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    • 1. 发明授权
    • Developer for irradiated, radiation-sensitive recording materials
    • 辐射敏感记录材料的显影剂
    • US6100016A
    • 2000-08-08
    • US395961
    • 1999-09-14
    • Steffen DenzingerMichael DoerrKlaus-Peter KonradAndreas ElsaesserPaul Eckler
    • Steffen DenzingerMichael DoerrKlaus-Peter KonradAndreas ElsaesserPaul Eckler
    • C08F8/12C08F8/14C08F212/02C08F220/00C08F222/00C08K3/22C08K5/00C08L57/00G03F7/32G03C5/30
    • G03F7/322
    • The invention relates to a developer for irradiated, radiation-sensitive recording materials, in particular for the production of offset printing plates, which contains water, a compound which is alkaline in aqueous solution and a copolymer which acts as an emulsifier and has units of (I) a hydrophobic vinyl compound which has at least one optionally substituted mono- or bicyclic (C.sub.6 -C.sub.14)aryl radical and (II) a hydrophilic, ethylenically unsaturated carboxylic acid. Some of the carboxyl groups of the copolymer are esterified with reaction products of (A) (C.sub.1 -C.sub.30)alkanols, (C.sub.8 -C.sub.25)alkanoic acids, (C.sub.1 -C.sub.12)-alkylphenols or di(C.sub.1 -C.sub.20)alkylamines with (B) (C.sub.2 -C.sub.4)-alkylene oxides or tetrahydrofuran, the molar ratio (A):(B) being in the range from 1:2 to 1:50. If it is intended to develop recording materials having a negative-working layer, the developer additionally contains a water-miscible organic solvent and a surface-active compound. The developer has a low initial viscosity, which increases only slowly with increasing contamination with layer components. Furthermore it shows only a particularly low tendency to foam.
    • 本发明涉及一种用于辐射敏感记录材料的显影剂,特别是用于生产胶版印刷版,其中含有水,在水溶液中呈碱性的化合物和作为乳化剂的共聚物,并具有( I)疏水性乙烯基化合物,其具有至少一个任选取代的单或双环(C 6 -C 14)芳基和(II)亲水性烯属不饱和羧酸。 共聚物的一些羧基用(A)(C1-C30)链烷醇,(C8-C25)链烷酸,(C1-C12) - 烷基酚或二(C1-C20)烷基胺与(B )(C 2 -C 4) - 亚烷基氧化物或四氢呋喃,摩尔比(A):(B)在1:2至1:50的范围内。 如果要开发具有负性层的记录材料,则显影剂另外含有水混溶性有机溶剂和表面活性化合物。 显影剂具有低的初始粘度,其随着层组分的污染增加而缓慢增加。 此外,它仅显示出特别低的泡沫趋势。