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1. 发明申请

US20140209817A1 Radiation Source and Method for Lithographic Apparatus for Device Manufacture 有权
标题翻译：用于器件制造的平版印刷设备的辐射源和方法
公开(公告)号：US20140209817A1
公开(公告)日：2014-07-31
申请号：US14342007
申请日：2012-07-27
申请人： Ronald Johannes Hultermans , Antonius Theodorus Wilhelmus Kempen , Bernard Van Essen
发明人： Ronald Johannes Hultermans , Antonius Theodorus Wilhelmus Kempen , Bernard Van Essen
IPC分类号： H05G2/00
CPC分类号： H05G2/006 , B22D43/004 , G03F7/70033 , H05G2/005 , H05G2/008 , Y10S430/146 , Y10T29/49826
摘要： A radiation source for generating EUV from a stream of molten metal fuel droplets by LPP (Laser Produced Plasma) or (Dual Laser Plasma) has a fuel droplet generator arranged to provide a stream of droplets of fuel and at least one laser configured to vaporise at least some of said droplets of fuel, whereby radiation is generated. The fuel droplet generator has nozzle, fuel supply line, and reservoir, with a pumping device arranged to supply a flow of molten metal fuel from the reservoir through the fuel feed line and out of the nozzle as a stream of droplets. The fuel droplet generator has a replaceable filter assembly in the fuel feed line, arranged to filter the molten metal fuel in use, to deter nozzle blockage by solid particulate impurities in the fuel.
摘要翻译：用于通过LPP（激光产生等离子体）或（双激光等离子体）从熔融金属燃料液滴流产生EUV的辐射源具有燃料液滴发生器，其布置成提供燃料液滴流和至少一个配置成在至少一些所述燃料液滴，从而产生辐射。燃料液滴发生器具有喷嘴，燃料供应管线和储存器，其中泵送装置被布置成以液滴流的形式从燃料供给管路提供来自储存器的熔融金属燃料流。燃料液滴发生器在燃料供给管线中具有可替换的过滤器组件，布置成在使用中过滤熔融金属燃料，以阻止喷嘴堵塞燃料中的固体颗粒杂质。

2. 发明申请

US20100315610A1 LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD 审中-公开
标题翻译： LITHOGRAPHIC装置和装置制造方法
公开(公告)号：US20100315610A1
公开(公告)日：2010-12-16
申请号：US12820970
申请日：2010-06-22
申请人： Ronald Johannes Hultermans , Ton De Groot , Jacobus Johannus Leonardus Hendricus Verspay , Gerardus Everadus Marie Hannen
发明人： Ronald Johannes Hultermans , Ton De Groot , Jacobus Johannus Leonardus Hendricus Verspay , Gerardus Everadus Marie Hannen
IPC分类号： G03B27/52 , G03B27/32
CPC分类号： G03F7/70341 , G03F7/70866 , G03F7/70925
摘要： An immersion lithographic apparatus is disclosed having comprising a pump and buffer volume configured to remove remaining liquid from a substrate, the pump and the buffer volume configured to generate a vacuum cleaning gas flow near the substrate by gas suction into the buffer volume. In an embodiment, since gas flow is needed only a limited amount of time (ordinarily less than 5%), evacuation may be performed using only a moderately powered vacuum pump. In addition or alternatively, the buffer volume may be used as a backup volume buffer configured to provide gas vacuum suction, e.g., in case of a vacuum supply outage.
摘要翻译：公开了一种浸没式光刻设备，其包括构造成从衬底去除剩余液体的泵和缓冲体积，所述泵和缓冲体积构造成通过气体吸入到缓冲体积中而在衬底附近产生真空清洁气体流。在一个实施方案中，由于仅需要有限量的时间（通常小于5％），因此只能使用中等功率的真空泵进行排气。另外或替代地，缓冲器体积可以用作配置为提供气体真空吸力的备用体积缓冲器，例如在真空供应中断的情况下。

