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    • 5. 发明申请
    • NEW SUNSCREEN COMPOUNDS AND COMPOSITIONS CONTAINING SAME AND METHODS FOR USE THEREOF
    • 新SUNSCREEN化合物及其组合物及其使用方法
    • WO2005062860A2
    • 2005-07-14
    • PCT/US2004/042962
    • 2004-12-20
    • AVON PRODUCTS, INC.GONZALEZ, Anthony, D.PECHKO, Andrew, H.ANDERSON, Glen, T.KALAFSKY, Robert, E.
    • GONZALEZ, Anthony, D.PECHKO, Andrew, H.ANDERSON, Glen, T.KALAFSKY, Robert, E.
    • A61K8/40A61Q17/04
    • A61K8/40A61K2800/52A61Q17/04
    • There is provided a photostable and synergistically enhanced topical sunscreen composition that provides increased substantivity, waterproofness, sweat resistance and rub off resistance. There is further provided methods of enhancing the photostability of a sunscreen active in a topical sunscreen composition, synergistically enhancing the W absorbance of a topical sunscreen composition having a sunscreen active, and enhancing the substantivity, waterproofness, sweat resistance and rub off resistance in a topical sunscreen composition. The preferred compositions and methods have a sunscreen active, a cosmetically acceptable vehicle, and novel 2­ substituted-3,3-diaryl-2-propenoic acid derivatives with [A] a C 16 to C 50 straight or branched chain, substituted or un-substituted, conjugated or non­ conjugated hydrocarbon, or [B] a siloxane, polysiloxane, organo-modified polysiloxane residue, a group represented by the formula R 10 [Si (R 10 ) 2] n- and R 11 which is a silicone residue derived from a silicone represented by the formula R 11 0H having a molecular weight up to about 30,000, wherein each R 10 is independently selected from the group consisting of alkyl, alkoxy, aryl and aryloxy and n is from (1) to about (500).
    • 提供了一种光稳定和协同增强的局部防晒组合物,其提供增强的亲和性,防水性,耐汗性和耐擦性。 还提供了增强局部防晒组合物中防晒活性物质的光稳定性的方法,协同地增强了具有防晒活性的局部防晒组合物的W吸光度,并且增强了局部防晒组合物的亲和性,防水性,耐汗性和耐擦伤性 防晒组成。 优选的组合物和方法具有防晒活性物质,美容上可接受的载体和具有[A] C16至C50直链或支链,取代或未取代的新的2取代-3,3-二芳基-2-丙烯酸衍生物, 共轭或非共轭烃,或[B]硅氧烷,聚硅氧烷,有机改性聚硅氧烷残基,由式R 10 [Si(R 10)2] n - 表示的基团和作为硅氧烷残基的R 11 衍生自分子量高达约30,000的由式R 11 OH表示的硅氧烷,其中每个R 10独立地选自烷基,烷氧基,芳基和芳氧基,n是(1) 到(500)左右。