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    • 4. 发明授权
    • Composition for photoimaging
    • 光成像用组合物
    • US06210862B1
    • 2001-04-03
    • US09150824
    • 1998-09-10
    • Richard Allen DayDavid John RussellDonald Herman Glatzel
    • Richard Allen DayDavid John RussellDonald Herman Glatzel
    • G03F7004
    • C08G59/38C08G59/687G03F7/038G03F7/0385H05K3/287Y10S428/901
    • According to the present invention, an improved photoimagable cationically polymerizable epoxy based solder mask is provided that contains a non-brominated epoxy resin system and from about 0.1 to about 15 parts, by weight per 100 parts of resin system, of a cationic photoinitiator. The non-brominated epoxy-resin system has solids that are comprised of from about 10% to about 80% by weight, of a polyol resin having epoxy functionality; from about 0% to about 90% by weight of a polyepoxy resin; and from about 25% to about 85% by weight of an difunctional epoxy resin. Since the photosensitive cationically polymerizable epoxy based solder mask does not contain bromine, it is particularly advantageous halogens in waste processing chemicals or in incinerated scrap circuit boards are regulated by environmental concerns. The photosensitive cationically polymerizable non-brominated epoxy based solder mask has a glass transition temperature greater than about 100° C., preferably greater than about 110° C. The solder mask dries to a tack-free film; thus, artwork used in the photoimaging process will not stick to the dried soldermask film. The polyol resin which is a condensation product of epichlorohydrin and bisphenol A, has a weight average molecular weight of between about 40,000 and 130,000. The polyepoxy resin is an epoxidized multi-functional bisphenol A formaldehyde novolak resin having a weight average molecular weight of 4,000 to 10,000. The epoxidized diglycidyl ether of bisphenol A has two epoxide groups per molecule, a melting point of between about 80° C. and about 110° C. and a weight average molecular weight of between about 600 and 2,500. The invention also relates to a cationically polymerized solder mask.
    • 根据本发明,提供了一种改进的可光成像的可阳离子聚合的环氧基焊接掩模,其包含非溴化环氧树脂体系和每100份树脂体系约0.1至约15重量份的阳离子光引发剂。 非溴化环氧树脂体系具有由约10重量%至约80重量%的具有环氧官能团的多元醇树脂组成的固体; 约0重量%至约90重量%的聚环氧树脂; 和约25重量%至约85重量%的双官能环氧树脂。 由于光敏阳离子聚合型环氧基焊接掩模不含溴,所以特别有利的是废物处理化学品中的卤素或焚烧废料电路板中的卤素受到环境问题的限制。 光敏阳离子聚合的非溴化环氧基焊料掩模具有大于约100℃,优选大于约110℃的玻璃化转变温度。焊料掩模干燥成无粘性膜; 因此,在光成像过程中使用的艺术品不会粘附在干燥的焊接膜上。 作为表氯醇和双酚A的缩合物的多元醇树脂的重均分子量为约40,000〜130,000。 聚环氧树脂是重均分子量为4000〜10000的环氧化多官能双酚A甲醛酚醛清漆树脂。 双酚A的环氧化二缩水甘油醚每分子具有两个环氧基团,熔点在约80℃至约110℃之间,重均分子量约为600-2,500。 本发明还涉及阳离子聚合的焊接掩模。
    • 6. 发明授权
    • Composition for photoimaging
    • 光成像用组合物
    • US06180317B2
    • 2001-01-30
    • US07793889
    • 1991-11-18
    • Robert David AllenRichard Allen DayDonald Herman GlatzelWilliam Dinan HinsbergJohn Richard MertzDavid John RussellGregory Michael Wallraff
    • Robert David AllenRichard Allen DayDonald Herman GlatzelWilliam Dinan HinsbergJohn Richard MertzDavid John RussellGregory Michael Wallraff
    • G03C1725
    • G03F7/038
    • An improved photoimagable cationically polymerizable epoxy based coating material is provided, that is suitable for use on a variety of substrates including epoxy-glass laminate boards cured with dicyandiamide. The material includes an epoxy resin system consisting essentially of between about 10% and about 80% by weight of a polyol resin which is a condensation product of epichlorohydrin and bisphenol A having a molecular weight of between about 40,000 and 130,000; and between about 35% and 72% by weight of an epoxidized glycidyl ether of a brominated bisphenol A having a softening point of between about 60° C. and about 110° C. and a molecular weight of between about 600 and 2,500. Optionally, a third resin may be added to the resin system. To this resin system is added about 0.1 to about 15 parts by weight per 100 parts of resin of a cationic photoinitiator capable of initiating polymerization of said epoxidized resin system upon exposure to actinic radiation; the system being further characterized by having an absorbance of light in the 330 to 700 nm region of less than 0.1 for a 2.0 mil thick film. Optionally a photosensitizer such as perylene and its derivatives or anthracene and its derivatives may be added.
