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    • 1. 发明申请
    • PERSONAL DESCENT APPARATUS
    • 个人服装设备
    • WO2005009541A1
    • 2005-02-03
    • PCT/KR2004/001785
    • 2004-07-19
    • CHUN, Jung-MyungKIM, Myoung-OhCHUN, Jae-Ryoong
    • CHUN, Jung-MyungKIM, Myoung-OhCHUN, Jae-Ryoong
    • A62B1/06
    • A62B1/14
    • A personal descent apparatus for evacuating occupants from a high elevation of tall building under emergency. The personal descent apparatus comprises a pair of supporting plates connected to each other front and rear with a predetermined gap, braking rods rotatably fixed to the pair of supporting plates in the predetermined gap between the pair of supporting plates, the braking rods form a passage which is formed by two guide grooves each of which is tapered and formed at arc ends facing to each other, so that a rope is inserted to the passage, and weight receiving means connected to both ends of the braking rods for receiving a load, wherein the braking rods are rotated by the load.
    • 在紧急情况下从高高的高层撤离乘客的个人血统仪器。 个人下降装置包括一对以预定间隙彼此前后连接的支撑板,在一对支撑板之间的预定间隙中可旋转地固定到一对支撑板的制动杆,制动杆形成通道, 由两个引导槽形成,每个引导槽是锥形的并且形成在彼此面对的弧形端,使得绳索被插入到通道中,并且重物接收装置连接到用于接收负载的制动杆的两端,其中 制动杆由负载旋转。
    • 4. 发明申请
    • Hetero junction bipolar transistor and method of manufacturing the same
    • 异质结双极晶体管及其制造方法
    • US20070131971A1
    • 2007-06-14
    • US11634614
    • 2006-12-06
    • Yong KimEun NamHo KimSang LeeDong JunHong LeeSeon HongDong KimJong LimMyoung Oh
    • Yong KimEun NamHo KimSang LeeDong JunHong LeeSeon HongDong KimJong LimMyoung Oh
    • H01L31/00
    • H01L29/7371H01L29/0817H01L29/41708H01L29/66318
    • Provided are a hetero-junction bipolar transistor (HBT) that can increase data processing speed and a method of manufacturing the hetero-junction bipolar transistor. The HBT includes a semi-insulating compound substrate, a sub-collector layer formed on the semi-insulating compound substrate, a pair of collector electrodes disposed at a predetermined distance apart from each other on a predetermined portion of the sub-collector layer, a collector layer and a base layer disposed between the collector electrodes, a pair of base electrodes disposed at a predetermined distance apart from each other on a predetermined portion of the base layer, an emitter layer stack disposed between the base electrodes, and an emitter electrode that is formed on the emitter layer stack, and includes a portion having a line width wider than the line width of the emitter layer stack, wherein both sidewalls of the emitter electrode are respectively aligned with inner walls of the pair of base electrodes, and sidewalls of the collector layer and the base layer are located between outer sidewalls of the pair of base electrodes of the pair of base electrodes.
    • 提供了可以提高数据处理速度的异质结双极晶体管(HBT)和制造异质结双极晶体管的方法。 HBT包括半绝缘复合基板,形成在半绝缘复合基板上的副集电极层,在副集电极层的预定部分上彼此隔开预定距离设置的一对集电极, 集电极层和设置在集电极之间的基极层,在基极层的预定部分上彼此隔开预定距离设置的一对基底电极,设置在基极之间的发射极层叠层和发射极电极, 形成在发射极层堆叠上,并且包括具有比发射极层堆叠的线宽宽的线宽的部分,其中发射极电极的两个侧壁分别与一对基底电极的内壁对齐,并且侧壁 集电极层和基极层位于该对基极的一对基极的外侧壁之间。
    • 6. 发明申请
    • DISPLAY APPARATUS
    • 显示设备
    • US20130051596A1
    • 2013-02-28
    • US13594054
    • 2012-08-24
    • Kyu-eun PARKKyoung-hoon KIMJi-gwang KIMSi-myoung OH
    • Kyu-eun PARKKyoung-hoon KIMJi-gwang KIMSi-myoung OH
    • H04R1/02
    • G06F1/1605
    • A display apparatus includes a base; a stand which extends from the base; and a display body which comprises a cover frame detachably mounted on one end portion of the stand, a display unit accommodated in the cover frame and configured to display images, and a plurality of speakers installed on the cover frame and configured to output sounds corresponding to a plurality of audio channels. A first speaker of the plurality of speakers is disposed at a central position of a lower side of the cover frame facing the base among four sides of the cover frame and perpendicular to an image display side of the display unit, projecting toward the base.
