专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明授权

US08529700B2 Apparatus for gaseous vapor deposition 失效
标题翻译：气相沉积装置
公开(公告)号：US08529700B2
公开(公告)日：2013-09-10
申请号：US12550832
申请日：2009-08-31
申请人： Peter Francis Carcia , Richard Dale Kinard , Robert Scott McLean , Geoffrey Nunes , Kirstin H. Shilkitus
发明人： Peter Francis Carcia , Richard Dale Kinard , Robert Scott McLean , Geoffrey Nunes , Kirstin H. Shilkitus
IPC分类号： C23C16/00
CPC分类号： C23C16/545 , B33Y80/00 , B65H18/00 , B65H2301/51145 , B65H2801/87 , C23C16/45506 , C23C16/45544 , C23C16/45582 , C23C16/45591 , C23C16/458
摘要： A vapor deposition apparatus includes an insert within which a material is deposited on the surface of a film. A cassette includes end plates each having a rib that edgewise receive a spiral wrapping of a film at least 300 mm wide. Spaces between turns of the wrapping define a gas flow channel and spaces between adjacent turns of one rib define inlet openings that communicate with the channel. Each rib has a predetermined width dimension, a predetermined average thickness dimension, and a width-to-thickness aspect ratio of at least 2:1. The spacing between end plates is at least 300 mm and is also greater than the film width at deposition temperature. The width dimension of each rib is between about 0.5% to about 2.0% of the end plate spacing. A diverging flow director contacts one end plate to directing gaseous fluid toward the inlet openings in that end plate.
摘要翻译：气相沉积设备包括一个插入件，材料沉积在薄膜的表面上。盒式磁带包括端板，每个端板具有边缘，其沿边缘容纳至少300mm宽的膜的螺旋卷绕。包裹圈之间的空间限定了气体流动通道，并且一个肋的相邻匝之间的间隔限定了与通道连通的入口开口。每个肋具有至少2:1的预定宽度尺寸，预定平均厚度尺寸和宽至厚纵横比。端板之间的间距至少为300mm，并且也大于沉积温度下的膜宽度。每个肋的宽度尺寸在端板间距的约0.5％至约2.0％之间。分流导流器接触一个端板以将气态流体引向该端板中的入口开口。

2. 发明授权

US08524003B2 Loaded film cassette for gaseous vapor deposition 失效
标题翻译：用于气相沉积的加载胶片盒
公开(公告)号：US08524003B2
公开(公告)日：2013-09-03
申请号：US12550766
申请日：2009-08-31
申请人： Peter Francis Carcia , Calixto Estrada , Richard Dale Kinard , Robert Scott McLean , Kirstin H. Shilkitus
发明人： Peter Francis Carcia , Calixto Estrada , Richard Dale Kinard , Robert Scott McLean , Kirstin H. Shilkitus
IPC分类号： C23C16/00
CPC分类号： C23C16/458 , B33Y80/00 , B65H18/00 , B65H2301/51145 , C23C16/45506 , C23C16/45544 , C23C16/45582 , C23C16/45591
摘要： A cassette for supporting a film during a gaseous vapor deposition has first and second end plates. A rib on each end plate forms a spiral groove that edgewise receives a spiral wrapping of a film having a width greater than 300 mm. Spaces between turns of the film wrapping define a gas flow channel and spaces between adjacent turns of the rib define a plurality of inlet openings in one end plate that communicate with the channel. Each rib has a predetermined width dimension, a predetermined average thickness dimension, and a width-to-thickness aspect ratio of at least 2:1. The spacing between end plates is at least three hundred millimeters (300 mm) and is also greater than the width dimension of a film substrate at a gaseous deposition temperature. The width dimension of each rib is between about 0.5% to about 2.0% of the end plate spacing.
摘要翻译：在气相气相沉积期间用于支撑膜的盒具有第一和第二端板。每个端板上的肋形成螺旋槽，该螺旋槽沿边缘容纳宽度大于300mm的膜的螺旋缠绕。薄膜卷绕圈之间的间隔限定了气体流动通道，并且肋的相邻匝之间的间隔限定了在一个端板中与通道连通的多个入口开口。每个肋具有至少2:1的预定宽度尺寸，预定平均厚度尺寸和宽至厚纵横比。端板之间的间距至少为三百毫米（300毫米），并且也大于气相沉积温度下薄膜基板的宽度尺寸。每个肋的宽度尺寸在端板间距的约0.5％至约2.0％之间。