    • 提供了一种改进的可光成像的可阳离子聚合的环氧基涂料,适用于各种基材,包括用双氰胺固化的环氧玻璃层压板。 该材料包括基本上由约10重量%至约80重量%的多元醇树脂组成的环氧树脂体系,多元醇树脂是分子量为约40,000至130,000的表氯醇和双酚A的缩合产物; 和约35重量%至72重量%的软化点在约60℃至约110℃之间且分子量为约600至2,500之间的溴化双酚A的环氧化缩水甘油醚。 任选地,可以向树脂体系中加入第三树脂。 向该树脂体系中添加约0.1〜约15重量份/ 100份阳离子光引发剂的树脂,其能够在暴露于光化辐射下引发所述环氧化树脂体系的聚合; 该系统的特征还在于,对于2.0密耳厚的膜,在330至700nm区域中的光的吸光度小于0.1。 任选地,可加入光敏剂如苝及其衍生物或蒽及其衍生物。
    • 7. 发明授权
    • Composition for photoimaging
    • 光成像用组合物
    • US5747223A
    • 1998-05-05
    • US677230
    • 1996-07-09
    • Robert D. AllenRichard Allen DayDonald Herman GlatzelWilliam Dinan HinsbergJohn Richard MertzDavid John RussellGregory Michael Wallraff
    • Robert D. AllenRichard Allen DayDonald Herman GlatzelWilliam Dinan HinsbergJohn Richard MertzDavid John RussellGregory Michael Wallraff
    • G03C5/00G03F7/038H05K3/28
    • G03F7/038H05K3/287
    • An improved photoimagable cationically polymerizable epoxy based coating material is provided, that is suitable for use on a variety of substrates including epoxy-glass laminate boards cured with dicyandiamide. The material includes an epoxy resin system consisting essentially of between about 10% and about 80% by weight of a polyol resin which is a condensation product of epichlorohydrin and bisphenol A having a molecular weight of between about 40,000 and 130,000; and between about 35% and 72% by weight of an epoxidized glycidyl ether of a brominated bisphenol A having a softening point of between about 60.degree. C. and about 110.degree. C. and a molecular weight of between about 600 and 2,500. Optionally, a third resin may be added to the resin system. To this resin system is added about 0.1 to about 15 parts by weight per 100 parts of resin of a cationic photoinitiator capable of initiating polymerization of said epoxidized resin system upon exposure to actinic radiation; the system being further characterized by having an absorbance of light in the 330 to 700 nm region of less than 0.1 for a 2.0 mil thick film. Optionally a photosensitizer such as perylene and its derivatives or anthracene and its derivatives may be added.
    • 提供了一种改进的可光成像的可阳离子聚合的环氧基涂料,适用于各种基材,包括用双氰胺固化的环氧玻璃层压板。 该材料包括基本上由约10重量%至约80重量%的多元醇树脂组成的环氧树脂体系,多元醇树脂是分子量为约40,000至130,000的表氯醇和双酚A的缩合产物; 和约35重量%至72重量%的软化点为约60℃至约110℃,分子量为约600至2,500的溴化双酚A的环氧化缩水甘油醚。 任选地,可以向树脂体系中加入第三树脂。 向该树脂体系中添加约0.1〜约15重量份/ 100份阳离子光引发剂的树脂,其能够在暴露于光化辐射下引发所述环氧化树脂体系的聚合; 该系统的特征还在于,对于2.0密耳厚的膜,在330至700nm区域中的光的吸光度小于0.1。 任选地,可加入光敏剂如苝及其衍生物或蒽及其衍生物。