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    • 3. 发明授权
    • Reconfigurable lithographic structures
    • 可重构光刻结构
    • US08703073B2
    • 2014-04-22
    • US12864942
    • 2009-03-06
    • David Hugo GraciasTimothy Gar-Ming Leong
    • David Hugo GraciasTimothy Gar-Ming Leong
    • G01N15/06
    • B25J7/00B81B3/0024B81B3/0032B81B2201/031B81C99/002Y10T436/11
    • A lithographically structured device has an actuation layer and a control layer operatively connected to the actuation layer. The actuation layer includes a stress layer and a neutral layer that is constructed of materials and with a structure such that it stores torsional energy upon being constructed. The control layer is constructed to maintain the actuation layer substantially in a first configuration in a local environmental condition and is responsive to a change in the local environmental condition such that it permits a release of stored torsional energy to cause a change in a structural configuration of the lithographically structured device to a second configuration, the control layer thereby providing a trigger mechanism. The lithographically structured device has a maximum dimension that is less than about 10 mm when it is in the second configuration.
    • 光刻结构的器件具有可操作地连接到致动层的致动层和控制层。 致动层包括应力层和中性层,其由材料构成,并具有在构造时存储扭转能的结构。 控制层被构造成在局部环境条件下将致动层基本上保持在第一构型中并且响应于局部环境条件的改变,使得其允许释放存储的扭转能量以引起结构构造的变化 光刻结构的设备到第二配置,控制层由此提供触发机构。 光刻结构的装置在其处于第二构型时的最大尺寸小于约10mm。
    • 7. 发明申请
    • RECONFIGURABLE LITHOGRAPHIC STRUCTURES
    • 可重构光刻结构
    • US20100326071A1
    • 2010-12-30
    • US12864942
    • 2009-03-06
    • David Hugo GraciasTimothy Gar-Ming Leong
    • David Hugo GraciasTimothy Gar-Ming Leong
    • F03G7/06
    • B25J7/00B81B3/0024B81B3/0032B81B2201/031B81C99/002Y10T436/11
    • A lithographically structured device has an actuation layer and a control layer operatively connected to the actuation layer. The actuation layer includes a stress layer and a neutral layer that is constructed of materials and with a structure such that it stores torsional energy upon being constructed. The control layer is constructed to maintain the actuation layer substantially in a first configuration in a local environmental condition and is responsive to a change in the local environmental condition such that it permits a release of stored torsional energy to cause a change in a structural configuration of the lithographically structured device to a second configuration, the control layer thereby providing a trigger mechanism. The lithographically structured device has a maximum dimension that is less than about 10 mm when it is in the second configuration.
    • 光刻结构的器件具有可操作地连接到致动层的致动层和控制层。 致动层包括应力层和中性层,其由材料构成,并具有在构造时存储扭转能的结构。 控制层被构造成在局部环境条件下将致动层基本上保持在第一构型中并且响应于局部环境条件的改变,使得其允许释放存储的扭转能量以引起结构构造的变化 光刻结构的设备到第二配置,控制层由此提供触发机构。 光刻结构的装置在其处于第二构型时的最大尺寸小于约10mm。