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1. 发明申请

WO2012010848A1 FIBRES, A PROCESS FOR PRODUCING SUCH FIBRES AND A WOUND DRESSING INCORPORATING THEM 审中-公开
标题翻译：纤维，生产这种纤维的方法和合并它们的创意连衣裙
公开(公告)号：WO2012010848A1
公开(公告)日：2012-01-26
申请号：PCT/GB2011/001102
申请日：2011-07-22
申请人： CONVATEC TECHNOLOGIES INC , BALLAMY, Lucy, Louisa , LAM PO TANG, Sharon , HERBE, Marion , ROGERS, Alan , KELLY, Sean
发明人： BALLAMY, Lucy, Louisa , LAM PO TANG, Sharon , HERBE, Marion , ROGERS, Alan , KELLY, Sean
IPC分类号： A61L15/32 , A61L15/42 , A61L26/00
CPC分类号： A61L15/225 , A61L15/44 , A61L15/60 , A61L26/0052 , A61L2300/232 , A61L2300/252 , A61L2300/41 , A61L2300/412 , A61L2300/434 , B29C47/0014 , B29K2005/00 , B29L2031/731 , D01D5/06 , D01F4/00 , C08L89/00 , C08L5/06
摘要： Multi component fibres for the reduction of the damaging activity of wound exudate components such as protein degrading enzymes and inflammatory mediators in wounds, the fibres comprising: from 10% to 100% by weight of the fibres of pectin and a sacrificial proteinaceous material in a weight ratio of 100 :0 to 10:90 pectin to sacrificial proteinaceous material and from 0% to 90% by weight of the fibres of another polysaccharide or a water soluble polymer.
摘要翻译：用于降低伤口渗出物组分如伤口中的蛋白质降解酶和炎症介质的破坏活性的多组分纤维，所述纤维包含：10％至100％重量的果胶纤维和重量的牺牲性蛋白质材料比例为100：0至10:90的果胶与牺牲性蛋白质材料和0％至90％重量的另一种多糖或水溶性聚合物的纤维。

2. 发明专利

GB2401554A Golf bag 未知
公开(公告)号：GB2401554A
公开(公告)日：2004-11-17
申请号：GB0311142
申请日：2003-05-15
申请人： SU PO-TANG
发明人： SU PO-TANG
IPC分类号： A63B55/00 , A63B55/60
摘要： A golf bag which is designed to be dismantled for storage comprises top and bottom seats 20, 30 together with connecting support elements 40 and a bag covering 50. Seats 20,30 are hollow with insertion holes 21, 31 for the support elements, seat 20 additionally being partitioned for receipt of golf clubs. The bag covering is attached using co-operating fixing elements 22, 32 on the seats with elements 51, 52 on the bag, eg buttons, hooks, zippers or hook-and-loop fastenings. The bag is closed using similar elements 53, 54. The surface of the bag covering may have fixed or detachable supplementary components such as side pockets, carrying straps, supporting legs, push handles, wheels (Fig 4, not shown).

3. 发明专利

MXPA01011373A ESTRUCTURA RADIANTE DE TECHO. 未知
公开(公告)号：MXPA01011373A
公开(公告)日：2003-05-19
申请号：MXPA01011373
申请日：2001-11-08
申请人： CHUN-PO TANG
发明人： CHUN-PO TANG
摘要： Una estructura radiante de techo tiene un par de placas radiantes 50, un par de bloques de colocacion 60 y una placa de cubierta 70. Cada placa radiante 50 tiene una pluralidad de corrugacion 55, un par de bordes en angulo recto 51, un par de placas rectas 52, un par de bordes curvados 53 y un par de extremos de bisel 54. Cada bloque de colocacion 60 tiene una barra transversa 61, una placa longitudinal 631 colocada en la barra transversa 61, dos barras de brazo 63 que se extienden desde la placa longitudinal 631, dos proyecciones de extremo 65 conectadas a las barras de brazo 63 y dos rebajos curvados 632 y dos ranuras de insercion 64 definidas por la placa longitudinal 631 y las barras de brazo 63. Cada ranura de insercion 64 recibe el extremo de bisel correspondiente 54 de la placa radiante 50. La barra transversa 61 se coloca en una viga hueca 1. Un tornillo P sujeta la barra transversa 61 y la viga hueca 1 unidas. La placa de cubierta 70 cubre los bloques de colocacion 60.

