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    • 3. 发明授权
    • Semiconductor device and method of forming thin film capacitor
    • 半导体器件和薄膜电容器的形成方法
    • US08111113B2
    • 2012-02-07
    • US12705810
    • 2010-02-15
    • Kai LiuRobert Charles Frye
    • Kai LiuRobert Charles Frye
    • H03H7/00H01G4/06
    • H03H7/09H01F17/0006H01F2017/0046H01F2017/0073H03H7/1708H03H7/1775Y10T29/4902
    • A semiconductor device has a first coil structure formed over the substrate. A second coil structure is formed over the substrate adjacent to the first coil structure. A third coil structure is formed over the substrate adjacent to the second coil structure. The first and second coil structures are coupled by mutual inductance, and the second and third coil structures are coupled by mutual inductance. The first, second, and third coil structures each have a height greater than a skin current depth of the coil structure defined as a depth which current reduces to 1/(complex permittivity) of a surface current value. A thin film capacitor is formed within the semiconductor device by a first metal plate, dielectric layer over the first metal plate, and second and third electrically isolated metal plates opposite the first metal plate. The terminals are located on the same side of the capacitor.
    • 半导体器件具有形成在衬底上的第一线圈结构。 在与第一线圈结构相邻的衬底上形成第二线圈结构。 在与第二线圈结构相邻的衬底上形成第三线圈结构。 第一和第二线圈结构通过互感耦合,并且第二和第三线圈结构通过互感耦合。 第一,第二和第三线圈结构各自具有高于线圈结构的皮肤电流深度的高度,其被定义为电流减小到表面电流值的1 /(复数介电常数)的深度。 通过第一金属板,第一金属板上的电介质层和与第一金属板相对的第二和第三电隔离金属板,在半导体器件内形成薄膜电容器。 端子位于电容器的同一侧。
    • 6. 发明申请
    • Semiconductor Device and Method of Forming Thin Film Capacitor
    • 半导体器件和薄膜电容器的形成方法
    • US20100140742A1
    • 2010-06-10
    • US12705810
    • 2010-02-15
    • Kai LiuRobert Charles Frye
    • Kai LiuRobert Charles Frye
    • H01L29/92H01L21/02
    • H03H7/09H01F17/0006H01F2017/0046H01F2017/0073H03H7/1708H03H7/1775Y10T29/4902
    • A semiconductor device has a first coil structure formed over the substrate. A second coil structure is formed over the substrate adjacent to the first coil structure. A third coil structure is formed over the substrate adjacent to the second coil structure. The first and second coil structures are coupled by mutual inductance, and the second and third coil structures are coupled by mutual inductance. The first, second, and third coil structures each have a height greater than a skin current depth of the coil structure defined as a depth which current reduces to 1/(complex permittivity) of a surface current value. A thin film capacitor is formed within the semiconductor device by a first metal plate, dielectric layer over the first metal plate, and second and third electrically isolated metal plates opposite the first metal plate. The terminals are located on the same side of the capacitor.
    • 半导体器件具有形成在衬底上的第一线圈结构。 在与第一线圈结构相邻的衬底上形成第二线圈结构。 在与第二线圈结构相邻的衬底上形成第三线圈结构。 第一和第二线圈结构通过互感耦合,并且第二和第三线圈结构通过互感耦合。 第一,第二和第三线圈结构各自具有高于线圈结构的皮肤电流深度的高度,其被定义为电流减小到表面电流值的1 /(复数介电常数)的深度。 通过第一金属板,第一金属板上的电介质层和与第一金属板相对的第二和第三电隔离金属板,在半导体器件内形成薄膜电容器。 端子位于电容器的同一侧。
    • 8. 发明申请
    • Miniaturized Wide-Band Baluns for RF Applications
    • 用于射频应用的小型化宽带不平衡变压器
    • US20100039185A1
    • 2010-02-18
    • US12579286
    • 2009-10-14
    • Kai LiuRobert Charles Frye
    • Kai LiuRobert Charles Frye
    • H03H5/12
    • H03H7/42H01F17/0013H03H7/1775Y10T29/4902Y10T29/49071
    • A wide-band balun device includes a first metallization deposited over a substrate and oriented in a first coil. The first coil extends horizontally across the substrate while maintaining a substantially flat vertical profile. A second metallization is deposited over the substrate and oriented in a second coil. The second coil is magnetically coupled to the first coil and a portion of the second coil oriented interiorly of the first coil. A third metallization is deposited over the substrate and oriented in a third coil. The third coil is magnetically coupled to the first and second coils. A first portion of the third coil is oriented interiorly of the second coil. The third coil has a balanced port connected to the third coil between second and third portions of the third coil.
    • 宽带平衡 - 不平衡转换器包括沉积在衬底上并定向在第一线圈中的第一金属化。 第一线圈水平延伸穿过衬底,同时保持基本平坦的垂直轮廓。 第二金属化沉积在衬底上并定向在第二线圈中。 第二线圈磁耦合到第一线圈,并且第二线圈的一部分定向在第一线圈的内部。 第三金属化沉积在衬底上并定向在第三线圈中。 第三线圈磁耦合到第一和第二线圈。 第三线圈的第一部分位于第二线圈的内部。 第三线圈具有在第三线圈的第二和第三部分之间连接到第三线圈的平衡端口。