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1. 发明授权

US08384882B2 Calibration method and lithographic apparatus for calibrating an optimum take over height of a substrate 有权
标题翻译：校准方法和光刻设备，用于校准基板的最佳接管高度
公开(公告)号：US08384882B2
公开(公告)日：2013-02-26
申请号：US12580066
申请日：2009-10-15
申请人： Rene Theodorus Petrus Compen , Gerardus Petrus Matthijs Van Nunen , Martijn Houben , Marco Adrianus Peter Van Den Heuvel
发明人： Rene Theodorus Petrus Compen , Gerardus Petrus Matthijs Van Nunen , Martijn Houben , Marco Adrianus Peter Van Den Heuvel
IPC分类号： G03B27/32 , G03B27/58
CPC分类号： G03B27/58 , G03F7/70516 , G03F7/70691
摘要： A calibration method for calibrating an optimum take over height of a substrate in a lithographic apparatus between a substrate table and an ejector element moveable to load and unload the substrate from the substrate table, the method including clamping the substrate on one of the substrate table and ejector element; moving the ejector element between an unloaded state wherein the substrate is supported by the substrate table and a loaded state wherein the substrate is at least partly supported by the ejector element; determining a reference height of the ejector element at the moment that the weight of the substrate is at least partly taken over between the substrate table and the ejector element; and determining the optimum take over height for the ejector element from the determined reference height.
摘要翻译：一种校准方法，用于校准光刻设备中的基板的最佳接管高度，该基板在基板台和顶板元件之间移动，可移动以从基板台装载和卸载基板，该方法包括将基板夹在基板台之一和喷射元件在所述衬底被所述衬底台支撑的卸载状态和所述衬底至少部分地被所述顶出器元件支撑的负载状态之间移动所述顶出器元件; 在衬底的重量至少部分地覆盖在衬底台和顶出器元件之间的时刻，确定顶出器元件的基准高度; 以及从所确定的参考高度确定所述喷射器元件的最佳接管高度。

2. 发明授权

US08086348B2 Method of transferring a substrate, transfer system and lithographic projection apparatus 有权
标题翻译：转印基板，转印系统和光刻投影装置的方法
公开(公告)号：US08086348B2
公开(公告)日：2011-12-27
申请号：US12248290
申请日：2008-10-09
申请人： Jozef Augustinus Maria Alberti , Gerardus Petrus Matthijs Van Nunen , Frans Erik Groensmit , Rene Theodorus Petrus Compen
发明人： Jozef Augustinus Maria Alberti , Gerardus Petrus Matthijs Van Nunen , Frans Erik Groensmit , Rene Theodorus Petrus Compen
IPC分类号： G06F7/00
CPC分类号： G03F7/70725 , G03F7/70633 , G03F7/70775 , G03F7/70783 , G03F9/7011 , H01L21/67265 , H01L21/67745
摘要： A method is provided for transferring a substrate from a first substrate holder, e.g., a pre-alignment unit, to a second substrate holder, e.g., a substrate table in a lithographic apparatus, by means of a transfer unit on the basis of transfer data available thereto. First, the substrate is provided on the first substrate holder. Subsequently, a position error of the substrate is measured, and positioning adjustment data are calculated based on the position error as measured. Then, the second substrate holder is moved relative to a reference position thereof in accordance with the positioning adjustment data. Finally, the substrate is transferred by means of the transfer unit from the first substrate holder to the second substrate holder in accordance with the transfer data, and placed on the second substrate holder as moved.
摘要翻译：提供了一种用于将基板从第一基板保持器（例如，预对准单元）传送到第二基板保持器（例如光刻设备中的基板台）的方法，借助于基于转印数据的转印单元可用。首先，将基板设置在第一基板支架上。随后，测量基板的位置误差，并根据所测量的位置误差来计算定位调整数据。然后，第二基板支架根据定位调整数据相对于其基准位置移动。最后，根据传送数据，将基板通过传送单元从第一基板保持器传送到第二基板保持器，并且移动时放置在第二基板保持器上。

