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1. 发明申请

US20090081852A1 HOLDING JIG, SEMICONDUCTOR WAFER GRINDING METHOD, SEMICONDUCTOR WAFER PROTECTING STRUCTURE AND SEMICONDUCTOR WAFER GRINDING METHOD AND SEMICONDUCTOR CHIP FABRICATION METHOD USING THE STRUCTURE 有权
标题翻译：控制晶圆，半导体晶粒磨削方法，半导体晶体保护结构和半导体晶粒研磨方法及半导体芯片制造方法
公开(公告)号：US20090081852A1
公开(公告)日：2009-03-26
申请号：US12282984
申请日：2007-03-09
申请人： Kiyofumi Tanaka , Satoshi Odashima , Noriyoshi Hosono , Hironobu Fujimoto , Takeshi Segawa
发明人： Kiyofumi Tanaka , Satoshi Odashima , Noriyoshi Hosono , Hironobu Fujimoto , Takeshi Segawa
IPC分类号： H01L21/304 , B24B41/06
CPC分类号： H01L21/6875 , B24B37/042 , B24B41/061 , B65G49/061 , B65G2249/045 , Y10T428/24322
摘要： A backgrinding machine 10 of a semiconductor wafer W includes: a table 13 set on the working plane of a mount 11; a multiple number of holding jigs 20 arranged via check tables 15 on table 13; a grinding machine 30 for performing a grinding process of the rear side of semiconductor wafer W held by holding jig 20; and a washing device 40 for ground semiconductor wafers W. Each holding jig 20 is constructed of a concave 22 depressed on the surface of a base plate 21, a multiple number of supporting projections 23 projectively arrayed on the bottom surface of concave 22, a deformable contact film 24, covering the concave 22, being supported by the multiple supporting projections 23, for detachably holding semiconductor wafer W in close contact with it; and an exhaust path 25 for conducting air from the concave 22 covered by contact film 24 to the outside.
摘要翻译：半导体晶片W的背面研磨机10包括：设置在安装件11的工作面上的工作台13; 通过表13上的检查台15布置多个保持夹具20; 用于进行通过保持夹具20保持的半导体晶片W的后侧的研磨处理的研磨机30; 以及用于接地半导体晶片W的洗涤装置40.每个保持夹具20由在基板21的表面上凹陷的凹部22构成，多个支撑突起23投影地排列在凹部22的底面上，接触膜24，覆盖凹部22，由多个支撑突起23支撑，用于可拆卸地保持半导体晶片W与其紧密接触; 以及用于将空气从由接触膜24覆盖的凹部22引导到外部的排气路径25。

2. 发明授权

US07875501B2 Holding jig, semiconductor wafer grinding method, semiconductor wafer protecting structure and semiconductor wafer grinding method and semiconductor chip fabrication method using the structure 有权
标题翻译：保持夹具，半导体晶片研磨方法，半导体晶片保护结构和半导体晶片研磨方法以及使用该结构的半导体芯片制造方法
公开(公告)号：US07875501B2
公开(公告)日：2011-01-25
申请号：US12282984
申请日：2007-03-09
申请人： Kiyofumi Tanaka , Satoshi Odashima , Noriyoshi Hosono , Hironobu Fujimoto , Takeshi Segawa
发明人： Kiyofumi Tanaka , Satoshi Odashima , Noriyoshi Hosono , Hironobu Fujimoto , Takeshi Segawa
IPC分类号： H01L21/44 , H01L21/48 , H01L21/50
CPC分类号： H01L21/6875 , B24B37/042 , B24B41/061 , B65G49/061 , B65G2249/045 , Y10T428/24322
摘要： A backgrinding machine 10 of a semiconductor wafer W includes: a table 13 set on the working plane of a mount 11; a multiple number of holding jigs 20 arranged via check tables 15 on table 13; a grinding machine 30 for performing a grinding process of the rear side of semiconductor wafer W held by holding jig 20; and a washing device 40 for ground semiconductor wafers W. Each holding jig 20 is constructed of a concave 22 depressed on the surface of a base plate 21, a multiple number of supporting projections 23 projectively arrayed on the bottom surface of concave 22, a deformable contact film 24, covering the concave 22, being supported by the multiple supporting projections 23, for detachably holding semiconductor wafer W in close contact with it; and an exhaust path 25 for conducting air from the concave 22 covered by contact film 24 to the outside.
摘要翻译：半导体晶片W的背面研磨机10包括：设置在安装件11的工作面上的工作台13; 通过表13上的检查台15布置多个保持夹具20; 用于进行通过保持夹具20保持的半导体晶片W的后侧的研磨处理的研磨机30; 以及用于接地半导体晶片W的洗涤装置40.每个保持夹具20由在基板21的表面上凹陷的凹部22构成，多个支撑突起23投影地排列在凹部22的底面上，接触膜24，覆盖凹部22，由多个支撑突起23支撑，用于可拆卸地保持半导体晶片W与其紧密接触; 以及用于将空气从由接触膜24覆盖的凹部22引导到外部的排气路径25。