3. 发明授权

US07005798B2 Flexible organic electronic device with improved resistance to oxygen and moisture degradation 有权
标题翻译：柔性有机电子器件具有改善的抗氧气和水分降解能力
公开(公告)号：US07005798B2
公开(公告)日：2006-02-28
申请号：US10856512
申请日：2004-05-28
申请人： Peter Francis Carcia , Robert Scott McLean
发明人： Peter Francis Carcia , Robert Scott McLean
IPC分类号： H01J1/62 , H01L21/56 , H01L31/12
CPC分类号： H01L51/0504 , H01L51/0001 , H01L51/0097 , H01L51/42 , H01L51/448 , H01L51/5256 , H01L2251/5338 , Y02E10/549 , Y10S428/917 , Y10T428/259
摘要： The present invention relates to a device having a flexible organic electronic device comprising in the order listed: a) a first flexible composite barrier structure comprising at least one layer of a first polymeric film and at least one layer of a first barrier material, the first barrier structure having a first inner surface, b) at least one first electrical contact layer, c) at least one active layer comprising an organic active material, said active layer having dimensions defined by a length and a width, d) at least one second electrical contact layer, e) a second flexible composite barrier structure comprising at least one layer of a second polymeric film and at least one layer of a second barrier material, the second barrier structure having a second inner surface, wherein at least one of the first and second composite barrier structures is light-transmitting and the first and second composite barrier structures are sealed together to envelop the at least one active layer.
摘要翻译：本发明涉及一种具有柔性有机电子器件的器件，其中包括按照lis的顺序

4. 发明申请

US20130333835A1 PROCESS FOR MANUFACTURING GAS PERMEATION BARRIER MATERIAL AND STRUCTURE 审中-公开
标题翻译：气体渗透阻挡材料和结构的制造工艺
公开(公告)号：US20130333835A1
公开(公告)日：2013-12-19
申请号：US13523439
申请日：2012-06-14
申请人： Peter Francis Carcia , Robert Scott Mclean
发明人： Peter Francis Carcia , Robert Scott Mclean
IPC分类号： C23C16/06 , C23C16/38 , B32B37/00 , C23C16/40
CPC分类号： C23C16/45527 , B32B2037/246 , B32B2457/12 , B32B2457/206 , C23C16/403 , H01L51/107 , H01L51/448 , H01L51/5253 , Y02E10/549 , Y02P70/521 , Y10T156/10
摘要： Hybrid inorganic-organic, polymeric alloys are prepared by combining atomic layer deposition and molecular layer deposition techniques provide barrier protection against intrusion of atmospheric gases such as oxygen and water vapor. The alloy may be formed either directly on objects to be protected, or on a carrier substrate to form a barrier structure that subsequently may be employed to protect an object. The alloy thus formed is beneficially employed in constructing electronic devices such as photovoltaic cell arrays, organic light-emitting devices, and other optoelectronic devices.
摘要翻译：混合无机 - 有机聚合物合金是通过组合原子层沉积和分子层沉积技术来制备的，其提供了防止大气气体例如氧气和水蒸汽侵入的屏障保护。合金可以直接形成在待保护的物体上，或者形成在载体基底上，以形成随后可以用于保护物体的阻挡结构。这样形成的合金有益地用于构建诸如光电池阵列，有机发光器件和其它光电器件的电子器件。

5. 发明申请

US20120145240A1 BARRIER FILMS FOR THIN-FILM PHOTOVOLTAIC CELLS 审中-公开
标题翻译：用于薄膜光伏电池的遮蔽膜
公开(公告)号：US20120145240A1
公开(公告)日：2012-06-14
申请号：US13391880
申请日：2010-08-24
申请人： Peter Francis Carcia
发明人： Peter Francis Carcia
IPC分类号： H01L31/0203 , H01L31/0376 , H01L31/0384 , H01L31/18
CPC分类号： B32B17/10733 , B32B17/10018 , B32B17/10706 , B32B2327/12 , B32B2367/00 , H01L31/048 , Y02E10/50
摘要： A multilayer article having a cell substrate; a thin-film photovoltaic cell disposed on the cell substrate; an encapsulant layer disposed on the photovoltaic cell; and at least one plastic substrate coated on at least one side with one or more transparent, amorphous barrier layers disposed on the encapsulant layer. The invention extends to the process of making the article.
摘要翻译：具有电池基板的多层制品; 设置在所述电池基板上的薄膜光伏电池; 设置在所述光伏电池上的密封剂层; 以及至少一个涂覆在至少一个侧面上的塑料基底，其中一个或多个透明非晶形阻挡层设置在密封剂层上。本发明延伸到制造该制品的过程。