4. 发明申请

US20130292836A1 VIA-FREE INTERCONNECT STRUCTURE WITH SELF-ALIGNED METAL LINE INTERCONNECTIONS 有权
标题翻译：具有自对准金属线互连的无障碍互连结构
公开(公告)号：US20130292836A1
公开(公告)日：2013-11-07
申请号：US13461224
申请日：2012-05-01
申请人： Yu-Po Tang , Shih-Ming Chang , Ken-Hsien Hsieh , Ru-Gun Liu
发明人： Yu-Po Tang , Shih-Ming Chang , Ken-Hsien Hsieh , Ru-Gun Liu
IPC分类号： H01L23/48 , H01L21/28
CPC分类号： H01L21/76838 , H01L21/76897 , H01L23/522 , H01L23/5221 , H01L2924/0002 , H01L2924/00
摘要： The present disclosure provides a semiconductor device. The semiconductor device includes a first conductive line disposed over a substrate. The first conductive line is located in a first interconnect layer and extends along a first direction. The semiconductor device includes a second conductive line and a third conductive line each extending along a second direction different from the first direction. The second and third conductive lines are located in a second interconnect layer that is different from the first interconnect layer. The second and third conductive lines are separated by a gap that is located over or below the first conductive line. The semiconductor device includes a fourth conductive line electrically coupling the second and third conductive lines together. The fourth conductive line is located in a third interconnect layer that is different from the first interconnect layer and the second interconnect layer.
摘要翻译：本发明提供一种半导体器件。半导体器件包括设置在衬底上的第一导电线。第一导线位于第一互连层中并沿着第一方向延伸。半导体器件包括沿着与第一方向不同的第二方向延伸的第二导线和第三导线。第二和第三导线位于与第一互连层不同的第二互连层中。第二和第三导线被位于第一导电线之上或之下的间隙分开。半导体器件包括将第二和第三导线电耦合在一起的第四导线。第四导线位于与第一互连层和第二互连层不同的第三互连层中。

5. 发明授权

US08572520B2 Optical proximity correction for mask repair 有权
标题翻译：面罩修复光学接近校正
公开(公告)号：US08572520B2
公开(公告)日：2013-10-29
申请号：US13409515
申请日：2012-03-01
申请人： Chih-Shiang Chou , Ya-Ting Chang , Fu-Sheng Chu , Yu-Po Tang
发明人： Chih-Shiang Chou , Ya-Ting Chang , Fu-Sheng Chu , Yu-Po Tang
IPC分类号： G06F17/50 , G06G7/62
CPC分类号： G03F1/70 , G03F1/36
摘要： Integrated circuit (IC) methods for optical proximity correction (OPC) modeling and mask repair are described. The methods include use of an optical model that generates a simulated aerial image from an actual aerial image obtained in an optical microscope system. In the OPC modeling methods, OPC according to stage modeling is simulated, and OPC features may be added to a design layout according to the simulating OPC. In the mask repair methods, inverse image rendering is performed on the actual aerial image and diffraction image by applying an optical model that divides an incoherent exposure source into a plurality of coherent sources.
摘要翻译：描述了用于光学邻近校正（OPC）建模和掩模修复的集成电路（IC）方法。这些方法包括使用从在光学显微镜系统中获得的实际空间图像生成模拟空间图像的光学模型。在OPC建模方法中，根据阶段建模对OPC进行了仿真，根据模拟OPC可以将OPC特征加入到设计布局中。在掩模修复方法中，通过应用将非相干曝光源分割为多个相干光源的光学模型，对实际的空间图像和衍射图像执行逆图像渲染。

