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1. 发明申请

US20120227817A1 GAS DELIVERY SYSTEM AND METHOD OF USE THEREOF 有权
标题翻译：气体输送系统及其使用方法
公开(公告)号：US20120227817A1
公开(公告)日：2012-09-13
申请号：US13414217
申请日：2012-03-07
申请人： JAMES P. CRUSE , EZRA ROBERT GOLD , JOHN W. LANE
发明人： JAMES P. CRUSE , EZRA ROBERT GOLD , JOHN W. LANE
IPC分类号： B01F5/00 , F16K37/00
CPC分类号： B01F3/028 , G05D11/132 , Y10T137/0318 , Y10T137/2499 , Y10T137/8326 , Y10T137/87169 , Y10T137/87249 , Y10T137/87281 , Y10T137/87652 , Y10T137/8766 , Y10T137/87684
摘要： Methods and apparatus for delivery of gas are provided herein. In some embodiments, a gas delivery system may include a premix tank having an inlet and an outlet; a plurality of gas supplies coupled to the inlet of the premix tank; a plurality of valves, each valve respectively disposed in line with a corresponding one of the plurality of gas supplies; and a conduit coupling the outlet of the premix tank to one or more gas delivery zones.
摘要翻译：本文提供了用于输送气体的方法和装置。在一些实施例中，气体输送系统可以包括具有入口和出口的预混合罐; 耦合到预混合容器的入口的多个气体供应源; 多个阀，每个阀分别与所述多个气体供应中的相应一个排放成一直线; 以及将预混合箱的出口连接到一个或多个气体输送区的导管。

2. 发明授权

US08231799B2 Plasma reactor apparatus with multiple gas injection zones having time-changing separate configurable gas compositions for each zone 有权
标题翻译：具有多个气体注入区域的等离子体反应器装置，其具有用于每个区域的时变单独的可配置气体组成
公开(公告)号：US08231799B2
公开(公告)日：2012-07-31
申请号：US11414026
申请日：2006-04-28
申请人： Kallol Bera , Xiaoye Zhao , Kenny L. Doan , Ezra Robert Gold , Paul Lukas Brillhart , Bruno Geoffrion , Bryan Pu , Daniel J. Hoffman
发明人： Kallol Bera , Xiaoye Zhao , Kenny L. Doan , Ezra Robert Gold , Paul Lukas Brillhart , Bruno Geoffrion , Bryan Pu , Daniel J. Hoffman
IPC分类号： H01L21/00 , C23C16/00
CPC分类号： H01L21/3065 , H01J37/32082 , H01J37/3244 , H01J37/32449 , H01L21/31116
摘要： A plasma reactor for processing a workpiece such as a semiconductor wafer has a housing defining a process chamber, a workpiece support configured to support a workpiece within the chamber during processing and comprising a plasma bias power electrode. The reactor further includes plural gas sources containing different gas species, plural process gas inlets and an array of valves capable of coupling any of said plural gas sources to any of said plural process gas inlets. The reactor also includes a controller governing said array of valves and is programmed to change the flow rates of gases through said inlets over time. A ceiling plasma source power electrode of the reactor has plural gas injection zones coupled to the respective process gas inlets. In a preferred embodiment, the plural gas sources comprise supplies containing, respectively, fluorocarbon or fluorohydrocarbon species with respectively different ratios of carbon and fluorine chemistries. They further include an oxygen or nitrogen supply and a diluent gas supply. The controller is programmed to produce flow of different process gas species or mixtures thereof through different ones of said plural gas injection zones. The controller is further programmed to change over time the species content of the gases flowing through different ones of said plural gas injection zones.
摘要翻译：用于处理诸如半导体晶片的工件的等离子体反应器具有限定处理室的壳体，被配置为在处理期间支撑室内的工件并包括等离子体偏置功率电极的工件支撑件。反应器还包括含有不同气体种类的多个气体源，多个处理气体入口和能够将所述多个气体源中的任一个耦合到所述多个处理气体入口中的任何一个的阀阵列。反应器还包括控制所述阀阵列的控制器，并被编程为随时间改变通过所述入口的气体的流速。反应器的天花板等离子体源功率电极具有耦合到各个工艺气体入口的多个气体注入区域。在一个优选的实施方案中，多个气体源包括分别含有分别具有不同比例的碳和氟化学物质的碳氟化合物或氟代烃物质的物料。它们还包括氧气或氮气供应和稀释气体供应。控制器被编程为通过不同的所述多个气体注入区域产生不同工艺气体种类或其混合物的流动。控制器进一步被编程为随时间改变流过不同的所述多个气体注入区域的气体的物质含量。

