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1. 发明申请

WO2011138706A2 DEVICE FOR HOLDING WAFER SHAPED ARTICLES 审中-公开
标题翻译：用于保存形状文章的设备
公开(公告)号：WO2011138706A2
公开(公告)日：2011-11-10
申请号：PCT/IB2011051800
申请日：2011-04-26
申请人： LAM RES AG , LAM RES CORP , FRANK DIETER , PUGGL MICHAEL , FUCHS ROMAN , LACH OTTO
发明人： FRANK DIETER , PUGGL MICHAEL , FUCHS ROMAN , LACH OTTO
IPC分类号： H01L21/687 , H01L21/683
CPC分类号： H01L21/68785 , H01L21/68728 , H01L21/68792
摘要： A spin chuck for holding semiconductor wafers includes one or more damping mechanisms to limit the force with which chuck pins impact the wafer edge following 5 wafer shift. The damping mechanism may be a linear or rotary dashpot. The dashpot or dashpots are mounted on a surface of the chuck body and include a control arm that contacts a common gear ring that in turn drives the chuck pins during radially inward and outward movement.
摘要翻译：用于保持半导体晶片的自旋卡盘包括一个或多个阻尼机构，以限制在5个晶片移位之后卡盘销冲击晶片边缘的力。阻尼机构可以是线性或旋转缓冲器。缓冲器或缓冲器安装在卡盘主体的表面上，并且包括控制臂，该控制臂接触共同的齿圈，从而在径向向内和向外运动期间驱动卡盘销。

2. 发明申请

WO2013027153A1 METHOD AND DEVICE FOR WET TREATMENT OF PLATE-LIKE ARTICLES 审中-公开
标题翻译：用于湿润处理板状物品的方法和装置
公开(公告)号：WO2013027153A1
公开(公告)日：2013-02-28
申请号：PCT/IB2012/054131
申请日：2012-08-14
申请人： LAM RESEARCH AG , LAM RESEARCH CORPORATION , PUGGL, Michael , MATSUSHITA, Masaichiro Ken
发明人： PUGGL, Michael , MATSUSHITA, Masaichiro Ken
IPC分类号： H01L21/683
CPC分类号： H01L21/67028 , H01L21/67051 , H01L21/68728 , H01L21/68785
摘要： A method and device for wet treatment of a plate-like article comprises a spin chuck for holding and rotating the plate-like article. Gas supply nozzles open on a surface of the spin chuck facing a first side of the plate-like article. The spin chuck is configured to direct gas discharged from the gas supply nozzles radially outwardly through a gap defined between an upper surface of the spin chuck and a downwardly facing surface of a plate-like article positioned on the spin chuck. Liquid supply nozzles open on the surface of the spin chuck facing a first side of the plate-like article and positioned radially outwardly of the gas supply nozzles. The liquid supply nozzles are positioned beneath a peripheral region of a plate-like article positioned on the spin chuck.
摘要翻译：用于湿处理板状制品的方法和装置包括用于保持和旋转板状制品的旋转卡盘。气体供给喷嘴在旋转卡盘的面向板状物品的第一面的表面上开口。旋转夹盘构造成将从气体供给喷嘴排出的气体径向向外引导通过限定在旋转卡盘的上表面和位于旋转卡盘上的板状物品的面向下的表面之间的间隙。液体供应喷嘴在旋转卡盘的表面上朝向板状物品的第一侧开口，并且位于气体供应喷嘴的径向外侧。液体供给喷嘴位于位于旋转卡盘上的板状物品的周边区域的下方。

