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1. 发明专利

JP2017535914A 検査、テスト、デバッグ、及び表面の改変のための電子ビーム誘導プラズマ（ｅＢＩＰ）の適用审中-公开
公开(公告)号：JP2017535914A
公开(公告)日：2017-11-30
申请号：JP2017515230
申请日：2015-09-17
申请人：オルボテックエルティーディーOrbotech Ltd. , オルボテックエルティーディーOrbotech Ltd. , フォトオンダイナミクスインコーポレイティッドPhoton Dynamics Inc. , フォトオンダイナミクスインコーポレイティッドPhoton Dynamics Inc.
发明人：サレハ，ネダル , スターリン，エンリケ , トエット，ダニエル , グレイザー，アリー , ローウィンジャー，ローネン , クリシュナスワミ，スリラム
IPC分类号： H05H1/24 , A61L2/14 , B01J19/08 , C12N1/06 , G01R31/302 , H01J37/06 , H01J37/18 , H01J37/244 , H01J37/28
CPC分类号： H01J37/32825 , H05H2240/10
摘要：対象デバイスとのノンメカニカルの電気的接触を実現するために、電子ビーム誘導プラズマが用いられる。このプラズマ源は大気プラズマ源として言及され、非常に微細な直径且つ制御可能な特性のプラズマカラムを提供するように構成される。プラズマカラムは、大気に入るプラズマ源と対象デバイスとの間の大気空間を横断し、特徴的な電気信号がデバイスから収集さできるように対象デバイスへの電路として動作する。さらに、プローブは、プラズマカラムへと流れるガスを制御することによって、表面の改変、エッチング、及び堆積に用いられることが可能である。【選択図】図4

2. 发明专利

JP2017502484A 検査、テスト、デバッグ、及び表面の改変のための電子ビーム誘導プラズマプローブの適用审中-公开
标题翻译：检查，测试，调试和电子束诱导等离子体探头的应用用于表面改性
公开(公告)号：JP2017502484A
公开(公告)日：2017-01-19
申请号：JP2016546884
申请日：2014-10-02
申请人：オルボテックエルティーディーOrbotech Ltd. , オルボテックエルティーディーOrbotech Ltd. , フォトオンダイナミクスインコーポレイティッドPhoton Dynamics Inc. , フォトオンダイナミクスインコーポレイティッドPhoton Dynamics Inc.
发明人：サレハ，ネダル , トエット，ダニエル , スターリン，エンリケ , ローウィンジャー，ローネン , クリシュナスワミ，スリラム , グレイザー，アリー
IPC分类号： H05H1/24 , G01R31/302 , H01J37/06 , H01J37/18 , H01J37/28 , H01L21/66
CPC分类号： G01N27/70 , G01R31/305 , H01J33/00 , H01J37/3233 , H01J37/32449 , H01J37/32825 , H01J2237/063 , H01J2237/164 , H01J2237/188 , H01J2237/317 , H05H2240/10 , H05H2245/123
摘要：対象デバイスとのノンメカニカルの電気的接触を実現するために、電子ビーム誘導プラズマが用いられる。このプラズマ源は大気プラズマ源として言及され、非常に微細な直径且つ制御可能な特性のプラズマカラムを提供するように構成される。プラズマカラムは、大気に入るプラズマ源と対象デバイスとの間の大気空間を横断し、特徴的な電気信号がデバイスから収集されることができるように対象デバイスへの電路として動作する。さらに、プローブは、プラズマカラムへと流れるガスを制御することによって、表面の改変、エッチング、及び堆積に用いられることが可能である。【選択図】図11
摘要翻译：为了实现与目标设备非机械电接触中，使用电子束诱导等离子体。等离子体源被称为空气等离子体源被配置为提供非常细的直径和可控性质的等离子体柱。越过等离子体源和目标设备到大气之间的空气间隔等离子体柱，特征电信号作为对目标设备的路径操作，使得它可以从设备收集。此外，探针，通过控制流入到等离子体柱的气体，该表面的变形例，可以使用蚀刻，和沉积。 .The 11

