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1. 发明授权

US07169327B2 Composite particle for dielectrics, ultramicroparticulate composite resin particle, composition for forming dielectrics and use thereof 有权
标题翻译：电介质复合颗粒，超微晶复合树脂颗粒，用于形成电介质的组合物及其用途
公开(公告)号：US07169327B2
公开(公告)日：2007-01-30
申请号：US10240266
申请日：2002-01-24
申请人： Nobuyuki Ito , Hideaki Masuko , Satomi Hasegawa , Nakaatsu Yoshimura
发明人： Nobuyuki Ito , Hideaki Masuko , Satomi Hasegawa , Nakaatsu Yoshimura
IPC分类号： H01B1/22 , B32B33/00
CPC分类号： H01L24/49 , C08K9/02 , H01L23/145 , H01L23/49527 , H01L23/49589 , H01L23/49894 , H01L24/48 , H01L2224/48091 , H01L2224/48227 , H01L2224/48237 , H01L2224/49109 , H01L2924/00014 , H01L2924/01004 , H01L2924/01005 , H01L2924/01006 , H01L2924/01007 , H01L2924/0101 , H01L2924/01011 , H01L2924/01012 , H01L2924/01014 , H01L2924/01015 , H01L2924/01016 , H01L2924/01018 , H01L2924/01019 , H01L2924/01021 , H01L2924/01022 , H01L2924/01023 , H01L2924/01027 , H01L2924/01028 , H01L2924/01029 , H01L2924/0103 , H01L2924/01032 , H01L2924/01038 , H01L2924/01039 , H01L2924/0104 , H01L2924/01042 , H01L2924/01044 , H01L2924/01047 , H01L2924/0105 , H01L2924/01051 , H01L2924/01052 , H01L2924/01056 , H01L2924/01058 , H01L2924/01072 , H01L2924/01074 , H01L2924/01078 , H01L2924/01079 , H01L2924/01083 , H01L2924/01084 , H01L2924/014 , H01L2924/04941 , H01L2924/10253 , H01L2924/12042 , H01L2924/12044 , H01L2924/14 , H01L2924/15153 , H01L2924/1517 , H01L2924/19041 , H01L2924/30105 , H01L2924/351 , H05K1/0373 , H05K1/162 , H05K3/0023 , H05K3/4644 , H05K3/4673 , H05K2201/0209 , H05K2201/0218 , H05K2201/0239 , H05K2201/0257 , H05K2201/0326 , H05K2201/0329 , H05K2201/0355 , H05K2201/09309 , H05K2203/135 , H01L2924/00 , H01L2224/45099
摘要： The dielectric-forming composition according to the invention is characterized by consisting of: composite particles for dielectrics in which part or all of the surfaces of inorganic particles with permittivity of 30 or greater are coated with a conductive metal or a compound thereof, or a conductive organic compound or a conductive inorganic material; and (B) a resin component constituted of at least one of a polymerizable compound and a polymer. In addition, another dielectric-forming composition according to the invention is characterized by containing: ultrafine particle-resin composite particles composed of (J) inorganic ultrafine particles with the average particle size of 0.1 μm or smaller, and (B) a resin component constituted of at least one of a polymerizable compound and a polymer, wherein part or all of the surfaces of the inorganic ultrafine particles (J) are coated with the resin component (B), and the ultrafine particle-resin composite particles contain 20% by weight or more of the inorganic ultrafine particles (J); and inorganic particles with the average particle size of 0.1 to 2 μm and permittivity of 30 or greater, or inorganic composite particles in which a conductive metal or a compound thereof, or a conductive organic compound or a conductive inorganic material is deposited on the part or all of the surfaces of the inorganic particles.
摘要翻译：根据本发明的电介质形成组合物的特征在于：电介质复合颗粒，其中介电常数为30或更大的无机颗粒的部分或全部表面涂覆有导电金属或其化合物，或导电有机化合物或导电无机材料; 和（B）由聚合性化合物和聚合物中的至少一种构成的树脂成分。此外，根据本发明的另一种电介质形成组合物的特征在于包含：由（J）平均粒径为0.1μm以下的（J）无机超微粒子构成的超微粒子 - 树脂复合粒子，（B）构成的树脂成分的可聚合化合物和聚合物中的至少一种，其中无机超细颗粒（J）的一部分或全部表面涂覆有树脂组分（B），超细颗粒 - 树脂复合颗粒含有20重量％或更多的无机超细颗粒（J）; 和平均粒径为0.1〜2μm，介电常数为30以上的无机粒子，或其中导电性金属或其化合物或导电性有机化合物或导电性无机材料沉积在该部分上的无机复合粒子，或无机颗粒的所有表面。