3. 发明申请

US20090153816A1 Method of Transferring a Substrate, Transfer System and Lithographic Projection Apparatus 有权
标题翻译：传输基板，转印系统和平版印刷设备的方法
公开(公告)号：US20090153816A1
公开(公告)日：2009-06-18
申请号：US12248284
申请日：2008-10-09
申请人： Jozef Augustinus Maria ALBERTI , Gerardus Petrus Matthijs VAN NUNEN , Frans Erik GROENSMIT , Rene Theodorus Petrus COMPEN
发明人： Jozef Augustinus Maria ALBERTI , Gerardus Petrus Matthijs VAN NUNEN , Frans Erik GROENSMIT , Rene Theodorus Petrus COMPEN
IPC分类号： G03B27/68
CPC分类号： G03F7/70725 , G03F7/70633 , G03F7/70775 , G03F7/70783 , G03F9/7011
摘要： The invention relates to a method of transferring a substrate from a first substrate holder to a second substrate holder in a lithographic projection apparatus by means of a transfer unit on the basis of transfer data available thereto. The second substrate holder has a surface provided with a first plurality of burls. In the method, a memory encoded with burl position data and substrate position data is provided. Subsequently, a substrate is provided on the first substrate holder. The position error and orientation of the substrate is then measured. On the basis of the burl position data, substrate position data and orientation as measured orientation adjustment data are calculated. The orientation of the substrate is subsequently adjusted in accordance with the orientation adjustment data. The substrate is then transferred from the first substrate holder to the second substrate holder by the transfer unit and placed on the second substrate holder.
摘要翻译：本发明涉及一种基于可用的转印数据，通过转印单元将基板从第一基板支架转移到光刻投影装置中的第二基板支架的方法。第二基板保持器具有设置有第一多个毛刺的表面。在该方法中，提供了编码有放大位置数据和衬底位置数据的存储器。随后，在第一衬底保持器上设置衬底。然后测量衬底的位置误差和取向。基于钻头位置数据，计算作为测量取向调整数据的基板位置数据和取向。随后根据取向调整数据调整基板的取向。然后通过转印单元将衬底从第一衬底保持器转移到第二衬底保持器，并放置在第二衬底保持器上。

4. 发明授权

US07050147B2 Method of adjusting a height of protrusions on a support surface of a support table, a lithographic projection apparatus, and a support table for supporting an article in a lithographic apparatus 有权
标题翻译：调整支撑台的支撑表面上的突起的高度的方法，光刻投影装置和用于将物品支撑在光刻设备中的支撑台
公开(公告)号：US07050147B2
公开(公告)日：2006-05-23
申请号：US10886050
申请日：2004-07-08
申请人： Rene Theodorus Petrus Compen
发明人： Rene Theodorus Petrus Compen
IPC分类号： H01J21/27
CPC分类号： G03F7/707 , G03F7/70783 , G03F7/7095 , G03F7/70975
摘要： A lithographic projection apparatus is disclosed. The apparatus includes a beam production system configured to provide a beam of radiation, pattern the beam, and project the patterned beam onto a target portion of a substrate, and a support table for supporting an article so that a planar surface of the article lies in a predetermined plane transverse to a propagation direction of the projection beam. The support table has a support surface and an array of protrusions disposed on the support surface that are constructed and arranged to support the article. A position selective material surface melting device is configured to act on individual protrusions when the support table is operable in the apparatus, such that localized areas of an upper surface of the protrusion are melted and subsequently allowed to cool, thereby causing the localized areas to be raised with respect to the upper surface of the protrusion.
摘要翻译：公开了一种光刻投影装置。该装置包括：束生产系统，其被配置为提供辐射束，图案束，并将图案化束投影到基底的目标部分上;以及支撑台，用于支撑制品，使得制品的平坦表面位于与投影光束的传播方向横切的预定平面。支撑台具有支撑表面和布置在支撑表面上的突出物阵列，其构造和布置成支撑物品。位置选择性材料表面熔化装置构造成当支撑台在装置中可操作时作用于单独的突起，使得突起的上表面的局部区域熔化并随后允许冷却，从而使局部区域成为相对于突起的上表面凸起。

5. 发明授权

US09329497B2 Substrate table, lithographic apparatus and device manufacturing method 有权
标题翻译：基板，光刻设备及器件制造方法
公开(公告)号：US09329497B2
公开(公告)日：2016-05-03
申请号：US13979278
申请日：2011-11-17
申请人： Bensely Albert , Rene Theodorus Petrus Compen
发明人： Bensely Albert , Rene Theodorus Petrus Compen
IPC分类号： G03F7/20 , H01L21/687 , C23C16/44 , C23F1/00
CPC分类号： G03F7/70716 , C23C16/44 , C23F1/00 , H01L21/6875
摘要： A substrate table comprising a base and a plurality of burls that project from the base, wherein an upper surface of the burls is provided with a multilayer coating.
摘要翻译：一种基材台，其包括基部和从所述基部突出的多个毛刺，其中所述毛边的上表面设置有多层涂层。