3. 发明公开

KR20180030609A LIFT 토출 각도의 제어 审中-公开
标题翻译：控制LIFT卸料角度
公开(公告)号：KR20180030609A
公开(公告)日：2018-03-23
申请号：KR20187003945
申请日：2016-06-07
申请人： ORBOTECH LTD
发明人： ZENOU MICHAEL , KOTLER ZVI
IPC分类号： C23C14/28 , B23K26/064 , B23K26/067 , B23K26/57 , C23C14/54
CPC分类号： B23K26/064 , B23K26/067 , B23K26/57 , C23C14/225 , C23C14/28
摘要： 억셉터(acceptor) 표면상에재료증착을위한장치는대향하는제1 표면및 제2 표면, 및제2 표면상의도너필름을가지는투명한도너기판을포함한다. 장치는부가적으로광학어셈블리를포함하고, 광학어셈블리는, 억셉터표면상으로, 제2 표면상의위치에서제2 표면에수직이아닌각도로도너필름으로부터용융된재료의액적들의토출을유도하기위해, 방사선의빔이도너기판의제1 표면을통과하고제2 표면상의위치에서도너필름상에충돌하게하도록구성된다.
摘要翻译：用于在受体表面上沉积材料的设备包括具有相对的第一和第二表面的透明供体基底和在第二基底表面上的供体膜。该设备另外包括光学组件，用于在不与第二表面上的位置垂直的角度下引导熔融材料液滴从供体膜的喷射，使得辐射束穿过供体基底的第一表面并且甚至在第二表面上的位置处撞击在膜上。

4. 发明专利

JP2008040481A Plotting image on thin material having variation in thickness 审中-公开
标题翻译：在厚度变化的薄材料上绘制图像
公开(公告)号：JP2008040481A
公开(公告)日：2008-02-21
申请号：JP2007168008
申请日：2007-06-26
申请人： Orbotech Ltd , オーボテックリミテッド
发明人： GANOT AMNON , HANINA GOLAN
IPC分类号： G03F7/20 , B41J2/44 , B41J2/45 , B41J2/455
CPC分类号： B41J25/304 , B41J2/435 , G03F7/24 , H05K3/0082 , H05K2201/0191 , H05K2203/163
摘要： PROBLEM TO BE SOLVED: To provide a system and a corresponding method for plotting an image on a thin material having variations in thickness. SOLUTION: The system 40 includes a plotter unit 46 for plotting the image on a surface 48 of a thin material 42; a control unit 50 for controlling the plotter unit 46 for plotting; and a thickness measuring device 52 for measuring thickness 44 of the thin material 42. The control unit 50 receives measured thickness values from the thickness measuring device 52 and uses the measured thickness values for adjusting plotting of the image via the plotter unit 46 to compensate for variations in thickness 44 of the thin material 42. COPYRIGHT: (C)2008,JPO&INPIT
摘要翻译：要解决的问题：提供一种用于在具有厚度变化的薄材料上绘制图像的系统和相应方法。解决方案：系统40包括用于在薄材料42的表面48上绘制图像的绘图仪单元46; 用于控制绘图仪单元46进行绘图的控制单元50; 以及用于测量薄材料42的厚度44的厚度测量装置52.控制单元50从厚度测量装置52接收测量的厚度值，并使用测量的厚度值来调整通过绘图仪单元46绘制图像以补偿薄材料厚度44的变化。版权所有（C）2008，JPO＆INPIT

5. 发明专利

JP2004279244A Pattern inspection device 有权
公开(公告)号：JP2004279244A
公开(公告)日：2004-10-07
申请号：JP2003071791
申请日：2003-03-17
申请人： Orbotech Ltd , オルボテックリミテッド
发明人： SAPHIER OFER , YAMAMOTO SHIGERU
IPC分类号： G01B11/00 , G01N21/956 , G06T7/00 , H01L21/66
CPC分类号： G01N21/956
摘要： PROBLEM TO BE SOLVED: To provide the pattern inspection device capable of making it possible to measure the location gap of the local pattern possessing the same sensitivity as the conventional diffracted light observation, based on the images taken by a camera under the specified conditions.
SOLUTION: It possesses the camera 20 and the image processing unit 30 equipped with the storage means 32 to memorize beforehand the feature points in the image according to the sort of the substrate to be inspected; the image feature location measuring means 33 to measure the feature points in the images as the image feature location in lower accuracy than the image resolution, in comparison with the pixel values of the surrounding two or more pixels in the location of the feature points in the image taken by the above camera according to the sort memorized in the above memory means; the generating means 34 to estimate the location considering the location of the feature point as the estimated location based on the pattern repetition period; and the error detection means 35 to detect the difference between the above measuring position and the above estimated position considered as the location error information on the above patterns. It is inspected whether the above repetition pattern is good or bad, based on the difference between the above measuring position and the above estimated position.
COPYRIGHT: (C)2005,JPO&NCIPI