2. 发明申请

US20060223008A1 Composition for forming antireflection film, laminate, and method for forming resist pattern 有权
标题翻译：用于形成抗反射膜的组合物，层压体和形成抗蚀剂图案的方法
公开(公告)号：US20060223008A1
公开(公告)日：2006-10-05
申请号：US11376146
申请日：2006-03-16
申请人： Nakaatsu Yoshimura , Keiji Konno , Norihiro Natsume
发明人： Nakaatsu Yoshimura , Keiji Konno , Norihiro Natsume
IPC分类号： G03F7/00 , G03C5/00
CPC分类号： G03F7/091 , G03F7/0046
摘要： An antireflection film-forming composition having excellent coatability, capable of significantly inhibiting production of fine microbubbles and capable of forming an antireflection film with a sufficiently decreased standing-wave effect, and having excellent solubility in water and alkaline developers is provided. The composition comprises a polymer having at least one polymerization unit with a hydroxyl group-containing organic group on the side chain, preferably a copolymer having at least one recurring unit of the following formula (2) and/or at least one recurring unit of the following formula (3) and at least one recurring unit of the following formula (4), and/or a salt thereof: wherein R1 and R2 represent a hydrogen atom, a fluorine atom, or a monovalent organic group, m is an integer of 1-20, and A represents a divalent coupling means.
摘要翻译：提供了具有优异的涂布性的防反射膜形成组合物，其能够显着抑制微细微泡的产生并且能够形成具有足够降低的驻波效应的抗反射膜，并且在水和碱性显影剂中具有优异的溶解性。该组合物包含在侧链上具有至少一个具有含羟基有机基团的聚合单元的聚合物，优选具有至少一个下式（2）的重复单元的共聚物和/或至少一种重复单元下式（3）和至少一个下式（4）的重复单元和/或其盐：其中R 1和R 2代表氢原子氟原子或一价有机基团，m为1-20的整数，A表示二价键合机构。

3. 发明申请

US20110251323A1 COMPOSITION FOR FORMING RESIST LOWER LAYER FILM 有权
标题翻译：用于形成较低层膜的组合物
公开(公告)号：US20110251323A1
公开(公告)日：2011-10-13
申请号：US12599694
申请日：2008-05-21
申请人： Nakaatsu Yoshimura , Yousuke Konno
发明人： Nakaatsu Yoshimura , Yousuke Konno
IPC分类号： C08K5/101
CPC分类号： G03F7/094 , H01L21/31144 , H01L21/76808
摘要： A composition for forming a resist lower layer film, which contains (A) a resin, (B) a butyl ether group-containing crosslinking agent and (C) a solvent.
摘要翻译：含有（A）树脂，（B）含有丁基醚基团的交联剂和（C）溶剂的形成抗蚀剂下层膜的组合物。

4. 发明授权

US06737169B2 Polymer composition, cured product, laminate and method for producing the cured product 有权
标题翻译：聚合物组合物，固化产物，层压体和固化产物的制造方法
公开(公告)号：US06737169B2
公开(公告)日：2004-05-18
申请号：US10058423
申请日：2002-01-30
申请人： Mibuko Shimada , Nakaatsu Yoshimura , Yuichi Hashiguchi
发明人： Mibuko Shimada , Nakaatsu Yoshimura , Yuichi Hashiguchi
IPC分类号： B32B904
CPC分类号： G03F7/0758 , C08L43/04 , C09D143/04 , C09D201/10 , G03F7/0755 , G03F7/0757 , Y10T428/24388 , Y10T428/24405 , Y10T428/31663 , C08L2666/44
摘要： A polymer composition containing a specific silyl group-containing polymer, in which the maximum size of particles contained therein is 2 &mgr;m or less, and the number of particles having a size of 0.2 &mgr;m to 2 &mgr;m is 1,000 particles/ml or less. The composition may further contain a specific compound or at least one component selected from an organosilane represented by (R1)nSi(X)4-n, a hydrolyzate of the organosilane and a condensate of the organosilane. The composition is excellent in storage stability, high in hardness and excellent in mechanical strength such as wear resistance, so that a coating film having good taking-up properties even when no lubricant is contained, extremely smooth and having no difference in film thickness can be formed.
摘要翻译：含有特定含甲硅烷基的聚合物的聚合物组合物，其中包含的颗粒的最大尺寸为2μm或更小，并且具有0.2μm至2μm的尺寸的颗粒的数量为1,000个/ ml或更小。该组合物还可以含有选自（R 1）n Si（X）4-n表示的有机硅烷，有机硅烷的水解产物和有机硅烷的缩合物中的至少一种成分。该组合物的保存稳定性，硬度高，耐磨性等机械强度优异，因此即使不含润滑剂也具有良好的卷取性的涂膜，非常光滑，膜厚无差别形成。