6. 发明授权

US08519939B2 LCD and backlight module driving device and method thereof 有权
标题翻译： LCD和背光模组驱动装置及其方法
公开(公告)号：US08519939B2
公开(公告)日：2013-08-27
申请号：US12135222
申请日：2008-06-09
申请人： Yueh-Han Li , Po-Tang Hsu , Chien-Ming Ko , Ching-Chou Yu
发明人： Yueh-Han Li , Po-Tang Hsu , Chien-Ming Ko , Ching-Chou Yu
IPC分类号： G09G3/36
CPC分类号： G09G3/342 , G09G2310/024 , G09G2310/08 , G09G2320/0261 , G09G2330/06
摘要： An LCD and a backlight module driving device and a method thereof are provided. The method is adapted to drive at least one backlight unit in a backlight module. The backlight unit is used for supplying a surface light source to an Nth area pixel of the LCD panel, where N is a positive integer. The method includes the following steps of first calculating a time of the Nth area pixel under a stable state in a frame period and then providing a control signal to drive the backlight unit when the Nth area pixel is under the stable state in the frame period.
摘要翻译：提供了LCD和背光模块驱动装置及其方法。该方法适于驱动背光模块中的至少一个背光单元。背光单元用于向LCD面板的第N个区域像素提供表面光源，其中N是正整数。该方法包括以下步骤：在帧周期内首先计算稳定状态下的第N个区域像素的时间，然后在帧周期中当第N个区域像素处于稳定状态时提供控制信号来驱动背光单元。

7. 发明申请

US20130155498A1 MICROSCOPE APPARATUS FOR PHASE IMAGE ACQUISITION 有权
标题翻译：用于相位图像获取的显微镜装置
公开(公告)号：US20130155498A1
公开(公告)日：2013-06-20
申请号：US13328591
申请日：2011-12-16
申请人： Fu-Sheng CHU , Chih-Shiang CHOU , Yu-Po TANG , Yan-Ying HE
发明人： Fu-Sheng CHU , Chih-Shiang CHOU , Yu-Po TANG , Yan-Ying HE
IPC分类号： G02B21/14 , G02B21/36
CPC分类号： G02B21/14 , G02B21/36 , G02B26/06
摘要： A microscope apparatus includes a condenser lens to make an illuminating electromagnetic wave relatively homogeneous, a first beam splitter splitting the illuminating electromagnetic wave after the condenser lens, a movable reflector module, a second beam splitter, an objective lens to project the illuminating electromagnetic wave propagating after an object to be observed toward an observing device. The object is loaded between the first beam splitter and the second beam splitter. The microscope apparatus is configured to split the illuminating electromagnetic wave into two paths at the first beam splitter. A first path goes through the first and the second beam splitters, and a second path goes through the movable reflector module to rejoin the first path at the second beam splitter. The microscope apparatus is configured acquire phase images with interferences of the electromagnetic wave from the two paths with at least two distance settings of the movable reflector module.
摘要翻译：显微镜装置包括：聚光透镜，用于使照明电磁波相对均匀;第一分束器，分离聚光透镜后的照明电磁波;可移动反射器模块;第二分束器;物镜，用于投射照射电磁波; 在要观察的物体之后朝向观察装置。物体被装载在第一分束器和第二分束器之间。显微镜装置被配置为在第一分束器处将照明电磁波分成两个路径。第一路径穿过第一和第二分束器，并且第二路径穿过可移动反射器模块以在第二分束器处重新加入第一路径。显微镜装置被配置为获得具有来自两个路径的电磁波干扰的相位图像，其中可移动反射器模块具有至少两个距离设置。

8. 发明授权

US08431291B2 Intensity selective exposure photomask 有权
标题翻译：强度选择性曝光光掩模
公开(公告)号：US08431291B2
公开(公告)日：2013-04-30
申请号：US13281198
申请日：2011-10-25
申请人： George Liu , Kuei Shun Chen , Chih-Yang Yeh , Te-Chih Huang , Wen-Hao Liu , Ying-Chou Cheng , Boren Luo , Tsong-Hua Ou , Yu-Po Tang , Wen-Chun Huang , Ru-Gun Liu , Shu-Chen Lu , Yu Lun Liu , Yao-Ching Ku , Tsai-Sheng Gau
发明人： George Liu , Kuei Shun Chen , Chih-Yang Yeh , Te-Chih Huang , Wen-Hao Liu , Ying-Chou Cheng , Boren Luo , Tsong-Hua Ou , Yu-Po Tang , Wen-Chun Huang , Ru-Gun Liu , Shu-Chen Lu , Yu Lun Liu , Yao-Ching Ku , Tsai-Sheng Gau
IPC分类号： G03F1/00 , G03F1/36
CPC分类号： G06F17/5068 , G03F1/00 , G03F1/68
摘要： An intensity selective exposure photomask, also describes as a gradated photomask, is provided. The photomask includes a first region including a first array of sub-resolution features. The first region blocks a first percentage of the incident radiation. The photomask also includes a second region including a second array of sub-resolution features. The second region blocks a second percentage of the incident radiation different that the first percentage.
摘要翻译：还提供强度选择性曝光光掩模，还描述为渐变光掩模。光掩模包括包括第一子分解特征阵列的第一区域。第一个区域阻止了第一个入射辐射的百分比。光掩模还包括包括第二子分辨率特征阵列的第二区域。第二个区域阻止了第二个百分比的入射辐射不同于第一个百分比。

