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1. 发明申请

WO2002076641A2 CLEANING APPARATUS AND CLEANING METHOD 审中-公开
标题翻译：清洁装置和清洁方法
公开(公告)号：WO2002076641A2
公开(公告)日：2002-10-03
申请号：PCT/EP2002/002458
申请日：2002-01-22
申请人： L'AIR LIQUIDE, SOCIETE ANONYME A DIRECTOIRE ET CONSEIL DE SURVEILLANCE POUR L'ETUDE ET L'EXPLOITATION DES PROCEDES GEORGES CLAUDE , LETESSIER, Olivier , GIRARD, JEAN-MARC , NASU, Akinobu , XU, Mindi
发明人： LETESSIER, Olivier , GIRARD, JEAN-MARC , NASU, Akinobu , XU, Mindi
IPC分类号： B08B9/027
CPC分类号： B08B9/027 , B08B9/00 , B08B9/032 , B08B9/08
摘要： To provide a cleaning apparatus and a cleaning method that require a smaller conduit population and less space and as a result cost less and provide an improved operability. A cleaning apparatus (30) contains a gastight container (32) for holding solvent; the interior of this container is partitioned in a gastight manner by a partition wall (34) into a feed compartment (36) that holds fresh solvent and a recovery compartment (38) that holds spent solvent. The partition wall (34) is slideably supported by a sliding support member (42) in such a manner that the pressure within the feed compartment (36) becomes equalized with the pressure within the recovery compartment (38). The feed compartment (36) is connected to a manifold (12) by a feed conduit (44) and the recovery compartment (38) is connected to the manifold (12) by a recovery conduit (46). A gas introduction conduit (52) is connected to the feed conduit (44) in order to introduce pressurization gas from a pressurized gas source (54). An exhaust conduit (62) is connected to the recovery conduit (46) in order to conduct vacuum exhaust using a vacuum exhaust source (64).
摘要翻译：为了提供一种清洁装置和清洁方法，其需要较小的管道总数和更少的空间，并且因此降低了成本并且提供了改进的可操作性。清洁装置（30）包含用于保持溶剂的气体容器（32）该容器的内部以气密的方式被分隔壁（34）分隔成保持新鲜溶剂的进料室（36）和容纳废溶剂的回收室（38）。分隔壁（34）以滑动支撑构件（42）可滑动地支撑，使得进料室（36）内的压力与回收室（38）内的压力相等。进料室（36）通过进料管道（44）连接到歧管（12），并且回收室（38）通过回收管道（46）连接到歧管（12）。气体导入管道（52）连接到进料管道（44），以便从加压气体源（54）引入加压气体。排气导管（62）连接到回收管道（46），以便使用真空排气源（64）进行真空排气。

2. 发明申请

WO2003041881A1 SOURCE LIQUID SUPPLY APPARATUS HAVING A CLEANING FUNCTION 审中-公开
标题翻译：源液体供应装置具有清洁功能
公开(公告)号：WO2003041881A1
公开(公告)日：2003-05-22
申请号：PCT/EP2002/013491
申请日：2002-11-13
申请人： L'AIR LIQUIDE, SOCIETE ANONYME A DIRECTOIRE ET CONSEIL DE SURVEILLANCE POUR L'ETUDE ET L'EXPLOITATION DES PROCEDES GEORGES CLAUDE , GIRARD, Jean-Marc , LETESSIER, Olivier , KIMURA, Masao , NASU, Akinobu
发明人： GIRARD, Jean-Marc , LETESSIER, Olivier , KIMURA, Masao , NASU, Akinobu
IPC分类号： B08B9/027
CPC分类号： B08B9/032 , B08B9/00 , C23C16/4402 , C23C16/45561
摘要： To provide a source liquid supply apparatus that avoids leaving source liquid-and/or cleaning fluid-derived residues in the vicinity of the joint or connection region between the source liquid feed conduit and the source tank. A flow-switching mechanism Vc is attached to the source tank (22) of a source liquid supply apparatus (20). This flow-switching mechanism Vc has a first port (33) that is connected to the discharge port conduit (24) of the source tank (22), a second port (34) that is connected to a feed conduit (16), and a third port (35) that is connected to an exhaust conduit (25). The first port (33) can be closed by a valve member (43) on a diaphragm (42) disposed within a common compartment (38) while communication is maintained between the second and third ports (34) and (35). A cleaning fluid source (55) and a purge gas source (57) are connected to the feed conduit (16). Purge gas and cleaning fluid fed into the feed conduit (16) are discharged from the second and third ports (34) and (35) through the exhaust conduit (25).
摘要翻译：提供一种源液体供应装置，其避免在源液体供给管道和源罐之间的接头或连接区域附近留下源液体和/或清洁流体衍生的残留物。流动切换机构Vc附接到源液体供给装置（20）的源罐（22）。该流量切换机构Vc具有与源罐（22）的排出口导管（24）连接的第一端口（33），与供给导管（16）连接的第二端口（34），以及连接到排气导管（25）的第三端口（35）。第一端口（33）可以在设置在公共隔间（38）内的隔膜（42）上的阀构件（43）封闭，同时在第二和第三端口（34）和（35）之间保持连通。清洁流体源（55）和净化气体源（57）连接到进料管道（16）。进料到进料管道（16）的吹扫气体和清洗流体通过排气导管（25）从第二和第三端口（34）和（35）排出。

