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1. 发明授权

US5736066A Optically anisotropic film 失效
标题翻译：光学各向异性薄膜
公开(公告)号：US5736066A
公开(公告)日：1998-04-07
申请号：US555807
申请日：1995-11-09
申请人： Takanobu Noguchi , Toshihiro Ohnishi , Michitaka Morikawa , Masato Kuwabara
发明人： Takanobu Noguchi , Toshihiro Ohnishi , Michitaka Morikawa , Masato Kuwabara
IPC分类号： G02B5/30 , G02F1/13363 , C09K19/52 , C09K19/00
CPC分类号： G02F1/13363 , G02B5/3016 , G02F2001/133633 , G02F2001/133637 , G02F2203/21
摘要： The present invention provides an optically anisotropic film characterized in that the retardation at 80.degree. C. is 20-97% of that at 30.degree. C., and the film is made from a mixture of a transparent or semitransparent polymer and at least one liquid crystal compound, wherein the ratio of the liquid crystal compound in the mixture is 0.5-50% by weight based on the combined weight of the liquid crystal compound and the polymer, or an optically anisotropic film characterized in that the retardation at 60.degree. C. is 50-99% of that at 30.degree. C., and the film comprises a mixture of a transparent or semitransparent polymer and at least one liquid crystal compound, wherein the ratio of the liquid crystal compound in the mixture is 0.5-50% by weight based on the combined weight of the liquid crystal compound and the polymer. These optically anisotropic films have a temperature dependence of retardation corresponding to that of the liquid crystal display cell used in combination with the film, show a temperature compensating effect, and are also excellent in viewing angle characteristics and display performance, so that they can be used for the production of composite optically anisotropic films or liquid crystal display devices.
摘要翻译：本发明提供一种光学各向异性膜，其特征在于在80℃下的延迟是在30℃下的延迟的20-97％，并且该膜由透明或半透明聚合物和至少一种液体晶体化合物，其中液晶化合物在液晶化合物和聚合物的组合重量中的比例为0.5-50重量％，或者是在60℃下的延迟的光学各向异性膜。在30℃下为50-99％，膜包含透明或半透明聚合物和至少一种液晶化合物的混合物，其中混合物中液晶化合物的比例为0.5-50％基于液晶化合物和聚合物的组合重量。这些光学各向异性膜具有与膜结合使用的液晶显示元件的延迟的温度依赖性，显示出温度补偿效果，并且也具有优异的视角特性和显示性能，因此可以使用它们用于生产复合光学各向异性膜或液晶显示装置。

2. 发明授权

US5474731A Process for producing phase retarder film 失效
标题翻译：生产相延迟膜的方法
公开(公告)号：US5474731A
公开(公告)日：1995-12-12
申请号：US226465
申请日：1994-04-12
申请人： Michitaka Morikawa , Koji Higashi , Tadashi Shindo
发明人： Michitaka Morikawa , Koji Higashi , Tadashi Shindo
IPC分类号： G02B5/30 , G02F1/13363 , B29C61/02
CPC分类号： G02B5/3083 , G02F1/13363 , Y10S264/71
摘要： A process for continuously producing a phase retarder film or sheet comprising continuously supplying a stretched thermoplastic resin film or sheet to a heating zone in parallel with the stretching direction of the film or sheet and heating the film or sheet to a temperature not lower than the glass transition temperature of the resin while applying pressure to the surface of the film or sheet passing through the heating zone, thereby continuously subjecting the film or sheet to thermal relaxation while suppressing the expansion of the film or sheet in a direction parallel to the surface of the film or sheet and perpendicular to the stretching axis. According to the present invention, a phase retarder film or sheet having a low angular dependence of retardation can be produced continuously. By using the phase retarder film(s) or sheet(s) thus obtained as optical compensator(s), the viewing angle characteristics of liquid crystal display devices can remarkably be improved.
摘要翻译：一种连续制造延迟片或薄片的方法，包括将拉伸的热塑性树脂薄膜或片材与薄膜或片材的拉伸方向平行地连续地供给到加热区域，并将薄膜或薄片加热到不低于玻璃的温度同时向通过加热区域的膜或片的表面施加压力，从而连续地对膜或片进行热松弛，同时抑制膜或片在平行于该表面的方向上的膨胀膜或片材并垂直于拉伸轴。根据本发明，可以连续地制造具有低延迟角度依赖性的相位延迟片或片。通过使用如此获得的相位延迟膜或片作为光学补偿器，可以显着提高液晶显示装置的视角特性。

