专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明授权

US09598320B2 Method of producing composite metal oxide, metal oxide sintered body, and rotary kiln 有权
公开(公告)号：US09598320B2
公开(公告)日：2017-03-21
申请号：US14110734
申请日：2012-04-19
申请人： Naomichi Hori , Mikio Nakashima
发明人： Naomichi Hori , Mikio Nakashima
IPC分类号： C04B35/46 , C04B35/50 , C01G23/00 , C01G25/00 , F27B7/28 , F27B7/20 , F27D1/00
CPC分类号： C04B35/50 , C01G23/005 , C01G25/006 , F27B7/20 , F27B7/28 , F27D1/0006
摘要： Provided is a method of producing a composite metal oxide including, to calcine a composition containing an alkali metal and obtain a composite metal oxide, calcining the composition while being arranged on a mount a part of which in contact with the composition is formed of a metal oxide component. The metal oxide component has a content of K atoms ranging from 5 to 13 parts by weight in terms of K2O with respect to 100 parts by weight of the metal oxide component, and a total content of Al atoms, Zr atoms, Mg atoms, and Ce atoms ranging from 15 to 70 parts by weight in terms of oxides with respect to 100 parts by weight of the metal oxide component. The present invention thus provides a method of producing a composite metal oxide containing an alkali metal with reduced production costs.

2. 发明申请

US20120323052A1 EVAPORATOR, EVAPORATION METHOD AND SUBSTRATE PROCESSING APPARATUS 有权
标题翻译：蒸发器，蒸发方法和基板处理装置
公开(公告)号：US20120323052A1
公开(公告)日：2012-12-20
申请号：US13597314
申请日：2012-08-29
申请人： Mikio NAKASHIMA , Yuji Kamikawa
发明人： Mikio NAKASHIMA , Yuji Kamikawa
IPC分类号： C07C29/80
CPC分类号： B01D1/065 , B01B1/005 , B01D1/02 , B01D1/30 , F26B5/00 , F26B5/16
摘要： Disclosed are an evaporator, an evaporation method, and a substrate processing apparatus, which can increase the concentration of generated vapor of an organic solvent and efficiently heat the organic solvent. The evaporator includes a fluid tube, a liquid organic solvent supply device for supplying the organic solvent liquid to one end of the fluid tube, and heating units for heating the fluid tube. The fluid tube has a cross section that increases from the one end to the other end. When the organic solvent liquid supplied to one end of the fluid tube is heated, the organic solvent vapor is discharged from the other end of the fluid tube. The substrate processing apparatus includes the above-described evaporator.
摘要翻译：公开了一种蒸发器，蒸发方法和基板处理装置，其可以增加有机溶剂的产生蒸气的浓度并有效地加热有机溶剂。蒸发器包括流体管，用于将有机溶剂液体供给到流体管的一端的液体有机溶剂供给装置，以及用于加热流体管的加热单元。流体管具有从一端到另一端增加的横截面。当提供给流体管的一端的有机溶剂液体被加热时，有机溶剂蒸气从流体管的另一端排出。基板处理装置包括上述蒸发器。

3. 发明授权

US08266820B2 Substrate processing method, and program storage medium therefor 有权
标题翻译：基板处理方法及其程序存储介质
公开(公告)号：US08266820B2
公开(公告)日：2012-09-18
申请号：US13209741
申请日：2011-08-15
申请人： Hideki Nishimura , Mikio Nakashima
发明人： Hideki Nishimura , Mikio Nakashima
IPC分类号： F26B3/00
CPC分类号： H01L21/67109 , H01L21/02052 , H01L21/67034 , H01L21/67248
摘要： A substrate processing method which can reduce the number of particles to be left on each substrate is provided. In the substrate processing method, substrates W to be processed are dried, by using a fluid heated by a heating apparatus having one or more heating mechanisms. The substrate processing method comprises a first step of supplying a mixed fluid containing a gas and a processing liquid and heated by the heating apparatus, into a processing chamber in which the substrates to be processed are placed, and a second step of supplying the heated gas into the processing chamber. The output of at least one of the heating mechanisms is kept at a preset constant value for a period of time during which a predetermined time passes after the start of the first step. In the second step, the output of the heating mechanism is determined under a feed back control.
摘要翻译：提供了可以减少要留在每个基板上的颗粒数量的基板处理方法。在基板处理方法中，通过使用由具有一个或多个加热机构的加热装置加热的流体来干燥待加工的基板W. 基板处理方法包括：第一步骤，将含有气体和处理液体的混合流体供给并被加热装置加热到其中放置待处理基板的处理室中;以及第二步骤，进入处理室。至少一个加热机构的输出在第一步骤开始之后的预定时间过去的一段时间内保持在预设的恒定值。在第二步骤中，在反馈控制下确定加热机构的输出。