3. 发明申请

WO2008110216A1 COPPER INTERCONNECTION FOR FLAT PANEL DISPLAY MANUFACTURING 审中-公开
标题翻译：用于平板显示器制造的铜相互连接
公开(公告)号：WO2008110216A1
公开(公告)日：2008-09-18
申请号：PCT/EP2007/052466
申请日：2007-03-15
申请人： L'AIR LIQUIDE SOCIETE ANONYME POUR L'ETUDE ET L'EXPLOITATION DES PROCEDES GEORGES CLAUDE , INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE , NASU, Akinobu , CHEN, Yi-Tsung , CHEN, Shyuan-Fang
发明人： NASU, Akinobu , CHEN, Yi-Tsung , CHEN, Shyuan-Fang
IPC分类号： H01L21/77 , G03F7/00
CPC分类号： H01L27/124
摘要： A method of depositing a copper interconnection layer on a substrate for use in a flat panel display interconnection system, comprising the steps of : a) Coating said substrate (1) with a photoresist layer (2); b) Patterning said photoresist layer to obtain a patterned photoresist substrate comprising at least one trench (5) patterned into said photoresist layer,- c) Providing a first catalysation layer (6, 7) onto the patterned photoresist substrate; d) Providing an electroless plated layer (9, 10) of an insulation layer deposited onto said first catalysation layer,- e) Removing the successively superimposed photoresist layer, catalysation layer and insulation layer except in the at least one trench, to obtain a pattern of the first catalysation layer (7) with an insulation layer (10) of e.g. NiP deposited thereon.
摘要翻译：一种在用于平板显示器互连系统的衬底上沉积铜互连层的方法，包括以下步骤：a）用光致抗蚀剂层（2）涂覆所述衬底（1）; b）对所述光致抗蚀剂层进行构图以获得图案化的光致抗蚀剂基底，其包括图案化成所述光致抗蚀剂层的至少一个沟槽（5），c）在图案化的光致抗蚀剂基底上提供第一催化层（6,7） d）提供沉积在所述第一催化层上的绝缘层的化学镀层（9,10），e）除去所述至少一个沟槽中的连续叠加的光致抗蚀剂层，催化层和绝缘层以获得图案的第一催化层（7）与绝缘层（10） NiP沉积在其上。

4. 发明申请

WO2007144026A1 ELECTROLESS NIP ADHESION AND/OR CAPPING LAYER FOR COPPER INTERCONNEXION LAYER 审中-公开
标题翻译：铜箔互连层的电镀NIP粘合和/或覆盖层
公开(公告)号：WO2007144026A1
公开(公告)日：2007-12-21
申请号：PCT/EP2006/063286
申请日：2006-06-16
申请人： L'AIR LIQUIDE SOCIETE ANONYME POUR L'ETUDE ET L'EXPLOITATION DES PROCEDES GEORGES CLAUDE , NASU, Akinobu , LEE, Wen-Jin , CHEN, I-Chung , CHEN, Shyuan-Fang
发明人： NASU, Akinobu , LEE, Wen-Jin , CHEN, I-Chung , CHEN, Shyuan-Fang
IPC分类号： C23C18/16 , C23C18/18 , C23C18/40 , C23C18/36 , H01L21/288
CPC分类号： C23C18/405 , C23C18/1651 , C23C18/1889 , C23C18/36 , H01L21/288
摘要： A method of depositing a copper interconnection layer on a substrate such on a glass substrate for use e.g. in TFT-LCD flat panel interconnection system. The method according to the invention comprising the steps of: a) optionally cleaning the substrate, b) optionally micro-etching the substrate, c) depositing a catalyzation layer on the substrate to obtain a catalyzed substrate, d) conditioning the catalyzed substrate with a conditioning solution to obtain a conditioned catalyzed substrate, e) plating the catalyzed substrate with a NiP layer by contacting said substrate or at least a portion thereof with a wet bath mixture comprising precursors of Ni and P, f) depositing a copper catalyst layer onto the plated NiP layer, depositing a Cu layer on said copper catalyst layer.
摘要翻译：一种在诸如玻璃基板上的衬底上沉积铜互连层的方法，在TFT-LCD平板互连系统中。根据本发明的方法包括以下步骤：a）任选地清洁衬底，b）任选地微蚀刻衬底，c）在衬底上沉积催化层以获得催化底物，d）用催化底物以获得经调节的催化底物，e）通过使所述底物或其至少一部分与包含Ni和P的前体的湿浴混合物接触NiP层来镀覆催化底物，f）将铜催化剂层沉积在镀NiP层，在所述铜催化剂层上沉积Cu层。

