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    • 3. 发明申请
    • DEVICE, SYSTEM AND METHOD FOR USE IN MACHINES FOR ELECTROCHEMICAL PATTERN REPLICATION
    • 用于电化学模式复制的设备,系统和方法
    • WO2012007526A2
    • 2012-01-19
    • PCT/EP2011061996
    • 2011-07-13
    • REPLISAURUS GROUP SASMOELLER PATRIKFREDENBERG MIKAELUTTERBAECK TOMASSVENSSON STEFANSANTOS ANTONIOCHAUVET JEAN-MICHELROSEN DANIELWIWEN-NILSSON PETERLINDGREN LENNARTCAVAZZA GILBERTRAYNAUD NICOLAS
    • MOELLER PATRIKFREDENBERG MIKAELUTTERBAECK TOMASSVENSSON STEFANSANTOS ANTONIOCHAUVET JEAN-MICHELROSEN DANIELWIWEN-NILSSON PETERLINDGREN LENNARTCAVAZZA GILBERTRAYNAUD NICOLAS
    • C25D1/00
    • C25D1/00C25D5/02C25D7/123C25D17/001C25D17/005C25D17/008C25D17/06C25D17/12C25D21/12
    • A device for electrochemical pattern replication, ECPR, is provided. The device comprises; a base; a bottom chuck on a X-Y-Theta stage, said bottom chuck being configured to hold a master electrode or a substrate; and a Z-stage with an attached top chuck, said top chuck being configured to hold a master electrode when the bottom chuck is configured to hold a substrate or a substrate when the bottom chuck is configured to hold a master electrode; a displacement monitor system for measuring displacement of the master electrode relative the substrate, wherein said displacement monitor system comprises a position sensor and a reference frame, wherein the position sensor measures a distance to the reference frame. A method for electrochemical pattern replication method, ECPR, is also provided. The method comprises the steps of utilizing a master electrode and a substrate, said method comprising the steps of measuring x-, y-, and theta values of the master electrode, when the master electrode and the substrate are separated in a top position; measuring x-, y-, and theta values of the master electrode, when the master electrode and the substrate are adjacent in a bottom position; calculating a delta value, which is the difference in measured x-, y-, and theta values; comparing the delta value to a reference value; and adjusting the position of the master electrode in relation to the substrate to minimize the delta value. A device for providing electricity to a substrate arranged on a chuck during electrochemical pattern replication, ECPR, is also provided. The device comprises a contact module for mounting on the chuck on all sides of the substrate so that electrical contact is possible along the whole perimeter of a substrate.
    • 提供了一种用于电化学图案复制的装置,ECPR。 该装置包括: 一个基地 所述底卡盘被配置为保持主电极或基板; 以及具有附接的顶部卡盘的Z形平台,当所述底部卡盘构造成保持主电极时,所述顶部卡盘被构造成当所述底部卡盘配置成保持基板或基板时保持主电极; 用于测量所述主电极相对于所述基板的位移的位移监测器系统,其中所述位移监测器系统包括位置传感器和参考框架,其中所述位置传感器测量到所述参考系的距离。 还提供了电化学模式复制方法ECPR。 该方法包括以下步骤:利用主电极和衬底,所述方法包括以下步骤:当主电极和衬底在顶部位置分离时,测量主电极的x-,y-和θ值; 当主电极和衬底在底部位置相邻时,测量主电极的x-,y-和θ值; 计算增量值,它是测量的x,y和θ值的差值; 将增量值与参考值进行比较; 并且调节主电极相对于衬底的位置以最小化Δ值。 还提供了一种用于在电化学图案复制(ECPR)期间向布置在卡盘上的基板提供电力的装置。 该装置包括用于在基板的所有侧面上安装在卡盘上的接触模块,使得沿着基板的整个周边的电接触是可能的。