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    • 4. 发明授权
    • Method for staining sample
    • 染色样品的方法
    • US08298838B2
    • 2012-10-30
    • US12712133
    • 2010-02-24
    • Po-Fu ChouYu-Wen Liu
    • Po-Fu ChouYu-Wen Liu
    • G01R31/26H01L21/66
    • H01L22/24
    • A method for staining a sample includes the following steps. A test device is provided. The test device is sampled to obtain a sample. The sample includes a substrate, an active area disposed within the substrate and having a first doped substrate region and a second doped substrate region, at least one gate disposed between the first doped substrate region and the second doped substrate region, and an exposed shallow trench isolation embedded in the substrate and surrounding the active area. A first staining procedure is then carried out to selectively remove the shallow trench isolation to form a first void and to entirely expose the active area. A second staining procedure is subsequently carried out to selectively stain the first doped substrate region and the second doped substrate region to form a second void.
    • 染色样品的方法包括以下步骤。 提供测试设备。 对测试装置进行采样以获得样品。 样品包括衬底,设置在衬底内并具有第一掺杂衬底区域和第二掺杂衬底区域的有源区域,设置在第一掺杂衬底区域和第二掺杂衬底区域之间的至少一个栅极和暴露的浅沟槽 隔离嵌入基板并围绕有源区域。 然后执行第一染色程序以选择性地去除浅沟槽隔离以形成第一空隙并且完全暴露活性区域。 随后执行第二染色程序以选择性地污染第一掺杂衬底区域和第二掺杂衬底区域以形成第二空隙。