3. 发明授权

US07439010B2 Alkali-soluble siloxane polymer, positive type resist composition, resist pattern, process for forming the same, electronic device and process for manufacturing the same 有权
标题翻译：碱溶性硅氧烷聚合物，正型抗蚀剂组合物，抗蚀剂图案，其形成方法，电子器件及其制造方法
公开(公告)号：US07439010B2
公开(公告)日：2008-10-21
申请号：US11124121
申请日：2005-05-09
申请人： Keiji Watanabe , Miwa Kozawa , Shoichi Suda , Fumi Yamaguchi , Isao Yahagi , Michitaka Morikawa
发明人： Keiji Watanabe , Miwa Kozawa , Shoichi Suda , Fumi Yamaguchi , Isao Yahagi , Michitaka Morikawa
IPC分类号： G03F7/20 , G03F7/30 , G03F7/36 , G03F7/039
CPC分类号： G03F7/0233 , C09D183/06 , G03F7/0045 , G03F7/0757
摘要： A positive type resist composition having an alkali-soluble siloxane polymer expressed by the following Formula (1), a photosensitive compound, and a 1 μm thick resist film formed of the positive type resist composition which has 5% to 60% of transmittance to i-line radiation; in the Formula (1), R1 and R2 express a monovalent organic group, and may be identical or different; “A” is a group expressed by the following Formula (2) having at least one phenolic hydroxyl group; and “a”, “b,” and “c” satisfy the following relation; a+b+c=1, in the Formula (2), R3, R4, and R5 express one of a hydrogen atom and a monovalent organic group, and may be identical or different, “m” expresses an integer, and “n” expresses an integer of 1 to 5. Preferably, 0.25≦a≦0.60, and 0≦c≦0.25. The composition is preferably used in a resist film undergoing oxygen plasma etching.
摘要翻译：具有由下式（1）表示的碱溶性硅氧烷聚合物的正型抗蚀剂组合物，感光性化合物和由正型抗蚀剂组合物形成的1μm厚的抗蚀剂膜，其具有对i的透射率的5％至60％线辐射; 在式（1）中，R 1和R 2表示一价有机基团，可以相同或不同; “A”是具有至少一个酚羟基的由下式（2）表示的基团; 和“a”，“b”和“c”满足下列关系：在式（2）中，a + b + c = 1，R 3，R 4，R 5和R 5表示氢原子和一价有机基团，并且可以相同或不同，“m”表示整数，“n”表示1至5的整数。优选地，0.25 <= a <= 0.60，0 <= c < 0.25。该组合物优选用于进行氧等离子体蚀刻的抗蚀剂膜。

4. 发明申请

US20050221227A1 Alkali-soluble siloxane polymer, positive type resist composition, resist pattern, process for forming the same, electronic device and process for manufacturing the same 有权
公开(公告)号：US20050221227A1
公开(公告)日：2005-10-06
申请号：US11124121
申请日：2005-05-09
申请人： Keiji Watanabe , Miwa Kozawa , Shoichi Suda , Fumi Yamaguchi , Isao Yahagi , Michitaka Morikawa
发明人： Keiji Watanabe , Miwa Kozawa , Shoichi Suda , Fumi Yamaguchi , Isao Yahagi , Michitaka Morikawa
IPC分类号： C08G77/38 , C09D183/06 , G03F7/004 , G03F7/023 , G03F7/075 , G03F7/40 , H01L21/027 , G03C1/492
CPC分类号： G03F7/0233 , C09D183/06 , G03F7/0045 , G03F7/0757
摘要： A positive type resist composition having an alkali-soluble siloxane polymer expressed by the following Formula (1), a photosensitive compound, and a 1 μm thick resist film formed of the positive type resist composition which has 5% to 60% of transmittance to i-line radiation; in the Formula (1), R1 and R2 express a monovalent organic group, and may be identical or different; “A” is a group expressed by the following Formula (2) having at least one phenolic hydroxyl group; and “a”, “b,” and “c” satisfy the following relation; a+b+c=1, in the Formula (2), R3, R4, and R5 express one of a hydrogen atom and a monovalent organic group, and may be identical or different, “m” expresses an integer, and “n” expresses an integer of 1 to 5. Preferably, 0.25≦a≦0.60, and 0≦c≦0.25. The composition is preferably used in a resist film undergoing oxygen plasma etching.