3. 发明申请

US20060243620A1 Fixing carrier, fixing carrier manufacturing method, method of using fixing carriers and substrate storage container 审中-公开
标题翻译：固定载体，固定载体制造方法，使用固定载体和基材储存容器的方法
公开(公告)号：US20060243620A1
公开(公告)日：2006-11-02
申请号：US11342704
申请日：2006-01-31
申请人： Satoshi Odashima , Noriyoshi Hosono
发明人： Satoshi Odashima , Noriyoshi Hosono
IPC分类号： B65D85/00
CPC分类号： H01L21/67346 , H01L21/67383 , H01L21/67393
摘要： An object is to provide a fixing carrier, a fixing carrier manufacturing method, a method of using the fixing carrier and a substrate storage container, which provide proper shipment of items to be loaded that are prone to warp and crack. A base 2 having rigidity is hollowed on its surface and formed with a sectioned space 3 laminated and covered by a supporting layer 8 that supports semiconductor wafer W, multiple projections 4 that are formed in the sectioned space and supports supporting layer 8 in contact therewith and an exhaust passage 6 that is bored through base 2 and draws air out of sectioned space 3 covered by supporting layer 8. Since semiconductor wafer W that is prone to warp and crack is supported by supporting layer 8 of a fixing carrier 1 and accommodated in the container body of a substrate storage container, instead of being kept directly in the container, so it is possible to achieve safe and proper shipment between factories.
摘要翻译：本发明的目的是提供一种固定载体，固定载体制造方法，使用固定载体和基材储存容器的方法，其提供容易发生翘曲和裂纹的待加载物品的正确运输。具有刚性的基座2在其表面上是中空的，并且形成有由支撑半导体晶片W的支撑层8层叠并覆盖的截面空间3，多个突起4形成在截面空间中并支撑与其接触的支撑层8，排气通道6，其穿过底座2，并将空气抽出由支撑层8覆盖的截面空间3中。由于容易翘曲和裂纹的半导体晶片W由固定载体1的支撑层8支撑并容纳在容器体的基材储存容器，而不是直接保存在容器中，因此可以在工厂之间实现安全合适的运输。

