专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明授权

US08038431B2 Imprint mold 有权
标题翻译：印记模具
公开(公告)号：US08038431B2
公开(公告)日：2011-10-18
申请号：US12668520
申请日：2008-06-30
申请人： Hisatake Sano , Yuki Aritsuka , Morihisa Hoga , Hiroshi Fujita
发明人： Hisatake Sano , Yuki Aritsuka , Morihisa Hoga , Hiroshi Fujita
IPC分类号： A01J21/00
CPC分类号： B29C59/02 , B29C33/424 , B29C35/0894 , B29C2033/0005 , B29C2035/0827 , B29C2059/023 , B82Y10/00 , B82Y40/00 , G03F7/0002
摘要： An imprint mold including a substrate of transparent material having a first principal surface having a pattern region and a second principal surface; a first light shielding film provided on the first principal surface, along a periphery of the pattern region; and a second light shielding film provided on the second principal surface, having an opening including an opposite region to the pattern region, a part of the second light shielding film opposite to the first light shielding film. In a cross section perpendicular to the substrate, the maximum incident angle of the light for curing a transfer layer to the second principal surface is less than an angle between a perpendicular line of the second principal surface and a line connecting an end of the second light shielding film on a side of the opening and a farthest end of the first light shielding film from the pattern region.
摘要翻译：一种压印模具，包括具有第一主表面和第二主表面的透明材料的基板; 沿所述图案区域的周边设置在所述第一主表面上的第一遮光膜; 以及第二遮光膜，设置在所述第二主表面上，具有与所述图案区域相反的区域的开口，所述第二遮光膜的与所述第一遮光膜相对的一部分。在垂直于衬底的横截面中，用于固化转移层到第二主表面的光的最大入射角小于第二主表面的垂直线和连接第二光的端部的线之间的角度在开口侧的屏蔽膜和第一遮光膜的距离图案区域的最远端。

2. 发明授权

US06841399B2 Method of manufacturing mask and method of manufacturing semiconductor integrated circuit device 有权
标题翻译：半导体集成电路器件的制造方法和半导体集成电路器件的制造方法
公开(公告)号：US06841399B2
公开(公告)日：2005-01-11
申请号：US10349026
申请日：2003-01-23
申请人： Norio Hasegawa , Katsuya Hayano , Shinji Kubo , Yasuhiro Koizumi , Hironobu Takaya , Morihisa Hoga
发明人： Norio Hasegawa , Katsuya Hayano , Shinji Kubo , Yasuhiro Koizumi , Hironobu Takaya , Morihisa Hoga
IPC分类号： G03F1/50 , G03F1/56 , G03F1/62 , G03F1/72 , G03F1/84 , G03F7/20 , H01L21/027 , H01L21/00
CPC分类号： G03F1/84 , G03F1/56 , Y10S438/949
摘要： The manufacturing time of a mask is shortened. In a defect inspection of a mask having a light-shielding portion composed of a resist film, the presence or absence of defects, such as burr and film loss of a resist pattern on the mask, and foreign matters, etc. is inspected by reading optical information on either or both of reflection light and transmission light with respect to inspection light irradiated to the mask by the use of a foreign-matter inspection system. More specifically, in the inspection of the mask, it is possible to perform the defect inspection without performing a comparison inspection that requires a great amount of measuring time and advanced techniques. Therefore, the inspecting process of the mask can be simplified, and also the inspecting time of the mask can be shortened.
摘要翻译：掩模的制造时间缩短。在具有由抗蚀剂膜构成的遮光部的掩模的缺陷检查中，通过读取检查有无缺陷，例如掩模上的抗蚀剂图案的毛刺和膜损失以及异物等相对于通过使用异物检查系统照射到面罩的检查光，反射光和透射光中的任一个或两者的光学信息。更具体地，在掩模的检查中，可以进行缺陷检查，而不进行需要大量测量时间和先进技术的比较检查。因此，可以简化掩模的检查过程，并且可以缩短掩模的检查时间。

3. 发明申请

US20100169042A1 SYSTEM FOR MEASURING A SHAPE, METHOD FOR MEASURING A SHAPE, AND COMPUTER PROGRAM PRODUCT 有权
标题翻译：用于测量形状的系统，用于测量形状的方法和计算机程序产品
公开(公告)号：US20100169042A1
公开(公告)日：2010-07-01
申请号：US12600527
申请日：2008-04-02
申请人： Yuki Aritsuka , Morihisa Hoga
发明人： Yuki Aritsuka , Morihisa Hoga
IPC分类号： G06F15/00
CPC分类号： G01B21/20 , B81C99/0065 , B81C2201/0153 , B81C2201/0198 , G03F1/84
摘要： A system for measuring a shape, includes an external storage unit storing tolerances of first and second shape factors defining a design shape of a measuring object; a first measuring tool measuring the first shape factor of the measuring object to obtain measurement data; and a measurement processing unit determining a shape of the measuring object. The measurement processing unit includes; a comparison module comparing the measurement data of the first shape factor with the tolerance of the first shape factor; a verification module composing a predicted shape using the measurement data and verifying whether the predicted shape is formed as a figure; a calculation module calculating predicted data of the second shape factor from the predicted shape; and a determination module determining a measurement shape by comparing the predicted data with the tolerance of the second shape factor.
摘要翻译：一种用于测量形状的系统，包括存储限定测量对象的设计形状的第一和第二形状因子的公差的外部存储单元; 第一测量工具，测量测量对象的第一形状因子以获得测量数据; 以及测量处理单元，确定测量对象的形状。测量处理单元包括：将所述第一形状因子的测量数据与所述第一形状系数的公差进行比较的比较模块; 使用所述测量数据构成预测形状的验证模块，并验证所述预测形状是否形成为图形; 计算模块，根据所述预测形状计算所述第二形状因子的预测数据; 以及确定模块，通过将预测数据与第二形状因子的公差进行比较来确定测量形状。