3. 发明申请

WO2011073840A3 DEVICE AND PROCESS FOR LIQUID TREATMENT OF A WAFER SHAPED ARTICLE 审中-公开
标题翻译：用于液体处理的成形装置和方法
公开(公告)号：WO2011073840A3
公开(公告)日：2011-12-01
申请号：PCT/IB2010055550
申请日：2010-12-02
申请人： LAM RES AG , LAM RES CORP , FRANK DIETER , PUGGL MICHAEL
发明人： FRANK DIETER , PUGGL MICHAEL
IPC分类号： H01L21/302
CPC分类号： H01L21/67051 , H01L21/6708 , H01L21/6715 , H01L21/67253 , H01L21/68728 , H01L21/68735
摘要： A spin chuck in an apparatus for single wafer wet processing has structures at its periphery that, in combination with a supported wafer, form a series of annular nozzles that direct flowing gas from a chuck-facing surface of the wafer, around the edge of the wafer, and exhaust the gas away from the non-chuck- facing surface of the wafer, thereby preventing treatment fluid applied to the non-chuck- facing surface from contacting the edge region of the wafer. Retaining pins with enlarged heads engage the wafer edge and prevent it from being displaced upwardly when a high flow rate of gas is utilized.
摘要翻译：用于单晶片湿法处理的装置中的自旋卡盘在其周边具有结构，其与支撑的晶片组合形成一系列环形喷嘴，其将来自晶片的面向卡盘的表面的流动气体绕在并且将气体排出离开晶片的非卡盘面对表面，从而防止施加到非卡盘面对表面的处理流体接触晶片的边缘区域。具有扩大头部的固定销与晶片边缘接合，并且当使用高流量气体时防止其向上移位。

4. 发明申请

WO2012156858A3 DEVICE AND PROCESS FOR LIQUID TREATMENT OF WAFER SHAPED ARTICLES 审中-公开
标题翻译：用于液体处理成形文章的装置和方法
公开(公告)号：WO2012156858A3
公开(公告)日：2015-08-13
申请号：PCT/IB2012052239
申请日：2012-05-04
申请人： LAM RES AG , LAM RES CORP , PUGGL MICHAEL , AUFEGGER CHRISTIAN , HOHENWARTER KARL-HEINZ
发明人： PUGGL MICHAEL , AUFEGGER CHRISTIAN , HOHENWARTER KARL-HEINZ
IPC分类号： H01L21/67
CPC分类号： H01L21/68721 , H01L21/6715 , Y10T29/49998 , Y10T279/20
摘要： A spin chuck and a process of operating the same display improved resistance to backsplash by provision of a media collecting ring mounted on the spin chuck. The media collecting ring surrounds a wafer to be processed and includes a radially-inwardly extending upper portion having an obliquely-angled downwardly-facing surface positioned above an upper surface of a wafer held in the device. The device moreover includes a stationary chamber surrounding the spin chuck equipped with at least two superposed collecting baffles. During treatment, liquid collected by the media collecting ring is preferably discharged radially outwardly through a series of holes formed in the ring, so as to pass between a pair of the superposed collecting baffles of the chamber.
摘要翻译：旋转卡盘和操作相同显示器的过程通过提供安装在旋转卡盘上的介质收集环来提高对后挡板的抵抗力。介质收集环围绕要处理的晶片，并且包括径向向内延伸的上部，其具有位于装置中保持的晶片的上表面上方的倾斜向下的面向表面。该装置还包括围绕旋转卡盘的固定室，其配备有至少两个重叠的收集挡板。在处理期间，介质收集环收集的液体优选通过形成在环中的一系列孔径向向外排出，以便在室的一对叠置收集挡板之间通过。