4. 发明授权

US08212345B2 Holding jig, semiconductor wafer grinding method, semiconductor wafer protecting structure and semiconductor wafer grinding method and semiconductor chip fabrication method using the structure 有权
标题翻译：保持夹具，半导体晶片研磨方法，半导体晶片保护结构和半导体晶片研磨方法以及使用该结构的半导体芯片制造方法
公开(公告)号：US08212345B2
公开(公告)日：2012-07-03
申请号：US12945078
申请日：2010-11-12
申请人： Kiyofumi Tanaka , Satoshi Odashima , Noriyoshi Hosono , Hironobu Fujimoto , Takeshi Segawa
发明人： Kiyofumi Tanaka , Satoshi Odashima , Noriyoshi Hosono , Hironobu Fujimoto , Takeshi Segawa
IPC分类号： H01L23/02
CPC分类号： H01L21/6875 , B24B37/042 , B24B41/061 , B65G49/061 , B65G2249/045 , Y10T428/24322
摘要： A backgrinding machine 10 of a semiconductor wafer W includes: a table 13 set on the working plane of a mount 11; a multiple number of holding jigs 20 arranged via check tables 15 on table 13; a grinding machine 30 for performing a grinding process of the rear side of semiconductor wafer W held by holding jig 20; and a washing device 40 for ground semiconductor wafers W. Each holding jig 20 is constructed of a concave 22 depressed on the surface of a base plate 21, a multiple number of supporting projections 23 projectively arrayed on the bottom surface of concave 22, a deformable contact film 24, covering the concave 22, being supported by the multiple supporting projections 23, for detachably holding semiconductor wafer W in close contact with it; and an exhaust path 25 for conducting air from the concave 22 covered by contact film 24 to the outside.
摘要翻译：半导体晶片W的背面研磨机10包括：设置在安装件11的工作面上的工作台13; 通过表13上的检查台15布置多个保持夹具20; 用于进行通过保持夹具20保持的半导体晶片W的后侧的研磨处理的研磨机30; 以及用于接地半导体晶片W的洗涤装置40.每个保持夹具20由在基板21的表面上凹陷的凹部22构成，多个支撑突起23投影地排列在凹部22的底面上，接触膜24，覆盖凹部22，由多个支撑突起23支撑，用于可拆卸地保持半导体晶片W与其紧密接触; 以及用于将空气从由接触膜24覆盖的凹部22引导到外部的排气路径25。

5. 发明申请

US20110281509A1 HOLDING JIG, SEMICONDUCTOR WAFER GRINDING METHOD, SEMICONDUCTOR WAFER PROTECTING STRUCTURE AND SEMICONDUCTOR WAFER GRINDING METHOD AND SEMICONDUCTOR CHIP FABRICATION METHOD USING THE STRUCTURE 有权
标题翻译：控制晶圆，半导体晶粒磨削方法，半导体晶体保护结构和半导体晶粒研磨方法及半导体芯片制造方法
公开(公告)号：US20110281509A1
公开(公告)日：2011-11-17
申请号：US12945078
申请日：2010-11-12
申请人： KIYOFUMI TANAKA , Satoshi Odashima , Noriyoshi Hosono , Hironobu Fujimoto , Takeshi Segawa
发明人： KIYOFUMI TANAKA , Satoshi Odashima , Noriyoshi Hosono , Hironobu Fujimoto , Takeshi Segawa
IPC分类号： H01L21/304 , B24B41/06
CPC分类号： H01L21/6875 , B24B37/042 , B24B41/061 , B65G49/061 , B65G2249/045 , Y10T428/24322
摘要： A backgrinding machine 10 of a semiconductor wafer W includes: a table 13 set on the working plane of a mount 11; a multiple number of holding jigs 20 arranged via check tables 15 on table 13; a grinding machine 30 for performing a grinding process of the rear side of semiconductor wafer W held by holding jig 20; and a washing device 40 for ground semiconductor wafers W. Each holding jig 20 is constructed of a concave 22 depressed on the surface of a base plate 21, a multiple number of supporting projections 23 projectively arrayed on the bottom surface of concave 22, a deformable contact film 24, covering the concave 22, being supported by the multiple supporting projections 23, for detachably holding semiconductor wafer W in close contact with it; and an exhaust path 25 for conducting air from the concave 22 covered by contact film 24 to the outside.
摘要翻译：半导体晶片W的背面研磨机10包括：设置在安装件11的工作面上的工作台13; 通过表13上的检查台15布置多个保持夹具20; 用于进行通过保持夹具20保持的半导体晶片W的后侧的研磨处理的研磨机30; 以及用于接地半导体晶片W的洗涤装置40.每个保持夹具20由在基板21的表面上凹陷的凹部22构成，多个支撑突起23投影地排列在凹部22的底面上，接触膜24，覆盖凹部22，由多个支撑突起23支撑，用于可拆卸地保持半导体晶片W与其紧密接触; 以及用于将空气从由接触膜24覆盖的凹部22引导到外部的排气路径25。

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