6. 发明授权

US09019476B2 Lithographic apparatus and device manufacturing method 有权
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US09019476B2
公开(公告)日：2015-04-28
申请号：US13114714
申请日：2011-05-24
申请人： Rene Theodorus Petrus Compen , Oleg Voznyi , Martijn Houben , Majid El Bouchaibi , Franciscus Johannes Maria Boekholt , Remko Wakker
发明人： Rene Theodorus Petrus Compen , Oleg Voznyi , Martijn Houben , Majid El Bouchaibi , Franciscus Johannes Maria Boekholt , Remko Wakker
IPC分类号： G03F7/20
CPC分类号： G03F7/70783 , G03F7/707
摘要： A lithographic apparatus arranged to transfer a pattern from a patterning device onto a substrate is disclosed, the apparatus including a substrate table constructed to hold a substrate, a first clamping system configured to clamp the substrate table to a substrate table support structure, and a second clamping system configured to clamp a substrate to the substrate table after the substrate table has been clamped to the substrate table support structure.
摘要翻译：公开了一种布置成将图案从图案形成装置转印到基板上的光刻设备，该设备包括：被构造成保持基板的基板台，构造成将基板台夹持于基板台支撑结构的第一夹紧系统;以及第二夹紧系统构造成在衬底台已被夹持到衬底台支撑结构之后将衬底夹持到衬底台。

7. 发明申请

US20130301028A1 Substrate Table, Lithographic Apparatus and Device Manufacturing Method 有权
标题翻译：基板，平版印刷设备和器件制造方法
公开(公告)号：US20130301028A1
公开(公告)日：2013-11-14
申请号：US13979278
申请日：2011-11-17
申请人： Bensely Albert , Rene Theodorus, Petrus Compen
发明人： Bensely Albert , Rene Theodorus, Petrus Compen
IPC分类号： G03F7/20 , C23F1/00 , C23C16/44
CPC分类号： G03F7/70716 , C23C16/44 , C23F1/00 , H01L21/6875
摘要： A substrate table comprising a base and a plurality of burls that project from the base, wherein an upper surface of the burls is provided with a multilayer coating.
摘要翻译：一种基材台，其包括基部和从所述基部突出的多个毛刺，其中所述毛边的上表面设置有多层涂层。

8. 发明申请

US20100296073A1 Lithographic Apparatus, Substrate Table, and Method for Enhancing Substrate Release Properties 有权
标题翻译：平版印刷设备，基板和增强基材释放性能的方法
公开(公告)号：US20100296073A1
公开(公告)日：2010-11-25
申请号：US12856106
申请日：2010-08-13
申请人： Michiel PUYT , Arno Jan Bleeker , Johannes Hendrikus Gertrudis Franssen , Rene Theodorus Petrus Compen , Johannes Theodorus Guillielmus Maria Van De Ven , Egbert Dirk Stam , Rudolf Hartmut Fischer , Edwin Robert Martin Gelinck
发明人： Michiel PUYT , Arno Jan Bleeker , Johannes Hendrikus Gertrudis Franssen , Rene Theodorus Petrus Compen , Johannes Theodorus Guillielmus Maria Van De Ven , Egbert Dirk Stam , Rudolf Hartmut Fischer , Edwin Robert Martin Gelinck
IPC分类号： G03B27/58
CPC分类号： G03F7/707 , G03F7/70708 , H01L21/6875 , H01L21/68757
摘要： A lithographic apparatus includes an illumination system constructed and arranged to condition a radiation beam, and a support constructed and arranged to support a patterning device. The patterning device is capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam. The apparatus also includes a substrate table constructed and arranged to hold a substrate, and a projection system constructed and arranged to project the patterned radiation beam onto a target portion of the substrate. The substrate table includes a chuck having a plurality of protrusions constructed and arranged to support corresponding parts of a bottom surface of a wafer. The top surface of at least one of the protrusions includes a plurality of elements that define a reduced contact area between the substrate and the top surface of the protrusion.
摘要翻译：光刻设备包括构造和布置成调节辐射束的照明系统，以及构造和布置成支撑图案形成装置的支撑件。图案形成装置能够在其横截面中赋予辐射束图案以形成图案化的辐射束。所述装置还包括被构造和布置成保持基板的基板台，以及构造和布置成将图案化的辐射束投影到基板的目标部分上的投影系统。衬底台包括具有多个突出部的卡盘，所述多个突起被构造和布置成支撑晶片底面的对应部分。至少一个突起的顶表面包括多个元件，其限定了基板和突起的顶表面之间的减小的接触面积。