4. 发明授权

US07582393B2 Transfer mask blank, transfer mask, and transfer method using the transfer mask 失效
标题翻译：传输掩模空白，传输掩码和传输方法使用传输掩码
公开(公告)号：US07582393B2
公开(公告)日：2009-09-01
申请号：US10535165
申请日：2003-12-01
申请人： Hisatake Sano , Morihisa Hoga , Yukio Iimura , Yuki Aritsuka , Masaaki Kurihara , Hiroshi Nozue , Akira Yoshida
发明人： Hisatake Sano , Morihisa Hoga , Yukio Iimura , Yuki Aritsuka , Masaaki Kurihara , Hiroshi Nozue , Akira Yoshida
IPC分类号： G03F1/00
CPC分类号： G03F1/78 , G03F1/20 , G03F1/22 , G03F1/24
摘要： It is an object of the present invention to effectively manufacture a charged-particle beam lithography mask, an X-ray lithography mask, or an extreme ultraviolet beam lithography mask by using, for example, an existing writer such as an electron beam writer for photomasks, while achieving improvement in processing accuracy of a mask pattern. A lithography mask (1) comprises a substrate (2) which has a lower surface provided substantially at the center thereof with an opening (3) and a self-supporting membrane (m) having a pattern region (4) substantially at the center of an upper surface of the substrate (2) corresponding to the opening (3). The self-supporting membrane (m) is provided with through-holes (h) of a mask pattern in it or an absorber or scatterer of a mask pattern on it, and the pattern region (4) and a peripheral region around the pattern region (5) are in one plane.
摘要翻译：本发明的目的是通过使用例如诸如用于光掩模的电子束写入器的现有写入器来有效地制造带电粒子束光刻掩模，X射线光刻掩模或极紫外光束光刻掩模同时实现掩模图案的处理精度的提高。光刻掩模（1）包括基底（2），基底（2）具有基本上在其中心处设置有开口（3）的下表面和具有基本上位于中心的图案区域（4）的自支撑膜（m）所述基板（2）的与所述开口（3）对应的上表面。自支撑膜（m）在其上设置有掩模图案的通孔（h）或其上的掩模图案的吸收体或散射体，图案区域（4）和图案区域周围的周边区域（5）在一个平面上。

5. 发明授权

US08543352B2 System for measuring a shape, method for measuring a shape, and computer program product 有权
标题翻译：用于测量形状的系统，测量形状的方法和计算机程序产品
公开(公告)号：US08543352B2
公开(公告)日：2013-09-24
申请号：US12600527
申请日：2008-04-02
申请人： Yuki Aritsuka , Morihisa Hoga
发明人： Yuki Aritsuka , Morihisa Hoga
IPC分类号： G01B3/46 , G01B3/04 , G01B3/20 , H04B17/00
CPC分类号： G01B21/20 , B81C99/0065 , B81C2201/0153 , B81C2201/0198 , G03F1/84
摘要： A system for measuring a shape, includes an external storage unit storing tolerances of first and second shape factors defining a design shape of a measuring object; a first measuring tool measuring the first shape factor of the measuring object to obtain measurement data; and a measurement processing unit determining a shape of the measuring object. The measurement processing unit includes; a comparison module comparing the measurement data of the first shape factor with the tolerance of the first shape factor; a verification module composing a predicted shape using the measurement data and verifying whether the predicted shape is formed as a figure; a calculation module calculating predicted data of the second shape factor from the predicted shape; and a determination module determining a measurement shape by comparing the predicted data with the tolerance of the second shape factor.
摘要翻译：一种用于测量形状的系统，包括存储限定测量对象的设计形状的第一和第二形状因子的公差的外部存储单元; 第一测量工具，测量测量对象的第一形状因子以获得测量数据; 以及测量处理单元，确定测量对象的形状。测量处理单元包括：将所述第一形状因子的测量数据与所述第一形状系数的公差进行比较的比较模块; 使用所述测量数据构成预测形状的验证模块，并验证所述预测形状是否形成为图形; 计算模块，根据所述预测形状计算所述第二形状因子的预测数据; 以及确定模块，通过将预测数据与第二形状因子的公差进行比较来确定测量形状。

