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1. 发明申请

US20100164040A1 Microlens Structure for Image Sensors 审中-公开
标题翻译：图像传感器的微透镜结构
公开(公告)号：US20100164040A1
公开(公告)日：2010-07-01
申请号：US12722372
申请日：2010-03-11
申请人： Ming-Chang Kao , Chih-Kung Chang , Fu-Tien Weng , Bii-Junq Chang
发明人： Ming-Chang Kao , Chih-Kung Chang , Fu-Tien Weng , Bii-Junq Chang
IPC分类号： H01L31/0232
CPC分类号： H01L27/14685 , H01L27/14627
摘要： A microlens structure and a method of fabrication thereof are provided. The method comprises forming a layer of microlens material over a substrate, which has photo-sensitive elements formed therein. The microlens material, which comprises a photo-resist material, is exposed in accordance with a desired pattern a plurality of times. The energy used with each exposure process is less than the energy required if a single exposure is used. Furthermore, the masks used for each exposure may differ. In an embodiment, the masks are varied so as to create a notch in the upper corner of the microlens. The microlens structure may have a height less than about 0.5 um and/or a gap between microlenses less than about 0.2 um. In an embodiment, one or more dielectric layers having a combined thickness greater than about 3.5 um are interposed between the photo-sensitive elements and the microlenses.
摘要翻译：提供微透镜结构及其制造方法。该方法包括在其上形成有光敏元件的衬底上形成微透镜材料层。包含光致抗蚀剂材料的微透镜材料根据期望的图案多次曝光。每次曝光过程中使用的能量小于使用单次曝光所需的能量。此外，用于每次曝光的掩模可能不同。在一个实施例中，改变掩模以便在微透镜的上角形成凹口。微透镜结构可以具有小于约0.5μm的高度和/或微透镜之间的间隙小于约0.2μm。在一个实施例中，具有大于约3.5μm的组合厚度的一个或多个介电层插入在光敏元件和微透镜之间。

2. 发明授权

US07704778B2 Microlens structure for image sensors 有权
标题翻译：图像传感器的微透镜结构
公开(公告)号：US07704778B2
公开(公告)日：2010-04-27
申请号：US11181508
申请日：2005-07-14
申请人： Ming-Chang Kao , Chih-Kung Chang , Fu-Tien Weng , Bii-Junq Chang
发明人： Ming-Chang Kao , Chih-Kung Chang , Fu-Tien Weng , Bii-Junq Chang
IPC分类号： H01L21/00
CPC分类号： H01L27/14685 , H01L27/14627
摘要： A microlens structure and a method of fabrication thereof are provided. The method comprises forming a layer of microlens material over a substrate, which has photo-sensitive elements formed therein. The microlens material, which comprises a photo-resist material, is exposed in accordance with a desired pattern a plurality of times. The energy used with each exposure process is less than the energy required if a single exposure is used. Furthermore, the masks used for each exposure may differ. In an embodiment, the masks are varied so as to create a notch in the upper corner of the microlens.
摘要翻译：提供微透镜结构及其制造方法。该方法包括在其上形成有光敏元件的衬底上形成微透镜材料层。包含光致抗蚀剂材料的微透镜材料根据期望的图案多次曝光。每次曝光过程中使用的能量小于使用单次曝光所需的能量。此外，用于每次曝光的掩模可能不同。在一个实施例中，改变掩模以便在微透镜的上角形成凹口。

3. 发明授权

US07505206B2 Microlens structure for improved CMOS image sensor sensitivity 有权
标题翻译：微透镜结构提高了CMOS图像传感器的灵敏度
公开(公告)号：US07505206B2
公开(公告)日：2009-03-17
申请号：US11456249
申请日：2006-07-10
申请人： Jack Deng , Chih-Kung Chang , Chin Chen Kuo , Ming-Chang Kao , Fu-Tien Weng , Bii-Junq Chang
发明人： Jack Deng , Chih-Kung Chang , Chin Chen Kuo , Ming-Chang Kao , Fu-Tien Weng , Bii-Junq Chang
IPC分类号： G02B27/10
CPC分类号： G02B3/0056 , G02B3/0018
摘要： A method of manufacturing a microlens device by depositing a microlens material layer over a substrate that includes photo-sensors. The microlens material layer is then exposed and developed to define microlens material elements, including first microlens material elements and second microlens material elements. Each second microlens material element is substantially greater in thickness relative to each first microlens material element. The microlens material elements are then heated to form a microlens array that includes first microlens array elements, each corresponding to a first microlens material element, and second microlens array elements, each corresponding to a second microlens material element. Each first microlens array element has a substantially greater focal length relative to each second microlens array element. For example, each second microlens array element is substantially greater in thickness relative to each first microlens array element.
摘要翻译：一种通过在包括光电传感器的衬底上沉积微透镜材料层来制造微透镜器件的方法。然后将微透镜材料层曝光和显影以限定微透镜材料元件，包括第一微透镜材料元件和第二微透镜材料元件。每个第二微透镜材料元件相对于每个第一微透镜材料元件的厚度基本上更大。然后将微透镜材料元件加热以形成微透镜阵列，其包括每个对应于第一微透镜材料元件的第一微透镜阵列元件和分别对应于第二微透镜材料元件的第二微透镜阵列元件。每个第一微透镜阵列元件相对于每个第二微透镜阵列元件具有大得多的焦距。例如，每个第二微透镜阵列元件相对于每个第一微透镜阵列元件的厚度基本上更大。

4. 发明申请

US20060189024A1 Microlens structure for image sensors 有权
标题翻译：图像传感器的微透镜结构
公开(公告)号：US20060189024A1
公开(公告)日：2006-08-24
申请号：US11181508
申请日：2005-07-14
申请人： Ming-Chang Kao , Chih-Kung Chang , Fu-Tien Weng , Bii-Junq Chang
发明人： Ming-Chang Kao , Chih-Kung Chang , Fu-Tien Weng , Bii-Junq Chang
IPC分类号： H01L21/00
CPC分类号： H01L27/14685 , H01L27/14627
摘要： A microlens structure and a method of fabrication thereof are provided. The method comprises forming a layer of microlens material over a substrate, which has photo-sensitive elements formed therein. The microlens material, which comprises a photo-resist material, is exposed in accordance with a desired pattern a plurality of times. The energy used with each exposure process is less than the energy required if a single exposure is used. Furthermore, the masks used for each exposure may differ. In an embodiment, the masks are varied so as to create a notch in the upper corner of the microlens.
摘要翻译：提供微透镜结构及其制造方法。该方法包括在其上形成有光敏元件的衬底上形成微透镜材料层。包含光致抗蚀剂材料的微透镜材料根据期望的图案多次曝光。每次曝光过程中使用的能量小于使用单次曝光所需的能量。此外，用于每次曝光的掩模可能不同。在一个实施例中，改变掩模以便在微透镜的上角形成凹口。

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