5. 发明申请

WO2012164454A1 METHOD AND APPARATUS FOR LIQUID TREATMENT OF WAFER SHAPED ARTICLES 审中-公开
标题翻译：用于液体处理形状文章的方法和装置
公开(公告)号：WO2012164454A1
公开(公告)日：2012-12-06
申请号：PCT/IB2012/052607
申请日：2012-05-24
申请人： LAM RESEARCH AG , LAM RESEARCH CORPORATION , PUGGL, Michael
发明人： PUGGL, Michael
IPC分类号： H01L21/00
CPC分类号： H01L21/67034 , H01L21/67051 , H01L21/68728
摘要： An apparatus for treating a wafer-shaped article, comprises a spin chuck for holding a wafer-shaped article in a predetermined orientation, at least one upper nozzle for dispensing a treatment fluid onto an upwardly facing surface of a wafer-shaped article when positioned on the spin chuck, and at least one lower nozzle arm comprising a series of lower nozzles extending from a central region of the spin chuck to a peripheral region of the spin chuck. The series of nozzles comprises a smaller nozzle in a central region of the spin chuck and a larger nozzle in a peripheral region of the spin chuck. In the method according to the invention, a heated liquid is supplied through the series of nozzles so as to supply more heat to peripheral regions of a wafer than to central regions.
摘要翻译：一种用于处理晶片状物品的装置，包括用于将晶片状物品保持在预定取向上的旋转卡盘，至少一个上部喷嘴，用于将处理流体分配到晶片状物品的向上的表面上，当位于旋转卡盘和至少一个下喷嘴臂，其包括从旋转卡盘的中心区域延伸到旋转卡盘的周边区域的一系列下部喷嘴。一系列喷嘴包括在旋转卡盘的中心区域中的较小的喷嘴和在旋转卡盘的周边区域中的较大的喷嘴。在根据本发明的方法中，通过一系列喷嘴供应加热的液体，以便向中心区域提供比晶片周边区域更多的热量。

6. 发明申请

WO2011073840A2 DEVICE AND PROCESS FOR LIQUID TREATMENT OF A WAFER SHAPED ARTICLE 审中-公开
标题翻译：一种用于处理晶片形状物品的装置和方法
公开(公告)号：WO2011073840A2
公开(公告)日：2011-06-23
申请号：PCT/IB2010/055550
申请日：2010-12-02
申请人： LAM RESEARCH AG , LAM RESEARCH CORPORATION , FRANK, Dieter , PUGGL, Michael
发明人： FRANK, Dieter , PUGGL, Michael
IPC分类号： H01L21/302
CPC分类号： H01L21/67051 , H01L21/6708 , H01L21/6715 , H01L21/67253 , H01L21/68728 , H01L21/68735
摘要： A spin chuck in an apparatus for single wafer wet processing has structures at its periphery that, in combination with a supported wafer, form a series of annular nozzles that direct flowing gas from a chuck-facing surface of the wafer, around the edge of the wafer, and exhaust the gas away from the non-chuck- facing surface of the wafer, thereby preventing treatment fluid applied to the non-chuck- facing surface from contacting the edge region of the wafer. Retaining pins with enlarged heads engage the wafer edge and prevent it from being displaced upwardly when a high flow rate of gas is utilized.
摘要翻译：在用于单晶片湿法处理的装置中的旋转卡盘在其外围具有结构，该结构与被支撑的晶片结合形成一系列环形喷嘴，该一系列环形喷嘴引导流动气体从面向卡盘的表面该晶片围绕晶片的边缘并且将气体从晶片的非面向卡盘的表面排出，从而防止施加到非面向卡盘的表面的处理流体接触晶片的边缘区域。具有扩大头部的挡销与晶片边缘接合并防止在利用高流率气体时向上移动晶片边缘。

7. 发明申请

WO2012156858A2 DEVICE AND PROCESS FOR LIQUID TREATMENT OF WAFER SHAPED ARTICLES 审中-公开
标题翻译：用于液体处理成形文章的装置和方法
公开(公告)号：WO2012156858A2
公开(公告)日：2012-11-22
申请号：PCT/IB2012/052239
申请日：2012-05-04
申请人： LAM RESEARCH AG , LAM RESEARCH CORPORATION , PUGGL, Michael , AUFEGGER, Christian , HOHENWARTER, Karl-Heinz
发明人： PUGGL, Michael , AUFEGGER, Christian , HOHENWARTER, Karl-Heinz
IPC分类号： B23B31/02 , B23Q7/00
CPC分类号： H01L21/68721 , H01L21/6715 , Y10T29/49998 , Y10T279/20
摘要： A spin chuck and a process of operating the same display improved resistance to backsplash by provision of a media collecting ring mounted on the spin chuck. The media collecting ring surrounds a wafer to be processed and includes a radially-inwardly extending upper portion having an obliquely-angled downwardly-facing surface positioned above an upper surface of a wafer held in the device. The device moreover includes a stationary chamber surrounding the spin chuck equipped with at least two superposed collecting baffles. During treatment, liquid collected by the media collecting ring is preferably discharged radially outwardly through a series of holes formed in the ring, so as to pass between a pair of the superposed collecting baffles of the chamber.
摘要翻译：旋转卡盘和操作相同显示器的过程通过提供安装在旋转卡盘上的介质收集环来提高对后挡板的抵抗力。介质收集环围绕要处理的晶片，并且包括径向向内延伸的上部，其具有位于装置中保持的晶片的上表面上方的倾斜向下的面向表面。该装置还包括围绕旋转卡盘的固定室，其配备有至少两个重叠的收集挡板。在处理期间，介质收集环收集的液体优选通过形成在环中的一系列孔径向向外排出，以便在室的一对叠置收集挡板之间通过。