    • 显示装置包括基座; 从基座延伸的立场; 以及显示体,其包括可拆卸地安装在所述支架的一个端部上的盖框架,容纳在所述盖框架中并被配置为显示图像的显示单元,以及安装在所述盖框架上的多个扬声器, 多个音频通道。 所述多个扬声器的第一扬声器设置在所述盖框架的下侧面朝向所述底座的所述盖框架的四个侧面中的垂直于所述显示单元的图像显示侧的中心位置,朝向所述底座突出。
    • 7. 发明授权
    • Discrete time filter and receiver including the same
    • 离散时间滤波器和接收机包括相同
    • US08385490B2
    • 2013-02-26
    • US12795208
    • 2010-06-07
    • Jung Ho LeeMyoung Oh KiSang Yoon JeonHeung Bae Lee
    • Jung Ho LeeMyoung Oh KiSang Yoon JeonHeung Bae Lee
    • H04B1/10
    • H04B1/30H03H15/023H04L27/00
    • A discrete time filter includes a plurality of sampling cells and a first dummy sampling cell. Each of the sampling cells performs a current mode sampling operation based on current input to an input terminal in response to a corresponding one of a plurality of sampling clock signals and is reset in response to a corresponding one of the plurality of sampling clock signals and a first dummy sampling clocks. The first dummy sampling cell alternately performs with the first sampling cell the current mode sampling operation based on current input to the input terminal in response to the first dummy sampling clock signal and is alternately reset with the first sampling cell in response to the first sampling clock signal.
    • 离散时间滤波器包括多个采样单元和第一虚拟采样单元。 每个采样单元响应于多个采样时钟信号中相应的一个采样时钟信号,基于对输入端的电流输入来执行电流模式采样操作,并响应于多个采样时钟信号中的一个采样时钟信号和 第一个虚拟采样时钟。 第一虚拟采样单元响应于第一虚拟采样时钟信号,基于当前输入到输入端的电流模式采样操作与第一采样单元交替执行,并且响应于第一采样时钟与第一采样单元交替重置 信号。
    • 8. 发明申请
    • CMP slurry and method for polishing semiconductor wafer using the same
    • CMP浆料和使用其的抛光半导体晶片的方法
    • US20070191244A1
    • 2007-08-16
    • US11657051
    • 2007-01-24
    • Seung ChoJong KimJun NhoMyoung OhJang Kim
    • Seung ChoJong KimJun NhoMyoung OhJang Kim
    • C11D7/32
    • C09G1/02H01L21/3212
    • Disclosed is a CMP slurry in which a compound having a weight-average molecular weight of 30-500 and containing a hydroxyl group (OH), a carboxyl group (COOH), or both, is added to a CMP slurry comprising abrasive particles and water and having a first viscosity, so that the CMP slurry is controlled to have a second viscosity 5-30% lower than the first viscosity. Also disclosed is a method for polishing a semiconductor wafer using the CMP slurry. According to the disclosed invention, the agglomerated particle size of abrasive particles in the CMP slurry can be reduced, while the viscosity of the CMP slurry can be reduced and the global planarity of wafers upon polishing can be improved. Thus, the CMP slurry can be advantageously used in processes for manufacturing semiconductor devices requiring fine patterns and can improve the reliability and production of semiconductor devices through the use thereof in semiconductor processes.
    • 公开了一种CMP浆料,其中将包含重均分子量为30-500并含有羟基(OH),羧基(COOH)或二者)的化合物加入到包含磨料颗粒和水的CMP浆料中 并且具有第一粘度,使得CMP浆料被控制为具有比第一粘度低5-30%的第二粘度。 还公开了使用CMP浆料来研磨半导体晶片的方法。 根据所公开的发明,可以减少CMP浆料中的磨料颗粒的聚集粒度,同时可以减少CMP浆料的粘度,并且可以提高抛光时晶片的全局平面性。 因此,CMP浆料可以有利地用于制造需要精细图案的半导体器件的工艺中,并且可以通过其在半导体工艺中的使用来提高半导体器件的可靠性和生产。