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    • 9. 发明授权
    • Method for preparing superconductor sputtering target
    • 制备超导体溅射靶的方法
    • US5091221A
    • 1992-02-25
    • US571138
    • 1990-08-22
    • Jau-Jier ChuMing-Chih LaiMei-Rurng TsengHuei-Hsing Yeh
    • Jau-Jier ChuMing-Chih LaiMei-Rurng TsengHuei-Hsing Yeh
    • C04B35/45C04B35/636C23C14/34H01L39/24
    • C23C14/3414C04B35/45C04B35/6365H01L39/2435Y10S505/731Y10S505/741
    • A method for preparing a superconductor sputtering target is disclosed in which sputtering targets for coating superconductor films can be prepared essentially by mixing oxides (carbonates or fluorides) of metals such as Y, Ba, Cu (Bi, Pb), Sr, Ca,Cu) with the atomic ratio of individual elements be controlled in a specific range, an oxide superconductor paste being prepared by blending an organic binder and an organic solvent according to a specific solid percentage, and a metal such as aluminum being used as the substrate; by scraping with a squeegee and adjusting the distance between a stencil and the substrate such that the superconductor paste seeps through a mesh to be printed on the substrate and then dried; after scraping, screen-printing and drying having been repeated several times, the substrate being placed into an oven and heated to a temperature of 400.degree.-450.degree. C., at a rate of less than 5.degree. C./min, for 30 minutes and then cooled down to room temperature at the same rate of less than 5.degree. C./min.
    • 公开了一种制备超导体溅射靶的方法,其中用于涂覆超导体膜的溅射靶可以通过将Y,Ba,Cu(Bi,Pb),Sr,Ca,Cu等金属的氧化物(碳酸盐或氟化物) )将单体元素的原子比控制在特定范围内,通过将有机粘合剂和有机溶剂按照特定的固体成分配合而制备的氧化物超导体糊料,以及铝等金属作为基材; 通过用刮刀刮擦并调节模板和基底之间的距离,使得超导体糊剂通过待印刷的网孔渗透到基底上然后干燥; 在刮擦,丝网印刷和干燥之后,重复几次,将基材放入烘箱中,以低于5℃/分钟的速率加热到400-450℃的温度,30 分钟,然后以低于5℃/分钟的相同速率冷却至室温。