9. 发明申请

US20120072874A1 DISSECTION SPLITTING WITH OPTICAL PROXIMITY CORRECTION AND MASK RULE CHECK ENFORCEMENT 有权
标题翻译：具有光学接近校正和掩蔽规则检查执行的分离
公开(公告)号：US20120072874A1
公开(公告)日：2012-03-22
申请号：US12884442
申请日：2010-09-17
申请人： Chia-Ping Chiang , Yu-Po Tang , Ming-Hui Chih , Cheng-Kun Tsai , Wei-Long Wang , Wen-Chun Huang , Ru-Gun Liu , Tsai-Sheng Gau , Cheng-Lung Tsai , Josh J.H. Feng , Bing-Syun Yeh , Jeng-Shiun Ho , Cheng-Cheng Kuo
发明人： Chia-Ping Chiang , Yu-Po Tang , Ming-Hui Chih , Cheng-Kun Tsai , Wei-Long Wang , Wen-Chun Huang , Ru-Gun Liu , Tsai-Sheng Gau , Cheng-Lung Tsai , Josh J.H. Feng , Bing-Syun Yeh , Jeng-Shiun Ho , Cheng-Cheng Kuo
IPC分类号： G06F17/50
CPC分类号： G06F17/5068 , G06F2217/12 , Y02P90/265
摘要： The present disclosure provides one embodiment of an integrated circuit (IC) design method. The method includes receiving an IC design layout having a plurality of main features; applying a main feature dissection to the main features of the IC design layout and generating sub-portions of the main features; performing an optical proximity correction (OPC) to the main features; performing a mask rule check (MRC) to a main feature of the IC design layout; and modifying one of the sub-portions of the main feature if the main feature fails the MRC.
摘要翻译：本公开提供了集成电路（IC）设计方法的一个实施例。该方法包括接收具有多个主要特征的IC设计布局; 将主要特征解剖应用于IC设计布局的主要特征，并生成主要特征的子部分; 对主要特征执行光学邻近校正（OPC）; 执行掩模规则检查（MRC）到IC设计布局的主要特征; 并且如果主要特征使MRC故障，则修改主要特征的一个子部分。

10. 发明申请

US20120060817A1 STOVE STRUCTURE 审中-公开
标题翻译： STOVE结构
公开(公告)号：US20120060817A1
公开(公告)日：2012-03-15
申请号：US13231130
申请日：2011-09-13
申请人： Po-Tang WANG , Hui-Chun Yu , Kuan-Wen Wang , Rih-Yang Wang , Ting-Yu Wang
发明人： Po-Tang WANG , Hui-Chun Yu , Kuan-Wen Wang , Rih-Yang Wang , Ting-Yu Wang
IPC分类号： F24C15/00
CPC分类号： F24C15/34
摘要： A stove structure includes a stove body. The stove body has a heat source portion and a wall portion. The wall portion has an inner wall and an outer wall. The inner wall and the outer wall are connected by a plurality of cross-section conducting members. Between the inner wall, the outer wall and the cross-section conducting members is provided with a low conductivity coefficient member. The cross-section conducting members extend the heat conduction distance and decrease the contact area of heat conduction. The lower conductivity coefficient member and the cross-section conducting members lower the heat conduction rate. The temperature of the outer wall is lowered to a second temperature and the temperature in the heating portion of the stove body is kept at the first high temperature.
摘要翻译：炉灶结构包括炉体。炉体具有热源部和壁部。壁部具有内壁和外壁。内壁和外壁通过多个横截面导电构件连接。在内壁，外壁和横截面导电构件之间设置有低导电系数构件。横截面导电构件延长了导热距离，并减小了热传导的接触面积。较低的导电率元件和横截面导电元件降低了导热率。外壁的温度降低到第二温度，炉体的加热部分的温度保持在第一高温。

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