4. 发明申请

US20110296707A1 SUBSTRATE PROCESSING METHOD, AND PROGRAM STORAGE MEDIUM THEREFOR 有权
标题翻译：基板处理方法及其程序存储介质
公开(公告)号：US20110296707A1
公开(公告)日：2011-12-08
申请号：US13209741
申请日：2011-08-15
申请人： Hideki NISHIMURA , Mikio Nakashima
发明人： Hideki NISHIMURA , Mikio Nakashima
IPC分类号： F26B3/02
CPC分类号： H01L21/67109 , H01L21/02052 , H01L21/67034 , H01L21/67248
摘要： A substrate processing method which can reduce the number of particles to be left on each substrate is provided. In the substrate processing method, substrates W to be processed are dried, by using a fluid heated by a heating apparatus having one or more heating mechanisms. The substrate processing method comprises a first step of supplying a mixed fluid containing a gas and a processing liquid and heated by the heating apparatus, into a processing chamber in which the substrates to be processed are placed, and a second step of supplying the heated gas into the processing chamber. The output of at least one of the heating mechanisms is kept at a preset constant value for a period of time during which a predetermined time passes after the start of the first step. In the second step, the output of the heating mechanism is determined under a feed back control.
摘要翻译：提供了可以减少要留在每个基板上的颗粒数量的基板处理方法。在基板处理方法中，通过使用由具有一个或多个加热机构的加热装置加热的流体来干燥待加工的基板W. 基板处理方法包括：第一步骤，将含有气体和处理液体的混合流体供给并被加热装置加热到其中放置待处理基板的处理室中;以及第二步骤，进入处理室。至少一个加热机构的输出在第一步骤开始之后的预定时间过去的一段时间内保持在预设的恒定值。在第二步骤中，在反馈控制下确定加热机构的输出。

5. 发明授权

US07593625B2 Fluid heating apparatus 有权
标题翻译：流体加热装置
公开(公告)号：US07593625B2
公开(公告)日：2009-09-22
申请号：US11481253
申请日：2006-07-06
申请人： Yuji Kamikawa , Mikio Nakashima , Osamu Tsuda
发明人： Yuji Kamikawa , Mikio Nakashima , Osamu Tsuda
IPC分类号： F24F3/14 , H05B3/40
CPC分类号： F24H1/101 , F24H1/162 , F28F2245/06
摘要： Disclosed is a fluid heating apparatus including a halogen lamp 23, and a tubular structure 26 surrounding the heating lamp and having a fluid inlet 24 and a fluid outlet 25. The tubular structure 26 comprises plural straight pipes 26a arrayed circumferentially around the halogen lamp 26, with adjacent straight pipes 26a being in contact with each other, or being slightly spaced from each other. At least the surfaces, facing the halogen lamp 26, of the straight pipes 26a are coated with a black paint 27, or a radiant-light-absorbing paint.
摘要翻译：公开了一种包括卤素灯23和围绕加热灯并具有流体入口24和流体出口25的管状结构26的流体加热装置。管状结构26包括沿卤素灯26周向排列的多个直管26a，相邻的直管26a彼此接触或者彼此稍微间隔开。直管26a的至少面对卤素灯26的表面涂覆有黑色漆27或辐射光吸收涂料。

