HUSKENS JURRIAAN
发明人： DECRE MICHEL M J , BLEES MARTIN , VAN EERD PATRICK P J , SCHROEDERS RICHARD J M , BURDINSKI DIRK , SHARPE RUBEN B A , HUSKENS JURRIAAN
IPC分类号： G03F7/00 , H05K3/12
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00 , H05K3/0002 , H05K3/1275 , H05K2203/0108 , H05K2203/1173
摘要： The present invention provides a soft lithographic stamp (30) and a method for the manufacturing of such a stamp (30). A stamp (30) according to the present invention comprises blocking regions (37) and printing regions (38). The blocking regions (37) are formed of a material which is different from the material the printing regions (38) are formed of and which exhibits a reduced permeability, diffusivity or absorbing or adsorbing capability to the printing compound, such that it prevents or significantly reduces chemical or physical transport or transfer of the printing compound from the blocking regions to a substrate that has to be patterned or printed. In that way, when impregnating the stamp (30) with a printing compound, the printing compound only diffuses into the printing regions (38) and hence, the printing compound is only transferred from the printing regions (38) to the substrate to be patterned and substantially no diffusion of printing compound via air voids (33) between protruding elements (32) will occur.
摘要翻译：本发明提供了一种软光刻印模（30）及其制造方法。根据本发明的印模（30）包括阻挡区域（37）和印刷区域（38）。阻挡区域（37）由不同于印刷区域（38）的材料形成的材料形成，并且其对印刷化合物的渗透性，扩散性或吸收或吸附能力降低，从而防止或显着地减少化学或物理运输或将印刷化合物从阻挡区转移到必须被图案化或印刷的基底上。以这种方式，当用印刷化合物浸渍印模（30）时，印刷化合物仅扩散到印刷区域（38）中，因此印刷化合物仅从印刷区域（38）转移到待图案化的基材并且基本上不会在突出元件（32）之间通过空气（33）扩散印刷化合物。

2. 发明申请

WO2006003592A2 SOFT LITHOGRAPHIC STAMP WITH A CHEMICALLY PATTERNED SURFACE 审中-公开
标题翻译：具有化学图案表面的软光栅印章
公开(公告)号：WO2006003592A2
公开(公告)日：2006-01-12
申请号：PCT/IB2005/052111
申请日：2005-06-27
申请人： KONINKLIJKE PHILIPS ELECTRONICS N.V. , DECRE, Michel, M., J. , BLEES, Martin , VAN EERD, Patrick, P., J. , SCHROEDERS, Richard, J., M. , BURDINSKI, Dirk , SHARPE, Ruben, B., A. , HUSKENS, Jurriaan
发明人： DECRE, Michel, M., J. , BLEES, Martin , VAN EERD, Patrick, P., J. , SCHROEDERS, Richard, J., M. , BURDINSKI, Dirk , SHARPE, Ruben, B., A. , HUSKENS, Jurriaan
IPC分类号： G03F7/00
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00 , H05K3/0002 , H05K3/1275 , H05K2203/0108 , H05K2203/1173
摘要： The present invention provides a soft lithographic stamp (30) and a method for the manufacturing of such a stamp (30). A stamp (30) according to the present invention comprises blocking regions (37) and printing regions (38). The blocking regions (37) are formed of a material which is different from the material the printing regions (38) are formed of and which exhibits a reduced permeability, diffusivity or absorbing or adsorbing capability to the printing compound, such that it prevents or significantly reduces chemical or physical transport or transfer of the printing compound from the blocking regions to a substrate that has to be patterned or printed. In that way, when impregnating the stamp (30) with a printing compound, the printing compound only diffuses into the printing regions (38) and hence, the printing compound is only transferred from the printing regions (38) to the substrate to be patterned and substantially no diffusion of printing compound via air voids (33) between protruding elements (32) will occur.
摘要翻译：本发明提供了一种软平版印记（30）和用于制造这种印章（30）的方法。根据本发明的印章（30）包括阻挡区域（37）和印刷区域（38）。阻挡区域（37）由与形成印刷区域（38）的材料不同的材料形成，并且对印刷化合物表现出降低的渗透性，扩散性或吸收或吸收能力，使得其防止或显着减少印刷化合物从阻挡区域到必须被图案化或印刷的基板的化学或物理传输或转印。以这种方式，当用印刷化合物浸渍印模（30）时，印刷化合物仅扩散到印刷区域（38）中，并且因此印刷化合物仅从印刷区域（38）转印到待图案化的基板并且基本上不会经由凸出元件（32）之间的空气空隙（33）扩散印刷化合物。

