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    • 9. 发明申请
    • ELECTROCHEMICAL TREATMENT OF SUBSTRATES
    • 基板电化学处理
    • WO2005037425A1
    • 2005-04-28
    • PCT/GB2004/004390
    • 2004-10-15
    • OXFORD GENE TECHNOLOGY IP LIMITEDEGELAND, Ryan, D.
    • EGELAND, Ryan, D.
    • B01J19/00
    • B01J19/0046B01J2219/00317B01J2219/00585B01J2219/00653B01J2219/00659B01J2219/00713B01J2219/00722B01J2219/00725C40B40/06C40B40/10C40B60/14H01L51/56
    • A method of electrochemically treating a substrate is provided comprising the steps of: (a) providing an electrolyte in contact with the substrate; (b) providing a device which faces the substrate and is in contact with the electrolyte, the device having: (i) a common first electrode arranged to define cells therein; and (ii) a plurality of individually addressable second electrodes, wherein a plurality of the cells contain individually addressable second electrodes; and (c) altering the potential of at least one of the second electrodes relative to the common first electrode so that: (i) the common first electrode generates a first redox product; and (ii) the at least one of the second electrodes generate a second redox product which is able to modify a region of the substrate facing the at least one electrodes, wherein the electrolyte is such that the second redox product is quenchable by the first redox product.
    • 提供一种电化学处理基片的方法,包括以下步骤:(a)提供与基底接触的电解质; (b)提供面向衬底并与电解质接触的器件,该器件具有:(i)公共第一电极,其布置成在其中限定电池; 和(ii)多个单独可寻址的第二电极,其中多个单元包含单独可寻址的第二电极; 和(c)相对于公共第一电极改变至少一个第二电极的电位,使得:(i)共同的第一电极产生第一氧化还原产物; 和(ii)所述第二电极中的至少一个产生第二氧化还原产物,其能够修改面向所述至少一个电极的所述衬底的区域,其中所述电解质使得所述第二氧化还原产物可被所述第一氧化还原 产品。