6. 发明授权

US07513194B2 Screen mask 失效
标题翻译：屏幕面具
公开(公告)号：US07513194B2
公开(公告)日：2009-04-07
申请号：US11790677
申请日：2007-04-26
申请人： Naoto Yanagihara , Masayuki Seto , Mikio Nakashima , Nobuyuki Ushifusa
发明人： Naoto Yanagihara , Masayuki Seto , Mikio Nakashima , Nobuyuki Ushifusa
IPC分类号： B41N1/24
CPC分类号： B41N1/247 , H05K3/1225
摘要： A screen mask includes a screen mesh with a tensioning force of 196 to 392 N/mm; a tension mesh with a tensioning force of 49 to 98 N/mm; a resin plate (fixing part) arranged so as to surround the outer periphery of the screen mesh for fixing a part of the tension mesh with a tensioning force of 392 to 980 N/mm; and a screen frame. A length Ls of the screen mesh in a first direction intersecting a direction in which a squeegee squeegees on the screen mesh when performing a screen printing is 0.6 to 0.9 times a length Lt of the tension mesh in the first direction, a length Lk of the resin plate, the length Ls, and the length Lt in the first direction satisfy a relationship Lk=a(Lt+Ls)/2, where “a” is a coefficient in a range of 0.5 to 1.2.
摘要翻译：屏幕掩模包括具有196至392N / mm的张力的筛网; 拉伸力为49〜98N / mm的张力网; 布置成围绕所述筛网的外周的树脂板（固定部），用于以392〜980N / mm的张力固定所述张力网的一部分; 和屏幕框架。在进行丝网印刷时，与筛网上的刮板刮擦方向相交的第一方向的筛网长度Ls为第一方向上的张力网的长度Lt的0.6〜0.9倍，树脂板，长度Ls和第一方向上的长度Lt满足关系Lk = a（Lt + Ls）/ 2，其中“a”是0.5至1.2范围内的系数。

7. 发明申请

US20080060214A1 Substrate processing method, substrate processing apparatus, and program storage medium 有权
标题翻译：基板处理方法，基板处理装置和程序存储介质
公开(公告)号：US20080060214A1
公开(公告)日：2008-03-13
申请号：US11896936
申请日：2007-09-06
申请人： Hideki Nishimura , Mikio Nakashima
发明人： Hideki Nishimura , Mikio Nakashima
IPC分类号： F26B3/00
CPC分类号： H01L21/67109 , H01L21/02052 , H01L21/67034 , H01L21/67248
摘要： A substrate processing method which can reduce the number of particles to be left on each substrate is provided. In the substrate processing method, substrates W to be processed are dried, by using a fluid heated by a heating apparatus having one or more heating mechanisms. The substrate processing method comprises a first step of supplying a mixed fluid containing a gas and a processing liquid and heated by the heating apparatus, into a processing chamber in which the substrates to be processed are placed, and a second step of supplying the heated gas into the processing chamber. The output of at least one of the heating mechanisms is kept at a preset constant value for a period of time during which a predetermined time passes after the start of the first step. In the second step, the output of the heating mechanism is determined under a feed back control.
摘要翻译：提供了可以减少要留在每个基板上的颗粒数量的基板处理方法。在基板处理方法中，通过使用由具有一个或多个加热机构的加热装置加热的流体来干燥待加工的基板W. 基板处理方法包括：第一步骤，将含有气体和处理液体的混合流体供给并被加热装置加热到其中放置待处理基板的处理室中;以及第二步骤，进入处理室。至少一个加热机构的输出在第一步骤开始之后的预定时间过去的一段时间内保持在预设的恒定值。在第二步骤中，在反馈控制下确定加热机构的输出。

8. 发明申请

US20070017502A1 Fluid heating apparatus 有权
标题翻译：流体加热装置
公开(公告)号：US20070017502A1
公开(公告)日：2007-01-25
申请号：US11481253
申请日：2006-07-06
申请人： Yuji Kamikawa , Mikio Nakashima , Osamu Tsuda
发明人： Yuji Kamikawa , Mikio Nakashima , Osamu Tsuda
IPC分类号： A47J27/62 , F24H9/20
CPC分类号： F24H1/101 , F24H1/162 , F28F2245/06
摘要： Disclosed is a fluid heating apparatus including a halogen lamp 23, and a tubular structure 26 surrounding the heating lamp and having a fluid inlet 24 and a fluid outlet 25. The tubular structure 26 comprises plural straight pipes 26a arrayed circumferentially around the halogen lamp 26, with adjacent straight pipes 26a being in contact with each other, or being slightly spaced from each other. At least the surfaces, facing the halogen lamp 26, of the straight pipes 26a are coated with a black paint 27, or a radiant-light-absorbing paint.
摘要翻译：公开了一种流体加热装置，其包括卤素灯23和围绕加热灯并具有流体入口24和流体出口25的管状结构26。管状结构26包括围绕卤素灯26周向排列的多个直管26a，相邻的直管26a彼此接触或彼此稍微间隔开。直管26a的至少面向卤素灯26的表面涂覆有黑色漆27或辐射光吸收涂料。