3. 发明申请

US20110265951A1 TWIN CHAMBER PROCESSING SYSTEM 审中-公开
标题翻译：双室加工系统
公开(公告)号：US20110265951A1
公开(公告)日：2011-11-03
申请号：US12908644
申请日：2010-10-20
申请人： MING XU , ANDREW NGUYEN , EVANS LEE , JARED AHMAD LEE , JAMES P. CRUSE , CORIE LYNN COBB , MARTIN JEFF SALINAS , ANCHEL SHEYNER , EZRA ROBERT GOLD , JOHN W. LANE
发明人： MING XU , ANDREW NGUYEN , EVANS LEE , JARED AHMAD LEE , JAMES P. CRUSE , CORIE LYNN COBB , MARTIN JEFF SALINAS , ANCHEL SHEYNER , EZRA ROBERT GOLD , JOHN W. LANE
IPC分类号： C23F1/08 , C23C16/458 , C23C16/52 , C23C16/455
CPC分类号： C23C16/52 , C23C16/45561 , C23C16/46 , C23C16/509 , C23C16/54
摘要： Methods and apparatus for twin chamber processing systems are disclosed, and, in some embodiments, may include a first process chamber and a second process chamber having independent processing volumes and a plurality of shared resources between the first and second process chambers. In some embodiments, the shared resources include at least one of a shared vacuum pump, a shared gas panel, or a shared heat transfer source.
摘要翻译：公开了用于双室处理系统的方法和装置，并且在一些实施例中，可以包括具有独立处理量的第一处理室和第二处理室以及第一处理室和第二处理室之间的多个共享资源。在一些实施例中，共享资源包括共享真空泵，共用气体面板或共用传热源中的至少一个。

4. 发明授权

US07910013B2 Method of controlling a chamber based upon predetermined concurrent behavior of selected plasma parameters as a function of source power, bias power and chamber pressure 有权
标题翻译：基于所选等离子体参数的预定并行行为作为源功率，偏置功率和腔室压力的函数来控制腔室的方法
公开(公告)号：US07910013B2
公开(公告)日：2011-03-22
申请号：US11608980
申请日：2006-12-11
申请人： Daniel J. Hoffman , Ezra Robert Gold
发明人： Daniel J. Hoffman , Ezra Robert Gold
IPC分类号： G01L21/30 , H01L21/66
CPC分类号： H01J37/32174 , H01J37/32935
摘要： For each one of plural plasma parameters, such as ion density, wafer voltage, etch rate, wafer current, a relevant surface of constant value is fetched from a memory. The relevant surface of constant value corresponds to a user-selected value of one of the plasma parameters, the surface being defined in a space of which each one of plural, chamber parameters (e.g., source power, bias power and chamber pressure) is a dimension. An intersection of these relevant surfaces is found, the intersection corresponding to a target value of source power, bias power and chamber pressure. The source power, the bias power and the chamber pressure, respectively, are set to their corresponding target values.
摘要翻译：对于诸如离子密度，晶片电压，蚀刻速率，晶片电流的多个等离子体参数中的每一个，从存储器取出恒定值的相关表面。恒定值的相关表面对应于等离子体参数之一的用户选择的值，表面被定义在其中多个室参数（例如，源功率，偏置功率和室压力）中的每一个为尺寸。找到这些相关表面的交点，该交点对应于源功率，偏置功率和室压力的目标值。源功率，偏置功率和室压力分别设置为其相应的目标值。