5. 发明授权

US08663905B2 Pattern-forming method 有权
标题翻译：图案形成方法
公开(公告)号：US08663905B2
公开(公告)日：2014-03-04
申请号：US12515061
申请日：2007-11-19
申请人： Nakaatsu Yoshimura , Yousuke Konno
发明人： Nakaatsu Yoshimura , Yousuke Konno
IPC分类号： G03F7/20 , G03F7/30 , G03F7/36
CPC分类号： G03F7/095 , G03F7/11
摘要： A resist under layer film-forming composition comprises (A) an aminated fullerene having at least one amino group bonded to a fullerene skeleton, and (B) a solvent. The composition exhibits excellent etching resistance, causes an under layer film pattern to bend only with difficulty in a dry etching process, and can transfer a resist pattern faithfully onto a substrate to be processed with high reproducibility.
摘要翻译：抗蚀层下层成膜组合物包含（A）具有至少一个与富勒烯骨架结合的氨基的胺化富勒烯和（B）溶剂。该组合物表现出优异的耐蚀刻性，使得底层膜图案难以弯曲，并且可以将抗蚀剂图案忠实地转印到待加工的基板上，具有高再现性。

6. 发明申请

US20130004900A1 METHOD FOR FORMING RESIST UNDER LAYER FILM, PATTERN FORMING METHOD AND COMPOSITION FOR RESIST UNDER LAYER FILM 有权
标题翻译：层状薄膜成膜方法，图案形成方法及层状薄膜电阻组合
公开(公告)号：US20130004900A1
公开(公告)日：2013-01-03
申请号：US13609373
申请日：2012-09-11
申请人： Yousuke Konno , Nakaatsu Yoshimura , Fumihiro Toyokawa , Hikaru Sugita
发明人： Yousuke Konno , Nakaatsu Yoshimura , Fumihiro Toyokawa , Hikaru Sugita
IPC分类号： B05D7/24 , C09D5/00 , B05D3/10 , G03F7/20
CPC分类号： G03F7/091 , G03F7/168
摘要： A method for forming a resist under layer film includes providing a composition for forming a resist under layer film on a substrate which is to be processed. The composition includes a solvent and a calixarene compound or a derivative of the calixarene compound. The composition is set under an oxidizing atmosphere with an oxygen content of 1% or more by volume to form a resist under layer film.
摘要翻译：形成抗蚀剂下层膜的方法包括提供在待加工的基材上形成抗蚀剂下层膜的组合物。该组合物包括溶剂和杯芳烃化合物或杯芳烃化合物的衍生物。将该组合物设定为氧含量为1体积％以上的氧化气氛，形成抗蚀剂层下膜。

7. 发明申请

US20080124524A1 Composition For Forming Antireflection Film, Layered Product, And Method Of Forming Resist Pattern 有权
标题翻译：用于形成抗反射膜，分层产品和形成抗蚀剂图案的方法的组合物
公开(公告)号：US20080124524A1
公开(公告)日：2008-05-29
申请号：US11792077
申请日：2005-11-28
申请人： Nakaatsu Yoshimura , Keiji Konno
发明人： Nakaatsu Yoshimura , Keiji Konno
IPC分类号： C08F20/56 , B32B5/00 , G03F7/039
CPC分类号： G03F7/091 , G03F7/0046 , Y10T428/24802
摘要： An antireflection film-forming composition which has excellent applicability, is significantly inhibited from generating ultrafine microbubbles, gives an antireflection film capable of sufficiently reducing the standing-wave effect, and has excellent solubility in water and an alkaline developing solution. The antireflection film-forming composition contains: (A) a copolymer (salt) of a sulfonic acid group-containing acrylamide derivative represented by, e.g., 2-(meth)acrylamido-2-methylpropanesulfonic acid and a fluoroalkyl group-containing acrylic acid ester derivative represented by, e.g., 2,2,3,3,3-pentafluoropropyl (meth)acrylate; and (B) a surfactant whose 0.1 wt. % aqueous solution has a surface tension as measured at 25° C. of 45 mN/m or lower.
摘要翻译：显着地抑制了具有优异适用性的抗反射膜形成组合物，从而产生超细微泡，得到能够充分降低驻波效应的抗反射膜，并且在水和碱性显影液中具有优异的溶解性。防反射膜形成组合物包含：（A）由例如2-（甲基）丙烯酰胺基-2-甲基丙磺酸和含氟烷基的丙烯酸酯表示的含磺酸基的丙烯酰胺衍生物的共聚物（盐）衍生物，例如（甲基）丙烯酸2,2,3,3,3-五氟丙酯; 和（B）表面活性剂，其0.1重量％％水溶液在25℃下测得的表面张力为45mN / m以下。

