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    • 1. 发明申请
    • HANDS-FREE VISION AID
    • 无障碍的视觉援助
    • US20130063929A1
    • 2013-03-14
    • US13410189
    • 2012-03-01
    • Peter G. BordenPeter H. Muller
    • Peter G. BordenPeter H. Muller
    • G02C11/04F21L4/02
    • G02C11/04
    • Described herein are hands-free vision aids that may be used for low-vision reading. These vision aids may be beneficial for individuals with low-vision disorders such as age-related macular degeneration, retinitis pigmentosa, and other visual disorders. The vision aids described here comprise an optical system with one or more light sources configured to provide a rectangular field of illumination with high illuminance levels bounded by high contrast perimeter. Such an illumination field greatly illuminates a targeted viewing region while reducing glare that arises from illuminating peripheral regions. Some vision aids use green light with high illuminance values for improving visual acuity and comfort for long-duration reading. The optical system of a vision aid may be configured to fit onto and/or integrate with eyeglass frames.
    • 这里描述的是可以用于低视力阅读的免提视力辅助器。 这些视力援助对于具有低视力障碍的个体,如年龄相关性黄斑变性,色素性视网膜炎和其他视觉障碍可能是有益的。 这里描述的视觉辅助设备包括具有一个或多个光源的光学系统,其被配置为提供具有由高对比度周界限定的高照度水平的矩形照明场。 这样的照明领域大大地照亮目标观看区域,同时减少由照射周边区域引起的眩光。 一些视力辅助工具使用具有高照度值的绿灯,以提高长时间阅读的视力和舒适度。 视力辅助装置的光学系统可以被配置成装配在眼镜框架上和/或与眼镜框架整合。
    • 3. 发明申请
    • CARRIER FOR TRANSPORTING SOLAR CELL SUBSTRATES
    • 用于运输太阳能电池基板的载体
    • US20100326797A1
    • 2010-12-30
    • US12766263
    • 2010-04-23
    • Peter G. Borden
    • Peter G. Borden
    • B65G17/00B65H1/00
    • B65G15/42H01L21/67706H01L21/67721
    • A carrier for transporting a plurality of solar cell substrates comprising a peripheral frame defined by a pair of side members connected by first and second complementary end members, a plurality of cross struts, a plurality of standoffs for supporting the substrates, and at least one drive member coupled to one of the end members. The end members have alternating bends that provide a wave-like pattern of projections and indentations, are arranged in a spaced and substantially parallel orientation, and are constructed from metal wire. Each cross strut is connected to the first end member and the second end member between complementary projections and indentations. Rotation of the drive member causes both end members to rotate in a circular motion.
    • 一种用于传送多个太阳能电池基板的载体,包括由由第一和第二互补端部构件连接的一对侧构件限定的外围框架,多个横向支柱,用于支撑基板的多个支座,以及至少一个驱动 成员与其中一个终端成员相连。 端部构件具有交替的弯曲,其提供波浪状图案的突出和凹陷,以间隔且基本上平行的方向布置,并且由金属线构成。 每个交叉支柱连接到第一端构件和第二端构件之间的互补突起和凹槽之间。 驱动构件的旋转导致两个端部构件以圆周运动旋转。
    • 5. 发明申请
    • NITRIDED BARRIER LAYERS FOR SOLAR CELLS
    • 用于太阳能电池的氮化阻挡层
    • US20090288704A1
    • 2009-11-26
    • US12421563
    • 2009-04-09
    • Peter G. BORDEN
    • Peter G. BORDEN
    • H01L31/0368H01L31/18
    • H01L31/062H01L31/1804Y02E10/547Y02P70/521
    • The present invention relates to polysilicon emitter solar cells, and more particularly to polysilicon emitter solar cells with hyperabrupt junctions, and methods for making such solar cells. According to one aspect, a polysilicon emitter solar cell according to the invention includes a nitrided tunnel insulator. The nitridation prevents boron diffusion, enabling a hyperabrupt junction for a p-poly on n-Si device. According to another aspect, a nitrided oxide (DPN) is used in a tunnel oxide layer of a MIS solar cell structure. The DPN layer minimizes plasma damage, resulting in improved interface properties. An overlying polysilicon emitter can then provide a low sheet resistance emitter without heavy doping effects in the substrate, excess recombination, or absorption, and is a significant improvement over a conventional diffused emitter or TCO. According to another aspect, the invention includes a method for making a solar cell structure that is functionally equivalent to a selective emitter, but without the requirement for multiple diffusions, long diffusions, aligned lithography, or fine contact holes.