5. 发明申请

WO2007006338A1 ELECTROLESS NIWP ADHESION AND CAPPING LAYERS FOR TFT COPPER GATE PROCESS 审中-公开
标题翻译：用于TFT铜箔工艺的电镀NIWP粘合层和覆盖层
公开(公告)号：WO2007006338A1
公开(公告)日：2007-01-18
申请号：PCT/EP2005/009175
申请日：2005-07-13
申请人： L'AIR LIQUIDE, SOCIETE ANONYME A DIRECTOIRE ET CONSEIL DE SURVEILLANCE POUR L'ETUDE ET L'EXPLOITATION DES PROCEDES GEORGES CLAUDE , INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE (ITRI) , NASU, Akinobu , CHEN, Shyuan-Fang , CHEN, I-Chung , LIN, Tsu-An , HSIUNG, Chiung, Sheng
发明人： NASU, Akinobu , CHEN, Shyuan-Fang , CHEN, I-Chung , LIN, Tsu-An , HSIUNG, Chiung, Sheng
IPC分类号： C23C18/50 , C23C18/18 , C23C18/54
CPC分类号： C23C18/50 , C23C18/1844 , C23C18/1893 , Y10T428/1095
摘要： Electroless NiWP layers are used for TFT Cu gate process. The NiWP deposition process comprises the following steps. (a) Cleaning of the base surface using for example UV light, ozone solution and/or alkaline mixture solution, (b) micro-etching of the base surface using, e.g. diluted acid, (c) catalyzation of the base surface using, e.g. SnCl 2 and PdCl 2 solutions. (d) conditioning of the base surface using reducing agent solution, and (e) NiWP deposition. It has been discovered that NiWP layers deposited under certain conditions could provide good adhesion to the glass substrate and to the Cu layer with a good Cu barrier capability. A NiWP layer in useful for adhesion, capping and/or barrier layers for TFT Cu gate process (e.g. for flat screen display panels).
摘要翻译：无电镀NiWP层用于TFT Cu栅极工艺。 NiWP沉积工艺包括以下步骤。（a）使用例如UV光，臭氧溶液和/或碱性混合物溶液清洗基底表面，（b）使用例如紫外光，稀释的酸，（c）基底表面的催化。 SnCl 2和PdCl 2溶液。（d）使用还原剂溶液对基底表面进行调理，和（e）NiWP沉积。已经发现，在某些条件下沉积的NiWP层可以对玻璃基底和具有良好Cu阻挡能力的Cu层提供良好的附着力。用于TFT Cu栅极工艺（例如用于平板显示面板）的粘合，封盖和/或阻挡层的NiWP层。

6. 发明申请

WO02076641A3 CLEANING APPARATUS AND CLEANING METHOD 审中-公开
标题翻译：清洁装置和清洁方法
公开(公告)号：WO02076641A3
公开(公告)日：2003-02-06
申请号：PCT/EP0202458
申请日：2002-01-22
申请人： AIR LIQUIDE , LETESSIER OLIVIER , GIRARD JEAN-MARC , NASU AKINOBU , XU MINDI
发明人： LETESSIER OLIVIER , GIRARD JEAN-MARC , NASU AKINOBU , XU MINDI
IPC分类号： B08B3/08 , B08B9/00 , B08B9/02 , B08B9/08 , H01L21/304 , B08B9/027
CPC分类号： B08B9/027 , B08B9/00 , B08B9/032 , B08B9/08
摘要： To provide a cleaning apparatus and a cleaning method that require a smaller conduit population and less space and as a result cost less and provide an improved operability. A cleaning apparatus (30) contains a gastight container (32) for holding solvent; the interior of this container is partitioned in a gastight manner by a partition wall (34) into a feed compartment (36) that holds fresh solvent and a recovery compartment (38) that holds spent solvent. The partition wall (34) is slideably supported by a sliding support member (42) in such a manner that the pressure within the feed compartment (36) becomes equalized with the pressure within the recovery compartment (38). The feed compartment (36) is connected to a manifold (12) by a feed conduit (44) and the recovery compartment (38) is connected to the manifold (12) by a recovery conduit (46). A gas introduction conduit (52) is connected to the feed conduit (44) in order to introduce pressurization gas from a pressurized gas source (54). An exhaust conduit (62) is connected to the recovery conduit (46) in order to conduct vacuum exhaust using a vacuum exhaust source (64).
摘要翻译：为了提供一种清洁装置和清洁方法，其需要较小的管道总数和更少的空间，并且因此降低了成本并且提供了改进的可操作性。清洁装置（30）包含用于保持溶剂的气体容器（32）该容器的内部以气密的方式被分隔壁（34）分隔成保持新鲜溶剂的进料室（36）和容纳废溶剂的回收室（38）。分隔壁（34）以滑动支撑构件（42）可滑动地支撑，使得进料室（36）内的压力与回收室（38）内的压力相等。进料室（36）通过进料管道（44）连接到歧管（12），并且回收室（38）通过回收管道（46）连接到歧管（12）。气体导入管道（52）连接到进料管道（44），以便从加压气体源（54）引入加压气体。排气导管（62）连接到回收管道（46），以便使用真空排气源（64）进行真空排气。

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