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    • 4. 发明申请
    • ANTI-MICROBIAL POLYMERIC FILM AND METHOD OF MANUFACTURE OF SAID FILM
    • 抗微生物聚合物薄膜和制作薄膜的方法
    • WO2009150424A8
    • 2011-02-24
    • PCT/GB2009001459
    • 2009-06-10
    • DUPONT TEIJIN FILMS US LTDROBINSON JULIAN NEALEVESON ROBERT WRAKOS KARLBROWN DAVIDSYMONDS JACKIESTEPHENSON DEBBIE A
    • ROBINSON JULIAN NEALEVESON ROBERT WRAKOS KARLBROWN DAVIDSYMONDS JACKIESTEPHENSON DEBBIE A
    • B29C55/02B29C71/00B65D81/28
    • B29C55/026B29C55/023B29C71/0009Y10T428/24942
    • A method of manufacture of an anti-microbial polymeric film comprising coextruding a polymeric substrate layer comprising a first layer of a first polymeric material and a second layer of a second polymeric material wherein the crystalline melting temperature (TM2) of said second polymeric material is lower than the crystalline melting temperature (TM1) of the first polymeric material; stretching the coextruded substrate in a first direction; optionally stretching the substrate layer in a second, orthogonal direction; disposing on the surface of the polymeric second layer a composition comprising a particulate antimicrobial compound and a liquid vehicle, and preferably also a surfactant; and heat-setting the stretched film at a temperature above the crystalline melting temperature (TM2) of the second polymeric material but below the crystalline melting temperature (TMI) of the first polymeric material; wherein the composition is applied to the polymeric second layer after the coextrusion step but before the heat-setting step; such that in the final film said second layer comprises said anti-microbial compound in an amount of from about 1 to about 80 % by weight of said polymeric material of the second layer is described. Anti-microbial films are also described.
    • 一种制造抗微生物聚合物膜的方法,包括将包含第一聚合物材料的第一层和第二聚合物材料的第二层的聚合物基底层共挤出,其中所述第二聚合物材料的结晶熔融温度(TM2)较低 比第一聚合物材料的结晶熔融温度(TM1)高; 在第一方向上拉伸所述共挤出的基材; 任选地在第二正交方向上拉伸基底​​层; 在聚合物第二层的表面上设置包含颗粒状抗微生物化合物和液体载体的组合物,优选还包括表面活性剂; 以及在高于第二聚合物材料的结晶熔化温度(TM2)但低于第一聚合物材料的结晶熔化温度(TMI)的温度下热定型拉伸膜; 其中所述组合物在共挤出步骤之后但在热定形步骤之前施加到聚合物第二层; 使得在最终膜中所述第二层包含所述抗微生物化合物的量为所述第二层聚合物材料的约1至约80重量%。 还描述了抗微生物膜。
    • 5. 发明申请
    • METROLOGY METHOD
    • 计量方法
    • WO2014045038A1
    • 2014-03-27
    • PCT/GB2013/052455
    • 2013-09-19
    • DUPONT TEIJIN FILMS U.S. LIMITED PARTNERSHIPRAKOS, Karl
    • RAKOS, Karl
    • G01B11/24G01B9/02
    • G01B11/30G01B9/02032G01B9/02048G01B11/2441
    • An interferometric method for profiling the topography of a sample surface, said method comprising the steps of: (i)a first interferometric profiling step in which a sample surface is analysed by single-frame interferometry (SFI) at a relatively low first magnification M1 to produce a map comprising pixels with planar (X,Y)-coordinates corresponding to the area of the sample surface, (ii)interrogating the pixel data obtained from the first profiling step by identifying pixel(s) which meet or exceed a Cut-Off Threshold, and which also meet or exceed a parameter N NAP which is the number of adjacent pixels all of which meet or exceed the Cut-Off Threshold; (iii)interrogating the pixel data obtained from the first profiling step by identifying pixel(s) for which no z-coordinate has been recorded; (iv)generating a Low Magnification Frame File (LMFF) which comprises the (X,Y) coordinates of the pixels derived from steps (ii) and (iii); (v)a second interferometric profiling step in which the sample surface is analysed at a relatively high second magnification M2, wherein M2>M1, wherein only selected regions of the sample surface are analysed at said second magnification M2, wherein said selected regions comprise the features associated with the (X,Y)-coordinates of the pixels in the Low Magnification Frame File; and further comprising a step selected from: (vi)the step of analysis of the output of the second interferometric profiling step to differentiate between an intrinsic defect and an extrinsic defect; (vii)the step of assessing whether said sample surface meets one or more quality control standard(s) and/or one or more target property or properties; and (viii)the step of assessing whether said sample surface is suitable as a surface for subsequent coating.
