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    • 2. 发明授权
    • Scanning probe apparatus
    • 扫描探针装置
    • US07765606B2
    • 2010-07-27
    • US11627845
    • 2007-01-26
    • Takao KusakaNobuki YoshimatsuSusumu YasudaJunichi Seki
    • Takao KusakaNobuki YoshimatsuSusumu YasudaJunichi Seki
    • G01N23/00
    • G01Q70/04G01Q10/04
    • A scanning probe apparatus for obtaining information of a sample, recording information in the sample, or processing the sample with relative movement between the sample and the apparatus, the apparatus is constituted by a probe; and a scanning stage including a drive element for moving a sample holding table for holding the sample and a movable portion movable in a direction in which an inertial force generated during movement of the sample holding table is cancelled. The scanning stage further includes a memory for storing characteristic information of the scanning stage and is detachably or replaceably mountable to a main assembly of the apparatus.
    • 一种扫描探针装置,用于获取样本的信息,在样本中记录信息,或者在样本与装置之间相对移动来处理样本,该装置由探针构成; 以及扫描台,其包括用于移动用于保持样品的样品保持台的驱动元件和可移除在样品保持台移动期间产生的惯性力的方向的可移动部分。 扫描阶段还包括用于存储扫描台的特征信息的存储器,并且可拆卸地或可替换地安装到装置的主组件。
    • 3. 发明申请
    • NANO STRUCTURE AND MANUFACTURING METHOD OF NANO STRUCTURE
    • 纳米结构的纳米结构与制造方法
    • US20090315153A1
    • 2009-12-24
    • US12109701
    • 2008-04-25
    • Taiko MotoiKenji TamamoriShinan WangMasahiko OkunukiHaruhito OnoToshiaki AibaNobuki Yoshimatsu
    • Taiko MotoiKenji TamamoriShinan WangMasahiko OkunukiHaruhito OnoToshiaki AibaNobuki Yoshimatsu
    • H01L29/06H01L21/302
    • B82Y10/00H01L21/3083H01L21/31144
    • To provide a method of manufacturing a nano structure having a pattern of 2 μm or more in depth formed on the surface of a substrate containing Si and a nano structure having a pattern of a high aspect and nano order. A nano structure having a pattern of 2 μm or more in depth formed on the surface of a substrate containing Si, wherein the nano structure is configured to contain Ga or In on the surface of the pattern, and has the maximum value of the concentration of the Ga or the In positioned within 50 nm of the surface of the pattern in the depth direction of the substrate. Further, its manufacturing method is configured such that the surface of the substrate containing Si is irradiated with a focused Ga ion or In ion beam, and the Ga ions or the In ions are injected, while sputtering away the surface of the substrate, and a layer containing Ga or In is formed on the surface of the substrate, and with this layer taken as an etching mask, a dry etching is performed.
    • 本发明提供一种制造具有深度形成在2μm以上的图案的纳米结构体的方法,该方法形成在含有Si的衬底和具有高方面和纳米级的图案的纳米结构的表面上。 在包含Si的基板的表面上形成深度为2μm或更大的图案的纳米结构,其中纳米结构被配置为在图案的表面上含有Ga或In,并且具有 Ga或In位于衬底的深度方向上图案表面的50nm以内。 此外,其制造方法被配置为使得包含Si的衬底的表面被照射聚焦的Ga离子或In离子束,并且注入Ga离子或In离子,同时溅射离开衬底的表面,并且 在基板的表面上形成含有Ga或In的层,将该层作为蚀刻掩模进行干法蚀刻。
    • 9. 发明申请
    • DRIVE STAGE FOR SCANNING PROBE APPARATUS, AND SCANNING PROBE APPARATUS
    • 扫描探针设备的驱动级和扫描探测器
    • US20070267580A1
    • 2007-11-22
    • US11747581
    • 2007-05-11
    • Susumu YasudaJunichi SekiTakao KusakaNobuki Yoshimatsu
    • Susumu YasudaJunichi SekiTakao KusakaNobuki Yoshimatsu
    • G21K5/10
    • G01Q70/04G01Q10/04
    • A drive stage for a scanning probe apparatus includes a supporting member, a plurality of movable portions fixed to the supporting member, and a plurality of drive elements configured and positioned to drive the plurality of movable portions. The drive stage is driven in a direction in which inertial forces of the plurality of movable portions are mutually canceled during drive of the plurality of drive elements. The drive stage further includes an inertial force difference detection member configured and positioned to detect a difference in inertial force between the plurality of movable portions, and an inertial force adjustment member configured and positioned to effect inertial force adjustment so that the difference in inertial force between the plurality of movable portions is decreased on the basis of a detection output of the inertial force detection member.
    • 用于扫描探针装置的驱动台包括支撑构件,固定到支撑构件的多个可移动部分,以及构造和定位以驱动多个可移动部分的多个驱动元件。 在多个驱动元件的驱动期间,驱动级被驱动在多个可动部的惯性力相互抵消的方向上。 驱动平台还包括惯性力差检测构件,其构造和定位成检测多个可移动部分之间的惯性力差,以及惯性力调节构件,其构造和定位成实现惯性力调节,使得惯性力差 多个可动部根据惯性力检测部件的检测输出而减少。