9. 发明申请

US20090086187A1 Lithographic Apparatus and Device Manufacturing Method 审中-公开
标题翻译：光刻设备和器件制造方法
公开(公告)号：US20090086187A1
公开(公告)日：2009-04-02
申请号：US12189546
申请日：2008-08-11
申请人： Rene Theodorus Petrus COMPEN , Martin Frans Pierre Smeets
发明人： Rene Theodorus Petrus COMPEN , Martin Frans Pierre Smeets
IPC分类号： G03B27/60 , G03B27/32
CPC分类号： H01L21/67288 , G03F7/707 , G03F7/70783 , H01L21/6838
摘要： A clamping device can be configured to clamp an object on a support. The clamping device can include a first device configured to exert an attracting force on the object, and a second device configured to exert a rejecting force on the object. The first device and second device can be configured to simultaneously exert an attracting and a rejecting force on the object to shape the object to a desired shape before clamping of the object on the support. A method is provided for loading an object on a support, comprising the steps of shaping the object in a desired shape spaced from the support. The shaping can include subjecting the object simultaneously to an attracting force pulling the object toward the support and a rejecting force pushing the object away from the support, and clamping the object on the support.
摘要翻译：夹持装置可以被配置为将物体夹持在支撑件上。夹持装置可以包括构造成在物体上施加吸引力的第一装置，以及被配置为在物体上施加排斥力的第二装置。第一装置和第二装置可以被配置为在将物体夹持在支撑件上之前同时对物体施加吸引力和拒绝力，以将物体成形为期望的形状。提供了一种用于将物体加载在支撑件上的方法，包括以与所述支撑件间隔开的期望形状对所述物体成形的步骤。成形可以包括同时对待物体将吸引力拉向支撑件，并且将物体推离支撑件，并将物体夹持在支撑件上。

10. 发明授权

US08810777B2 Lithographic apparatus, a method for removing material of one or more protrusions on a support surface, and an article support system 有权
标题翻译：光刻设备，用于去除支撑表面上的一个或多个突起的材料的方法以及物品支撑系统
公开(公告)号：US08810777B2
公开(公告)日：2014-08-19
申请号：US12699562
申请日：2010-02-03
申请人： Theodorus Petrus Maria Cadee , Noud Jan Gilissen , Rene Theodorus Petrus Compen , James Kennon
发明人： Theodorus Petrus Maria Cadee , Noud Jan Gilissen , Rene Theodorus Petrus Compen , James Kennon
IPC分类号： G03B27/58 , G03F7/20 , B24B35/00 , B24B31/112
CPC分类号： B24B31/112 , B24B35/00 , G03B27/58 , G03F7/707 , G03F7/70783
摘要： A lithographic projection apparatus includes a beam production system to provide a beam of radiation, pattern the beam of radiation, and project the patterned beam onto a target portion of a substrate, a support table including protrusions to support an article, a detector to detect height deviations of the protrusions, a material removing device arranged to modify a height of the protrusion material, a controller coupled between the detector and the material removing device, wherein material removing device includes a removal tool selected from the group consisting of a mechanical polishing device, a magneto rheological finishing tool, and a single or multipoint diamond tool.
摘要翻译：平版印刷投影设备包括一个光束产生系统，用于提供辐射束，对辐射束进行图案化，并将图案化的光束投影到基板的目标部分上;支撑台，其包括用于支撑物品的突起，检测器以检测高度突起的偏差，用于改变突起材料的高度的材料去除装置，耦合在检测器和材料去除装置之间的控制器，其中材料去除装置包括从由以下组成的组中选择的去除工具：机械抛光装置，磁流变整理工具，以及单点或多点金刚石工具。

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