    • 一种用于对样品表面的形貌进行分析的干涉测量方法,所述方法包括以下步骤:(i)第一干涉测量步骤,其中样品表面通过单帧干涉测量(SFI)在相对低的第一放大率M1至 产生包括对应于样本表面区域的平面(X,Y)坐标的像素的图,(ii)通过识别满足或超过截止的像素来询问从第一分析步骤获得的像素数据 阈值,并且其也满足或超过参数N NAP,其是所有符合或超过截止阈值的相邻像素的数量; (iii)通过识别没有记录z坐标的像素来询问从第一分析步骤获得的像素数据; (iv)产生包括从步骤(ii)和(iii)导出的像素的(X,Y)坐标的低放大帧文件(LMFF); (v)第二干涉测量步骤,其中在相对较高的第二倍率M2处分析样品表面,其中M2> M1,其中仅在所述第二放大倍率M2处分析样品表面的选定区域,其中所述选择的区域包括 与低放大帧文件中的像素的(X,Y)坐标相关联的特征; 并且还包括选自以下的步骤:(vi)分析所述第二干涉测量步骤的输出以区分本征缺陷和外在缺陷的步骤; (vii)评估所述样品表面是否满足一个或多个质量控制标准和/或一个或多个目标性质或性质的步骤; 和(viii)评估所述样品表面是否适合作为后续涂层的表面的步骤。
    • 6. 发明申请
    • ANTI-MICROBIAL POLYMERIC FILM AND METHOD OF MANUFACTURE OF SAID FILM
    • 抗微生物聚合物薄膜和制作薄膜的方法
    • WO2009150424A1
    • 2009-12-17
    • PCT/GB2009/001459
    • 2009-06-10
    • DUPONT TEIJIN FILMS U.S. LIMITED PARTNERSHIPROBINSON, Julian, NealEVESON, Robert, W.RAKOS, KarlBROWN, DavidSYMONDS, JackieSTEPHENSON, Debbie, A.
    • EVESON, Robert, W.RAKOS, KarlBROWN, DavidSYMONDS, JackieSTEPHENSON, Debbie, A.
    • B29C55/02B29C71/00B65D81/28
    • B29C55/026B29C55/023B29C71/0009Y10T428/24942
    • A method of manufacture of an anti-microbial polymeric film comprising coextruding a polymeric substrate layer comprising a first layer of a first polymeric material and a second layer of a second polymeric material wherein the crystalline melting temperature (TM2) of said second polymeric material is lower than the crystalline melting temperature (TM1) of the first polymeric material; stretching the coextruded substrate in a first direction; optionally stretching the substrate layer in a second, orthogonal direction; disposing on the surface of the polymeric second layer a composition comprising a particulate antimicrobial compound and a liquid vehicle, and preferably also a surfactant; and heat-setting the stretched film at a temperature above the crystalline melting temperature (TM2) of the second polymeric material but below the crystalline melting temperature (TMI) of the first polymeric material; wherein the composition is applied to the polymeric second layer after the coextrusion step but before the heat-setting step; such that in the final film said second layer comprises said anti-microbial compound in an amount of from about 1 to about 80 % by weight of said polymeric material of the second layer is described. Anti-microbial films are also described.
    • 一种制造抗微生物聚合物膜的方法,包括将包含第一聚合物材料的第一层和第二聚合物材料的第二层的聚合物基底层共挤出,其中所述第二聚合物材料的结晶熔融温度(TM2)较低 比第一聚合物材料的结晶熔融温度(TM1)高; 在第一方向上拉伸所述共挤出的基材; 任选地在第二正交方向上拉伸基底​​层; 在聚合物第二层的表面上设置包含颗粒状抗微生物化合物和液体载体的组合物,优选还包括表面活性剂; 以及在高于第二聚合物材料的结晶熔融温度(TM2)但低于第一聚合物材料的结晶熔化温度(TMI)的温度下热定型拉伸膜; 其中所述组合物在共挤出步骤之后但在热定形步骤之前施加到聚合物第二层; 使得在最终膜中所述第二层包含所述抗微生物化合物的量为所述第二层聚合物材料的约1至约80重量%。 还描述了抗微生物膜。