5. 发明授权

US5366682A Process for producing phase retarder 失效
标题翻译：制备相缓凝剂的方法
公开(公告)号：US5366682A
公开(公告)日：1994-11-22
申请号：US987803
申请日：1992-12-09
申请人： Michitaka Morikawa , Koji Higashi , Tadashi Shindo
发明人： Michitaka Morikawa , Koji Higashi , Tadashi Shindo
IPC分类号： B29C55/00 , B29C61/02 , B29C71/02 , B29D7/01 , G02B5/30 , G02F1/13363
CPC分类号： B29C71/02 , B29C61/02 , B29D7/01 , G02B5/3083 , G02F1/13363 , B29C55/00 , B29K2069/00 , B29K2995/0026 , B29K2995/0032 , B29L2011/00 , Y10S264/71
摘要： A process for producing a phase retarder film or sheet, which comprises subjecting a stretched thermoplastic resin film or sheet to thermal relaxation at a temperature not lower than the glass transition temperature of the thermoplastic resin to shrink the film or sheet in the stretching axis direction while suppressing the expansion of the film or sheet in a direction parallel to the film or sheet surface and perpendicular to the stretching axis.
摘要翻译：一种相变缓凝膜或片材的制造方法，其特征在于，在拉伸热塑性树脂膜或片材在不低于所述热塑性树脂的玻璃化转变温度的温度下进行热松弛，使所述膜或片材沿拉伸轴方向收缩，同时抑制膜或片在平行于膜或片表面并垂直于拉伸轴的方向上的膨胀。

6. 发明授权

US06949324B2 Alkali-soluble siloxane polymer, positive type resist composition, resist pattern, process for forming the same, electronic device and process for manufacturing the same 有权
标题翻译：碱溶性硅氧烷聚合物，正型抗蚀剂组合物，抗蚀剂图案，其形成方法，电子器件及其制造方法
公开(公告)号：US06949324B2
公开(公告)日：2005-09-27
申请号：US10329992
申请日：2002-12-27
申请人： Keiji Watanabe , Miwa Kozawa , Shoichi Suda , Fumi Yamaguchi , Isao Yahagi , Michitaka Morikawa
发明人： Keiji Watanabe , Miwa Kozawa , Shoichi Suda , Fumi Yamaguchi , Isao Yahagi , Michitaka Morikawa
IPC分类号： C08G77/38 , C09D183/06 , G03F7/004 , G03F7/023 , G03F7/075 , G03F7/40 , H01L21/027
CPC分类号： G03F7/0233 , C09D183/06 , G03F7/0045 , G03F7/0757
摘要： A positive type resist composition having an alkali-soluble siloxane polymer expressed by the following Formula (1), a photosensitive compound, and a 1 μm thick resist film formed of the positive type resist composition which has 5% to 60% of transmittance to i-line radiation; in the Formula (1), R1 and R2 express a monovalent organic group, and may be identical or different; “A” is a group expressed by the following Formula (2) having at least one phenolic hydroxyl group; and “a”, “b,” and “c” satisfy the following relation; a+b+c=1, in the Formula (2), R3, R4, and R5 express one of a hydrogen atom and a monovalent organic group, and may be identical or different, “m” expresses an integer, and “n” expresses an integer of 1 to 5. Preferably, 0.25≦a≦0.60, and 0≦c≦0.25. The composition is preferably used in a resist film undergoing oxygen plasma etching.
摘要翻译：具有由下式（1）表示的碱溶性硅氧烷聚合物的正型抗蚀剂组合物，感光性化合物和由正型抗蚀剂组合物形成的1μm厚的抗蚀剂膜，其具有对i的透射率的5％至60％线辐射; 在式（1）中，R 1和R 2表示一价有机基团，可以相同或不同; “A”是具有至少一个酚羟基的由下式（2）表示的基团; 和“a”，“b”和“c”满足下列关系：在式（2）中，a + b + c = 1，R 3，R 4，R 5和R 5表示氢原子和一价有机基团，并且可以相同或不同，“m”表示整数，“n”表示1至5的整数。优选地，0.25 <= a <= 0.60，0 <= c < 0.25。该组合物优选用于进行氧等离子体蚀刻的抗蚀剂膜。

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