6. 发明申请

US20100189839A1 IMPRINT MOLD 有权
标题翻译： IMPRINT模具
公开(公告)号：US20100189839A1
公开(公告)日：2010-07-29
申请号：US12668520
申请日：2008-06-30
申请人： Hisatake Sano , Yuki Aritsuka , Morihisa Hoga , Hiroshi Fujita
发明人： Hisatake Sano , Yuki Aritsuka , Morihisa Hoga , Hiroshi Fujita
IPC分类号： B29C35/08
CPC分类号： B29C59/02 , B29C33/424 , B29C35/0894 , B29C2033/0005 , B29C2035/0827 , B29C2059/023 , B82Y10/00 , B82Y40/00 , G03F7/0002
摘要： An imprint mold including a substrate of transparent material having a first principal surface having a pattern region and a second principal surface; a first light shielding film provided on the first principal surface, along a periphery of the pattern region; and a second light shielding film provided on the second principal surface, having an opening including an opposite region to the pattern region, a part of the second light shielding film opposite to the first light shielding film. In a cross section perpendicular to the substrate, the maximum incident angle of the light for curing a transfer layer to the second principal surface is less than an angle between a perpendicular line of the second principal surface and a line connecting an end of the second light shielding film on a side of the opening and a farthest end of the first light shielding film from the pattern region.
摘要翻译：一种压印模具，包括具有第一主表面和第二主表面的透明材料的基板; 沿所述图案区域的周边设置在所述第一主表面上的第一遮光膜; 以及第二遮光膜，设置在所述第二主表面上，具有与所述图案区域相反的区域的开口，所述第二遮光膜的与所述第一遮光膜相对的一部分。在垂直于衬底的横截面中，用于固化转移层到第二主表面的光的最大入射角小于第二主表面的垂直线和连接第二光的端部的线之间的角度在开口侧的屏蔽膜和第一遮光膜的距离图案区域的最远端。

7. 发明授权

US07289657B2 Method of inspecting photo-mask 失效
标题翻译：检查光罩的方法
公开(公告)号：US07289657B2
公开(公告)日：2007-10-30
申请号：US10411610
申请日：2003-04-10
申请人： Morihisa Hoga , Hiroyuki Inomata
发明人： Morihisa Hoga , Hiroyuki Inomata
IPC分类号： G06K9/00
CPC分类号： G03F1/84
摘要： Provided is a method of inspecting a photo-mask, which enables performing destruction inspection such as contact-type inspection and cross section inspection. The method of inspecting a photo-mask comprises performing destruction inspection with respect to the photo-mask for inspection, by using one of two photo-masks that have been successively manufactured under the same conditions that are set, as a photo-mask for inspection, and using the other of them as a product.
摘要翻译：提供了一种检查光掩模的方法，其能够进行诸如接触型检查和横截面检查的销毁检查。检查光掩模的方法包括通过使用在相同条件下连续制造的两个光掩膜中的一个作为检查用光掩模进行相对于用于检查的光掩模的销毁检查，并使用其他作为产品。

8. 发明申请

US20060068298A1 Transfer mask blank, transfer mask, and transfer method using the transfer mask 失效
标题翻译：传输掩模空白，传输掩码和传输方法使用传输掩码
公开(公告)号：US20060068298A1
公开(公告)日：2006-03-30
申请号：US10535165
申请日：2003-12-01
申请人： Hisatake Sano , Morihisa Hoga , Yukio Iimura , Yuki Aritsuka , Masaaki Kurihara , Hiroshi Nozue , Akira Yoshida
发明人： Hisatake Sano , Morihisa Hoga , Yukio Iimura , Yuki Aritsuka , Masaaki Kurihara , Hiroshi Nozue , Akira Yoshida
IPC分类号： G03F1/00
CPC分类号： G03F1/78 , G03F1/20 , G03F1/22 , G03F1/24
摘要： It is an object of the present invention to effectively manufacture a charged-particle beam lithography mask, an X-ray lithography mask, or an extreme ultraviolet beam lithography mask by using, for example, an existing writer such as an electron beam writer for photomasks, while achieving improvement in processing accuracy of a mask pattern. A lithography mask (1) comprises a substrate (2) which has a lower surface provided substantially at the center thereof with an opening (3) and a self-supporting membrane (m) having a pattern region (4) substantially at the center of an upper surface of the substrate (2) corresponding to the opening (3). The self-supporting membrane (m) is provided with through-holes (h) of a mask pattern in it or an absorber or scatterer of a mask pattern on it, and the pattern region (4) and a peripheral region around the pattern region (5) are in one plane.
摘要翻译：本发明的目的是通过使用例如诸如用于光掩模的电子束写入器的现有写入器来有效地制造带电粒子束光刻掩模，X射线光刻掩模或极紫外光束光刻掩模同时实现掩模图案的处理精度的提高。光刻掩模（1）包括基底（2），基底（2）具有基本上在其中心处设置有开口（3）的下表面和具有基本上位于中心的图案区域（4）的自支撑膜（m）所述基板（2）的与所述开口（3）对应的上表面。自支撑膜（m）在其上设置有掩模图案的通孔（h）或其上的掩模图案的吸收体或散射体，图案区域（4）和图案区域周围的周边区域（5）在一个平面上。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式