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    • 1. 发明授权
    • Process for producing uniform nozzle orifices in silicon wafers
    • 在硅晶片上生产均匀的喷嘴孔的工艺
    • US4169008A
    • 1979-09-25
    • US925126
    • 1978-07-17
    • Richard H. Kurth
    • Richard H. Kurth
    • B41J2/16G01D15/18H01L21/306H01L21/308
    • B41J2/1626B41J2/162B41J2/1631B41J2/1632G01D15/18H01L21/30608
    • Nozzle plates for ink jet recording are produced by etching through silicon and like monocrystalline material wafers which frequently are non-uniform in thickness. The "100" plane surfaces of the wafers are coated with etchant masking material after which a nozzle array pattern is defined on the obverse surface and a similar, but larger and less exacting, aperture array of the same pattern is defined on the reverse surface. The silicon wafer as thus exposed is anisotropically etched from the reverse substantially through to the obverse and thereafter etched completely through the wafer from the obverse by the same anisotropic process. The lateral walls of the nozzles are substantially in the "111" plane of the wafers. The masking material is then stripped from the wafer.
    • 用于喷墨记录的喷嘴板通过蚀刻通常通常是厚度不均匀的硅等单晶材料晶片来制造。 晶片的“100”平面表面涂有蚀刻剂掩蔽材料,之后在正面上限定喷嘴阵列图案,并且在相反表面上限定相同图案的相似但较大且较不严格的孔径阵列。 如此暴露的硅晶片从反向基本上通过正向各向异性蚀刻,然后从正面通过相同的各向异性工艺完全蚀刻通过晶片。 喷嘴的侧壁基本上在晶片的“111”平面内。 然后将掩模材料从晶片剥离。