6. 发明专利

JPH06317772A LASER DISPLAY DEVICE 失效
公开(公告)号：JPH06317772A
公开(公告)日：1994-11-15
申请号：JP11044593
申请日：1993-05-12
申请人： ORBOTECH LTD
发明人： EIBURAHAMU GUROSU
IPC分类号： G02F1/11 , G02F1/33 , H04N1/036 , H04N1/19
摘要： PURPOSE: To provide a laser display device capable of solving problems included in conventional technique and having improved characteristics. CONSTITUTION: The laser display device consists of at least one laser beam source 10, a multiple channel acoustic modulator 20 for regulating modulation areas at least partially overlapped, a means for expanding at least one laser beam 18 from the source 10 over at least two modulation areas at least partially overlapped through the modulator 20 and an image forming means for directing a beam from the modulator 20 to a laser display image board.

7. 发明专利

JP2008207247A Multi-beam micro-machining system and method 有权
标题翻译：多光束微加工系统及方法
公开(公告)号：JP2008207247A
公开(公告)日：2008-09-11
申请号：JP2008038177
申请日：2008-02-20
申请人： Orbotech Ltd , オーボテックリミテッド
发明人： LIPMAN ELIEZER , KOTLER ZVI , GROSS ABRAHAM
IPC分类号： G02B26/08 , B23K26/04 , B23K26/06 , B23K26/073 , B23K26/14 , B23K26/38 , B23K26/382 , B23K26/402 , B23K101/42 , G02B27/14 , G02F1/33 , H01S3/00 , H01S3/11 , H05K3/00
CPC分类号： B23K26/073 , B23K26/067 , B23K26/0676 , B23K26/082 , B23K26/382 , B23K26/40 , B23K2201/42 , B23K2203/16 , B23K2203/42 , B23K2203/50 , G02B26/0833 , G02B27/106 , G02B27/143 , G02B27/145 , H01S3/005 , H05K3/0026
摘要： PROBLEM TO BE SOLVED: To provide a multi-beam micro-machining system and method. SOLUTION: A system for delivering energy to a substrate 14 includes a dynamically directable source 20 of radiant energy providing a plurality of beams of radiation, each propagating in a dynamically selectable direction. Independently positionable beam steering elements 54 in a plurality of beam steering elements 54 are operative to receive the beams and direct them to selectable locations on the substrate. COPYRIGHT: (C)2008,JPO&INPIT
摘要翻译：要解决的问题：提供多光束微加工系统和方法。解决方案：用于将能量传递到基板14的系统包括能够提供多个辐射束的可动态定向的辐射能源20，每个辐射束均以动态选择的方向传播。多个光束操纵元件54中的独立定位的光束操纵元件54可操作以接收光束并将它们引导到基板上的可选位置。版权所有（C）2008，JPO＆INPIT

8. 发明专利

JPH07164364A VACUUM SUCKING AND RETAINING DEVICE PARTICULARLY USEFUL AS VACUUM SUCTION CUP 失效
公开(公告)号：JPH07164364A
公开(公告)日：1995-06-27
申请号：JP29661393
申请日：1993-11-26
申请人： ORBOTECH LTD
发明人： YOSHIE KURAINMAN
IPC分类号： B25J15/06 , B25B11/00
摘要： PURPOSE: To solve the trouble of consumption of sucking force in a sucking opening not covered with an article in holding a small article by dividing the vacuum chamber of a vacuum holding device into a plurality of mutually communicating vacuum chambers covered with a partitioning member with control passageways. CONSTITUTION: In a vacuum holding device effective for receiving and holding an article such as printed circuit board PCB, a vacuum chamber is divided into of a plurality of suction openings 61 innumerably bored in a surface plate body 6 and a plurality of mutually communicating vacuum chambers 21 mutually communicating through a control passageway 31. This device further comprises a plate member 5 having a valve member 51 for each control passageway 31 integrally formed with an elastic connecting part nipped between the surface plate body 6 and a space holding member 4, and the valve member 51 is regularly pressed to open the corresponding control passageway 31 to permit the application of suction force to the suction opening 61. When the suction opening 61 is not covered with the article to be held, the corresponding valve member 5 is displaced by the sucking force to block the corresponding control passageway 31.