5. 发明授权

US07846497B2 Method and apparatus for controlling gas flow to a processing chamber 有权
公开(公告)号：US07846497B2
公开(公告)日：2010-12-07
申请号：US11678623
申请日：2007-02-26
申请人： Ezra Robert Gold , Richard Charles Fovell , James Patrick Cruse , Jared Ahmad Lee , Bruno Geoffrion , Douglas Arthur Buchberger , Martin J. Salinas
发明人： Ezra Robert Gold , Richard Charles Fovell , James Patrick Cruse , Jared Ahmad Lee , Bruno Geoffrion , Douglas Arthur Buchberger , Martin J. Salinas
IPC分类号： C23C16/00 , F17D1/00 , F17D1/02
CPC分类号： C23C16/52 , C23C16/4412 , C23C16/455 , H01L21/67098 , H01L21/67103 , H01L21/67109 , H01L21/67115 , Y10T137/0318 , Y10T137/0324 , Y10T137/87249
摘要： A method and apparatus for delivering gases to a semiconductor processing system are provided. In one embodiment, an apparatus for delivering gases to a semiconductor processing system includes a plurality of gas input and output lines having inlet and outlet ports. Connecting lines couple respective pairs of the gas input and gas output lines. Connecting valves are arranged to control flow through the respective connecting lines. Mass gas flow controllers are arranged to control flow into respective inlet ports. In another embodiment, a method includes providing a manifold having at least a plurality of inlet that may be selectively coupled to at least one of a plurality of outlets, flowing one or more gases through the manifold to a vacuum environment by-passing the processing chamber prior to processing or to a calibration circuit, and flowing the one or more gases into the processing chamber during substrate processing.

6. 发明申请

US20080202610A1 METHOD AND APPARATUS FOR CONTROLLING GAS FLOW TO A PROCESSING CHAMBER 有权
公开(公告)号：US20080202610A1
公开(公告)日：2008-08-28
申请号：US11678622
申请日：2007-02-26
申请人： Ezra Robert Gold , Richard Charles Fovell , James Patrick Cruse , Jared Ahmad Lee , Bruno Geoffrion , Douglas Arthur Buchberger , Martin J. Salinas
发明人： Ezra Robert Gold , Richard Charles Fovell , James Patrick Cruse , Jared Ahmad Lee , Bruno Geoffrion , Douglas Arthur Buchberger , Martin J. Salinas
IPC分类号： F16K21/00
CPC分类号： H01J37/3244 , H01J37/32449 , H01L21/67098 , H01L21/67103 , H01L21/67109 , H01L21/67115 , Y10T137/7761 , Y10T137/87249
摘要： A method and apparatus for delivering gases to a semiconductor processing system are provided. In one embodiment, an apparatus for delivering gases to a semiconductor processing system includes a plurality of gas input and output lines having inlet and outlet ports. Connecting lines couple respective pairs of the gas input and gas output lines. Connecting valves are arranged to control flow through the respective connecting lines. Mass gas flow controllers are arranged to control flow into respective inlet ports. In another embodiment, a method includes providing a manifold having at least a plurality of inlet that may be selectively coupled to at least one of a plurality of outlets, flowing one or more gases through the manifold to a vacuum environment by-passing the processing chamber prior to processing or to a calibration circuit, and flowing the one or more gases into the processing chamber during substrate processing.