8. 发明申请

WO2011138706A3 DEVICE FOR HOLDING WAFER SHAPED ARTICLES 审中-公开
公开(公告)号：WO2011138706A3
公开(公告)日：2011-11-10
申请号：PCT/IB2011/051800
申请日：2011-04-26
申请人： LAM RESEARCH AG , LAM RESEARCH CORPORATION , FRANK, Dieter , PUGGL, Michael , FUCHS, Roman , LACH, Otto
发明人： FRANK, Dieter , PUGGL, Michael , FUCHS, Roman , LACH, Otto
IPC分类号： H01L21/687 , H01L21/683
摘要： A spin chuck for holding semiconductor wafers includes one or more damping mechanisms to limit the force with which chuck pins impact the wafer edge following 5 wafer shift. The damping mechanism may be a linear or rotary dashpot. The dashpot or dashpots are mounted on a surface of the chuck body and include a control arm that contacts a common gear ring that in turn drives the chuck pins during radially inward and outward movement.

9. 发明申请

WO2009010394A1 APPARATUS AND METHOD FOR WET TREATMENT OF DISC-LIKE ARTICLES 审中-公开
标题翻译：用于湿润处理类似物品的装置和方法
公开(公告)号：WO2009010394A1
公开(公告)日：2009-01-22
申请号：PCT/EP2008/058568
申请日：2008-07-03
申请人： SEZ AG , PUGGL, Michael , SCHWARZFURTNER, Alexander , FRANK, Dieter
发明人： PUGGL, Michael , SCHWARZFURTNER, Alexander , FRANK, Dieter
IPC分类号： H01L21/00
CPC分类号： H01L21/67051
摘要： Disclosed is an apparatus for wet treatment of a disc-like article, which comprises: a spin chuck for holding and rotating the disc-like article, and an inner edge nozzle dispensing treatment liquid directed towards a first peripheral region of the first surface of the disc-like article, wherein the first surface is facing the spin chuck and the first peripheral region is defined as being a region of the first surface with an inner radius (ri), which is greater than 1 cm less than the disc-like article's radius (ra), wherein the inner edge nozzle is positioned in a stationary manner between the disc-like article (when placed on the spin chuck) and the spin chuck, wherein the inner edge nozzle is feed through a central pipe, which is disposed in a stationary manner and penetrates centrally through the spin chuck, for supplying a treatment liquid against a first surface of the disc-like article.
摘要翻译：公开了一种用于湿处理盘状物品的设备，其包括：用于保持和旋转盘状物品的旋转卡盘，以及分配处理液体的内边缘喷嘴，该处理液朝向第一表面的第一表面的第一周边区域盘状物品，其中第一表面面向旋转卡盘，并且第一周边区域被定义为第一表面的具有内半径（ri）的区域，其比盘状物品的尺寸大1cm 半径（ra），其中所述内边缘喷嘴以静止的方式定位在所述盘状制品（当放置在所述旋转卡盘上）与所述旋转卡盘之间时，所述内边缘喷嘴通过中心管进给，所述中心管被设置以静止的方式穿过旋转卡盘中心地穿过，以将治疗液体提供给盘状物品的第一表面。

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