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1. 发明授权

US08038833B2 Plasma processing apparatus 有权
标题翻译：等离子体处理装置
公开(公告)号：US08038833B2
公开(公告)日：2011-10-18
申请号：US12506838
申请日：2009-07-21
申请人： Satoshi Maebashi , Toshihiro Hayami , Naoyuki Umehara
发明人： Satoshi Maebashi , Toshihiro Hayami , Naoyuki Umehara
IPC分类号： H01L21/00 , C23C14/00 , C23C16/00
CPC分类号： H01J37/32174 , H01J37/32082 , H01J37/32935
摘要： In a plasma processing apparatus, a member for propagating high frequency from a high frequency power supply and/or to which the high frequency is applied. A power feed rod is electromagnetically shielded between a matching unit and a bottom plate of a chamber by a coaxial cylindrical conductor connected to a ground potential. A surface potential system disposed in an appropriate distance from the power feed rod in radius direction is installed in the cylindrical conductor, and measures in a non-contact state the electrostatic surface potential of the power feed rod through electrostatic capacitance and provides a controller with a surface potential detection signal including surface potential measurement value information. The controller performs a required signal processing or operation processing on the basis of the surface potential detection signal from the surface potential system, thereby obtaining the measurement value of the DC potential on the power feed rod.
摘要翻译：在等离子体处理装置中，用于从高频电源传播高频的部件和/或施加高频电源的部件。馈电杆通过连接到地电位的同轴圆柱形导体电磁屏蔽在腔室的匹配单元和底板之间。在圆柱形导体中安装了一个距离供电杆适当距离设置的表面电位系统，并且在非接触状态下测量供电棒的静电表面电位通过静电电容，并向控制器提供一个表面电位检测信号包括表面电位测量值信息。控制器基于来自表面电位系统的表面电位检测信号进行所需的信号处理或操作处理，从而获得供电棒上的直流电位的测量值。

2. 发明申请

US20050070174A1 Electrical joint forming member and plasma processing apparatus 有权
标题翻译：电接头成形构件和等离子体处理装置
公开(公告)号：US20050070174A1
公开(公告)日：2005-03-31
申请号：US10951884
申请日：2004-09-29
申请人： Toshihiro Hayami , Naoyuki Umehara , Tsuyoshi Hasegawa
发明人： Toshihiro Hayami , Naoyuki Umehara , Tsuyoshi Hasegawa
IPC分类号： H01L21/3065 , H01L21/00 , H01R13/03 , H01R13/24 , H01R13/33
CPC分类号： H01R13/2407 , H01L21/67069 , H01R13/03
摘要： An electrical joint forming member is held between adjacent conductive members included in a semiconductor device fabricating apparatus to reduce electrical resistance between those conductive members. The electrical joint forming member includes an elastic member made of a titanium sheet (75 μm thick, 2 mm wide) and having a surface covered with an aluminum layer (7 μm thick), the aluminum layer being formed by joining an aluminum sheet to the surface of the titanium sheet by cold-roll bonding.
摘要翻译：电接头形成构件被保持在包括在半导体器件制造装置中的相邻导电构件之间以减小这些导电构件之间的电阻。电接头形成构件包括由钛片（厚度为75μm，宽2mm）并且具有被覆盖有铝层（7μm厚）的表面的弹性构件），铝层通过将铝片接合到钛板的表面通过冷轧粘合。

3. 发明授权

US07008275B2 Electrical joint forming member and plasma processing apparatus 有权
标题翻译：电接头成形构件和等离子体处理装置
公开(公告)号：US07008275B2
公开(公告)日：2006-03-07
申请号：US10951884
申请日：2004-09-29
申请人： Toshihiro Hayami , Naoyuki Umehara , Tsuyoshi Hasegawa
发明人： Toshihiro Hayami , Naoyuki Umehara , Tsuyoshi Hasegawa
IPC分类号： H01R13/02
CPC分类号： H01R13/2407 , H01L21/67069 , H01R13/03
摘要： An electrical joint forming member is held between adjacent conductive members included in a semiconductor device fabricating apparatus to reduce electrical resistance between those conductive members. The electrical joint forming member includes an elastic member made of a titanium sheet (75 μm thick, 2 mm wide) and having a surface covered with an aluminum layer (7 μm thick), the aluminum layer being formed by joining an aluminum sheet to the surface of the titanium sheet by cold-roll bonding.
摘要翻译：电接头形成构件被保持在包括在半导体器件制造装置中的相邻导电构件之间以减小这些导电构件之间的电阻。电接头形成部件包括由钛片（厚度为75μm，宽2mm）并且具有被覆盖有铝层（7μm厚）的表面的弹性部件），铝层通过将铝片接合到钛板的表面通过冷轧粘合。

