会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 2. 发明申请
    • Method to reduce corner shunting during fabrication of CPP read heads
    • 在CPP读取头制造过程中减少拐角分流的方法
    • US20080020240A1
    • 2008-01-24
    • US11890868
    • 2007-08-07
    • Robert FontanaYing HongWipul JayasekaraHoward Zolla
    • Robert FontanaYing HongWipul JayasekaraHoward Zolla
    • G11B5/33B05D5/12C23F1/04
    • B82Y10/00B82Y25/00G11B5/3163G11B5/3932G11B2005/3996Y10T428/1171
    • A method is presented for fabricating a CPP read head having a CPP read head sensor and a hard bias layer which includes forming a strip of sensor material in a sensor material region, and depositing strips of fast-milling dielectric material in first and second fast-milling dielectric material regions adjacent to the sensor material region. A protective layer and a layer of masking material are deposited on the strip of sensor material and the strips of fast-milling dielectric material to provide masked areas and exposed areas. A shaping source, such as an ion milling source, is provided which shapes the exposed areas. Hard bias material is then deposited on the regions of sensor material and fast-milling dielectric material to form caps on each of these regions. The caps of hard bias material and the masking material are then removed from each of these regions.
    • 提出了一种用于制造具有CPP读取头传感器和硬偏置层的CPP读取头的方法,该CPP读取头包括在传感器材料区域中形成传感器材料条,以及将快速研磨电介质材料的条带放置在第一和第二快速接头中, 研磨与传感器材料区域相邻的介电材料区域。 保护层和掩蔽材料层沉积在传感器材料条和快速研磨电介质材料条上,以提供掩蔽区域和暴露区域。 提供成形源,例如离子铣削源,其形成暴露的区域。 然后将硬偏置材料沉积在传感器材料和快速研磨电介质材料的区域上,以在这些区域中的每一个上形成盖。 然后从这些区域中的每一个去除硬偏置材料的盖子和掩模材料。
    • 4. 发明申请
    • Planar extraordinary magnetoresistance sensor
    • 平面非凡磁阻传感器
    • US20060022672A1
    • 2006-02-02
    • US10909122
    • 2004-07-30
    • Amitava ChattopadhyayRobert FontanaBruce GurneyStefan MaatErnesto Marinero
    • Amitava ChattopadhyayRobert FontanaBruce GurneyStefan MaatErnesto Marinero
    • G01R33/02
    • B82Y25/00G01R33/093G01R33/095
    • An extraordinary magnetoresistance (EMR) sensor has a planar shunt and planar leads formed on top of the sensor and extending downward into the semiconductor active region, resulting. Electrically conductive material, such as Au or AuGe, is first deposited into lithographically defined windows on top of the sensor. After liftoff of the photoresist a rapid thermal annealing process causes the conductive material to diffuse downward into the semiconductor material and make electrical contact with the active region. The outline of the sensor is defined by reactive etching or other suitable etching techniques. Insulating backfilling material such as Al-oxide is deposited to protect the EMR sensor and the edges of the active region. Chemical mechanical polishing of the structure results in a planar sensor that does not have exposed active region edges.
    • 非常大的磁阻(EMR)传感器具有平面分流和平面引线,形成在传感器的顶部并向下延伸到半导体有源区域中。 诸如Au或AuGe的导电材料首先沉积在传感器顶部的光刻定义的窗口中。 在光致抗蚀剂剥离之后,快速热退火工艺使得导电材料向下扩散到半导体材料中并与活性区电接触。 传感器的轮廓由反应性蚀刻或其他合适的蚀刻技术限定。 沉积诸如Al氧化物的回填材料的绝缘以保护EMR传感器和有源区域的边缘。 结构的化学机械抛光导致没有暴露的有源区边缘的平面传感器。
    • 7. 发明申请
    • METHOD FOR ACCOUNTING FOR PEOPLE IN EMERGENCIES IN INDUSTRIAL SETTINGS
    • 会计处理工业场所紧急情况的方法
    • US20080030359A1
    • 2008-02-07
    • US11757757
    • 2007-06-04
    • Curt SmithSteve PoirotRobert Fontana
    • Curt SmithSteve PoirotRobert Fontana
    • G08B21/00
    • G07C9/00111G01S5/14G01S13/767G07C9/00G08B13/2462G08B21/22
    • A method for accounting for individuals in an emergency at industrial facilities utilizing Ultra-Wideband (UWB) transmitters associated with individuals or objects and UWB monitoring stations. Identification information received from the UWB transmitters by UWB monitoring stations are communicated along with time of arrival information to a computer which calculates the location of the UWB transmitter. The system can be used despite severe multi-path effects and can provide location information in 3 dimensions. The system can optionally include proximity-based RF equipment for access control or otherwise for identification in specific locations. Information from the proximity-based RF equipment is also sent to the computer which also receives information from the UWB monitoring stations.
    • 在利用与个人或物体相关联的超宽带(UWB)发射机和UWB监测站的工业设施的紧急情况下对个人进行会计的方法。 由UWB监控站从UWB发射机接收的识别信息与到达时间信息一起传送到计算UWB发射机位置的计算机。 尽管严重的多路径效应,系统也可以使用,并且可以在三维空间中提供位置信息。 该系统可以可选地包括用于访问控制的基于邻近的RF设备或用于在特定位置识别的基于RF的RF设备。 来自接近性RF设备的信息也被发送到也从UWB监控站接收信息的计算机。
    • 8. 发明申请
    • Three terminal magnetic sensor having an in-stack longitudinal biasing layer structure
    • 具有叠层纵向偏置层结构的三端磁传感器
    • US20060152859A1
    • 2006-07-13
    • US11032598
    • 2005-01-10
    • Jeffrey ChildressRobert FontanaJeffrey Lille
    • Jeffrey ChildressRobert FontanaJeffrey Lille
    • G11B5/33G11B5/127G11B5/147H01L29/82H01L43/00
    • B82Y25/00G01R33/093G11B5/3903G11B5/3932H01L29/66984H01L43/08
    • A three terminal magnetic sensor (TTM) suitable for use in a magnetic head has a base region, a collector region, and an emitter region. A first barrier layer is located between the emitter region and the base region, and a second barrier layer is located between the collector region and the base region. An air bearing surface (ABS) sensing plane of the TTM is defined along sides of the base region, the collector region, and the emitter region. The base region includes a free layer structure, a pinned layer structure, a first non-magnetic spacer layer formed between the free layer structure and the pinned layer structure, an in-stack longitudinal biasing layer (LBL) structure which magnetically biases the free layer structure, and a second non-magnetic spacer layer formed between the free layer structure and the in-stack longitudinal biasing layer structure. In one variation, the layers in the base region are inverted. The TTM may comprise a spin valve transistor (SVT), a magnetic tunnel transistor (MTT), or a double junction structure.
    • 适用于磁头的三端磁传感器(TTM)具有基极区域,集电极区域和发射极区域。 第一阻挡层位于发射极区域和基极区域之间,第二阻挡层位于集电极区域和基极区域之间。 TTM的空气轴承表面(ABS)感测平面沿着基极区域,集电极区域和发射极区域的侧面被限定。 基极区域包括自由层结构,钉扎层结构,形成在自由层结构和被钉扎层结构之间的第一非磁性间隔层,叠层纵向偏置层(LBL)结构,其磁性地偏置自由层 结构,以及形成在自由层结构和叠层间纵向偏置层结构之间的第二非磁性间隔层。 在一个变型中,基区中的层被倒置。 TTM可以包括自旋阀晶体管(SVT),磁隧道晶体管(MTT)或双结结构。