    • 本发明涉及多晶硅发射极太阳能电池,更具体地说涉及具有过度连接的多晶硅发射极太阳能电池,以及制造这种太阳能电池的方法。 根据一个方面,根据本发明的多晶硅发射极太阳能电池包括氮化隧道绝缘体。 氮化防止硼扩散,使得能够在n-Si器件上进行p-poly的过度连接。 根据另一方面,在MIS太阳能电池结构的隧道氧化物层中使用氮化氧化物(DPN)。 DPN层最小化等离子体损伤,从而改善界面性能。 然后,叠加的多晶硅发射极可以提供低的薄层电阻发射极,而不会在衬底中产生重掺杂效应,过量的复合或吸收,并且比传统的扩散发射极或TCO具有显着的改进。 根据另一方面,本发明包括一种用于制造在功能上等同于选择性发射器但不需要多次扩散,长扩散,对准光刻或精细接触孔的太阳能电池结构的方法。
    • 6. 发明授权
    • Apparatus and method for measuring a property of a layer in a multilayered structure
    • 用于测量多层结构中的层的性质的装置和方法
    • US06958814B2
    • 2005-10-25
    • US10090316
    • 2002-03-01
    • Peter G. BordenJi Ping Li
    • Peter G. BordenJi Ping Li
    • G01N21/00G01N21/17G01N21/55G01N21/59G01N21/88G01N27/04G01R31/26H01L20060101H01L21/66
    • G01N27/041G01N21/1717
    • An apparatus measures a property of a layer (such as the sheet resistance of a conductive layer) by performing the following method: (1) focusing the heating beam on the heated a region (also called “heated region”) of the conductive layer (2) modulating the power of the heating beam at a predetermined frequency that is selected to be sufficiently low to ensure that at any time the temperature of the optically absorbing layer is approximately equal to (e.g., within 90% of) a temperature of the optically absorbing layer when heated by an unmodulated beam, and (3) measuring the power of another beam that is (a) reflected by the heated region, and (b) modulated in phase with modulation of the heating beam. The measurement in act (3) can be used directly as a measure of the resistance (per unit area) of a conductive pad formed by patterning the conductive layer. Acts (1)-(3) can be repeated during fabrication of a semiconductor wafer, at each of a number of regions on a conductive layer, and any change in measurement indicates a corresponding change in resistance of the layer. When the measurement changes by more than a predetermined amount (e.g., by 10%), a process parameter that controls the fabrication process is changed to return the measurement to normal in the next wafer.