7. 发明授权

US07243795B2 Identification system for individual containers 有权
标题翻译：单个容器的识别系统
公开(公告)号：US07243795B2
公开(公告)日：2007-07-17
申请号：US10812435
申请日：2004-03-30
申请人： Robert Gold , Stephen Cochran
发明人： Robert Gold , Stephen Cochran
IPC分类号： B65D77/00
CPC分类号： B65D25/34 , B65D17/4012 , B65D23/08 , B65D2203/12 , B65D2517/0052
摘要： An identification system distinguishes among a set of individual containers. The identification system has an identifier member associated with each of the containers in the set for facilitating visual discrimination of each of the containers from the others of the set. The identifier member of each container in the set has distinct and visibly different printed identifying indicia positioned over a surface portion of the container, and an opaque covering material covering the printed identifying indicia. The opaque covering material is removable to selectively expose a preselected one of the printed identifying indicia so that during consumption of the contents of the container a user may readily distinguish his container from the other containers in the set by visual inspection of the exposed printed identifying indicia.
摘要翻译：识别系统区分一组单独的容器。识别系统具有与集合中的每个容器相关联的标识符构件，以便于将容器中的每一个与集合中的其他容器视觉区分开。集合中的每个容器的标识符构件具有位于容器的表面部分上方的不同且明显不同的印刷识别标记，以及覆盖印刷的识别标记的不透明覆盖材料。不透明的覆盖材料是可去除的，以选择性地暴露印刷的识别标记中的预选的一个，使得在消费容器的内容物期间，用户可以通过目视检查暴露的打印识别标记来容易地将其容器与组中的其他容器区分开。

8. 发明授权

US5724383A Method for generating and encoding signals for spread spectrum communication 失效
标题翻译：用于生成和编码扩频通信信号的方法
公开(公告)号：US5724383A
公开(公告)日：1998-03-03
申请号：US432905
申请日：1995-05-01
申请人： Robert Gold , Robert C. Dixon
发明人： Robert Gold , Robert C. Dixon
IPC分类号： H04B1/707 , H04J14/00 , H04L7/04 , H04B15/00 , H04K1/00 , H04L27/30
CPC分类号： H04B1/707 , H04B1/70718 , H04J14/005 , H04L7/042
摘要： A method for communicating using a plurality of spread spectrum codes. A plurality of spreading codes are generated by use of one or more linear feedback shift registers configured with feedback taps. The spreading codes may be maximal or non-maximal. A plurality of code portions are selected, one from each of the spreading codes. The code portions each have the same length and are selected for low cross-correlation and favorable auto-correlation and spectral properties. Each of the code portions is associated with a data symbol representing a unique group of data bits. An input data stream is divided into groups of data bits and, in response thereto, the code portion associated with each group of data bits is transmitted. At the receiver, the transmitted signal is captured in one or more receive shift registers. The receive shift register or registers have tap locations matching the tap locations of the transmitter, and simultaneously detect for each code portion by combining the incoming signal with each of the taps for a given code portion. When a code portion is recognized, a sequence of consecutive ones is output. More than one code portion may be sent and received using offset quadrature phase shift keyed modulation.
摘要翻译：一种使用多个扩频码进行通信的方法。通过使用配置有反馈抽头的一个或多个线性反馈移位寄存器来生成多个扩展码。扩展码可以是最大的或非最大的。从每个扩展码中选择多个码部分。代码部分各自具有相同的长度并且被选择用于低互相关和良好的自相关和光谱性质。每个代码部分与表示唯一的数据位组的数据符号相关联。输入数据流被分成数据位组，响应于此，发送与每组数据位相关联的代码部分。在接收机处，发送的信号被捕获在一个或多个接收移位寄存器中。接收移位寄存器或寄存器具有与发送器的抽头位置匹配的抽头位置，并且通过将输入信号与给定代码部分的每个抽头相结合来同时检测每个代码部分。当识别代码部分时，输出一连串序列。可以使用偏移正交相移键控调制发送和接收多于一个的代码部分。