3. 发明申请

WO2006067694A3 NANOFABRICATION BASED ON SAM GROWTH 审中-公开
公开(公告)号：WO2006067694A3
公开(公告)日：2006-06-29
申请号：PCT/IB2005/054250
申请日：2005-12-14
申请人： KONINKLIJKE PHILIPS ELECTRONICS N.V. , BURDINSKI, Dirk , SHARPE, Ruben, B., A.
发明人： BURDINSKI, Dirk , SHARPE, Ruben, B., A.
IPC分类号： G03F7/00
摘要： The present invention relates to a process of nano fabrication based on nucleated SAM growth, to patterned substrates prepared thereby, to a nano wire or grid of nanowires prepared thereby and to electronic devices including the same. In particular, there is provided a process which comprises applying a first SAM- forming molecular species to a first surface region of the substrate surface, so as to provide a first SAM defining a scaffold pattern on the first surface region; and applying a second SAM-forming molecular species to at least a second surface region of said substrate surface which is not covered by the first SAM, whereby a second replica SAM comprising the second SAM-forming molecular species selectively forms on substrate surface adjacent to at least one edge of said first SAM.

4. 发明申请

WO2005035438A1 METHOD FOR PATTERNING A SUBSTRATE SURFACE 审中-公开
标题翻译：用于绘制基板表面的方法
公开(公告)号：WO2005035438A1
公开(公告)日：2005-04-21
申请号：PCT/IB2004/052009
申请日：2004-10-07
申请人： KONINKLIJKE PHILIPS ELECTRONICS N.V. , BURDINSKI, Dirk , SHARPE, Ruben, B., A.
发明人： BURDINSKI, Dirk , SHARPE, Ruben, B., A.
IPC分类号： B81C1/00
CPC分类号： B82Y30/00 , B05D1/283 , B82Y10/00 , B82Y40/00 , G03F7/0002
摘要： An elastomeric stamp (10) is provided, which has a bulk surface (12) from which protruding features (14, 14') extend. A barrier layer (20) covers the bulk surface (12) and the protruding features (14, 14'). After applying an ink solution to the elastomeric stamp (10) and drying the elastomeric stamp (10), the elastomeric stamp (10) is brought into contact with a surface (42) of a first substrate (40). The surface (42) of the first substrate (40) has a high affinity with the ink molecules (32), which is utilized to effectively remove the ink molecules (32) from the contact surfaces (16, 16') of the protruding features (14, 14'). Subsequently, the elastomeric stamp (10) is brought into contact with the surface (52) of a second substrate (50). Ink molecules 32 are transferred from the edges (18, 18') of the protruding features (14, 14') to the surface (52) of a second substrate (50), thus forming an ink pattern in the form of a selfassembled monolayer on this surface (52). The patterning method of the present invention allows for the formation of high-definition ink patterns on a substrate (50) using a wide variety of inks.
摘要翻译：提供了弹性体印模（10），其具有突出特征（14,14'）延伸的体表面（12）。阻挡层（20）覆盖主体表面（12）和突出特征（14,14'）。在将墨水溶液施加到弹性体印模（10）上并干燥弹性体印模（10）之后，弹性体印模（10）与第一基底（40）的表面（42）接触。第一衬底（40）的表面（42）与油墨分子（32）具有高亲和力，其用于从突出特征的接触表面（16,16'）有效地去除油墨分子（32）（14,14'）。随后，弹性体印模（10）与第二基底（50）的表面（52）接触。墨水分子32从突出特征（14,14'）的边缘（18,18'）转移到第二基底（50）的表面（52），从而形成自组装单层形式的墨图形在该表面（52）上。本发明的图案化方法允许使用各种各样的油墨在基板（50）上形成高分辨率油墨图案。