4. 发明申请

US20050095732A1 Plasma processing apparatus and method and apparatus for measuring DC potential 审中-公开
标题翻译：用于测量直流电位的等离子体处理装置及方法和装置
公开(公告)号：US20050095732A1
公开(公告)日：2005-05-05
申请号：US10933422
申请日：2004-09-03
申请人： Satoshi Maebashi , Toshihiro Hayami , Naoyuki Umehara
发明人： Satoshi Maebashi , Toshihiro Hayami , Naoyuki Umehara
IPC分类号： H05H1/00 , H01J37/32 , H01L21/3065 , H01L21/66 , H05H1/46
CPC分类号： H01J37/32174 , H01J37/32082 , H01J37/32935
摘要： In a plasma processing apparatus, a member for propagating high frequency from a high frequency power supply and/or to which the high frequency is applied. A power feed rod is electromagnetically shielded between a matching unit and a bottom plate of a chamber by a coaxial cylindrical conductor connected to a ground potential. A surface potential system disposed in an appropriate distance from the power feed rod in radius direction is installed in the cylindrical conductor, and measures in a non-contact state the electrostatic surface potential of the power feed rod through electrostatic capacitance and provides a controller with a surface potential detection signal including surface potential measurement value information. The controller performs a required signal processing or operation processing on the basis of the surface potential detection signal from the surface potential system, thereby obtaining the measurement value of the DC potential on the power feed rod.
摘要翻译：在等离子体处理装置中，用于从高频电源传播高频的部件和/或施加高频电源的部件。馈电杆通过连接到地电位的同轴圆柱形导体电磁屏蔽在腔室的匹配单元和底板之间。在圆柱形导体中安装了一个距离供电杆适当距离设置的表面电位系统，并且在非接触状态下测量供电棒的静电表面电位通过静电电容，并向控制器提供一个表面电位检测信号包括表面电位测量值信息。控制器基于来自表面电位系统的表面电位检测信号进行所需的信号处理或操作处理，从而获得供电棒上的直流电位的测量值。

5. 发明申请

US20120009829A1 ELECTRICAL JOINT MEMBER FOR REDUCING AN ELECTRICAL RESISTANCE BETWEEN CONDUCTIVE MEMBERS IN A PLASMA PROCESSING APPARATUS 审中-公开
标题翻译：用于降低等离子体处理装置中的导电构件之间的电阻的电接头部件
公开(公告)号：US20120009829A1
公开(公告)日：2012-01-12
申请号：US13237130
申请日：2011-09-20
申请人： Satoshi MAEBASHI , Toshihiro Hayami , Naoyuki Umehara
发明人： Satoshi MAEBASHI , Toshihiro Hayami , Naoyuki Umehara
IPC分类号： H01R13/02 , C23F1/08
CPC分类号： H01J37/32174 , H01J37/32082 , H01J37/32935
摘要： In a plasma processing apparatus, a member for propagating high frequency from a high frequency power supply and/or to which the high frequency is applied. A power feed rod is electromagnetically shielded between a matching unit and a bottom plate of a chamber by a coaxial cylindrical conductor connected to a ground potential. A surface potential system disposed in an appropriate distance from the power feed rod in radius direction is installed in the cylindrical conductor, and measures in a non-contact state the electrostatic surface potential of the power feed rod through electrostatic capacitance and provides a controller with a surface potential detection signal including surface potential measurement value information. The controller performs a required signal processing or operation processing on the basis of the surface potential detection signal from the surface potential system, thereby obtaining the measurement value of the DC potential on the power feed rod.
摘要翻译：在等离子体处理装置中，用于从高频电源传播高频的部件和/或施加高频电源的部件。馈电杆通过连接到地电位的同轴圆柱形导体电磁屏蔽在腔室的匹配单元和底板之间。在圆柱形导体中安装了一个距离供电杆适当距离设置的表面电位系统，并且在非接触状态下测量供电棒的静电表面电位通过静电电容，并向控制器提供一个表面电位检测信号包括表面电位测量值信息。控制器基于来自表面电位系统的表面电位检测信号进行所需的信号处理或操作处理，从而获得供电棒上的直流电位的测量值。

6. 发明申请

US20090277585A1 PLASMA PROCESSING APPRATUS AND METHOD AND APPARATUS FOR MEASURING DC POTENTIAL 有权
标题翻译：等离子体处理装置和测量直流电位的方法和装置
公开(公告)号：US20090277585A1
公开(公告)日：2009-11-12
申请号：US12506838
申请日：2009-07-21
申请人： Satoshi MAEBASHI , Toshihiro HAYAMI , Naoyuki UMEHARA
发明人： Satoshi MAEBASHI , Toshihiro HAYAMI , Naoyuki UMEHARA
IPC分类号： C23F1/08
CPC分类号： H01J37/32174 , H01J37/32082 , H01J37/32935
摘要： In a plasma processing apparatus, a member for propagating high frequency from a high frequency power supply and/or to which the high frequency is applied. A power feed rod is electromagnetically shielded between a matching unit and a bottom plate of a chamber by a coaxial cylindrical conductor connected to a ground potential. A surface potential system disposed in an appropriate distance from the power feed rod in radius direction is installed in the cylindrical conductor, and measures in a non-contact state the electrostatic surface potential of the power feed rod through electrostatic capacitance and provides a controller with a surface potential detection signal including surface potential measurement value information. The controller performs a required signal processing or operation processing on the basis of the surface potential detection signal from the surface potential system, thereby obtaining the measurement value of the DC potential on the power feed rod.
摘要翻译：在等离子体处理装置中，用于从高频电源传播高频的部件和/或施加高频电源的部件。馈电杆通过连接到地电位的同轴圆柱形导体电磁屏蔽在腔室的匹配单元和底板之间。在圆柱形导体中安装了一个距离供电杆适当距离设置的表面电位系统，并且在非接触状态下测量供电棒的静电表面电位通过静电电容，并向控制器提供一个表面电位检测信号包括表面电位测量值信息。控制器基于来自表面电位系统的表面电位检测信号进行所需的信号处理或操作处理，从而获得供电棒上的直流电位的测量值。

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