9. 发明授权

US08616224B2 Methods and apparatus for providing a gas mixture to a pair of process chambers 失效
标题翻译：将气体混合物提供给一对处理室的方法和装置
公开(公告)号：US08616224B2
公开(公告)日：2013-12-31
申请号：US12907944
申请日：2010-10-19
申请人： Jared Ahmad Lee , Martin Jeff Salinas , Ezra Robert Gold , James P. Cruse
发明人： Jared Ahmad Lee , Martin Jeff Salinas , Ezra Robert Gold , James P. Cruse
IPC分类号： B08B3/00
CPC分类号： F17D3/03 , H01J37/3244 , H01J37/32899 , H01L21/02071 , H01L21/6719 , H01L21/67201 , Y10T137/0318 , Y10T137/877
摘要： A method and apparatus for supplying a gas mixture to a load lock chamber is described. In one embodiment, the apparatus supplies a gas mixture to a pair of process chambers, comprising a first ozone generator to provide a first gas mixture to a first process chamber, a second ozone generator to provide a second gas mixture to a second process chamber, a first gas source coupled to the first ozone generator via a first mass flow controller and a first gas line, and coupled to the second ozone generator via a second mass flow controller and a second gas line, and a second gas source coupled to the first ozone generator via a third mass flow controller and a third gas line and coupled to the second ozone generator via fourth mass flow controller and a fourth gas line.
摘要翻译：描述了一种将气体混合物供应到负载锁定室的方法和装置。在一个实施例中，该装置将气体混合物提供给一对处理室，包括第一臭氧发生器以向第一处理室提供第一气体混合物，第二臭氧发生器将第二气体混合物提供给第二处理室，第一气体源，经由第一质量流量控制器和第一气体管线耦合到第一臭氧发生器，并且经由第二质量流量控制器和第二气体管线耦合到第二臭氧发生器，以及耦合到第一气体源的第一气体源臭氧发生器，经由第三质量流量控制器和第三气体管线，并经由第四质量流量控制器和第四气体管线与第二臭氧发生器连接。

10. 发明授权

US08616043B2 Methods and apparatus for calibrating pressure gauges in a substrate processing system 有权
标题翻译：在基板处理系统中校准压力表的方法和装置
公开(公告)号：US08616043B2
公开(公告)日：2013-12-31
申请号：US12916450
申请日：2010-10-29
申请人： James P. Cruse , Ezra Robert Gold , Jared Ahmad Lee , Ming Xu
发明人： James P. Cruse , Ezra Robert Gold , Jared Ahmad Lee , Ming Xu
IPC分类号： G01L27/02
CPC分类号： G01L27/005 , H01L21/67253 , Y10T137/86083
摘要： Systems and methods for calibrating pressure gauges in one or more process chambers coupled to a transfer chamber having a transfer volume is disclosed herein. The method includes providing a first pressure in the transfer volume and in a first inner volume of a first process chamber coupled to the transfer chamber, wherein the transfer volume and the first inner volume are fluidly coupled, injecting a calibration gas into the transfer volume to raise a pressure in the transfer volume and in the first inner volume to a second pressure, measuring the second pressure using each of a reference pressure gauge coupled to the transfer chamber and a first pressure gauge coupled to the first process chamber while the transfer volume and the first inner volume are fluidly coupled, and calibrating the first pressure gauge based on a difference in the measured second pressure between the reference pressure gauge and the first pressure gauge.
摘要翻译：本文公开了用于校准耦合到具有转移体积的转移室的一个或多个处理室中的压力计的系统和方法。该方法包括在传送体积和连接到传送室的第一处理室的第一内部容积中提供第一压力，其中传送体积和第一内部体积被流体耦合，将校准气体注入到传送体积中将传送体积和第一内部体积中的压力提高到第二压力，使用耦合到传送室的参考压力表中的每一个测量第二压力，以及耦合到第一处理室的第一压力表，同时传送体积和第一内部体积流体耦合，并且基于测量的参考压力计和第一压力计之间的第二压力的差异校准第一压力计。

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