5. 发明申请

WO2007049225A1 A METHOD OF MANUFACTURING A STRUCTURE 审中-公开
标题翻译：一种制造结构的方法
公开(公告)号：WO2007049225A1
公开(公告)日：2007-05-03
申请号：PCT/IB2006/053906
申请日：2006-10-24
申请人： KONINKLIJKE PHILIPS ELECTRONICS N.V. , BURDINSKI, Dirk , SHARPE, Ruben, B., A. , BLEES, Martin, H. , HUSKENS, Jurriaan
发明人： BURDINSKI, Dirk , SHARPE, Ruben, B., A. , BLEES, Martin, H. , HUSKENS, Jurriaan
IPC分类号： H01L21/68
CPC分类号： H01L21/76838 , B82Y10/00 , B82Y30/00 , B82Y40/00 , G03F7/0002 , H01L21/32139 , H01L21/76885 , H05K1/09 , H05K3/061 , H05K3/062 , H05K2203/0108 , H05K2203/0315 , H05K2203/0537 , H05K2203/0582 , H05K2203/1157 , H05K2203/1189 , H05K2203/122
摘要： A gold layer (20) is patterned with a gold oxide mask (30), which mask is patterned with an acid, preferably with microcontactprinting. The gold oxide mask (30) is stable in alkalic etch solutions for the gold layer (20). The gold oxide mask (30) may be maintained to create a reexposable gold pad (20).
摘要翻译：用金氧化物掩模（30）对金层（20）进行图案化，该掩模用酸形成图案，优选用微印刷印刷。金氧化物掩模（30）在金层（20）的碱蚀刻溶液中是稳定的。金氧化物掩模（30）可以被保持以产生可重复使用的金垫（20）。

6. 发明申请

WO2006067694A2 NANOFABRICATION BASED ON SAM GROWTH 审中-公开
标题翻译：基于SAM生长的南非
公开(公告)号：WO2006067694A2
公开(公告)日：2006-06-29
申请号：PCT/IB2005054250
申请日：2005-12-14
申请人： KONINKL PHILIPS ELECTRONICS NV , BURDINSKI DIRK , SHARPE RUBEN B A
发明人： BURDINSKI DIRK , SHARPE RUBEN B A
IPC分类号： G03F7/00
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00
摘要： The present invention relates to a process of nano fabrication based on nucleated SAM growth, to patterned substrates prepared thereby, to a nano wire or grid of nanowires prepared thereby and to electronic devices including the same. In particular, there is provided a process which comprises applying a first SAM- forming molecular species to a first surface region of the substrate surface, so as to provide a first SAM defining a scaffold pattern on the first surface region; and applying a second SAM-forming molecular species to at least a second surface region of said substrate surface which is not covered by the first SAM, whereby a second replica SAM comprising the second SAM-forming molecular species selectively forms on substrate surface adjacent to at least one edge of said first SAM.
摘要翻译：本发明涉及一种基于有核SAM生长的纳米制造方法，由其制备的图案化衬底，由其制备的纳米线或纳米线网格以及包括该纳米线的电子器件。特别地，提供了一种方法，其包括将第一SAM形成分子物质施加到衬底表面的第一表面区域，以便在第一表面区域上提供限定支架图案的第一SAM; 以及将第二SAM形成分子物质施加到所述基底表面的至少第二表面区域，所述第二表面区域未被所述第一SAM覆盖，由此包含所述第二SAM形成分子种类的第二副本SAM选择性地形成在邻近于所述第一SAM的至少一个边缘。

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