3. 发明授权

US07764356B2 Lithographic apparatus and device manufacturing method 失效
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US07764356B2
公开(公告)日：2010-07-27
申请号：US12232971
申请日：2008-09-26
申请人： Ronald Johannes Hultermans , Ton De Groot , Jacobus Johannus Leonardus Hendricus Verspay , Gerardus Everardus Marie Hannen
发明人： Ronald Johannes Hultermans , Ton De Groot , Jacobus Johannus Leonardus Hendricus Verspay , Gerardus Everardus Marie Hannen
IPC分类号： G03B27/52 , G03B27/42 , G03B27/58 , G03B27/32
CPC分类号： G03F7/70341 , G03F7/70866 , G03F7/70925
摘要： An immersion lithographic apparatus is disclosed having comprising a pump and buffer volume configured to remove remaining liquid from a substrate, the pump and the buffer volume configured to generate a vacuum cleaning gas flow near the substrate by gas suction into the buffer volume. In an embodiment, since gas flow is needed only a limited amount of time (ordinarily less than 5%), evacuation may be performed using only a moderately powered vacuum pump. In addition or alternatively, the buffer volume may be used as a backup volume buffer configured to provide gas vacuum suction, e.g., in case of a vacuum supply outage.
摘要翻译：公开了一种浸没式光刻设备，其包括构造成从衬底去除剩余液体的泵和缓冲体积，所述泵和缓冲体积构造成通过气体吸入到缓冲体积中而在衬底附近产生真空清洁气体流。在一个实施方案中，由于仅需要有限量的时间（通常小于5％），因此只能使用中等功率的真空泵进行排气。另外或替代地，缓冲器体积可以用作配置为提供气体真空吸力的备用体积缓冲器，例如在真空供应中断的情况下。

4. 发明授权

US07136142B2 Lithographic apparatus having a gas flushing device 有权
标题翻译：具有气体冲洗装置的平版印刷设备
公开(公告)号：US07136142B2
公开(公告)日：2006-11-14
申请号：US10852686
申请日：2004-05-25
申请人： Marcel Beckers , Ronald Johannes Hultermans , Nicolaas Ten Kate , Nicolaas Rudolf Kemper , Nicolaas Franciscus Koppelaars , Jan-Marius Schotsman , Ronald Van Der Ham , Johannes Antonius Maria Martina Van Uijtregt
发明人： Marcel Beckers , Ronald Johannes Hultermans , Nicolaas Ten Kate , Nicolaas Rudolf Kemper , Nicolaas Franciscus Koppelaars , Jan-Marius Schotsman , Ronald Van Der Ham , Johannes Antonius Maria Martina Van Uijtregt
IPC分类号： G03B27/52 , G03B27/42
CPC分类号： G03F7/70933 , G03F7/70908
摘要： A lithographic apparatus is disclosed. The apparatus includes an illumination system to provide a beam of radiation, and a support structure for supporting a patterning device. The patterning device serves to impart the beam with a pattern in its cross-section. The apparatus also includes a gas flushing device for flushing a substantially laminar flow of gas across the beam of radiation and/or along a surface of an optical component. The gas flushing device includes a single gas outlet that has an inner rim at a downstream end of the gas outlet. The inner rim defines a total gas outlet area. The gas outlet is provided with a laminator that has an effective area out of which, in use, the substantially laminar flow of gas flows. The laminator effective area includes material that has laminator openings and is at least as large as the total gas outlet area.
摘要翻译：公开了一种光刻设备。该装置包括用于提供辐射束的照明系统和用于支撑图案形成装置的支撑结构。图案形成装置用于在其横截面中赋予光束图案。该装置还包括用于冲洗基本层流的气体穿过辐射束和/或沿着光学部件的表面冲洗的气体冲洗装置。气体冲洗装置包括单个气体出口，其在气体出口的下游端具有内缘。内缘定义了总气体出口面积。气体出口设置有层压机，其具有在使用中基本上层流的气体流动的有效区域。层压机有效区域包括具有层压机开口并且至少与总气体出口面积一样大的材料。

