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    • 3. 发明授权
    • Deep ultraviolet light emitting diode
    • 深紫外线发光二极管
    • US08907322B2
    • 2014-12-09
    • US13161961
    • 2011-06-16
    • Remigijus GaskaMaxim S. ShatalovMichael Shur
    • Remigijus GaskaMaxim S. ShatalovMichael Shur
    • H01L31/00H01L33/10H01L33/04H01L33/00H01L33/40H01L33/06H01L33/22H01L33/38
    • H01L33/04H01L33/06H01L33/10H01L33/22H01L33/385H01L33/405
    • A light emitting diode is provided, which includes an n-type contact layer and a light generating structure adjacent to the n-type contact layer. The light generating structure includes a set of quantum wells. The contact layer and light generating structure can be configured so that a difference between an energy of the n-type contact layer and an electron ground state energy of a quantum well is greater than an energy of a polar optical phonon in a material of the light generating structure. Additionally, the light generating structure can be configured so that its width is comparable to a mean free path for emission of a polar optical phonon by an electron injected into the light generating structure. The diode can include a blocking layer, which is configured so that a difference between an energy of the blocking layer and the electron ground state energy of a quantum well is greater than the energy of the polar optical phonon in the material of the light generating structure. The diode can include a composite contact, including an adhesion layer, which is at least partially transparent to light generated by the light generating structure and a reflecting metal layer configured to reflect at least a portion of the light generated by the light generating structure.
    • 提供一种发光二极管,其包括n型接触层和与n型接触层相邻的发光结构。 光产生结构包括一组量子阱。 接触层和发光结构可以被配置为使得n型接触层的能量与量子阱的电子基态能量之间的差大于光的材料中的极性光学声子的能量 生成结构。 另外,发光结构可以被配置为使得其宽度与用于通过注入到光产生结构中的电子发射极性光学声子的平均自由程相当。 二极管可以包括阻挡层,其被配置为使得阻挡层的能量与量子阱的电子基态能量之间的差异大于光生成结构的材料中的极化光学声子的能量 。 二极管可以包括复合触点,其包括对由光产生结构产生的光至少部分透明的粘附层和被配置为反射由光产生结构产生的光的至少一部分的反射金属层。
    • 7. 发明授权
    • Device having active region with lower electron concentration
    • 具有较低电子浓度的有源区的器件
    • US08497527B2
    • 2013-07-30
    • US12402526
    • 2009-03-12
    • Alexei KoudymovMichael ShurRemigijus Gaska
    • Alexei KoudymovMichael ShurRemigijus Gaska
    • H01L29/66
    • H01L29/7787H01L29/0657H01L29/2003H01L29/207H01L29/518H01L29/7831
    • A device comprising a two-dimensional electron gas that includes an active region located in a portion of the electron gas is disclosed. The active region comprises an electron concentration less than an electron concentration of a set of non-active regions of the electron gas. The device includes a controlling terminal located on a first side of the active region. The device can comprise, for example, a field effect transistor (FET) in which the gate is located and used to control the carrier injection into the active region and define the boundary condition for the electric field distribution within the active region. The device can be used to generate, amplify, filter, and/or detect electromagnetic radiation of radio frequency (RF) and/or terahertz (THz) frequencies.
    • 公开了一种包括二维电子气体的装置,其包括位于电子气体的一部分中的有源区。 有源区包含小于电子气体的一组非有源区的电子浓度的电子浓度。 该装置包括位于有源区域的第一侧上的控制终端。 该器件可以包括例如场效应晶体管(FET),其中栅极位于并用于控制载流子注入有源区域并且限定用于有源区域内的电场分布的边界条件。 该装置可用于产生,放大,滤波和/或检测射频(RF)和/或太赫兹(THz)频率的电磁辐射。