8. 发明申请

US20060070551A1 Coating composition 审中-公开
标题翻译：涂料组成
公开(公告)号：US20060070551A1
公开(公告)日：2006-04-06
申请号：US10525218
申请日：2003-08-07
申请人： Tarou Kanamori , Nakaatsu Yoshimura , Akira Nishikawa
发明人： Tarou Kanamori , Nakaatsu Yoshimura , Akira Nishikawa
IPC分类号： B01J31/00 , C08F4/02 , C09K17/40
CPC分类号： C09D183/12 , C09D183/04 , C09D183/14 , C23C2222/20
摘要： Coating compositions are silane-based coating compositions containing (a) fine metal particles and/or fine metal oxide particles, and (b) a titanium compound of specific structure and/or (d) an organosiloxane oligomer of specific structure, and (c) a silane compound of specific structure. The silane-based coating compositions can give coating films having good dispersibility of fine particles (a) and high transparency even at high concentrations.
摘要翻译：涂料组合物是含有（a）金属微粒和/或细金属氧化物颗粒的硅烷类涂料组合物，和（b）特定结构的钛化合物和/或（d）具体结构的有机硅氧烷低聚物，和（c）具体结构的硅烷化合物。硅烷类涂料组合物可以得到具有良好的细颗粒分散性（a）的涂膜，即使在高浓度下也具有高透明度。

9. 发明授权

US08334338B2 Composition for forming resist lower layer film 有权
标题翻译：用于形成抗蚀剂下层膜的组合物
公开(公告)号：US08334338B2
公开(公告)日：2012-12-18
申请号：US12599694
申请日：2008-05-21
申请人： Nakaatsu Yoshimura , Yousuke Konno
发明人： Nakaatsu Yoshimura , Yousuke Konno
IPC分类号： A61K9/16 , C08K5/10
CPC分类号： G03F7/094 , H01L21/31144 , H01L21/76808
摘要： A composition for forming a resist lower layer film, which contains (A) a resin, (B) a butyl ether group-containing crosslinking agent and (C) a solvent.
摘要翻译：含有（A）树脂，（B）含有丁基醚基团的交联剂和（C）溶剂的形成抗蚀剂下层膜的组合物。

10. 发明申请

US20090098486A1 COMPOSITION FOR FORMING LOWER LAYER FILM AND PATTERN FORMING METHOD 有权
标题翻译：用于形成下层薄膜和图案形成方法的组合物
公开(公告)号：US20090098486A1
公开(公告)日：2009-04-16
申请号：US12282599
申请日：2007-03-14
申请人： Nakaatsu Yoshimura , Yousuke Konno , Hikaru Sugita , Junichi Takahashi
发明人： Nakaatsu Yoshimura , Yousuke Konno , Hikaru Sugita , Junichi Takahashi
IPC分类号： G03F7/004 , C08G61/12 , G03F7/20
CPC分类号： G03F7/091 , G03F7/094 , G03F7/11 , Y10S430/106
摘要： A composition for forming a lower layer film comprises a polymer (A) having a naphthalene derivative structural unit shown by the following formula (1), wherein R1 represents a hydroxyl group and the like, X represents a substitutable alkylene group having 1 to 20 carbon atoms and the like, n represents 0 to 6, m represents 1 to 8, and n+m represents an integer from 1 to 8, provided that two or more R1s may be the same or different and two or more Xs may be the same or different.
摘要翻译：用于形成下层膜的组合物包括具有如下式（1）所示的萘衍生物结构单元的聚合物（A），其中R1表示羟基等，X表示具有1〜20碳的可取代亚烷基原子等，n表示0〜6，m表示1〜8，n + m表示1〜8的整数，条件是两个以上的R 1可以相同或不同，两个以上的X可以相同或不同。

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