6. 发明申请

US20110048328A1 APPARATUS FOR GASEOUS VAPOR DEPOSITION 失效
标题翻译：气体沉积装置
公开(公告)号：US20110048328A1
公开(公告)日：2011-03-03
申请号：US12550832
申请日：2009-08-31
申请人： PETER FRANCIS CARCIA , Richard Dale Kinard , Robert Scott McLean , Geoffrey Nunes , Kirstin H. Shilkitus
发明人： PETER FRANCIS CARCIA , Richard Dale Kinard , Robert Scott McLean , Geoffrey Nunes , Kirstin H. Shilkitus
IPC分类号： C23C16/458
CPC分类号： C23C16/545 , B33Y80/00 , B65H18/00 , B65H2301/51145 , B65H2801/87 , C23C16/45506 , C23C16/45544 , C23C16/45582 , C23C16/45591 , C23C16/458
摘要： A vapor deposition apparatus includes an insert within which a material is deposited on the surface of a film. A cassette includes end plates each having a rib that edgewise receive a spiral wrapping of a film at least 300 mm wide. Spaces between turns of the wrapping define a gas flow channel and spaces between adjacent turns of one rib define inlet openings that communicate with the channel. Each rib has a predetermined width dimension, a predetermined average thickness dimension, and a width-to-thickness aspect ratio of at least 2:1. The spacing between end plates is at least 300 mm and is also greater than the film width at deposition temperature. The width dimension of each rib is between about 0.5% to about 2.0% of the end plate spacing. A diverging flow director contacts one end plate to directing gaseous fluid toward the inlet openings in that end plate.
摘要翻译：气相沉积设备包括一个插入件，材料沉积在薄膜的表面上。盒式磁带包括端板，每个端板具有边缘，其沿边缘容纳至少300mm宽的膜的螺旋卷绕。包裹圈之间的空间限定了气体流动通道，并且一个肋的相邻匝之间的间隔限定了与通道连通的入口开口。每个肋具有至少2:1的预定宽度尺寸，预定平均厚度尺寸和宽至厚纵横比。端板之间的间距至少为300mm，并且也大于沉积温度下的膜宽度。每个肋的宽度尺寸在端板间距的约0.5％至约2.0％之间。分流导流器接触一个端板以将气态流体引向该端板中的入口开口。

7. 发明申请

US20100247855A1 Breathable low-emissivity metallized sheets 有权
标题翻译：透气低发射金属化片材
公开(公告)号：US20100247855A1
公开(公告)日：2010-09-30
申请号：US11647066
申请日：2006-12-28
申请人： Ioannis V. Bletsos , Peter Francis Carcia
发明人： Ioannis V. Bletsos , Peter Francis Carcia
IPC分类号： B32B3/10 , B32B3/26 , B32B5/24 , B32B7/02
CPC分类号： B32B5/22 , B32B3/266 , B32B5/022 , B32B5/024 , B32B5/26 , B32B27/08 , B32B27/12 , B32B27/20 , B32B27/285 , B32B27/306 , B32B27/32 , B32B27/34 , B32B27/36 , B32B27/40 , B32B2255/02 , B32B2255/10 , B32B2255/205 , B32B2255/26 , B32B2255/28 , B32B2262/00 , B32B2270/00 , B32B2307/30 , B32B2307/54 , B32B2307/724 , B32B2307/7265 , B32B2419/00 , B32B2419/06 , B32B2607/00 , C08J7/042 , C23C14/025 , C23C14/20 , C23C14/205 , C23C14/562 , D06N5/00 , D06N2209/123 , D06N2209/128 , E04B1/625 , E04B1/78 , E04B2001/7691 , E04B2001/925 , E04D12/002 , E04D13/1625 , E04D2015/047 , E04F13/12 , H05K9/0003 , Y10T428/12361 , Y10T428/24322 , Y10T428/24917 , Y10T428/24975 , Y10T442/2139 , Y10T442/2148 , Y10T442/3382 , Y10T442/3398 , Y10T442/654 , Y10T442/657
摘要： A durable metallized moisture vapor permeable sheet is formed by coating a moisture vapor permeable sheet with at least one metal coating comprising a layer of a corrosion resistant metal or a plurality of metal layers having differing compositions. The metallized moisture vapor permeable sheet material is suitable for use as a building construction wrap such as roof lining and house wrap, and as EMF radiation shielding material.
摘要翻译：通过用至少一种包含耐腐蚀金属层或具有不同组成的多个金属层的金属涂层涂覆水蒸气可透过的片材来形成耐久的金属蒸汽透湿片材。金属化的水蒸气透过片材适合用作建筑结构包装，如屋顶衬里和房屋包装，以及作为EMF辐射屏蔽材料。