9. 发明专利

JP2009194016A Apparatus for inspecting semiconductor substrate 有权
标题翻译：检查半导体基板的装置
公开(公告)号：JP2009194016A
公开(公告)日：2009-08-27
申请号：JP2008030468
申请日：2008-02-12
申请人： Orbotech Ltd , オルボテックリミテッド
发明人： YAMAMOTO SHIGERU
IPC分类号： H01L31/04
CPC分类号： Y02E10/50
摘要： PROBLEM TO BE SOLVED: To provide an apparatus for inspecting a semiconductor substrate which detects an extremely precise defective occurrence position in microns through a combination of optical inspection and electrical inspection on a semiconductor substrate, and has a defective correcting mechanism capable of carrying out effective correction with a minimum area to be separated in combination with a correcting mechanism.
SOLUTION: The apparatus for inspecting the semiconductor substrate includes a scanning drive mechanism which places the semiconductor substrate on an inspection stage to scan the semiconductor substrate through a drive unit, an illuminating device which illuminates an illumination area of the semiconductor substrate, an optical detecting means which detects an optical defect based on image data of the illumination area, a position detecting means which detects the position of the illumination area to output position information, a voltage detecting means which detects voltage based on a photovoltaic force of the semiconductor substrate, and a defective determining means which determines a defect type by combining a defective position detected by the optical detecting means with a voltage change measured by the voltage detecting means.
COPYRIGHT: (C)2009,JPO&INPIT
摘要翻译：要解决的问题：提供一种用于检查半导体衬底的装置，其通过在半导体衬底上的光学检查和电气检查的组合来检测以微米为单位的极精确的缺陷发生位置，并且具有能够承载的缺陷校正机构有效校正，最小面积与校正机构相结合。解决方案：用于检查半导体衬底的装置包括扫描驱动机构，其将半导体衬底放置在检查台上以通过驱动单元扫描半导体衬底，照明装置照亮半导体衬底的照明区域，基于照明区域的图像数据检测光学缺陷的光学检测装置，检测照射区域的位置以输出位置信息的位置检测装置，检测基于半导体基板的光电压的电压的电压检测装置以及有缺陷的确定装置，其通过将由光学检测装置检测的缺陷位置与由电压检测装置测量的电压变化组合来确定缺陷类型。版权所有（C）2009，JPO＆INPIT

10. 发明专利

JP2008116930A Linear light concentrator 有权
标题翻译：线性光集中器
公开(公告)号：JP2008116930A
公开(公告)日：2008-05-22
申请号：JP2007265406
申请日：2007-10-11
申请人： Orbotech Ltd , オルボテックリミテッド
发明人： KATZIR YIGAL , MEIMOUN ELIE
IPC分类号： G02B5/08 , G02B17/00
CPC分类号： G02B19/0066 , G01N21/8806 , G01N2021/95638 , G02B19/0028 , H04N1/02855 , H04N1/02865
摘要： PROBLEM TO BE SOLVED: To concentrate light from a multidirectional light source onto a linear target region. SOLUTION: An optical element includes a non-circularly-symmetrical unitary part 36 of an optically-transmissive material, wherein the part has at least first and second surfaces for concentrating light from the light source onto the linear target region 26, at least one of the first and second surfaces is curved, a first portion of the light is concentrated onto the linear target region 26 by reflection from the first surface and a second portion of the light is concentrated onto the linear target region 26 by refraction at the second surface. COPYRIGHT: (C)2008,JPO&INPIT
摘要翻译：要解决的问题：将来自多方向光源的光聚焦到线性目标区域上。解决方案：光学元件包括光学透射材料的非圆形对称单体部分36，其中该部分具有至少第一和第二表面，用于将来自光源的光聚焦到线性目标区域26上，在第一和第二表面中的至少一个是弯曲的，光的第一部分通过来自第一表面的反射而集中在线性目标区域26上，并且第二部分的光通过折射在集束在线性目标区域26上第二面。版权所有（C）2008，JPO＆INPIT

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