    • 一种装置通过以下方法测量层的性质(例如导电层的薄层电阻):(1)将加热束聚焦在加热的导电层的加热区域(也称为“加热区域”)上 2)以预定的频率调制加热束的功率,该预定频率被选择为足够低以确保在任何时候光学吸收层的温度近似等于(例如,90%以内)光学的温度 并且(3)测量由(a)被加热区域反射的另一个光束的功率,和(b)通过加热光束的调制相位调制。 作用(3)中的测量可以直接用作通过图案化导电层形成的导电焊盘的电阻(每单位面积)的量度。 在制造半导体晶片期间,在导电层上的多个区域的每一个处可以重复使用(1) - (3),并且测量的任何变化表示层的电阻的相应变化。 当测量改变超过预定量(例如,10%)时,改变控制制造过程的处理参数,以使测量在下一个晶片中恢复正常。
    • 7. 发明授权
    • Evaluating sidewall coverage in a semiconductor wafer
    • 评估半导体晶片中的侧壁覆盖
    • US06911349B2
    • 2005-06-28
    • US09788273
    • 2001-02-16
    • Jiping LiPeter G. Borden
    • Jiping LiPeter G. Borden
    • G01N21/55G01R31/307G01R31/26H01L21/66
    • G01N21/55G01R31/307
    • A sidewall or other feature in a semiconductor wafer is evaluated by illuminating the wafer with at least one beam of electromagnetic radiation, and measuring intensity of a portion of the beam reflected by the wafer. Change in reflectance between measurements provides a measure of a property of the feature. The change may be either a decrease in reflectance or an increase in reflectance, depending on the embodiment. A single beam may be used if it is polarized in a direction substantially perpendicular to a longitudinal direction of the sidewall. A portion of the energy of the beam is absorbed by the sidewall, thereby to cause a decrease in reflectance when compared to reflectance by a flat region. Alternatively, two beams may be used, of which a first beam applies heat to the feature itself or to a region adjacent to the feature, and a second beam is used to measure an increase in reflectance caused by an elevation in temperature due to heat transfer through the feature. The elevation in temperature that is measured can be either of the feature itself, or of a region adjacent to the feature.
    • 通过用至少一束电磁辐射照射晶片并测量由晶片反射的光束的一部分的强度来评估半导体晶片中的侧壁或其它特征。 测量之间的反射率变化提供了特征属性的量度。 根据实施例,该变化可以是反射率的降低或反射率的增加。 如果沿着与侧壁的纵向方向基本垂直的方向极化,则可以使用单个光束。 光束的能量的一部分被侧壁吸收,从而当与平坦区域的反射率相比时,反射率降低。 或者,可以使用两个光束,其中第一光束对特征本身或与特征相邻的区域施加热量,并且第二光束用于测量由于热传递引起的温度升高引起的反射率的增加 通过功能。 所测量的温度升高可以是特征本身,也可以是与特征相邻的区域。
    • 8. 发明授权
    • System and method for measuring the microroughness of a surface of a
substrate
    • 用于测量衬底表面的微粗糙度的系统和方法
    • US6154280A
    • 2000-11-28
    • US204330
    • 1998-12-02
    • Peter G. Borden
    • Peter G. Borden
    • G01B11/30G02F1/1333G11B5/84G01B11/24
    • G01B11/303
    • A system for measuring an amount of microroughness of a surface of a substrate, wherein a first beam of electromagnetic radiation and a second beam of electromagnetic radiation are generated, the first and second beams being substantially parallel and spaced apart from each other so that the first and second beams are substantially non-overlapping, and the first and second beams are focused onto the substrate so that the beams impinge upon a selected area of the surface of the substrate having a surface contour, the surface contour of the substrate causing a scattering of both beams. The scattering of the first and second beams is detected, the amount of scattering corresponding to a microroughness value of the selected area of the substrate, and the microroughness value of the selected area of the substrate is determined from the amount of scattering of the first and second beams. The microroughness measuring system may also be used for controlling a fabrication process.
    • 一种用于测量基板表面的微粗糙度的系统,其中产生第一电磁辐射束和第二电磁辐射束,所述第一和第二光束基本上平行并彼此间隔开,使得所述第一 并且第二光束基本上不重叠,并且第一和第二光束聚焦到基板上,使得光束撞击具有表面轮廓的基板的表面的选定区域,基板的表面轮廓导致散射 两束。 检测第一和第二光束的散射,对应于衬底的选定区域的微粗度值的散射量和衬底的选定区域的微粗糙度值由第一和第二光束的散射量确定, 第二梁。 微粗糙度测量系统也可用于控制制造工艺。