8. 发明授权

US07067843B2 Transparent oxide semiconductor thin film transistors 有权
标题翻译：透明氧化物半导体薄膜晶体管
公开(公告)号：US07067843B2
公开(公告)日：2006-06-27
申请号：US10669940
申请日：2003-09-24
申请人： Peter Francis Carcia , Robert Scott McLean
发明人： Peter Francis Carcia , Robert Scott McLean
IPC分类号： H01L29/04
CPC分类号： H01L29/7869 , C23C14/086 , H01L21/02422 , H01L21/02554 , H01L21/02565 , H01L21/0262 , H01L21/02631 , H01L29/66969
摘要： Transistors fabricated with transparent oxide semiconductors are provided. The semiconductors are metal oxides deposited without the intentional incorporation of additional doping elements, and enable the fabrication of transparent thin film transistors. The transparent transistors can be used to control pixels in a display, without significantly reducing the active area of the pixels.
摘要翻译：提供了用透明氧化物半导体制造的晶体管。半导体是金属氧化物沉积而不是有意地并入额外的掺杂元素，并且能够制造透明薄膜晶体管。透明晶体管可用于控制显示器中的像素，而不显着地减小像素的有效面积。

9. 发明授权

US06274280B1 Multilayer attenuating phase-shift masks 失效
标题翻译：多层衰减相移掩模
公开(公告)号：US06274280B1
公开(公告)日：2001-08-14
申请号：US09459777
申请日：1999-12-13
申请人： Peter Francis Carcia
发明人： Peter Francis Carcia
IPC分类号： G03F900
CPC分类号： G03F1/32
摘要： Disclosed are attenuating embedded phase shift masks capable of producing a phase shift of 180° with an optical transitivity of at least 0.001 at a selected lithographic wavelength less than 200 nm. The masks are comprised of distinct contiguous alternating contiguous layers of an optically transparent material consisting essentially of an oxide selected from the group consisting of oxides of Al and Si and layers. of an optically absorbing material consisting essentially of a nitride selected from the group consisting of nitrides of Al and Si. Such masks are commonly known in the art as attenuating (embedded) phase shift masks or half-tone phase shift masks.
摘要翻译：公开了衰减嵌入式相移掩模，其能够在小于200nm的选定光刻波长下产生180°的相移，其光学传导率至少为0.001。掩模由基本上由选自Al和Si的氧化物和层的氧化物组成的光学透明材料的不同邻接的交替连续层组成。的光学吸收材料，其基本上由选自Al和Si的氮化物的氮化物组成。这种掩模在本领域中通常被称为衰减（嵌入）相移掩模或半色调相移掩模

10. 发明授权

US08445937B2 Barrier films for plastic substrates fabricated by atomic layer deposition 有权
标题翻译：通过原子层沉积制造的塑料基板的阻挡膜
公开(公告)号：US08445937B2
公开(公告)日：2013-05-21
申请号：US12055560
申请日：2008-03-26
申请人： Peter Francis Carcia , Robert Scott McLean
发明人： Peter Francis Carcia , Robert Scott McLean
IPC分类号： H01L33/00
CPC分类号： C23C16/403 , C23C16/45525 , C23C16/45555 , G02F1/133345 , H01L21/02178 , H01L21/0228 , H01L21/3141 , H01L21/31616 , H01L23/564 , H01L51/0096 , H01L51/5253 , H01L2924/0002 , H01L2924/12044 , Y02E10/549 , Y10T428/26 , H01L2924/00
摘要： Gas permeation barriers can be deposited on plastic or glass substrates by atomic layer deposition (ALD). The use of the ALD coatings can reduce permeation by many orders of magnitude at thicknesses of tens of nanometers with low concentrations of coating defects. These thin coatings preserve the flexibility and transparency of the plastic substrate. Such articles are useful in container, electrical and electronic applications.
摘要翻译：气体渗透屏障可通过原子层沉积（ALD）沉积在塑料或玻璃基板上。使用ALD涂层可以在几十纳米的厚度下以低的涂层缺陷浓度将渗透减少许多数量级。这些薄涂层保持塑料基材的柔韧性和透明度。这些物品在容器，电气和电子应用中是有用的。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式