5. 发明授权

US08890099B2 Radiation source and method for lithographic apparatus for device manufacture 有权
标题翻译：用于器件制造的光刻设备的辐射源和方法
公开(公告)号：US08890099B2
公开(公告)日：2014-11-18
申请号：US14342007
申请日：2012-07-27
申请人： Ronald Johannes Hultermans , Antonius Theodorus Wilhelmus Kempen , Bernard Van Essen
发明人： Ronald Johannes Hultermans , Antonius Theodorus Wilhelmus Kempen , Bernard Van Essen
IPC分类号： H05G2/00 , G03F7/20 , H01L25/13
CPC分类号： H05G2/006 , B22D43/004 , G03F7/70033 , H05G2/005 , H05G2/008 , Y10S430/146 , Y10T29/49826
摘要： A radiation source for generating EUV from a stream of molten metal fuel droplets by LPP (Laser Produced Plasma) or (Dual Laser Plasma) has a fuel droplet generator arranged to provide a stream of droplets of fuel and at least one laser configured to vaporise at least some of said droplets of fuel, whereby radiation is generated. The fuel droplet generator has nozzle, fuel supply line, and reservoir, with a pumping device arranged to supply a flow of molten metal fuel from the reservoir through the fuel feed line and out of the nozzle as a stream of droplets. The fuel droplet generator has a replaceable filter assembly in the fuel feed line, arranged to filter the molten metal fuel in use, to deter nozzle blockage by solid particulate impurities in the fuel.
摘要翻译：用于通过LPP（激光产生等离子体）或（双激光等离子体）从熔融金属燃料液滴流产生EUV的辐射源具有燃料液滴发生器，其布置成提供燃料液滴流和至少一个配置成在至少一些所述燃料液滴，从而产生辐射。燃料液滴发生器具有喷嘴，燃料供应管线和储存器，其中泵送装置被布置成以液滴流的形式从燃料供给管路提供来自储存器的熔融金属燃料流。燃料液滴发生器在燃料供给管线中具有可替换的过滤器组件，布置成在使用中过滤熔融金属燃料，以阻止喷嘴堵塞燃料中的固体颗粒杂质。

6. 发明授权

US07446850B2 Lithographic apparatus and device manufacturing method 有权
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US07446850B2
公开(公告)日：2008-11-04
申请号：US11002454
申请日：2004-12-03
申请人： Ronald Johannes Hultermans , Ton De Groot , Jacobus Johannus Leonardus Hendricus Verspay , Gerardus Everardus Marie Hannen
发明人： Ronald Johannes Hultermans , Ton De Groot , Jacobus Johannus Leonardus Hendricus Verspay , Gerardus Everardus Marie Hannen
IPC分类号： G03B27/52 , G03B27/42 , G03B27/58 , G03B27/32
CPC分类号： G03F7/70341 , G03F7/70866 , G03F7/70925
摘要： An immersion lithographic apparatus is disclosed having comprising a pump and buffer volume configured to remove remaining liquid from a substrate, the pump and the buffer volume configured to generate a vacuum cleaning gas flow near the substrate by gas suction into the buffer volume. In an embodiment, since gas flow is needed only a limited amount of time (ordinarily less than 5%), evacuation may be performed using only a moderately powered vacuum pump. In addition or alternatively, the buffer volume may be used as a backup volume buffer configured to provide gas vacuum suction, e.g., in case of a vacuum supply outage.
摘要翻译：公开了一种浸没式光刻设备，其包括构造成从衬底去除剩余液体的泵和缓冲体积，所述泵和缓冲体积构造成通过气体吸入到缓冲体积中而在衬底附近产生真空清洁气体流。在一个实施方案中，由于仅需要有限量的时间（通常小于5％），因此只能使用中等功率的真空泵进行排气。另外或替代地，缓冲器体积可以用作配置为提供气体真空吸力的备用体积缓冲器，例如在真空供应中断的情况下。