9. 发明申请

US20140065565A1 METHOD OF PRODUCING COMPOSITE METAL OXIDE, METAL OXIDE SINTERED BODY, AND ROTARY KILN 有权
标题翻译：生产复合金属氧化物，金属氧化物烧结体和旋转窑的方法
公开(公告)号：US20140065565A1
公开(公告)日：2014-03-06
申请号：US14110734
申请日：2012-04-19
申请人： Naomichi Hori , Mikio Nakashima
发明人： Naomichi Hori , Mikio Nakashima
IPC分类号： C04B35/50 , F27B7/28
CPC分类号： C04B35/50 , C01G23/005 , C01G25/006 , F27B7/20 , F27B7/28 , F27D1/0006
摘要： Provided is a method of producing a composite metal oxide including, to calcine a composition containing an alkali metal and obtain a composite metal oxide, calcining the composition while being arranged on a mount a part of which in contact with the composition is formed of a metal oxide component. The metal oxide component has a content of K atoms ranging from 5 to 13 parts by weight in terms of K2O with respect to 100 parts by weight of the metal oxide component, and a total content of Al atoms, Zr atoms, Mg atoms, and Ce atoms ranging from 15 to 70 parts by weight in terms of oxides with respect to 100 parts by weight of the metal oxide component. The present invention thus provides a method of producing a composite metal oxide containing an alkali metal with reduced production costs.
摘要翻译：提供一种复合金属氧化物的制造方法，其包含煅烧含有碱金属的组合物并获得复合金属氧化物的方法，在组合物的一部分与金属组成接触的基板上进行煅烧，氧化物组分。相对于100重量份的金属氧化物成分，金属氧化物成分的K原子含量以K 2 O表示5〜13重量份，Al原子，Zr原子，Mg原子的总含量和相对于100重量份的金属氧化物组分，Ce原子的氧化物为15〜70重量份。因此，本发明提供一种制造含有碱金属的复合金属氧化物的方法，其生产成本降低。

10. 发明申请

US20080098911A1 Screen mask 失效
标题翻译：屏幕面具
公开(公告)号：US20080098911A1
公开(公告)日：2008-05-01
申请号：US11790677
申请日：2007-04-26
申请人： Naoto Yanagihara , Masayuki Seto , Mikio Nakashima , Nobuyuki Ushifusa
发明人： Naoto Yanagihara , Masayuki Seto , Mikio Nakashima , Nobuyuki Ushifusa
IPC分类号： B41N1/24
CPC分类号： B41N1/247 , H05K3/1225
摘要： A screen mask includes a screen mesh with a tensioning force of 196 to 392 N/mm; a tension mesh with a tensioning force of 49 to 98 N/mm; a resin plate (fixing part) arranged so as to surround the outer periphery of the screen mesh for fixing a part of the tension mesh with a tensioning force of 392 to 980 N/mm; and a screen frame. A length Ls of the screen mesh in a first direction intersecting a direction in which a squeegee squeegees on the screen mesh when performing a screen printing is 0.6 to 0.9 times a length Lt of the tension mesh in the first direction, a length Lk of the resin plate, the length Ls, and the length Lt in the first direction satisfy a relationship Lk=a(Lt+Ls)/2, where “a” is a coefficient in a range of 0.5 to 1.2.
摘要翻译：屏幕掩模包括具有196至392N / mm的张力的筛网; 拉伸力为49〜98N / mm的张力网; 布置成围绕所述筛网的外周的树脂板（固定部），用于以392〜980N / mm的张力固定所述张力网的一部分; 和屏幕框架。在进行丝网印刷时，与筛网上的刮板刮擦方向相交的第一方向的筛网长度Ls为第一方向上的张力网的长度Lt的0.6〜0.9倍，树脂板，长度Ls和第一方向上的长度Lt满足关系Lk = a（Lt + Ls）/ 2，其中“a”是0.5至1.2范围内的系数。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式