7. 发明申请

US20090033891A1 Lithographic apparatus and device manufacturing method 失效
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US20090033891A1
公开(公告)日：2009-02-05
申请号：US12232971
申请日：2008-09-26
申请人： Ronald Johannes Hultermans , Ton DE Groot , Jacobus Johannus Leonardus Hendricus Verspay , Gerardus Everardus Marie Hannen
发明人： Ronald Johannes Hultermans , Ton DE Groot , Jacobus Johannus Leonardus Hendricus Verspay , Gerardus Everardus Marie Hannen
IPC分类号： G03B27/52
CPC分类号： G03F7/70341 , G03F7/70866 , G03F7/70925
摘要： An immersion lithographic apparatus is disclosed having comprising a pump and buffer volume configured to remove remaining liquid from a substrate, the pump and the buffer volume configured to generate a vacuum cleaning gas flow near the substrate by gas suction into the buffer volume. In an embodiment, since gas flow is needed only a limited amount of time (ordinarily less than 5%), evacuation may be performed using only a moderately powered vacuum pump. In addition or alternatively, the buffer volume may be used as a backup volume buffer configured to provide gas vacuum suction, e.g., in case of a vacuum supply outage.
摘要翻译：公开了一种浸没式光刻设备，其包括构造成从衬底去除剩余液体的泵和缓冲体积，所述泵和缓冲体积构造成通过气体吸入到缓冲体积中而在衬底附近产生真空清洁气体流。在一个实施方案中，由于仅需要有限量的时间（通常小于5％），因此只能使用中等功率的真空泵进行排气。另外或替代地，缓冲器体积可以用作配置为提供气体真空吸力的备用体积缓冲器，例如在真空供应中断的情况下。

8. 发明授权

US07106412B2 Lithographic apparatus comprising a gas flushing system 失效
标题翻译：光刻设备包括气体冲洗系统
公开(公告)号：US07106412B2
公开(公告)日：2006-09-12
申请号：US10776641
申请日：2004-02-12
申请人： Pieter Klaas De Bokx , Tjarko Adriaan Rudolf Van Empel , Ronald Johannes Hultermans , Adrianus Cornelius Antonius Jonkers
发明人： Pieter Klaas De Bokx , Tjarko Adriaan Rudolf Van Empel , Ronald Johannes Hultermans , Adrianus Cornelius Antonius Jonkers
IPC分类号： G03B27/52 , G03B27/42
CPC分类号： G03F7/70933
摘要： A lithographic projection apparatus includes a radiation system constructed and arranged to supply a projection beam of radiation, a support structure constructed and arranged to support a patterning structure, the patterning structure constructed and arranged to pattern the projection beam according to a desired pattern, a substrate support constructed and arranged to support a substrate, and a projection system constructed and arranged to project the patterned beam onto a target portion of the substrate. The apparatus further includes a gas flushing system comprising radial gas flow outlets, said gas flushing system being constructed and arranged to generate a radial gas flow through said radial gas flow outlets in an intermediate space defined between said gas flushing system and said substrate, wherein the radial gas flow has a radial velocity directed outwards in said space with a magnitude larger than zero at every location in said space.
摘要翻译：一种光刻投影设备包括一个辐射系统，该辐射系统被构造和布置成提供一个投影辐射束，一个构造和布置成支撑图形结构的支撑结构，该图形结构被构造和布置成根据期望的图案对投影光束进行图案化，支撑构造和布置成支撑衬底;以及投影系统，其构造和布置成将图案化的光束投影到衬底的目标部分上。所述设备还包括气体冲洗系统，其包括径向气体流出口，所述气体冲洗系统被构造和布置成在所述气体冲洗系统和所述基板之间限定的中间空间中产生径向气流通过所述径向气流出口，其中，径向气流在所述空间中的每个位置处具有在所述空间中向外指向的幅度大于零的径向速度。

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